JPH0247201B2 - KUTSUNOKAKATONOKENMAHOHOTOSONOSOCHI - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" The present invention relates to a polishing method and a polishing apparatus for automatically polishing the exterior surface of the heel of a shoe.

``Prior Art and its Problems'' As shown in FIG. 11, the heel 1 of a leather shoe is made of synthetic resin or wood, and a heel core 2 is made of synthetic resin or wood. At the same time, the exterior leather 3b is also adhered to the almost vertical front surface, and after fixing a bottom piece 4 such as rubber to the lower end of the heel core 2, the exterior leather 3a and 3b are colored. After the surfaces of the leathers 3a and 3b are polished and polished, they are attached to the soles of the shoes. The top surface 2a of the heel core 2 has a curved concave surface, and the top surface 2a
The exterior leather is exposed without being glued.
Note that the front exterior leather 3b may be omitted.

Conventionally, the polishing of the exterior leather 3a, 3b was generally done by 1
This was done individually by hand, requiring a great deal of effort and time.

Therefore, attempts have been made to develop methods and devices for automatically performing this process, but no practical method has been proposed yet.

An object of the present invention is to provide a polishing method and a polishing apparatus that can automatically polish the surface of the exterior leather 3a or even the exterior leather 3b in an extremely efficient manner.

"Means for Solving the Problems" The polishing method of the present invention includes mounting at least five heel clamping mechanisms on a turntable with a predetermined phase difference, and at the same time attaching heel clamping mechanisms around the turntable in the direction of rotation of the heel clamping mechanism. A carrying-in device, a first rough-polishing device, a second rough-polishing device, a final-polishing device, and a carrying-out device are arranged in sequence, and the rotation of the turntable causes the heel clamping mechanism to be connected to the carrying-in device, the first rough-polishing device, and the Polishing device, 2nd
facing the rough polishing device, finish polishing device, and unloading device in sequence. Then, there is a step of vertically holding the heel carried in by the carrying device with a heel holding mechanism facing the heel holding device, and a step of rotating the heel held by the heel holding mechanism facing the first rough polishing device in a circular motion. A step of rough polishing one side of the circumference with a rotating buff of the first rough polishing device, and a step of rough polishing one side of the circumference while rotating the heel held by a heel clamping mechanism facing the second rough polishing device. A step of rough polishing the side surface with a rotating buff of the second rough polishing device, and a step of rotating both sides of the circumference of the heel held by a heel clamping mechanism facing the final polishing device. The step of final polishing with a rotary buff and the step of releasing the heel held by the holding mechanism facing the carrying-out device and carrying it out of the turntable by the carrying-out device are carried out in parallel.

The polishing device of the present invention includes a turntable rotated by a motor or the like, at least five heel clamping mechanisms mounted on the turntable with a predetermined phase difference, and a rotating heel clamping mechanism mounted around the turntable. The first unloading device is arranged sequentially in the direction of
The rough polishing device, the second rough polishing device, the final polishing device, and the carry-out device are arranged around the turntable and at the installation positions of the first rough polishing device, the second rough polishing device, and the final polishing device, respectively. It consists of a first heel rotation device for rough polishing, a second heel rotation device for rough polishing, and a heel rotation device for final polishing.
Each heel clamping mechanism consists of an upper pressing body that presses from above the bottom piece of the heel that is carried in upside down by the carrying device, and two parts that allow the downwardly facing curved top surface of the heel to swing from below. It includes a lower rotary receiver on which a point-supported rocker is swingably mounted, and a transmission gear for transmitting rotation to the lower rotary receiver. The first rough polishing device, the second rough polishing device, and the final polishing device each include a rotating buff, a buff rotation motor that rotates the buff, and a rotating buff that moves back and forth with respect to the heel held by the heel holding mechanism. The present invention includes a buff back and forth movement mechanism that moves the buff back and forth, a buff up and down movement mechanism that moves the rotary buff up and down, and a wax pressure contact mechanism that presses the solid wax against the rotary buff. The first heel rotation device for rough polishing, the second heel rotation device for rough polishing, and the heel rotation device for final polishing each have a drive gear that meshes with a transmission gear of the opposing heel clamping mechanism, It is equipped with a heel rotation motor that rotates the gear. The first heel rotating device for rough polishing rotates the lower rotary receiver by a predetermined amount so that one side of the circumference of the heel is roughly polished by the first rough polishing device. The second rough polishing heel rotating device rotates the lower rotary receiver by a predetermined amount so that the other side of the circumference of the heel is roughly polished by the second rough polishing device. The heel rotation device for final polishing rotates the lower rotary receiver by a required amount to perform final polishing on both sides of the circumference of the heel.

