JPS61257602A - Method and apparatus for polishing shoe heel - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" The present invention relates to a polishing method and a polishing apparatus for automatically polishing the exterior surface of the heel of a shoe.

``Prior Art and its Problems'' As shown in FIG. 11, the heel 1 of a leather shoe is made of synthetic resin or wood, and a heel core 2 is made of synthetic resin or wood. At the same time, the outer leather 3b is also glued on the vertical front surface, and after fixing a bottom piece 4 such as rubber to the lower end of the heel core 2, the outer leather 3a and 3b are colored. After the surfaces of the exterior leathers 3a and 3b are polished and polished, they are attached to the soles of the shoes. The top surface 2a of the heel core 2 has a curved concave surface, and the top surface 2a is exposed without being bonded with the exterior leather. Note that the front exterior leather 3b may be omitted.

Conventionally, polishing of the exterior leathers 3a and 3b has generally been performed one by one manually, which requires a great deal of effort and time.

Therefore, attempts have been made to develop methods and devices for automatically performing this process, but no practical method has been proposed yet.

An object of the present invention is to provide a polishing method and a polishing apparatus that can automatically polish the surface of the exterior leather 3a or even the exterior leather 3b in an extremely efficient manner.

"Means for Solving the Problems" The polishing method of the present invention provides at least five
While the heel clamping mechanisms are installed with a predetermined phase difference, a carry-in device, a first rough polishing device, a second rough polishing device, a finish polishing device, and a carry-out device are installed around the turntable in the direction of rotation thereof. The heel clamping mechanism is sequentially arranged to face the carry-in device, the first rough polishing device, the second rough polishing device, the final polishing device, and the carry-out device by rotating the turntable. Then, a step of vertically holding the heel carried in by the carrying device with a heel holding mechanism opposite thereto, and a first step.
a step of roughly polishing one side of the circumference with a rotary buff of the first rough polishing device while rotating the heel held by a heel clamping mechanism facing the rough polishing device; and a second rough polishing step. a step of rotating the heel held by a heel holding mechanism facing the device and rough polishing the other side of its circumference with a rotary buff of the second rough polishing device; and a step of rotating the heel held by the heel gripping mechanism facing the device; A step of polishing both sides of the circumference of the heel clamped by the mechanism with a rotating buff of the final polishing device while rotating the heel, and releasing the heel clamped by the clamping mechanism facing the carry-out device. The process of transporting the turntable out of the turntable using the transporting device is performed in parallel.

The polishing device of the present invention includes a turntable rotated by a motor or the like, at least five heel clamping mechanisms mounted on the turntable with a predetermined phase difference, and a heel clamping mechanism arranged around the turntable in the direction of rotation thereof. A carrying out device, a first rough polishing device, a second rough polishing device arranged in sequence,
a final polishing device, a carry-out device, and a first rough polishing heel rotation device disposed around the turntable and at the installation positions of the first rough polishing device, the second rough polishing device, and the final polishing device, respectively; It consists of a second heel rotation device for rough polishing and a heel rotation device for final polishing.

Each heel clamping mechanism has two points: an upper pressing body that presses from above the bottom piece of the heel that is carried in upside down by the carrying device, and a downwardly facing curved top surface of the heel that is swingably supported from below. The lower rotary receiver is provided with a rocking body swingably attached thereto, and a transmission gear for transmitting rotation to the lower rotary receiver. The first rough polishing device, the second rough polishing device, and the final polishing device each include a rotating buff, a buff rotation motor that rotates the buff, and a rotating buff that moves back and forth with respect to the heel held by the heel holding mechanism. The present invention includes a buff back and forth movement mechanism that moves the buff, a buff up and down movement mechanism that moves the rotary buff up and down, and a wax pressure contact mechanism that presses the solid wax against the rotary buff. The first heel rotation device for rough polishing, the second heel rotation device for rough polishing, and the heel rotation device for final polishing each have a drive gear that meshes with a transmission gear of the heel clamping mechanism facing thereto,
It is equipped with a heel rotation motor that rotates this drive gear. The first heel rotating device for rough polishing rotates the lower rotary receiver by a predetermined amount so that the first rough polishing device roughly polishes one side of the circumference of the heel. The second rough polishing heel rotating device rotates the lower rotary receiver by a predetermined amount so that the other side of the circumference of the heel is roughly polished by the second rough polishing device. The heel rotation device for final polishing rotates the lower rotary receiver by a required amount so as to perform final polishing on both sides of the circumference of the heel.

