JPS61254039A - Forming method for circuit pattern - Google Patents

Forming method for circuit pattern

Info

Publication number
JPS61254039A
JPS61254039A JP9488485A JP9488485A JPS61254039A JP S61254039 A JPS61254039 A JP S61254039A JP 9488485 A JP9488485 A JP 9488485A JP 9488485 A JP9488485 A JP 9488485A JP S61254039 A JPS61254039 A JP S61254039A
Authority
JP
Japan
Prior art keywords
patterns
etching
circuit pattern
pattern
coil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9488485A
Other languages
Japanese (ja)
Other versions
JPH07118877B2 (en
Inventor
Shoichi Muramoto
昭一 村本
Kenji Osawa
健治 大沢
Yoshio Watanabe
渡辺 喜夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP60094884A priority Critical patent/JPH07118877B2/en
Publication of JPS61254039A publication Critical patent/JPS61254039A/en
Publication of JPH07118877B2 publication Critical patent/JPH07118877B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02KDYNAMO-ELECTRIC MACHINES
    • H02K3/00Details of windings
    • H02K3/04Windings characterised by the conductor shape, form or construction, e.g. with bar conductors
    • H02K3/26Windings characterised by the conductor shape, form or construction, e.g. with bar conductors consisting of printed conductors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Windings For Motors And Generators (AREA)
  • Manufacture Of Motors, Generators (AREA)

Abstract

PURPOSE:To enable fine circuit patterns to be formed, by flattening the surface of the patterns, and plating them electrolytically, after the circuit patterns are formed by means of etching. CONSTITUTION:Firstly, on the both surfaces of an insulating layer 1, substrates with formed copper foil layers 2A, 2B are arranged. Secondly, after a slot 3 for a through hole is bored and the layers are patterned with photoresists 4A, 4B, the layers are treated by means of etching to remove unnecessary sections and to form coil patterns 5A, 5B. Third, after the photoresists 4A, 4B are exfoliated, spaces between formed coil patterns 5A, 5A and coil patterns 5B, 5B are filled up with insulating resin 6A, 6B and the pettern surfaces are polished and flattened. Finally, the patterns are electrolytically plated, and copper is separated out on the coil patterns 5A, 5B, and coil patterns 7A, 7B are obtained.

Description

【発明の詳細な説明】 A、産業上の利用分野 本発明は絶縁層上に回路パターンを形成する際に用いら
れる回路パターン形成方法に関し、たとえば小型モータ
用のプリントコイルを製造するのに好適なものである。
DETAILED DESCRIPTION OF THE INVENTION A. Industrial Application Field The present invention relates to a circuit pattern forming method used when forming a circuit pattern on an insulating layer, and is suitable for manufacturing printed coils for small motors, for example. It is something.

B0発明の概要 本発明は、絶縁層上に回路パターンを形成する際゛に用
いられる回路パターン形成方法において、エツチングに
より回路パターンを形成した後、表面を平坦化して電解
メッキを施すことにより、微細な回路パターンを形成す
ることができ、不都合が生じることなくパターンの厚み
を厚くでき、占積率を高めることができるようにしたも
のである。
B0 Summary of the Invention The present invention is a circuit pattern forming method used when forming a circuit pattern on an insulating layer, in which a circuit pattern is formed by etching, and then the surface is flattened and electroplated. According to the present invention, a circuit pattern can be formed, the thickness of the pattern can be increased without causing any inconvenience, and the space factor can be increased.

C0従来の技術 従来より、動力源を必要とする機器等にはモータが多用
されている。このモータのコイルは、たとえば第5図に
示すように、銅線11の周囲にエナメル層12を有する
いわゆるエナメル線を巻線機によってコア(図示せず)
に巻装することにより製造される。
C0 Prior Art Conventionally, motors have been widely used in devices that require a power source. For example, as shown in FIG. 5, the coils of this motor are made by winding a so-called enamelled wire having an enamel layer 12 around a copper wire 11 into a core (not shown).
It is manufactured by wrapping the

一方、近年、携帯用のカセットテーププレーヤやカセッ
トテープレコーダ(いわゆるヘッドフォンステレオ)等
の普及に伴い、より小型で性能の良いモータの開発が要
望されている。ところが、このような小型モータのコイ
ルは、上述した巻線法により製造することは困難である
。これは、巻線機が高価である、複数のコイルを同時に
製造できない、100μm以下の細線化が難しい(銅線
11の径が100μm以上必要であるため)、巻線ごと
の相互接続をするためのハンダ付作業がしにくい等の欠
点があるためである。
On the other hand, in recent years, with the spread of portable cassette tape players, cassette tape recorders (so-called headphone stereos), etc., there has been a demand for the development of smaller motors with better performance. However, it is difficult to manufacture coils for such small motors using the above-mentioned winding method. This is because the winding machine is expensive, it is not possible to manufacture multiple coils at the same time, it is difficult to thin the wire to 100 μm or less (because the diameter of the copper wire 11 must be at least 100 μm), and the interconnection of each winding is required. This is because it has drawbacks such as difficulty in soldering work.