"Function" According to the polishing method of the present invention, the heel carried onto the turntable by the carrying device is first held vertically one by one by the heel holding mechanism, and then, as the turntable rotates, the heel is placed on the first heel. It is sent to a position opposite to a rough polishing device, and one side surface of the circumference is roughly polished by this rough polishing device. When the turntable rotates again, the heel, while being held by the heel clamping mechanism, is then sent to a position facing the second rough polishing device, which then polishes the other side of the circumference. is roughly polished. When the turntable further rotates, the heel is moved to a position facing the final polishing device, whereby both sides of the heel are polished. Finally, as the turntable rotates, the heel is moved to a position facing the carry-out device, released from the heel clamping mechanism, and carried out from above the turntable. The heels are brought in one by one like this, rough polishing on one side, rough polishing on the other side, final polishing on both sides,
The five steps of carrying out are carried out in sequence, but these five steps are carried out in parallel, and when the first heel is carried out, the second heel is at the same time finished being polished, and the third heel is being roughened on the other side. One side of the fourth heel is roughly polished, and the fifth heel is brought in.

According to the polishing device of the present invention, the heel is held upside down by the heel holding mechanism, and its downwardly facing curved top surface is swingably supported at two points by the lower rotary receiver of the heel holding mechanism. Therefore, even if the curved top surface is distorted, it is held straight by the heel holding mechanism. The rotary buffs of the first and second rough polishing devices and the final polishing device are moved up and down while moving forward and backward according to the curved surface of the heel. Moreover, this rotary buff rotates while being coated with solid wax by the wax press mechanism. As the turntable rotates, the transmission gear of the heel clamping mechanism is transmitted to the drive gear of the first heel rotation device for rough polishing, the drive gear of the second heel rotation device for rough polishing, and the heel rotation device for final polishing. It sequentially meshes with the drive gear, transmits rotation to the lower rotation receiver at each opposing position, and rotates the heel.

"Example" An example of the present invention will be described in detail below based on the drawings.

First, to explain the outline of the polishing apparatus of this example, as shown in FIGS. Turntable 6 is placed on the 6th side of 5.
In the rotation direction (direction of the arrow in FIG. 1), the loading device 7, the first rough polishing device 8, the second rough polishing device 9, the third rough polishing device 10, the final polishing device 11, and the unloading device I am wearing 12. Further, on the machine stand 5, there are a turntable 6, a first rough polishing device 8, a second rough polishing device 9, and a third rough polishing device 1.
0, a first heel rotation device 13 for rough polishing, a second heel rotation device 14 for rough polishing, a third heel rotation device 15 for rough polishing, and a heel rotation device 15 for final polishing, respectively, between the final polishing device 11 and the final polishing device 11. A heel rotation device 16 is attached.

Six heel clamping mechanisms 17 are mounted on the upper surface of the turntable 6 with a phase difference of 60 degrees.
The turntable 6 is intermittently rotated by 60 degrees by a stepping motor 18 (FIG. 3) installed in the machine base 5, and the six heel clamping mechanisms 17 are moved to the carrying device 7 and the first rough polishing device. 8, second rough polishing device 9,
The third rough polishing device 10, the final polishing device 11, and the carrying-out device 12 are made to face each other in sequence.

Therefore, when the turntable 6 is stopped, the six heel clamping mechanisms 17 are connected to the loading device 7, the first rough polishing device 8, the second rough polishing device 9, the third rough polishing device 10, and the finishing device. Polishing device 11, unloading device 12
and simultaneously facing the first rough polishing device 8, the first rough polishing heel rotation device 13
When facing the second rough polishing device 9, the second rough polishing heel rotation device 14 is simultaneously activated, and when facing the third rough polishing device 10, the third rough polishing heel rotation device 15 is simultaneously activated. When facing the final polishing device 11, they respectively oppose the heel rotation device 16 for final polishing. Therefore, in the following, the carrying-in device 7, the first rough polishing device 8, the second rough polishing device 9, the third rough polishing device 10, the final polishing device 11, and the carrying-out device 12 are explained below.
The installation positions are respectively referred to as a carry-in position, a first rough polishing position, a second rough polishing position, a third rough polishing position, a final polishing position, and an unloading position.