"Function" According to the polishing method of the present invention, heels carried onto a turntable by a carry-in device are first held vertically one by one by a heel holding mechanism, and then are subjected to first rough polishing as the turntable rotates. It is transported to a position facing the device, and one side surface of the circumference is roughly polished by this rough polishing device. When the turntable rotates again, the heel, while being held by the heel holding mechanism, is transferred to a position facing the second rough polishing device, which then roughly polishes the other side of the circumference. Ru. When the turntable further rotates, the heel is moved to a position facing the final polishing device, whereby both sides of the heel are polished.

Finally, as the turntable rotates, the heel is moved to a position facing the carry-out device, released from the heel clamping mechanism, and carried out from above the turntable. The heels were brought in one by one like this, and the sides were roughly polished.

The five steps of rough polishing of the other side, finishing polishing of both sides, and removal are carried out in sequence, but these five steps are carried out in parallel, and when the first heel is carried out, the second heel is removed at the same time. is finished polished, the third heel is roughly polished on the other side, the fourth heel is roughly polished on one side, and the fifth heel is carried in.

According to the polishing device of the present invention, the heel is held upside down by the heel holding mechanism, and its downward curved top surface is swingably supported at two points by the lower rotary receiver of the heel holding mechanism. Therefore, even if the curved top surface is distorted, it is held straight by the heel holding mechanism. The rotary buffs of the first and second rough polishing devices and the final polishing device are moved up and down while moving forward and backward according to the curved surface of the heel. Moreover, this rotary buff rotates while being coated with solid wax by a wax pressure welding mechanism. The transmission gear of the heel clamping mechanism is a drive gear of the first rough polishing heel rotation device, and a second transmission gear as the turntable rotates.
The drive gear of the heel rotation device for rough polishing and the drive gear of the heel rotation device for final polishing are sequentially engaged, and rotation is transmitted to the lower rotation receiver at each opposing position to rotate the heel.

"Example" An example of the present invention will be described in detail below based on the drawings.

First, to explain the outline of the polishing apparatus of this example, as shown in FIGS. 5, a carrying device 7, a first rough polishing device 8,
Second rough polishing device 9, third rough polishing device 10, final polishing device 11. A carry-out device 12 is attached. Further, on the machine stand 5, first rough polishing devices are provided between the turntable 6 and the first rough polishing device 8, the second rough polishing device 9, the third rough polishing device 10, and the final polishing device 11, respectively. IS heel rotation device 1
3. Second rough! f A heel rotation device 14 for polishing, a third heel rotation device 15 for rough polishing, and a heel rotation device 16 for final polishing are attached.

Six heel clamping mechanisms 17 are mounted on the upper surface of the turntable 6 with a phase difference of 60 degrees.

The turntable 6 is intermittently rotated by 60 degrees by a stamping motor 18 (FIG. 3) installed in the machine base 5, and the six heel clamping mechanisms 17 are transferred to a loading device 7, a first rough polishing device 8, a second rough polishing device 9, a third rough polishing device 10,
Finish polishing device 11. They are made to face the unloading device 12 one after another.