これに対して、絶縁基板の両面にエツチングあるいはメ
ッキによりコイル(いわゆるプリントコイ/L/)を形
成する方法が提案されている。エツチング法は、第6図
に示すように、たとえば、銅箔層が形成されたポリイミ
ド等の絶縁基板13の両面にエツチング処理を施し、コ
イルパターン14A、14Bを形成する方法であり、メ
ッキ法は、第7図に示すように、たとえば、電極用金属
箔層15A、15Bを有する絶縁基板16の両面にフ・
 オドレジスト17A、17Bをパターニングシタ後、
電解メッキにより銅を析出させコイルパターン18A、
18Bを形成する方法である。
In contrast, a method has been proposed in which coils (so-called printed coils/L/) are formed on both sides of an insulating substrate by etching or plating. As shown in FIG. 6, the etching method is a method in which coil patterns 14A and 14B are formed by etching both sides of an insulating substrate 13 made of polyimide or the like on which a copper foil layer is formed. , for example, as shown in FIG.
After patterning the odd resists 17A and 17B,
Coil pattern 18A by depositing copper by electrolytic plating,
This is a method of forming 18B.

D1発明が解決しようとする問題点 このようなエツチング法あるいはメッキ法によれば、巻
線機が不要であると共に、複数のコイルを同時に製造す
ることができる。しかし、各方法は次に挙げるような欠
点をそれぞれ有している。
D1 Problems to be Solved by the Invention According to such an etching method or a plating method, a winding machine is not required and a plurality of coils can be manufactured at the same time. However, each method has the following drawbacks.

(a)  エツチング法の場合 パターン14A、14Bの厚みTEを得るためには元の
銅箔層が厚肉である必要があるため、目的の形状となり
難く、図示の如くサイドエツチング現象によりパターン
が細ってしまう。また、パターン間のギャップ(hは1
00μm程度が限界であり、これ以上小さくすることは
できず、微細なパターンを形成することができない。更
に、これらから、モータの性能に大きく関与する占積率
(導体占有率)が低くなってしまう。更にまた、絶縁基
板13を介して両面のパターン(導体)間の電気的接続
を行わなければならない。
(a) In the case of the etching method, in order to obtain the thickness TE of the patterns 14A and 14B, the original copper foil layer needs to be thick, so it is difficult to obtain the desired shape, and as shown in the figure, the pattern becomes thin due to the side etching phenomenon. I end up. Also, the gap between patterns (h is 1
The limit is approximately 00 μm, and it cannot be made smaller than this, making it impossible to form a fine pattern. Furthermore, due to these factors, the space factor (conductor occupancy factor), which greatly affects the performance of the motor, becomes low. Furthermore, electrical connections must be made between the patterns (conductors) on both sides via the insulating substrate 13.

! (b)  メッキ法の場合 メッキを施すための電極用金属箔層15A、15Bが必
要であり、メッキ後にこれを除去しなければならない。
! (b) In the case of the plating method, electrode metal foil layers 15A and 15B are required for plating, and must be removed after plating.

また、この際にフォトレジスト17A、17Bの剥離も
必要であるが、構造上困難を伴う。更に、パターン18
A、18Bの厚みTMを厚くするには、フォトレジスト
17A、17Bの厚みTMPを厚くすれば良いが、フォ
トレジスト17A、17Bの解像度が低下したり、隣接
するパターンと接触(短絡)する虞れがあり、厚みTM
をあまり厚くすることはできず、占積率が低下してしま
う。更にまた、パターンの幅WMは、厚みTMの要求か
ら100 pm程度が限界であり、微細なパターンを形
成することができない。
Furthermore, at this time, it is necessary to peel off the photoresists 17A and 17B, but this is structurally difficult. Furthermore, pattern 18
In order to increase the thickness TM of A and 18B, it is sufficient to increase the thickness TMP of photoresists 17A and 17B, but there is a risk that the resolution of photoresists 17A and 17B may decrease or they may contact (short circuit) with adjacent patterns. There is, thickness TM
cannot be made too thick, and the space factor will decrease. Furthermore, the width WM of the pattern is limited to about 100 pm due to the requirement of the thickness TM, making it impossible to form a fine pattern.

