JPS61251587A - Formation of inorganic coating - Google Patents
Formation of inorganic coatingInfo
- Publication number
- JPS61251587A JPS61251587A JP9297085A JP9297085A JPS61251587A JP S61251587 A JPS61251587 A JP S61251587A JP 9297085 A JP9297085 A JP 9297085A JP 9297085 A JP9297085 A JP 9297085A JP S61251587 A JPS61251587 A JP S61251587A
- Authority
- JP
- Japan
- Prior art keywords
- film
- inorganic
- coating
- forming
- transfer sheet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Decoration By Transfer Pictures (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
利用分野
本発明は無機質被膜の形成方法に関する。詳しくは、光
電池または電子機器部品等の実質的に耐熱性の物体の所
要面上に2例えば防水性を有する電気絶縁性の被膜(例
えば保護膜)を形成する方法に関する。DETAILED DESCRIPTION OF THE INVENTION Field of Application The present invention relates to a method of forming an inorganic coating. In particular, the present invention relates to a method of forming, for example, a waterproof, electrically insulating coating (eg, a protective coating) on a desired surface of a substantially heat-resistant object, such as a photovoltaic cell or an electronic device component.
従来技術および問題点 従来、上記のような保護膜等の被膜は、蒸着法。Prior art and problems Conventionally, films such as the above-mentioned protective film have been formed using a vapor deposition method.
スパッタリング法、無機質塗料の塗布等によって形成さ
れている。It is formed by sputtering method, application of inorganic paint, etc.
蒸着またはスパッタリング等による方法では。In methods such as vapor deposition or sputtering.
特別の設備または熟練を要する上に、一般に長時間の処
理工程が必要である。着膜が不充分であると、ピンホー
ル等が生成する怖れもあった。塗膜による場合には、ピ
ンホールおよび着膜むら等の怖れがあった。更に、該被
膜を適用する板状物等の上表面ならびに二側面および/
または裏面の所要部分へも被膜を形成する場合には、マ
スキング等を用いて別途に−ないし二回の被膜工程が必
要であった〇
問題点を解決するための手段
本発明者等は、基材シート上に加熱によって無機質被膜
を形成する材料を有する転写シートを使用して、上記の
種々の問題点を克服することに成功した。In addition to requiring special equipment or skill, they generally require long processing steps. If the film was insufficiently deposited, there was a risk that pinholes etc. would be generated. When using a paint film, there was a risk of pinholes and uneven film deposition. Furthermore, the upper surface and two sides of the plate-like object to which the coating is applied and/or
Alternatively, if a coating is to be formed on the required portions of the back side, a separate or two coating process using masking or the like is required. The various problems mentioned above have been successfully overcome by using a transfer sheet having a material that forms an inorganic film on the material sheet by heating.
すなわち本発明によって、基材シート3上に加熱によっ
て無機質被膜を形成する材料層1′を有する可撓性の転
写シート2を、鉱物質物体等の耐熱性物体の所要表面上
に貼着して該被膜形成材料層1′を適用し1次いで加熱
して無機質被膜1を形成することを特徴とする。無機質
保護膜等の被膜形成方法が提供される。That is, according to the present invention, a flexible transfer sheet 2 having a material layer 1' that forms an inorganic film by heating on a base sheet 3 is adhered onto a desired surface of a heat-resistant object such as a mineral object. The film-forming material layer 1' is applied and then heated to form the inorganic film 1. A method of forming a film such as an inorganic protective film is provided.
該転写シート2の被膜形成材料層1′は、該基材シート
3上に連続的にまたは断続的に存在していてもよい。断
続的に存在する場合には、それに応じて断続的なまたは
模様状の被膜を形成することができる。また2例えば鉱
物質板状物5の上表面12ならびに該板状物の一側面1
3ないし相対する二側面および/または該側面に続く裏
面14に、該転写シート2を用いて同時に該被膜材料層
1′を適用することができる。The film-forming material layer 1' of the transfer sheet 2 may be present on the base sheet 3 continuously or intermittently. If present intermittently, an intermittent or patterned coating can be formed accordingly. In addition, 2, for example, the upper surface 12 of the mineral plate-like object 5 and one side surface 1 of the plate-like object
3 or two opposing sides and/or the back side 14 adjoining the sides, the coating material layer 1' can be applied simultaneously using the transfer sheet 2.
