JPS6126521A - Production of quartz glass - Google Patents

Production of quartz glass

Info

Publication number
JPS6126521A
JPS6126521A JP14485084A JP14485084A JPS6126521A JP S6126521 A JPS6126521 A JP S6126521A JP 14485084 A JP14485084 A JP 14485084A JP 14485084 A JP14485084 A JP 14485084A JP S6126521 A JPS6126521 A JP S6126521A
Authority
JP
Japan
Prior art keywords
sol
quartz glass
filter
passed
filtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14485084A
Other languages
Japanese (ja)
Other versions
JPH0348140B2 (en
Inventor
Satoru Miyashita
悟 宮下
Sadao Kanbe
貞男 神戸
Motoyuki Toki
元幸 土岐
Tetsuhiko Takeuchi
哲彦 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP14485084A priority Critical patent/JPS6126521A/en
Publication of JPS6126521A publication Critical patent/JPS6126521A/en
Publication of JPH0348140B2 publication Critical patent/JPH0348140B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Silicon Compounds (AREA)

Abstract

PURPOSE:To produce completely homogeneous quartz glass of high quality usable in an optical system, by filtering a sol through a porous filter, and gelatinizing the filtered sol. CONSTITUTION:In production of quartz glass from at least an alkyl silicate and an ultrafine powdery silica as raw materials by the sol-gel method, sol is passed through a fine filter having <50mu pore diamter once or more, and gelatinized. Thus, completely homogeneous quartz glass of high quality can be produced, and the resultant quartz glass can be used in an optical system and applied to quartz substrates for photomasking, quartz glass fibers for ptical communication, various optical cells, etc. The sol has a high viscosity, and is gelatinized by drying to make the filtering operation difficult. Therefore, a method for continuously filtering the sol with a liquid supply pump under pressure is very effective. The use of a coarser filter to a finer filter one after another is preferred since clogging is not easily caused.

Description

【発明の詳細な説明】 〔技術分野〕 本発明はゾルQゲル法による石英ガラスの製造方法に間
中る。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method for producing quartz glass using the Sol-Q-gel method.

〔従来技術〕[Prior art]

石英ガラスは工C製造行穆中でるつぼやボード、拡散炉
等に使用これるようになり、その有用性がVめられ、炉
に水酸基の少ないものや光学的均一性の良いものが開発
されたことによって、各種の光学的用途忙使用されるよ
うになり、特に光通信用の石英ガラスファイバーが最近
注目されている。
Quartz glass came to be used for crucibles, boards, diffusion furnaces, etc. during the production of industrial carbon, and its usefulness was recognized, and furnaces with fewer hydroxyl groups and those with good optical uniformity were developed. As a result, silica glass fibers have come to be widely used in various optical applications, and quartz glass fibers for optical communications have recently attracted attention.

このように石英ガラスは種々の分野で使用され、その利
用範囲も広がっている。しかし石英ガラスの製造コスト
は高も、高価なことが問題忙なっている。安価で高品質
の石英ガラスを製造する方法として、ゾルOゲル法が昭
められている。
As described above, quartz glass is used in various fields, and the scope of its use is expanding. However, the manufacturing cost of quartz glass is high, and the high price is a problem. The sol-O-gel method has been hailed as a method for producing high-quality quartz glass at low cost.

ゾル・ゲル法を用いて歩留り良く、大型の石英ガラスを
得る方法として、アルキルシリケートを加水分解したゾ
ル中に超微粉末シリカを加え、更K PHを3〜6に調
整した後、50〜90℃で乾燥し、焼結する方法がある
。ドライゲル作製中の馴れの問題と、焼結中の割h、や
クラックの問題を同時に解決(1,たものであり、かな
り大きな石英ガラス(41nchφ以1:)が低コスト
で製造できるよう罠なうた。
As a method for obtaining large-sized quartz glass with good yield using the sol-gel method, ultrafine powdered silica is added to a sol prepared by hydrolyzing alkyl silicate, and the KPH is adjusted to 3 to 6, followed by 50 to 90. There is a method of drying at ℃ and sintering. This solves the problem of bending during dry gel production and the problems of splitting and cracking during sintering at the same time (1. Song.

結晶、気泡、不純物を含まない高品質の石英ガラスを製
造する方法としては、超音波振動により超微粉末シリカ
の分散を効果的に行なう方法、分散が不充分で残存する
塊状物を遠心分離により除去する方法等が提案きれ、そ
わなりお効果をあげている。(かし不定形状異物(数、
μ慴、〜50μm)がわずかながら存在し、完全に均質
な石英ガラスを製造するには至っていない。
Methods for manufacturing high-quality quartz glass that does not contain crystals, bubbles, or impurities include a method of effectively dispersing ultrafine silica powder using ultrasonic vibration, and a method of dispersing the remaining lumps due to insufficient dispersion by centrifugation. We have been able to suggest ways to remove it, and it has been very effective. (Irregularly shaped foreign objects (number,
50 μm), and it has not been possible to produce completely homogeneous quartz glass.