そこで、本発明は上述した従来の問題点に鑑みて提案さ
れたものであり、パターンの微細化が図れ、不都合が生
じることなくパターンの厚みを厚くでき、占積率を高め
られるような回路パターン形成方法を提供することを目
的とする。
Therefore, the present invention has been proposed in view of the above-mentioned conventional problems, and provides a circuit pattern that can be made finer, thicker without causing any inconvenience, and that can increase the space factor. The purpose is to provide a forming method.

E0問題点を解決するための手段 本発明に係る回路パターン形成方法は、上述した目的を
達成するために、絶縁層上に導電性層を形成した基板に
おいて、上記導電性層にエツチングを施し一体導通をな
す回路パターンを形成する工程と、上記形成された回路
パターン間の隙間に絶縁樹脂を埋込んで平坦化する工程
と、上記形成゛された回路パターン上に電解メッキを施
す工程とから成るこきを特徴としている。
Means for Solving the E0 Problem In order to achieve the above-mentioned object, the circuit pattern forming method according to the present invention etches the conductive layer on a substrate on which the conductive layer is formed on the insulating layer. It consists of a step of forming a conductive circuit pattern, a step of burying an insulating resin into the gap between the formed circuit patterns and flattening it, and a step of applying electrolytic plating on the formed circuit pattern. It is characterized by Koki.

21作用 本発明によれば、エツチングにより回路パターンが形成
された後、該回路パターン間の隙間に絶縁樹脂が充填さ
れ表面が平坦化され、電解メッキによってパターンの厚
みが増大される。
21 Effects According to the present invention, after circuit patterns are formed by etching, the gaps between the circuit patterns are filled with an insulating resin to flatten the surface, and the thickness of the pattern is increased by electrolytic plating.

G、実施例 以下、本発明に係る回路パターン形成方法の一実施例に
ついて図面を用いて詳細に説明する。なお、本実施例は
小型モータのコイル(プリントコイル)パターンの形成
方法に本発明を適用したものである。
G. Example Hereinafter, an example of the circuit pattern forming method according to the present invention will be described in detail with reference to the drawings. In this embodiment, the present invention is applied to a method of forming a coil (printed coil) pattern for a small motor.

まず、第1図に示すように、絶縁層1の両面に銅箔層2
A、 2Bが形成された基板を用意する。
First, as shown in FIG.
A substrate on which A and 2B are formed is prepared.

上記絶縁層1には、たとえば、ポリイミド、ポリアミド
、ポリエステル、ジアリルフタレート、ポリブタジェン
、エポキシウレタン等の材料を用いることができ、厚み
Torは5〜15μm程度である。また、上記銅箔層2
A、2Bは電解メッキ、圧延等によるものであり、厚み
Tocは8〜85μm程度である。
For example, materials such as polyimide, polyamide, polyester, diallyl phthalate, polybutadiene, and epoxyurethane can be used for the insulating layer 1, and the thickness Tor is about 5 to 15 μm. In addition, the copper foil layer 2
A and 2B are formed by electrolytic plating, rolling, etc., and the thickness Toc is about 8 to 85 μm.

次に、第2図に示すよう1乙スルーホールとなる孔3を
あけ、フォトレジスト4A、4Bをパターニングした後
、エツチング処理を施し不要な部分を除去してコイルパ
ターン5A、5Bを形成する。上記孔3は、たとえば、
ドリルを用いて0.5〜1.5mm程度の径に形成すれ
ば良い。また、上記フォトレジスト4A、4Bには、液
状レノストあるいはドライフィルムレジスト等を用いれ
ば良く、厚みTOPは1〜10μm程度で十分である。
Next, as shown in FIG. 2, a hole 3 serving as a through hole is made and photoresists 4A and 4B are patterned, and then an etching process is performed to remove unnecessary portions to form coil patterns 5A and 5B. The hole 3 is, for example,
It may be formed to a diameter of about 0.5 to 1.5 mm using a drill. Further, liquid renost or dry film resist may be used as the photoresists 4A and 4B, and a thickness TOP of about 1 to 10 μm is sufficient.

更に、上記エツチング処理は、たとえば、塩化第二鉄あ
るいは塩化第二銅等のエツチング液を用い、2kg/C
−程度の条件でスプレー法により行うようにすれば良い
Further, the above etching treatment is carried out using, for example, an etching solution such as ferric chloride or cupric chloride at a rate of 2 kg/C.
- It is sufficient to use a spray method under conditions of about -.