FIG. 10 shows the relationship between the movement of the heel 1 shown in FIG. 11 and its polished surface. The outline of the polishing method of this example will be explained with reference to this figure.
For example, the conveyor belt 19 (Fig. 1)
The heel clamps are placed upside down and fed into the main polishing device, captured one by one by the carry-in device 7, and transferred from the belt conveyor 19 to the heel clamp mechanism 17 at the carry-in position A. After being held upside down by the mechanism 17, the turntable 6 is rotated 60 degrees and sent to the first rough polishing position B. At this position B, the heel 1 is
While being held by the heel clamping mechanism 17, the heel is rotated in the circumferential direction by the first rough polishing heel rotation device 13 and subjected to the polishing action by the first rough polishing device 8, resulting in a curved shape. One half of the exterior leather 3a is roughly polished. Thereafter, the heel 1 is sent to the second rough polishing position C by further rotating the turntable 6 by 60 degrees, and is rotated at this position C by the second rough polishing heel rotation device 14. second while being
The other half of the exterior leather 3a is roughly polished by the polishing action of the rough polishing device 9. Next, heel 1
is sent to the third rough polishing position D, its direction is reversed by the third rough polishing heel rotation device 15, and is subjected to the polishing action of the third rough polishing device 10 without being rotated. , the entire surface of the almost vertical exterior leather 3b is roughly polished. Further, the heel 1 is sent to the final polishing position E, and while being rotated by the final polishing heel rotation device 16, the heel 1 is subjected to a polishing action by the final polishing device 11, and the entire surface of both exterior leathers 3a and 3b is polished for final polishing. be done. Finally, the heel 1 is transported to the carry-out position F, where it is released from the grip of the heel clamping mechanism 17 and captured by the carry-out device 12, thereby being transferred onto the carry-out belt conveyor 20 and transferred to the present polishing apparatus. It is carried outside.

Heels 1 are brought in one by one like this, and the exterior leather 3
Six steps are performed in sequence: rough polishing of one half of the exterior leather 3a, rough polishing of the other half of the exterior leather 3a, rough polishing of the exterior leather 3b, final polishing of both exterior leather 3a and 3b, and transport. However, these six steps are executed in parallel, and at the same time when the first heel 1 is carried out,
The second heel 1 has both exterior leathers 3a and 3b polished, the third heel 1 has the exterior leather 3b roughly polished, and the fourth heel 1 has the other half of the exterior leather 3a roughly polished. Polished, the fifth heel 1 is made of exterior leather 3a
One half of the heel 1 is roughly polished, and the sixth heel 1 is newly brought in.

Next, each device constituting this polishing apparatus will be specifically explained.

The carrying-in device 7 and the carrying-out device 12 have substantially the same structure, and as shown in FIGS. 1 and 4, are mounted on a mounting plate 21 fixed to the top surface of the machine base 5, and have a pair of fingers 22 at the tip. A manipulator 23 having
can be turned by a turning actuator 24, and can be expanded and contracted by an expanding and contracting air cylinder 25.

Each heel clamping mechanism 17 has an upper pressing body 26 and a lower rotation receiving body 27, as shown in FIGS. 4-8.
The lower rotary receiver 27 is vertically and rotatably supported on the upper surface of the turntable 6 by a bearing 28 and a shaft 29. The upper pressing body 26 has a cap 31 having an elastic protrusion 30 protruding from the lower end, which is removably fitted to the lower end of a spindle 32. The upper end of the spindle 32 is connected to a bracket attached to a sliding base 33. 34, needle bearing 3
5a and a thrust bearing 35b, it is rotatably suspended by a bearing. The slide table 33 is vertically slidably attached to two vertical guide rods 37 at the upper end of a guide table 36 fixed to the upper surface of the turntable 6.
It is biased downward by a spring 38 wound around. The guide table 36 has a slide rod 39
is installed so that it can slide up and down. The lower end 39a of this slide rod 39 is attached to the turntable 6.
protrudes downward through a hole 40 bored in the
Further, a spring 41 is interposed between the head 39b at the upper end and the upper surface of the guide stand 36. The slide rod 39 is normally pushed down by the slide table 33 so that its lower end 39a protrudes to the lower position shown by the chain line in FIGS. 6 and 7.