不定形状異物は、製造工稈中に混入するゴミや市販され
ている超微粉末シリカ(例えばCσ、b−θ−5il 
(cabot社製)、Aerosil (Degり+、
ssa社製)、yransil (yransil a
:JIM )、D、 c、 5ilica (Da、w
CoTning社製))中に含まれる粗粒(45μ慴の
フィルターを通らない)が原因と考見られる。ゾル中に
既に存在するこれらの異物を分離し、均質なゾルを調整
できないと高品質の石英ガラスを製造することけできな
い。現在のままでは光学系に使用できない為、その応用
範囲か肇めて限られたものにt「っている□ 〔目的〕 本発明はこのような問題点を解決するもので、完全に均
質な高品質の石英ガラスを製造中る方法を捷供すへとと
kある、 〔概要〕 本発明の石英ガラスの製造方法は、少なくともアル千ル
シリケートおよび超微粉末シリカを原料とするゾル・ゲ
ル法による石英ガラスの製造方法において、ゾルを5Q
tamより細かいフィルターを用いて1回以上漏過した
稜ゲル化させることを特徴とする。
Irregularly shaped foreign substances include dust mixed in the manufacturing process and commercially available ultrafine powdered silica (e.g. Cσ, b-θ-5il).
(manufactured by Cabot), Aerosil (Deguri+,
manufactured by SSA), yransil (yransil a)
:JIM), D, c, 5ilica (Da, w
The cause is thought to be coarse particles (which do not pass through a 45 μm filter) contained in CoTning (manufactured by CoTning). Unless these foreign substances already present in the sol are separated and a homogeneous sol is prepared, high-quality quartz glass cannot be manufactured. As it currently stands, it cannot be used in optical systems, and its range of application is therefore limited. [Purpose] The present invention is intended to solve these problems, and to create a completely homogeneous material. [Summary] The method for producing quartz glass of the present invention is a sol-gel method using at least alkyl silicate and ultrafine powder silica as raw materials. In the method for manufacturing quartz glass according to
It is characterized by gelling the ridge that has leaked at least once using a filter finer than tam.

ゾルは粘性が高く(数十op)、乾燥するとゲル化して
しまう為、濃過操作が難かしい。送液ポンプ等を用いて
、連続的に加圧濃過を行なう方法は大変有効でaす、処
理能力も増加する。
The sol has a high viscosity (several tens of ops) and turns into a gel when dried, making it difficult to concentrate. Continuous pressurized concentration using a liquid pump or the like is very effective and increases processing capacity.

またゾル中Kl−を巨大粒子(数十μm)が混在してお
り、いきなり細かいフィルターを渉すと目づまりを起こ
しやすい。その為、ネず相いフィルターを通した後、順
次より細かいフィルターを用いて濃過する方法が有効で
ある。細かいフィルターを用いるほど、・石英ガラスの
品質は向上する、同じサイズのフィルターでも、数回通
過ζせることにより、品質を向上シせることができるー
〔実施例〕 以下、本発明につl/1て実施例に基づ^詳細に卯明す
る。
In addition, Kl- in the sol contains large particles (several tens of micrometers), and if it suddenly passes through a fine filter, it tends to become clogged. Therefore, it is effective to pass through a mesh filter and then use successively finer filters to concentrate. The finer the filter is used, the better the quality of the quartz glass becomes.Even with the same size filter, the quality can be improved by passing it through several times. 1 will be explained in detail based on an example.

実施例1 エチルシリケート44tと005規定塩酸水溶液6.6
tを激しく攪拌し、無色透明の均一溶液を得た。そこに
超微粉末シリカ(Aerosil ox −5o )1
、5 Kpを徐々に添加し、充分に攪拌した。ゾルを2
0℃に俣ちながら213KH2の超音波を2時間照射す
ると、粘性は50 cp (25℃)から25cgに低
下し、平均粒径も022μmから0,16μmに減少し
た。
Example 1 44 tons of ethyl silicate and 6.6 tons of 005N hydrochloric acid aqueous solution
The mixture was stirred vigorously to obtain a colorless and transparent homogeneous solution. There is ultrafine powdered silica (Aerosil ox-5o) 1
, 5 Kp were gradually added and stirred thoroughly. 2 sol
When irradiated with 213 KH2 ultrasound for 2 hours at 0°C, the viscosity decreased from 50 cp (25°C) to 25 cg, and the average particle size decreased from 0.22 μm to 0.16 μm.