Therefore, when the turntable 6 is stopped, the six heel clamping mechanisms 17 are operated by the carrying-in device 7, the first rough polishing device 8, the second rough polishing device 9, the third rough polishing device 10, and the final polishing device. Device 11. When facing the FM output device 12, and simultaneously facing the first rough polishing device 8, the first rough polishing heel rotation device 13 and the second rough polishing device 9 simultaneously. When facing the third rough polishing heel rotation device 10, the heel rotation device 14 for rough polishing, and the third heel rotation device 15 for rough polishing simultaneously, and when facing the finish polishing device 11, the heel rotation device for final polishing. 16 respectively. Therefore, in the following, m-man apparatus 7, first rough polishing device 8, second rough polishing device 9, third rough polishing device 10, final polishing device 1
1. The installation positions of the carry-out device 12 are respectively referred to as a carry-in position, a first rough polishing position, a second rough polishing position, a third rough polishing position, a final polishing position, and a carry-out position.

Figure 10 shows the movement of the heel l shown in Figure 11 and its fjJf.
It shows the relationship between the surfaces to be polished. The outline of the polishing method of the present example will be explained with reference to this figure. The heel 1 is placed upside down on the conveyor belt 19 (FIG. 1), for example, and is sent into the present polishing apparatus. They are captured one by one by the carry-in device 7 and transferred from the belt conveyor 19 to the heel clamp mechanism 17 at the carry-in position A. After being held upside down by the heel clamp mechanism 17, the turntable 6 is turned into a 60-degree plane. By rotating, it is sent to the first rough polishing position B. At this point, at WjlB, the heel 1 is rotated in the circumferential direction by the first rough polishing heel rotating device 13 while being held by the heel clamping mechanism 17, and is subjected to the polishing action by the first rough polishing device 8. One half of the curved exterior leather 3a is roughly polished. Thereafter, the heel 1 is sent to the second rough polishing position C by further rotating the turntable 6 by 60 degrees, and in this position C, the heel 1 is rotated by the second rough polishing heel rotation device 14 and then rotated to the second rough polishing position C. The other half of the exterior leather 3a is roughly polished by the polishing action by the rough polishing device 9 of No.2. Next, the heel 1 is sent to a third rough polishing position, and its direction is reversed by the third rough polishing heel rotation device 15, and the heel 1 is polished by the third rough polishing device 10 without being rotated. As a result of this action, the entire surface of the nearly vertical exterior leather 3b is roughly polished. Furthermore, heel 1 is finished gfF! i
While being sent to position E and being rotated by the heel rotation device 16 for final polishing, it is subjected to the polishing action by the final polishing device 11, and the entire surface of the surface exterior leather 3a, 3b is finally polished. Finally, the heel 1 is transported to the carry-out position F, where it is released from the grip of the heel clamping mechanism 17 and captured by the carry-out device 12,
As a result, it is transferred onto the unloading belt conveyor 20,
It is carried out to the outside of this polishing device.

The heels 1 are brought in one by one in this way, rough polishing of one half of the exterior leather 3a, rough polishing of the other half of the exterior leather 3a, rough polishing of the exterior leather 3b, and rough polishing of the exterior leather 3a and 3b. The six steps of finishing polishing and carrying out are carried out sequentially, but these six steps are carried out in parallel. ``When the first heel 1 is carried out, at the same time, the second heel 1 is Surface exterior leather 3a, 3b
The third heel 1 has the outer leather 3b roughly polished, the fourth heel 1 has the other half of the outer leather 3a roughly polished, and the fifth heel 1 has the mailbag leather 3a rough polished. One half of the heel 1 is roughly polished, and the sixth heel 1 is newly brought in.

Next, each device constituting this polishing apparatus will be specifically explained.

The carrying-in device 7 and the carrying-out device 12 have substantially the same structure, and the first. 4t! As shown in FIG. 1, a manipulator 23 that is mounted on a mounting plate 21 fixed to the top surface of the machine base 5 and has a pair of fingers 22 at its tip can be rotated by a rotation actuator 24, and a telescopic air cylinder 2
5 allows it to expand and contract.