次に、フォトレジス1−4A、4Bを剥離した後、第3
図に示すように、形成されたコイルパターン5A、5A
問およびコイルパターン5B、5B間の隙間に絶縁樹脂
として、たとえばエポキシ系の樹脂5A、15Bを充填
し、表面を研磨することにより平坦化する。この樹脂6
A、6Bの充填により、次のメッキ工程で銅が水平方向
に異常成長し隣接パターンと接触(短絡)してしまうの
を防止することができる。
Next, after peeling off the photoresists 1-4A and 4B, the third
As shown in the figure, the formed coil patterns 5A, 5A
The gaps between the coil patterns 5B and 5B are filled with an insulating resin such as epoxy resins 5A and 15B, and the surfaces are polished to make them flat. This resin 6
By filling A and 6B, it is possible to prevent abnormal growth of copper in the horizontal direction and contact (short circuit) with adjacent patterns in the next plating process.

そして最後に、たとえば、硫酸銅あるいはピロリン酸銅
等のメッキ浴を用いて電解メッキを施し、コイルパター
ン5A、5B上に銅を析出させて、第4図に示すような
新たなコイルパターン7A。
Finally, electrolytic plating is performed using a plating bath such as copper sulfate or copper pyrophosphate to deposit copper on the coil patterns 5A and 5B, resulting in a new coil pattern 7A as shown in FIG.

7Bを得る。この時、両面のコイルパターン間の電気的
接続も同時に行え、スルーホール8が形成される。なお
、パターン間のギャップGoが極小(能えば80〜40
μm程度)に達した時点で、メッキ析出を停止させるよ
うにする。
Get 7B. At this time, electrical connections between the coil patterns on both sides can be made at the same time, and through holes 8 are formed. Note that the gap Go between patterns is extremely small (preferably 80 to 40
The plating precipitation is stopped when the thickness reaches 100 μm.

このように、本実施例のコイルパターンの形成方法はエ
ツチングと電解メッキを併用したものであり、良好なコ
イルパターンを簡単な製造プロセスにより得ることがで
きる。すなわち、元の銅箔層2A、2Bの厚みTocお
よびフォトレジスト4A、4Bの厚みTopが薄くても
、厚みTOの厚いコイルパターン7A、7Bが得られパ
ターンを補強することができると共に、目的とする形状
のパターンが容易に形成できる。また、樹脂6A、6B
の充填により、電解メッキによって析出した銅が隣接パ
ターンと接触するのを防止して、パターン間のギャップ
Goを極小に設定することができる。更に、これりのこ
とから、パターンの微細化が図れ、かつ占積率を高める
ことができる。
As described above, the method for forming the coil pattern of this embodiment uses etching and electrolytic plating in combination, and a good coil pattern can be obtained through a simple manufacturing process. That is, even if the thickness Toc of the original copper foil layers 2A, 2B and the thickness Top of the photoresists 4A, 4B are thin, thick coil patterns 7A, 7B with a thickness TO can be obtained, the pattern can be reinforced, and the pattern can be reinforced. A pattern with a shape can be easily formed. In addition, resins 6A and 6B
This filling prevents the copper deposited by electrolytic plating from coming into contact with adjacent patterns, making it possible to set the gap Go between the patterns to a minimum. Furthermore, because of this, the pattern can be made finer and the space factor can be increased.

ここで、前述したエツチング法(第6図参照)、メッキ
法(第7図参照)、および本実施例(第4図参照)によ
り形成された各コイルの占積率を導体の断面積比で比較
した一例を示す。条件は次の通りである。なお、単位は
μ扉とする。
Here, the space factor of each coil formed by the above-mentioned etching method (see Figure 6), plating method (see Figure 7), and this example (see Figure 4) is expressed as the cross-sectional area ratio of the conductor. An example of comparison is shown below. The conditions are as follows. The unit is μ door.

(a)  エツチング法 WE=lOOGE=100   TE=100(bl 
 メッキ法 WM = 100  0M = 80   TM = 
60(TMP=25) (C)  本実施例 Wo=50    Go=80   To=100(T
oc = 40 ) 以上の条件により各断面積SE、SM、Soをそれぞれ
計算した結果、断面積比は 8g : SM : So = l : 1.15 :
 1.26となり、本実施例において形成されたコイル
の占積率が極めて高いことが分かる。よって、高性能の
小型モータを得ることができる。
(a) Etching method WE=lOOGE=100 TE=100(bl
Plating method WM = 100 0M = 80 TM =
60 (TMP=25) (C) This example Wo=50 Go=80 To=100(T
oc = 40) As a result of calculating each cross-sectional area SE, SM, and So under the above conditions, the cross-sectional area ratio is 8g: SM: So = l: 1.15:
1.26, which shows that the space factor of the coil formed in this example is extremely high. Therefore, a high-performance compact motor can be obtained.