更に1500 Gの遠心力を10分間かけ、分散が不充
分の巨大粒子を沈降略せたー 得らり、た均@度の高いゾル(以後ゾルAと呼ぶ)を工
γ−ポンプを用いて孔径50μmのフィルター(ポリプ
ロピレン製カートリッジ型フィルター(東洋科学産業株
式会社製))に送り、3 K?/Cl1l”の圧力で濃
過を行t「つた。8tのゾルが2分間で処理できた。
A centrifugal force of 1500 G was further applied for 10 minutes to precipitate the poorly dispersed giant particles.A highly homogeneous sol (hereinafter referred to as sol A) was produced using a γ-pump to reduce the pore size. It was sent to a 50 μm filter (polypropylene cartridge type filter (manufactured by Toyo Kagaku Sangyo Co., Ltd.)) and heated at 3K? Concentration was carried out at a pressure of 1 liter/Cl. 8 tons of sol could be processed in 2 minutes.

回収し次ゾルをPH4,1に調整してから、ポリプロピ
レン製容器(幅20硼x20傭×高ざ10a)に深さが
1cmになる量のゾルを移入し、60℃で7日間乾燥さ
せた。直径14傭、厚さ0,7Qのドライゲルが得ら力
、180℃/hrの昇温速度で1300℃まで加熱する
と、直径jOcm、厚さ0.5硼の石英ガラスが製造で
きた。
After collecting and adjusting the pH of the sol to 4.1, an amount of the sol to a depth of 1 cm was transferred to a polypropylene container (width 20 cm x 20 cm x height 10 a) and dried at 60°C for 7 days. . A dry gel with a diameter of 14 mm and a thickness of 0.7 Q was obtained, and when heated to 1300 °C at a heating rate of 180 °C/hr, quartz glass with a diameter of j0 cm and a thickness of 0.5 cm was produced.

石英ガラス中に数十μmの不定形状異物を若干含むもの
の、ゾルAをそのままゲル化させて製造した石英ガラス
より品質的にすぐれていた。
Although the quartz glass contained some irregularly shaped foreign matter of several tens of micrometers, it was superior in quality to the quartz glass produced by directly gelling Sol A.

実施例2 ゾルAを孔径50μmのフィルターを通してから−に孔
径10μmのフィルターを通した。3に−2の圧力をか
け8tのゾルが3分間で処理でき念。
Example 2 Sol A was passed through a filter with a pore size of 50 μm, and then passed through a filter with a pore size of 10 μm. I was able to process 8 tons of sol in 3 minutes by applying a pressure of -2 to 3.

回収したゾルを実施例1と同様の操作により石英ガラス
としたところ、10〜20μmの不定形状異物が1−に
数個存在しているのみで、かなり均質閾が高かうた。
When the recovered sol was made into quartz glass by the same operation as in Example 1, only a few irregularly shaped foreign particles of 10 to 20 μm were present in 1-, and the homogeneity threshold was quite high.

実施例3 ゾルAを孔径50μ空のフィルターを伸してから更に孔
径10μmのフィルターを3回通した。
Example 3 Sol A was stretched through a filter with a pore size of 50 μm and then passed through a filter with a pore size of 10 μm three times.

回収したゾルを実施例1と同様の操作により石英ガラス
としたところ、10μ空以上の不定形状異物は全く存在
せず、極めて高品質だった。
When the recovered sol was made into quartz glass by the same operation as in Example 1, there was no irregularly shaped foreign matter of 10 μm or more, and the quality was extremely high.

実施例4 ゾルAを孔径50μm及び10μmのフィルターを通し
た後、更に孔径5μmのフィルターを通した。
Example 4 Sol A was passed through filters with pore diameters of 50 μm and 10 μm, and then further passed through a filter with pore diameter of 5 μm.

5 Kp/cm2の圧力をかけ81のゾルが3分間で処
理できた。
Applying a pressure of 5 Kp/cm2, 81 sols could be processed in 3 minutes.

回収したゾルを実施例1と同様の操作により石英ガラス
としたところ、10μm以上の不定形状異物は全く存在
せず、極めて高品質だった。
When the recovered sol was made into quartz glass by the same operation as in Example 1, there was no irregularly shaped foreign matter of 10 μm or more, and the quality was extremely high.

実施例5 ゾル八を孔径50μm及び10μmのフィルターを通し
た後、ulに孔径1μ情のフィルターを通しfc15 
K17cm 2の圧力をかけ8tのゾルが5分間で処理
できた、 回収したゾルを実施例1と同様の操作忙より石英ガラス
としたところ、完全に均質であり、極めて高品質だった
Example 5 Solhachi was passed through filters with a pore size of 50 μm and 10 μm, and then passed through a filter with a pore size of 1 μm through UL.
8 tons of sol was processed in 5 minutes by applying a pressure of 17 cm 2 K. When the recovered sol was made into quartz glass by the same operation as in Example 1, it was completely homogeneous and of extremely high quality.