Each heel clamping mechanism 17 has an upper pressing body 26 and a lower rotating receiver 27, as shown in FIGS. The upper pressing body 26 is rotatably supported vertically by a shaft 29.The upper pressing body 26 has a cap 3 having an elastic protrusion 30 protruding from its lower end.
1 is removably fitted to the lower end of a spindle 32, and the upper end of the spindle 32 is attached to a bracket 34 attached to a sliding table 33 with a needle bearing 35a.
The 6-sliding table 33, which is rotatably suspended by a thrust bearing 35b, is vertically slidable on two vertical guide rods 37 at the upper end of a guide table 36 fixed to the upper surface of the turntable 6. It is mounted and urged downward by a spring 38 wound around the guide rod 37. A slide rod 39 is inserted through the guide table 36 so as to be vertically slidable. The lower end 39a of the slide rod 39 projects downward through a hole 40 formed in the turntable 6, and a spring 41 is interposed between the head 39b at the upper end and the upper surface of the guide table 36. ing. The slide rod 39 is normally pushed down by the slide table 33 so that its lower end 39a protrudes to a lower position shown by the chain line in FIG. 6.7.

In order to push up the slide table 33 via this slide rod 39, a clamping air cylinder 42 is installed at the carry-in position A on the lower side of the upper surface of the machine frame 5, and a clamp-releasing air cylinder 43 (the third 2.3) are arranged respectively. When the heel clamping mechanism 17 is set at the carry-in position A, the lower end 39a of the slide rod 39 is aligned with the piston rod 42a of the clamping air cylinder 42 as shown in FIG.
The slide rod 39 is pushed up by the extension of the piston rod 42a, and the slide table 33 is lifted against the spring 38. As a result, the upper pressing body 26 is maintained at a predetermined position above.

On the other hand, a guide recess 44 is formed in the upper surface of the lower rotating receiver 27, as shown in FIG. There is. This rocking body 45 is biased upwardly on both the left and right sides by a pair of left and right springs 47 on the lower side thereof.
Usually held horizontally. A pair of left and right pins 48 are provided protruding from the upper surface of the rocking body 45. In addition, the lower rotation receiver 2
A transmission gear 49 is fixed to the lower end of the shaft 29 of 7. A pair of cam followers 50 are rotatably supported below the transmission gear 49 with a phase difference of 180 degrees. When the turntable 6 rotates, these cam followers 50 move along the periphery of a guide disk 51 installed on the upper surface of the machine base 5 below the turntable 6. As shown in FIG. 3, the periphery of this guide disk 51 has
Arc-shaped recesses 51a are formed between the first rough polishing position B, the second rough polishing position C1, the third rough polishing position, and the final polishing position.

Now, the heels 1 on the carry-in belt conveyor 19 are held upside down by the fingers 22 of the carry-in device 7 one by one.
By turning and extending the manubrake 23, the loading position A is
The upper pressing body 26 and the lower rotating receiver 27 of the heel clamping mechanism 17
will be moved between. When the heel 1 is positioned between these positions (at this time, the heel 1 turns its curved outer leather 3a toward the outside of the turntable 6), the clamping air cylinder 42 is activated and its piston rod 42a is lowered. As a result, the sliding table 33 also descends, and the upper pressing body 26 moves f￥! 1 while pushing down the heel 1 in conjunction with the lower rotation receiver 27.
Hold it upside down and hold it vertically as shown in Figure 6. At this time, the downward facing top surface 2a of the heel core 2 of the heel 1 is
Since the heel 1 is supported at two points by the two pins 48 of 5 so as to be able to swing left and right, even if the curve of the top surface 2a is distorted, the center line of the heel 1 is always aligned with the upper pressing body 26 and the lower rotating receiver. It is held correctly and precisely so that it is located on the center line of 27.