上記の被膜材料層1′の加熱によって無機質被膜を形成
する材料とは2代表的には、焼成等の加熱によって実質
的にガラス質のまたは緻密な焼結物系の被膜を形成する
材料を意味する。本発明による保護膜等の被膜の形成方
法は、光電池または電子機器部品等に好ましく適用され
るので、この場合には被膜すべき物品の耐熱温度以下(
例えば約700℃以下、好ましくは約600℃以下)の
加熱によって無機質被膜を形成する材料が用いられる。The above-mentioned material that forms an inorganic coating by heating the coating material layer 1'2 typically refers to a material that forms a substantially glassy or dense sintered coating by heating such as firing. do. The method of forming a film such as a protective film according to the present invention is preferably applied to photovoltaic cells or electronic device parts, so in this case, the heat resistant temperature of the article to be coated (
For example, a material that forms an inorganic film by heating at a temperature of about 700° C. or lower, preferably about 600° C. or lower) is used.
該無機質被膜形成材料としては、フリット粉末お
−よびガラス粉末および親水性結合剤等からなる易熔融
性の材料が例示される。As the inorganic film forming material, frit powder or
Examples include easily meltable materials such as glass powder, hydrophilic binder, and the like.
転写シート2は、一般的に第1図に例示するように、基
材シート3.被膜形成材料層1′および該材料層を保護
する剥離紙等の保護シート4からなる。該材料層1′の
厚さは1通常は約0.1〜0.4 m程度であるが、特
に限定されない。基材シート3としては、約0.211
11以下の厚さの可燃性プラスチック等の可撓性フィル
ムl;使用できる。該基材シートは剥離性のシートであ
ってもよく、貼着後に剥離して焼成してもよい。可燃焼
失性基材シートの場合には、貼着後剥離せずにそのまま
焼成すると。The transfer sheet 2 generally includes a base sheet 3. as illustrated in FIG. It consists of a film-forming material layer 1' and a protective sheet 4 such as release paper for protecting the material layer. The thickness of the material layer 1' is usually about 0.1 to 0.4 m, but is not particularly limited. As the base sheet 3, approximately 0.211
Flexible films such as combustible plastics having a thickness of 11 or less can be used. The base sheet may be a removable sheet, and may be peeled off and fired after being attached. In the case of a combustible and extinguishable base sheet, it is baked without being peeled off after being attached.
燃焼して焼失するので好都合である。This is convenient because it burns and is destroyed.
上記の被膜すべき鉱物質等の耐熱性物体とは。What are the heat-resistant objects such as minerals that should be coated?
代表的には、無機質被膜を形成する加熱温度にて耐熱性
である。セラミック製品、ガラス、金属等の材料および
これらの材料の集成物等からなる固形物品(例えば板状
物)を意味する。代表的には光電池および電子機器部分
等が例示される。なお被膜すべき該物体の表面は、転写
シートが適用できる程度以下の凹凸状ないし平面状の表
面であることが必要である。Typically, it is heat resistant at the heating temperature that forms an inorganic film. It refers to solid articles (for example, plate-shaped articles) made of materials such as ceramic products, glass, metals, and assemblies of these materials. Typical examples include photovoltaic cells and electronic equipment parts. Note that the surface of the object to be coated needs to be uneven or flat to the extent that the transfer sheet can be applied.
作用および効果
加熱によって無機質被膜を形成する材料層1′を有する
転写シート2を使用して、被膜すべき耐熱性物体に該被
膜形成材料を容易にかつ能率よく適用できる。これを焼
成することによって、ピンホールおよび着膜むら等の怖
れがなく無機質被膜lが有利に形成できる。従って、前
記の従来技術による問題点が簡単な工程にて解消される
。本発明による被膜は、気液遮断性かつ電気絶縁性の被
膜として、特に有用である。Actions and Effects Using a transfer sheet 2 having a material layer 1' which forms an inorganic coating by heating, the coating material can be easily and efficiently applied to the heat-resistant object to be coated. By firing this, an inorganic film 1 can be advantageously formed without fear of pinholes, uneven film deposition, etc. Therefore, the problems caused by the prior art described above can be solved through a simple process. The coating according to the invention is particularly useful as a gas-liquid barrier and electrically insulating coating.