In order to push up the slide table 33 via the slide rod 9, a clamping air cylinder 42 is installed at the carry-in position A on the lower side of the upper surface of the machine frame 5, and a clamp-releasing air cylinder 43 (a second ,3
) are arranged respectively. Heel clamp mechanism 17
When the slide rod 39 is set in the carrying device A, the lower end 39a of the slide rod 39 faces the piston rod 42a of the clamping air cylinder 42 as shown in FIG. 8, and the slide rod 39 is pushed up by the extension of the piston rod 42a. , sliding table 33
is lifted against the spring 38. Thereby, the upper pressing body 26 is maintained at a predetermined position above.

On the other hand, on the upper surface of the lower rotation receiver 27, fifth and sixth
As shown in the figure, a guide recess 44 is formed, and a swinging body 45 is supported within the guide recess 44 by a shaft 46 so as to be able to swing left and right. This rocking body 45
is biased upwardly on both the left and right sides by a pair of left and right springs 47 on the lower side thereof, and is normally held horizontally. A pair of left and right pins 48 are provided protruding from the upper surface of the rocking body 45. Further, a transmission gear 49 is fixed to the lower end of the shaft 29 of the lower rotation receiver 27. A pair of cam followers 50 are rotatably supported under the transmission gear 49 with a phase difference of 180 degrees. These cam followers 5
When the turntable 6 rotates, the roller 0 rolls along the periphery of a guide disk 51 installed on the upper surface of the machine stand 5 below the turntable 6. As shown in FIG. 3, the circumferential edge of the guide disk 51 has circular arc shapes at first rough polishing position B, second rough polishing position C, third rough polishing position D, and final polishing position E. A recessed portion 51a is formed.

Now, the heel 1 on the delivery belt conveyor 19 is
They are held upside down one by one by the fingers 22 of the carry-in device 7, and as the manipulator 23 rotates and extends, the heel clamping mechanism 17 at the carry-in position A is held between the upper pressing body 26 and the lower rotation receiving body 27. will be moved up to When the heel 1 is located between these positions (at this time, the heel 1 turns its curved outer leather 3a outward of the turntable 6), the clamping air cylinder 42 is activated and its piston rod 42a is lowered. As a result, the sliding table 33 also descends, and the upper pressing body 26 presses down the heel 1 while working together with the lower rotary receiver 27 to hold the heel 1 upside down up and down as shown in FIGS. 5 and 6. At this time, the downward facing top surface 2a of the heel core 2 of the heel 1 is connected to the two pins 48 of the rocking body 45.
Since the heel 1 is supported at two points so as to be able to swing from side to side, even if the curve of the top surface 2a is distorted, the center line of the heel 1 will always be on the center line of the upper pressing body 26 and the lower rotation receiving body 27. It is held correctly and precisely so that it is in position. Note that a plurality of caps 31 with different lengths are prepared so that they can be replaced depending on the size of the heel 1.

The heel 1 held in this manner is conveyed while being held as the turntable 6 rotates. During the forwarding, the two cam followers 50 are connected to the guide disk 51.
The heel 1 rolls along the circumferential edge of the turntable 6, and the lower rotation receiver 27 moves while its rotation with respect to the turntable 6 is restricted, so the heel 1 rolls around the curved outer leather 3a as shown in FIG. The state is maintained towards.

Next, the first rough polishing heel rotation device 13, the second
The heel rotation device 14 for rough polishing, the third heel rotation device 15 for rough polishing, and the heel rotation device 16 for final polishing have substantially the same structure, and as shown in FIGS. A motor base plate 53 is horizontally rotatably supported on the upper surface of the motor base plate 53 by a shaft 52, and a geared motor 54 capable of forward and reverse rotation is attached to the lower side of the motor base plate 53. Furthermore, a drive gear 55 is fixed on a motor base plate 53. The motor base plate 53 is urged to rotate toward the turntable 6 by a spring 56.
The cam follower 50 is also mounted on the top surface of the machine base 5.
Two proximity switches 57, one for the original position and the other for the reverse position, are arranged with a phase difference of, for example, 90 degrees. A proximity switch 58 for detecting a fall is provided. This proximity switch 58 includes an upper pressing body 26 and a lower rotating receiving body 27.
When the heel 1 falls from the gap and the slide table 33 descends, the slide rod 39 is pushed down by the slide table 33 and its lower end 39a descends to the position indicated by the chain line in FIG. 9, and is turned on. A guide piece 59 for guiding the cam follower 50 into the recess 51a of the guide disk 51 is also fixed to the upper surface of the machine base 5.