Note that a plurality of caps 31 with different lengths are prepared so that they can be replaced depending on the size of the heel 1.

The heel 1 held in this manner is conveyed while being held as the turntable 6 rotates. During the forwarding, the two cam followers 50 move along the periphery of the guide disk 51, and the lower rotary receiver 27 moves while its rotation relative to the turntable 6 is restricted, so that the heel 1 moves as shown in FIG. As shown in the figure, the curved exterior leather 3a is kept facing outward.

Next, the first rough polishing heel movement device 13. Second rough polishing heel rotation device 14. The third heel rotation device 15 for rough polishing and the heel rotation device 16 for final polishing have substantially the same structure,
As shown in Fig. 3.9, a motor base plate 53 is horizontally rotatably supported on the upper surface of the machine base 5 by a shaft 52, and a geared motor 54 that can be rotated in forward and reverse directions is mounted below the motor base plate 53. A drive gear 55 is fixed to the output shaft of the geared motor 54 on the motor base plate 53. The motor base plate 53 is urged to rotate toward the turntable 6 by a spring 56. Further, on the top surface of the machine base 5, two proximity switches 57 for the original position and the reverse position that respond to the cam follower 50 are arranged with a phase difference of, for example, 90 degrees, and further on the top surface of the guide disk 51. A heel drop detection proximity switch 58 that reacts with the lower end 39a of the slide rod 39 is disposed. This proximity switch 58 is activated when the heel 1 falls from between the upper pressing body 26 and the lower rotary receiving body 27 and the sliding base 33 is lowered, and the sliding base 33 pushes down the slide rod 39 so that the lower end portion 3 of the heel 1 falls.
9a is the 9th [! It turns on when it descends to the position indicated by the dashed line. A cam follower 50 is also mounted on the guide disk 5 on the top surface of the machine base 5.
A guide piece 59 that guides the inside of the first recess 51a is fixed.

The heel clamping mechanism 1 clamps the heel 1 at the carry-in position A as described above.
7 is moved to the first rough polishing position B as the turntable 6 rotates, its transmission gear 49 meshes with the drive gear 55 of the first rough polishing heel rotation device 13. At this time, the motor base plate 53 rotates slightly against the spring 56, so that the gears 49 and 55 mesh smoothly. Further, both cam followers 50 enter into the recess 51a of the guide disk 51 while being guided by the guide piece 59. As a result, the transmission gear 49 is allowed to rotate, and the drive gear 5
5 rotations are transmitted. When the transmission gear 49 rotates,
Together with this, the lower rotating receiver 27 rotates and the heel 1 rotates, and the upper pressing body 26 also rotates while pressing the heel 1. The drive gear 55 rotates starting from the position where one cam follower 50 is detected by the original position proximity switch 57, and even after the cam follower 50 is detected by the reverse position proximity switch 57, the drive gear 55 rotates further by a predetermined amount by the action of the timer. It is rotated in the same direction, then reversed, and rotated back to its original position. By such rotation, the heel 1 is reciprocated within a predetermined angle range including one half from the center line of the curved exterior leather 3a to one side edge, and the heel 1 is rotated back and forth within a predetermined angular range that includes one half from the center line of the curved exterior leather 3a to one side edge thereof, and the heel 1 is rotated back and forth within a predetermined angle range including one half from the center line of the curved exterior leather 3a to one side edge thereof. Rough polishing is performed by the rough polishing device 8 as follows.