なお、本発明はプリントコイルのみならず、通常のプリ
ント基板における回路パターンの形成方法に適用するこ
ともできる。また、形成する回路パターンは片面でも良
いことは勿論である。
Note that the present invention can be applied not only to printed coils but also to methods for forming circuit patterns on ordinary printed circuit boards. Further, it goes without saying that the circuit pattern to be formed may be formed on one side.

H0発明の効果 上述した実施例の説明から明らかなように、本発明によ
れば、エツチングにより回路パターンを形成した後、表
面を平坦化して電解メッキを施すこと番こよって、微細
な回路パターンを形成することができ、不都合が生じる
ことなくパターンの厚みを厚くでき、占積率を高めるこ
とができる。
H0 Effects of the Invention As is clear from the description of the embodiments described above, according to the present invention, after forming a circuit pattern by etching, the surface is flattened and electrolytically plated to form a fine circuit pattern. The thickness of the pattern can be increased without causing any inconvenience, and the space factor can be increased.

【図面の簡単な説明】[Brief explanation of drawings]

第1図〜第4図は本発明の一実施例を工程順に示す各断
面図である。 第5図〜第7図は従来の各方法によって形成されたコイ
ルを示す各断面図であり、第5図は巻線法、第6図はエ
ツチング法、第7図はメッキ法をそれぞれ示すものであ
る。 1・・・・・・・・・・・・・・・・・・絶縁層2A、
 2B・・・・・・銅箔層 5A、5B、7A、7B・・・・・クイルパターン6A
、6B・・・・・・樹 脂
FIGS. 1 to 4 are cross-sectional views showing an embodiment of the present invention in the order of steps. Figures 5 to 7 are cross-sectional views showing coils formed by conventional methods, with Figure 5 showing the winding method, Figure 6 the etching method, and Figure 7 the plating method. It is. 1・・・・・・・・・・・・・・・Insulating layer 2A,
2B...Copper foil layer 5A, 5B, 7A, 7B...Quill pattern 6A
, 6B...Resin

Claims (1)

【特許請求の範囲】  絶縁層上に導電性層を形成した基板において、上記導
電性層にエッチングを施し一体導通をなす回路パターン
を形成する工程と、 上記形成された回路パターン間の隙間に絶縁樹脂を埋込
んで平坦化する工程と、 上記形成された回路パターン上に電解メッキを施す工程
とから成る回路パターン形成方法。
[Claims] In a substrate having a conductive layer formed on an insulating layer, a step of etching the conductive layer to form a circuit pattern that is integrally conductive; and a step of etching the conductive layer to form an integrally conductive circuit pattern; A circuit pattern forming method comprising the steps of embedding and flattening a resin, and performing electrolytic plating on the formed circuit pattern.
JP60094884A 1985-05-02 1985-05-02 Circuit pattern forming method Expired - Fee Related JPH07118877B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60094884A JPH07118877B2 (en) 1985-05-02 1985-05-02 Circuit pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60094884A JPH07118877B2 (en) 1985-05-02 1985-05-02 Circuit pattern forming method

Publications (2)

Publication Number Publication Date
JPS61254039A true JPS61254039A (en) 1986-11-11
JPH07118877B2 JPH07118877B2 (en) 1995-12-18

Family

ID=14122470

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60094884A Expired - Fee Related JPH07118877B2 (en) 1985-05-02 1985-05-02 Circuit pattern forming method

Country Status (1)

Country Link
JP (1) JPH07118877B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0395676U (en) * 1990-01-12 1991-09-30
WO1997000526A1 (en) * 1995-06-17 1997-01-03 Robert Bosch Gmbh Inductive component
JPH1169684A (en) * 1997-08-14 1999-03-09 Asahi Chem Ind Co Ltd Printed coil for actuator

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54104563A (en) * 1978-02-03 1979-08-16 Alps Electric Co Ltd Method of making circuit board
JPS59204449A (en) * 1983-05-04 1984-11-19 Hitachi Ltd Manufacture of printed coil

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54104563A (en) * 1978-02-03 1979-08-16 Alps Electric Co Ltd Method of making circuit board
JPS59204449A (en) * 1983-05-04 1984-11-19 Hitachi Ltd Manufacture of printed coil

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0395676U (en) * 1990-01-12 1991-09-30
WO1997000526A1 (en) * 1995-06-17 1997-01-03 Robert Bosch Gmbh Inductive component
JPH1169684A (en) * 1997-08-14 1999-03-09 Asahi Chem Ind Co Ltd Printed coil for actuator

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