When the heel clamping mechanism 17 that clamps the heel 1 with the carrying device A as described above is moved to the first rough polishing position B as the turntable 6 rotates, the transmission gear 49 is transferred to the first rough polishing position B. It meshes with the drive gear 55 of the heel rotation device 13. At this time, the motor base plate 53
rotates slightly against the spring 56, so that the gears 49 and 55 mesh smoothly. Further, both cam followers 50 enter into the recess 51a of the guide disk 51 while being guided by the guide piece 59. This allows the transmission gear 49 to rotate,
Rotation of the drive gear 55 is transmitted. When the transmission gear 49 rotates, the lower rotation receiver 2
7 rotates, the heel 1 rotates, and the upper pressing body 26
The user is also rotated while pressing the heel 1. Drive gear 5
5, one cam follower 50 rotates starting from the position detected by the original position proximity switch 57, and even after the cam follower 50 is detected by the reverse position proximity switch 57, the timer continues to rotate. After being rotated in the same direction by a predetermined amount, it is reversed and rotated back to its original position. Through such rotation, the heel 1 is reciprocated within a predetermined angular range that includes one half of the curved exterior leather 3a from the center line to one side edge thereof,
The one half portion is roughly polished by the first rough polishing device 8 as follows.

The first and second rough polishing devices 8 and 9 have substantially the same structure, and as shown in FIGS. is mounted so as to be horizontally slidable along the rail 62, a rotating frame 63 is installed on the sliding table 61 so as to be vertically movable via a shaft 64, and a rotating buff is mounted on the front end of the rotating frame 63. The rotary buff 65 is rotatably supported horizontally and removably, and a buff rotation motor 66 for rotating the rotary buff 65 is attached to the rear end. The rotation frame 63 is rotated up and down by the operation of the air cylinder 67 for vertical movement of the buff. Sliding table 6
1 is urged forward by a weight 68 connected thereto, and is retreated by an air cylinder 69 for buff retreat. The rotation of the buff rotation motor 66 is transmitted to the rotary buff 65 via a belt 70. Also,
A wax attachment frame 70 is attached to the rotation frame 63. On this wax mounting frame 70, a wax pressure contact mechanism, that is, a wax clamping body 72 that removably clamps the solid wax 71 is attached so as to be slidable back and forth, and the wax clamping body 72
Air cylinder 7 for moving the wax back and forth
3 is attached, and the solid wax 71 is urged by the action of the air cylinder 73 so as to be always in pressure contact with the rotating buff 65.

Therefore, the rotary buff 65 of the first rough polishing device 8
is pressed against the exterior leather 3a of the heel 1, which is rotated at the first rough polishing position B as described above, by the urging force of the heavy heel 68 while being horizontally rotated by the buff rotation motor 66. The heel 1 is moved upward or downward by an air cylinder 67 for vertical buffing while being moved upward or downward, and automatically moves backward or forward according to the curved surface of the heel 1. In the first rough polishing position B, the heel 1 is One half of the leather 3a from the center line to one side edge is roughly polished.

Next, the heel clamping mechanism 17 moves to the second rough polishing position C.
, the transmission gear 49 meshes with the drive gear 55 of the second heel rotation device 14 for rough polishing. This second heel rotation device 14 for rough polishing
is set to reciprocate within a predetermined angle range including the other side edge from the center line of the exterior leather 3a in the opposite direction to the first rough polishing heel rotation device 13, and the second Heel 1 sent to rough polishing position C
The other half of the exterior leather 3a from the center line to the other side edge is roughly polished in the same manner as described above by the horizontally rotating rotary buff 65 of the second rough polishing device 9.

Third rough polishing position 10 and final polishing device 11
have substantially the same structure, and these rotary buffs 65 are vertically rotatably supported.
5 and the mounting structure of the wax mounting frame 70 are slightly different from the first and second rough polishing devices 8 and 9, but their operations are the same.