The first and second rough polishing devices 8.9 have substantially the same structure, and as shown in FIG. is mounted so as to be horizontally slidable along the rail 62, and a rotating frame 63 is installed on this sliding table 61 so as to be vertically movable via a shaft 64. A rotating buff 65 is mounted on the front end of the rotating frame 63. The rotary buff 65 is rotatably supported horizontally and removably, and a buff rotation motor 66 for rotating the rotary buff 65 is attached to the rear end. The rotation frame 63 is rotated up and down by the operation of the air cylinder 67 for vertical movement of the buff. The sliding table 61 is urged forward by a weight 68 connected thereto, and is retreated by an air cylinder 69 for buff retraction. Buff rotation motor 6
6 is transmitted to the rotating buff 65 via the belt 70. Further, a wax attachment frame 70 is attached to the rotating frame 63. The wax attachment frame 70 is equipped with a wax press mechanism, that is, a wax clamping body 72 that removably clamps the solid wax 71 so as to be slidable back and forth, and a wax clamping mechanism that moves the wax clamping body 72 back and forth. An air cylinder 73 is attached, and the solid wax 71 is always urged to be in pressure contact with the rotary buff 65 by the action of the air cylinder 73.

Therefore, the rotating buff 65 of the first rough polishing device 8 is rotated horizontally by the buff rotation motor 66 with respect to the exterior leather 3a of the heel 1 which is rotated at the first rough polishing position B as described above. The buff is moved upward or downward by an air cylinder 67 for vertical movement while being pressed by a weight 68, and automatically moves backward or forward according to the curved surface of the heel 1. Polishing position B
In this case, one half of the exterior leather 3a from the center line to one side edge is roughly polished.

Next, when the heel clamping mechanism 17 is sent to the second rough polishing position C, its transmission gear 49 meshes with the drive gear 55 of the second rough polishing heel rotation device 14. This second heel rotation device 14 for rough polishing rotates the heel l at a predetermined angle including the other side edge from the center line of the exterior leather 3a in the opposite direction to the first heel rotation device 13 for rough polishing. The heel 1 is set to reciprocate within a range, and the heel 1 sent to the second rough polishing position C is aligned with the center line of the exterior leather 3a by the horizontally rotating rotary buff 65 of the second rough polishing device 9. The other side half from the to the other side edge is roughly polished in the same manner as above.

The third rough polishing device 10 and the final polishing device 11 have substantially the same structure, and since they support the rotary buff 65 vertically rotatably, the mounting of the buff rotation motor 66 is different from the configuration. Although the connection structure between the rotary buff 65 and the attachment of the wax mounting frame 70 is slightly different from that of the first and second rough polishing devices 8.9, the operation thereof is the same.

When the heel clamping mechanism 17 is sent to the third rough polishing position,
The transmission gear 49 meshes with the drive gear 55 of the third heel rotation device 15 for rough polishing. This third heel rotation device 15 for rough polishing rotates the lower rotary receiver 26 by 180 degrees after one cam follower 50 is detected by one proximity switch 57 (the other proximity switch 57 is electrically The direction of the heel l is reversed by 180 degrees and the almost vertical exterior leather 3b is held facing the outside of the turntable 6. The heel l held in this orientation is roughly polished over the entire surface of the exterior leather 3b by the rotary buff 65 of the third rough polishing device 10, which is moved upward or downward while rotating vertically. After the polishing has been carried out for a certain period of time, the lower rotating receiver 26 is rotated back by the third rough polishing heel rotation device 15, and the heel l is returned to its original orientation.

When the heel clamping mechanism 17 is sent to the final polishing position E, its transmission gear 49 meshes with the drive gear 55 of the heel rotation device 16 for final polishing. This heel rotation device for finishing polishing 1
6, the heel 1 is reciprocated in one direction within a predetermined angle range that includes the center line of the exterior leather 3a and the center line of the exterior leather 3b, and then similarly reciprocated in the opposite direction. It is set as follows. While the heel 1 is being rotated in this way at the final polishing position E, the surface exterior leathers 3a and 3 are removed by the rotary buff 65 of the final polishing device 11 that rotates vertically.
The entire surface of b is finished and polished.