比較例 ゾルAをフィルターをy#ζず、実施例1と同様の操作
により石英ガラスとしたところ、数十μmの不定形状異
物が点在し、外部から混入したと思わ灼る糸クズ状のも
のも観察された。
When Comparative Example Sol A was made into quartz glass by the same operation as in Example 1 without using a filter, irregularly shaped foreign matter of several tens of micrometers was scattered, and it was thought that it had been mixed in from the outside. things were also observed.

〔効果〕〔effect〕

以上述べたように本発明によれば、少なくともアルキル
シリケートおよび超微粉末シリカを原料とするゾル・ゲ
ル法による石英ガラスの製造方法において、ゾルを50
μmより細かいフィルターを用いて1回線上濃過した後
ゲル化させること忙より、完全に均質な高品質の石英ガ
ラスを製造できる。その為、製造した石英ガラスを光学
系で用いることが可卯になり、フォトヤスク用石英基盤
、光通信用石英ガラスファイバー、各浦光学甲セA・埠
、限りない応用の道が開かれた1、 tフ h
As described above, according to the present invention, in the method for producing quartz glass by the sol-gel method using at least alkyl silicate and ultrafine powder silica as raw materials, the sol is
Completely homogeneous, high-quality quartz glass can be produced by concentrating in one pass using a filter finer than μm and then gelling it. As a result, it became possible to use the manufactured quartz glass in optical systems, opening the way to limitless applications such as quartz substrates for photo yasks, quartz glass fibers for optical communications, and each other. , t h

Claims (1)

【特許請求の範囲】 1)少なくともアルキルシリケートおよび超微粉末シリ
カを原料とするゾル・ゲル法による石英ガラスの製造方
法において、ゾルを50μmより細かいフィルターを用
いて1回以上漏過した後ゲル化させることを特徴とする
石英ガラスの製造方法。 2)送液ポンプ等を用いて、連続的に加圧漏過を行なう
ことを特徴とする特許請求の範囲第1項記載の石英ガラ
スの製造方法。 3)まず粗いフィルターを通した後、順次より細かいフ
ィルターを用いて漏過することを特徴とする特許請求の
範囲第1項又は第2項記載の石英ガラスの製造方法。
[Claims] 1) In a method for producing quartz glass by a sol-gel method using at least an alkyl silicate and ultrafine powdered silica as raw materials, the sol is passed through a filter finer than 50 μm one or more times and then gelled. A method for manufacturing quartz glass characterized by: 2) The method for producing quartz glass according to claim 1, characterized in that pressurized leakage is performed continuously using a liquid feeding pump or the like. 3) The method for producing quartz glass according to claim 1 or 2, wherein the quartz glass is first passed through a coarse filter and then sequentially passed through finer filters.
JP14485084A 1984-07-12 1984-07-12 Production of quartz glass Granted JPS6126521A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14485084A JPS6126521A (en) 1984-07-12 1984-07-12 Production of quartz glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14485084A JPS6126521A (en) 1984-07-12 1984-07-12 Production of quartz glass

Publications (2)

Publication Number Publication Date
JPS6126521A true JPS6126521A (en) 1986-02-05
JPH0348140B2 JPH0348140B2 (en) 1991-07-23

Family

ID=15371867

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14485084A Granted JPS6126521A (en) 1984-07-12 1984-07-12 Production of quartz glass

Country Status (1)

Country Link
JP (1) JPS6126521A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62246827A (en) * 1986-04-16 1987-10-28 Seiko Epson Corp Production of glass
JP2018090440A (en) * 2016-12-02 2018-06-14 クアーズテック株式会社 Method for manufacturing optical component having acute part

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5978948A (en) * 1982-10-28 1984-05-08 Seiko Epson Corp Manufacture of quartz glass
JPS59116135A (en) * 1982-12-23 1984-07-04 Seiko Epson Corp Manufacture of quartz glass

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5978948A (en) * 1982-10-28 1984-05-08 Seiko Epson Corp Manufacture of quartz glass
JPS59116135A (en) * 1982-12-23 1984-07-04 Seiko Epson Corp Manufacture of quartz glass

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62246827A (en) * 1986-04-16 1987-10-28 Seiko Epson Corp Production of glass
JP2018090440A (en) * 2016-12-02 2018-06-14 クアーズテック株式会社 Method for manufacturing optical component having acute part

Also Published As

Publication number Publication date
JPH0348140B2 (en) 1991-07-23

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