When the heel clamping mechanism 17 is sent to the third rough polishing position D, its transmission gear 49 meshes with the drive gear 55 of the third rough polishing heel rotation device 15. This third heel rotation device 15 for rough polishing rotates the lower rotary receiver 26 by 180 degrees after one cam follower 50 is detected by one proximity switch 57 (the other proximity switch 57 is (Actually, it does not operate effectively), the direction of the heel 1 is reversed 180 degrees, and the almost vertical exterior leather 3b is held facing the outside of the turntable 6. The heel 1 held in this orientation is moved upwardly or downwardly while being vertically rotated by the third rough polishing device 1.
The entire surface of the exterior leather 3b is roughly polished by the rotating buff 65 of 0. When the polishing is done for a certain period of time,
The lower rotation receiver 26 is the third rough polishing heel rotation device 1
5, the heel 1 is returned to its original orientation.

When the heel clamping mechanism 17 is sent to the final polishing position E, its transmission gear 49 meshes with the drive gear 55 of the heel rotation device 16 for final polishing. This heel rotation device 16 for finishing polishing reciprocates the heel 1 in one direction within a predetermined angle range that includes the center line of the exterior leather 3a and the center line of the exterior leather 3b, and then rotates the heel 1 in the opposite direction. It is set to rotate reciprocatingly in the same direction. While the heel 1 is thus rotated at the final polishing position E, the entire surfaces of both exterior leathers 3a and 3b are finally polished by the rotary buff 65 of the vertically rotating final polishing device 11.

When the heel clamping mechanism 17 is sent to the unloading position F,
The lower end 39a of the slide rod 39 is connected to the piston rod 4 of the air cylinder 43 for clamping and releasing.
3a (Fig. 3). At this time, the unloading device 1
2 operates and the heel 1 is grasped by it, and at the same time,
The air cylinder 43 is activated and the upper pressing body 26 is raised. With this, the heel 1 is held by the heel clamping mechanism 1.
After being released from the clamping by 7, it is transferred onto the belt conveyor 20 for carrying out by the carrying out device 12.

Note that when polishing a heel without the exterior leather 3b, the third rough polishing device 10 and the third rough polishing heel rotation device 15 are kept inactive.

"Effects of the Invention" As detailed above, according to the polishing method of the present invention,
The five steps of loading the heel, rough polishing on one side, rough polishing on the other side, final polishing on both sides, and removal can be performed in parallel on the turntable, making it possible to handle the heel extremely efficiently and in a small space. Automatic polishing can be done efficiently.

Further, according to the polishing device of the present invention, the heel is held upside down by the heel holding mechanism, and the downwardly facing curved top surface is swingable by the lower rotary receiver of the heel holding mechanism. Since the heel is supported at two points, the heel can be held straight and accurately even if the curved top surface is distorted, so the heel will not come off the heel holding mechanism during polishing work with a rotating buff. The rotary buffs of the first and second rough polishing devices and the final polishing device can be moved up and down while moving forward and backward according to the curved surface of the heel, and can be rotated while applying the solid wax, so the curved surface of the heel can be rotated. Can be automatically polished evenly and beautifully.

[Brief explanation of drawings]

The drawings show one embodiment of the present invention, and FIG. 1 is an overall plan view, FIG. 2 is a front view, FIG. 3 is a plan view showing the relationship between the machine base, the guide disk, and the heel rotation device, and FIG. Figure 4 is a front view showing the relationship between the carry-in device and the heel clamping mechanism, Figures 5, 6, and 7 are longitudinal sectional front views, partially cutaway side views, and rear views of the heel clamping mechanism, and Figure 8 is the heel clamping mechanism and the clamping mechanism. FIG. 9 is an enlarged sectional view showing the relationship between the heel clamping mechanism and the heel rotating device, FIG. 10 is an explanatory diagram showing the outline of the polishing method, and FIG. It is a partially cutaway perspective view of the heel. 1... Heel, 2... Heel core, 3a, 3b... Exterior leather, 4... Bottom piece, 5... Machine stand, 6... Turntable, 7... Carrying device, 8... First Rough polishing device, 9... Second rough polishing device, 10... Third rough polishing device, 11... Final polishing device, 12... Carrying out device, 13... First rough polishing heel rotation device ,1
4... Second heel rotation device for rough polishing, 15... Third
Heel rotating device for rough polishing, 16... Heel rotating device for finishing polishing, 17... Heel clamping mechanism, 18... Stepping motor, 19... Belt conveyor for carrying in,
20... Unloading belt conveyor, 21... Mounting plate, 22... Finger, 23... Manipulator, 24... Turning actuator, 25... Expanding air cylinder, 26... Upper pressing body, 27
...Lower rotation receiver, 28...Bearing, 29...
...Axis, 30...Elastic protrusion, 31...Cap, 3
2...Spindle, 33...Sliding base, 34...Bracket, 35a, 35b...Needle bearing, thrust bearing, 36...Guide table, 37
... Guide rod, 39 ... Slide rod, its lower end and head, 40 ... Hole, 41 ... Spring, 42, 42a ... Air cylinder for clamping and its piston rod, 43, 43a ... Air cylinder for releasing clamping and The piston rod, 4
5...Sliding body, 46...Shaft, 47...Spring, 48...Pin, 49...Transmission gear, 50...
...Cam follower, 51, 51a...Guide disk and its recess, 52...Shaft, 53...Motor base plate, 5
4... Geared motor, 55... Drive gear, 5
6... Spring, 57... Proximity switch, 58
...Heel drop detection proximity switch, 59...Guide piece, 60...Mounting base, 61...Sliding base, 62...
Rail, 63... Rotating frame, 64... Axis, 65...
Rotating buff, 66... Buff rotation motor, 67...
Air cylinder for vertical movement of buff, 68... Weight, 6
9... Air cylinder for buff retraction, 70... Wax mounting frame, 71... Solid wax, 72... Wax clamping body, 73... Air cylinder for moving wax back and forth.