When the heel clamp holding mechanism 17 is transferred to the unloading position F, the lower end 39a of the slide rod 39 faces the piston rod 43a (FIG. 3) of the clamp releasing air cylinder 43. At this time, the carry-out device 12 is operated and the heel 1 is gripped by it, and at the same time, the air cylinder 43 is operated and the upper pressing body 26 is raised. As a result, after the heel 1 is released from being held by the heel holding mechanism 17, the heel 1 is released from the holding by the heel holding mechanism 17, and then
is transferred onto the conveyor belt 20 for carrying out.

Note that when polishing a heel without the exterior leather 3b, the third rough polishing device 10 and the third rough polishing heel rotation device 15 are kept inactive.

"Effects of the Invention" As detailed above, according to the polishing method of the present invention, the five steps of carrying in the heel, rough polishing of its side, rough polishing of the other side, final polishing of both sides, and carrying out are carried out on a turntable. Since the polishing can be carried out in parallel, the heel can be polished very efficiently and automatically in a narrow space.

Further, according to the polishing device of the present invention, the heel is held upside down by the heel holding mechanism, and the downwardly facing curved top surface is pivotably moved at two points by the lower rotary receiver of the heel holding mechanism. Because of the support, even if the curved top surface is distorted, the heel can be held straight and accurately, so the heel will not come off the heel holding mechanism during polishing work with the rotating buff. The rotary buffs of the first and second rough polishing devices and the final polishing device can be moved up and down while moving forward and backward according to the curved surface of the heel, and can be rotated while applying solid wax, so that the curved surface of the heel can be perfectly smoothed. Can be automatically polished evenly and beautifully.

[Brief explanation of the drawing]

The drawings show one embodiment of the present invention, and FIG. 1 is an overall plan view, FIG. 2 is a front view, FIG. 3 is a plan view showing the relationship between the machine base, the guide disk, and the heel movement device, and FIG. Figure 4 is a front view showing the relationship between the carry-in device and the heel clamping mechanism, Figure 5.6.7 is a longitudinal sectional front view, partially cutaway side view and rear view of the heel clamping mechanism, and Figure 8 is the heel clamping mechanism and the clamping mechanism. 9 is an enlarged sectional view showing the relationship between the heel clamping mechanism and the heel moving device; FIG. 10 is an explanatory diagram showing the outline of the polishing method;
FIG. 1 is a partially cutaway perspective view of the heel. 1... Heel, 2... Heel core, 3a, 3b... Exterior leather, 4... Bottom piece, 5... Machine stand, 6... Turntable, 7... Carrying device , 8... First rough polishing device, 9... Second rough polishing device, 10... Third rough polishing device, 11... Finish polishing device, 12... Carrying out device, 13...First heel rotation device for rough polishing, 14...Second heel rotation device for rough polishing, 15...51st heel rotation device
No. 3: heel rotation device for rough polishing, 16: heel rotation device for final polishing, 17: heel clamping mechanism, 18: stepping motor, 19: delivery belt conveyor, 2
0... Belt conveyor for carrying out, 21... Mounting plate, 2
2...Finger, 23...Manie plate, 24.
...Turning actuator, 25...Expansion air cylinder, 26...Upper pressing body, 27...Lower rotation receiving body, 28...Bearing, 29...Shaft, 30...
Elasticity 1 protrusion, 31... cap,
32...Spindle, 33...Sliding;
Oh, 3410.2. Care,,35a,35b,=
-F t, < ring, thrust bearing, 36.
... Guide stand, 37 ... Guide rod, 39 ... Slide rod, its lower end 1 and head, 40 ... Hole, 41 ... Spring, 42.42
a... Air cylinder for clamping and its piston rod, 43, 43a... Air cylinder for clamping release and its piston rod, 45... Sliding body, 46... Shaft,
47...Spring, 48...Bin, 49...Transmission gear, 50...Cam follower, 51.51a...
- Guide disk and its recess, 52... Shaft, 53... Motor base plate, 54... Guard motor, 55... Drive gear, 56... Spring, 57... Proximity switch, 58...・Proximity switch for heel drop detection, 59...
Guide piece, 60...Mounting base, 61...Sliding base, 62.
...Rail, 63... Rotating frame, 64... Axis, 65.
...Rotating buff, 66...Buff rotation motor, 67...
・Air cylinder for vertical movement of buff, 68... Weight, 69
... Air cylinder for buff retraction, 70... Wax mounting frame, 71... Solid wax, 72... Wax clamping body, 73... Air cylinder for wax front and rear effects. Figure 5 4th circle