Claims (1)

[Claims] 1. At least five heel clamping mechanisms are mounted on the turntable with a predetermined phase difference, while a carrying device and a first rough polishing device are installed around the turntable in the direction of rotation thereof. A second rough polishing device, a final polishing device, and a carry-out device are arranged in sequence, and the heel clamping mechanism is controlled by rotation of the turntable. The final polishing device and the carry-out device are sequentially opposed to each other, and the heel carried in by the carry-in device is held vertically by the heel holding mechanism opposite thereto, and the heel is held by the heel holding mechanism opposed to the first rough polishing device. a step of roughly polishing one side of the circumference of the heel with a rotary buff of the first rough polishing device while rotating the heel; A step of roughly polishing the other side of the circumference with a rotary buff of the second rough polishing device while rotating the heel, and a step of roughly polishing the other side of the circumference while rotating the heel held by a heel clamping mechanism facing the final polishing device. A process of final polishing both sides of the periphery with a rotating buff of the final polishing device, and a process of releasing the heel clamped by a clamping mechanism facing the carry-out device and carrying it out of the turntable by the carry-out device. A method for polishing the heel of shoes, which is characterized by performing the polishing in parallel. 2. A turntable rotated by a motor, etc., at least five heel clamping mechanisms mounted on the turntable with a predetermined phase difference, and arranged sequentially around the turntable in the direction of rotation thereof. The unloading device, the first rough polishing device, the second
Rough polishing equipment, finish polishing equipment and unloading equipment,
A first rough polishing heel rotation device and a second rough polishing heel rotation device are arranged around the turntable and at the installation positions of the first rough polishing device, the second rough polishing device, and the final polishing device, respectively. Each heel holding mechanism consists of an upper pressing body that presses from above the bottom piece of the heel that is carried in upside down by the carrying device, and a heel that faces downward. The first rotary receiver comprises a lower rotary receiver on which a rocker supporting the curved top surface at two points from below is swingably mounted, and a transmission gear for transmitting rotation to the lower rotary receiver.
The rough polishing device, the second rough polishing device, and the final polishing device each include a rotary buff, a buff rotation motor that rotates the buff, and a buff back and forth that moves the rotary buff back and forth relative to the heel held by a heel holding mechanism. A buff vertical movement mechanism that moves a rotating buff up and down, and a wax pressure contact mechanism that presses solid wax against the rotating buff, a first heel rotation device for rough polishing, and a second heel rotation device for rough polishing. and a heel rotation device for final polishing each include a drive gear that meshes with a transmission gear of a heel clamping mechanism facing the heel rotation device, and a heel rotation motor that rotates this drive gear, and a first heel rotation device for rough polishing. The lower rotary receiver is rotated by a predetermined amount so that one side of the circumference of the heel is roughly polished by the first rough polishing device, and the second heel rotating device for rough polishing is configured to The lower rotary receiver is rotated by a predetermined amount so that the other side of the circumference of the heel is roughly polished by the second rough polishing device, and the heel rotating device for final polishing is used to roughly polish both sides of the circumference of the heel. A shoe heel polishing device characterized in that a lower rotary receiver is rotated by a required amount for final polishing.