Claims (1)

[Claims] 1. At least five heel clamping mechanisms are installed on the turntable with a predetermined phase difference, while a carrying device and a first rough polishing device are installed around the turntable in the direction of rotation thereof. , a second rough polishing device, a final polishing device, and an unloading device are arranged in this order, and by rotating the turntable, the heel clamping mechanism is connected to the loading device, the first rough polishing device, the second rough polishing device, and the finishing device. A step in which the heels brought in by the carrying-in device are held vertically by the heel holding mechanism opposed to the polishing device and the carrying-out device in sequence, and the heels are held by the heel holding mechanism opposed to the first rough polishing device. A step of rotating the heel and rough polishing one side of its circumference with a rotary buff of the first rough polishing device, and rotating the heel held by a heel clamping mechanism facing the second rough polishing device. while moving the other side of the circumference to the second
A process of rough polishing with a rotating buff of a rough polishing device, and a process of rotating the heel, which is held in a heel clamping mechanism facing the final polishing device, and finishing both sides of the circumference with a rotating buff of the final polishing device. Polishing of the heel of a shoe, characterized in that the step of polishing and the step of releasing the heel clamped by a clamping mechanism facing a carrying-out device and carrying it out of the turntable by the carrying-out device are carried out in parallel. Method. 2. A turntable rotated by a motor etc., at least five heel clamping mechanisms mounted on the turntable with a predetermined phase difference, and a carry-out mechanism arranged around the turntable in sequence in the direction of rotation thereof. The installation position of the device, the first rough polishing device, the second rough polishing device, the final polishing device, and the carrying out device, and around the turntable, and also the first rough polishing device, the second rough polishing device, and the final polishing device. It consists of a first heel rotation device for rough polishing, a second heel rotation device for rough polishing, and a heel rotation device for final polishing, which are respectively arranged in An upper pressing body that presses the bottom piece of the heel that has been brought in from above, a lower rotating receiver that is swingably equipped with a rocking body that supports the downwardly facing curved top surface of the heel from below at two points, and this The first rough polishing device, the second rough polishing device, and the final polishing device each include a rotary buff and a buff rotation motor that rotates the buff. A buff back and forth movement mechanism that moves a rotary buff back and forth relative to the heel held by a heel holding mechanism, a buff up and down movement mechanism that moves the rotary buff up and down, and a wax pressure contact mechanism that presses solid wax to the rotary buff. The first heel rotation device for rough polishing, the second heel rotation device for rough polishing, and the second heel rotation device for final polishing each include a drive gear that meshes with a transmission gear of a heel clamping mechanism opposite thereto, and a drive gear that meshes with a transmission gear of a heel clamping mechanism opposite thereto. and a heel rotation motor for rotating the heel, and the first heel rotation device for rough polishing positions the lower rotating receiver so that one side of the circumference of the heel is roughly polished by the first rough polishing device. The second heel rotation device for rough polishing rotates the lower rotary receiver by a predetermined amount so that the other side of the circumference of the heel is roughly polished by the second rough polishing device, and the second heel rotation device for rough polishing rotates the lower rotating receiver by a predetermined amount so that the second rough polishing device roughly polishes the other side of the circumference of the heel. The polishing heel rotating device is a shoe heel polishing device characterized in that the lower rotary receiver is rotated by a required amount so as to finish polish both sides of the circumference of the heel.