具体的な態様
太陽電池に本発明による無機質被膜を適用する態様を、
以下に例示する。Specific Embodiments The embodiments of applying the inorganic coating according to the present invention to solar cells are as follows:
Examples are shown below.
第2図に例示するような太陽電池の表面12上にガラス
質保護膜1を形成した。第2図において。A glass protective film 1 was formed on the surface 12 of a solar cell as illustrated in FIG. In fig.
基板6は各辺が約100−そして厚さが5露のセラミッ
クタイルである。層7は該タイルの施釉層である。層8
はIn2O5からなる電極層でアリ、この導電層はタイ
ルの二側面13およびこれに続くタイル裏面14の端部
まで延長されている。層9は、 CdTe系のP型半導
体層である。層10は、 CdS系のn型半導体層で
ある。層11は、銀成分からなる格子状電極層である。Substrate 6 is a ceramic tile approximately 100 mm on each side and 5 dew thick. Layer 7 is the glazed layer of the tile. layer 8
is an electrode layer made of In2O5, and this conductive layer extends to the ends of the two side surfaces 13 of the tile and the back surface 14 of the tile. Layer 9 is a CdTe-based P-type semiconductor layer. Layer 10 is a CdS-based n-type semiconductor layer. Layer 11 is a grid-like electrode layer made of a silver component.
第1図に例示するような、約0.2 tyaa未満のプ
ラスチックフィルムからなる基材シート3.約0.2
fiの厚さのガラス質系の被膜形成材料層1′、および
剥離紙4からなる可撓性転写シート2を用いた。該転写
シートを水に浸漬した後、剥離紙4をはがしそして上記
の太陽電池の上表面12および二側面13上に該転写シ
ート2を貼着した。これを充分に乾燥した後、約580
℃にて30分間焼成した。該太陽電池の上表面および二
側面に、透明なガラス質保護膜が均一かつ完全に形成さ
れた。3. A base sheet made of a plastic film of less than about 0.2 tyaa, as illustrated in FIG. Approximately 0.2
A flexible transfer sheet 2 consisting of a vitreous film-forming material layer 1' having a thickness of fi and a release paper 4 was used. After immersing the transfer sheet in water, the release paper 4 was peeled off, and the transfer sheet 2 was pasted onto the upper surface 12 and two side surfaces 13 of the solar cell. After thoroughly drying this, approximately 580
It was baked at ℃ for 30 minutes. A transparent glassy protective film was uniformly and completely formed on the upper surface and two side surfaces of the solar cell.
第1図は、無機質被膜形成材料を適用するための転写シ
ートの断面略図である。第2図は、光電池に無機質保護
膜を形成した態様を例示する断面略図である。
1・・・無機質被膜、1′・・・被膜形成材料層、2・
・・転写シート、5・・・光電池。
特許出願人 株式会社 イナノクス
1:!!、機買板頃
1′: 被腹影瓜材料賀
2: 転写シート
5: 光篭道FIG. 1 is a schematic cross-sectional view of a transfer sheet to which an inorganic film-forming material is applied. FIG. 2 is a schematic cross-sectional view illustrating an embodiment in which an inorganic protective film is formed on a photovoltaic cell. 1... Inorganic coating, 1'... Film forming material layer, 2...
...Transfer sheet, 5...Photovoltaic cell. Patent applicant Inanox Co., Ltd. 1:! ! , Machine purchase plate 1': Covered melon material 2: Transfer sheet 5: Light basket road
Claims (2)
シート上に有する可撓性の転写シートを、耐熱性物体の
所要表面上に貼着して該被膜形成材料層を適用し;次い
で加熱して該物体上に無機質被膜を形成することを特徴
とする、無機質被膜の形成方法。(1) A flexible transfer sheet having a material layer on a base sheet that forms an inorganic film by heating is adhered onto the desired surface of a heat-resistant object to apply the film-forming material layer; then heating A method for forming an inorganic film, the method comprising: forming an inorganic film on the object.
請求の範囲第1項の無機質被膜の形成方法。(2) The method for forming an inorganic coating according to claim 1, wherein the heat-resistant object is a substantially plate-like object.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9297085A JPS61251587A (en) | 1985-04-30 | 1985-04-30 | Formation of inorganic coating |
CA000507725A CA1257984A (en) | 1985-04-30 | 1986-04-28 | System for controlling a transfer clutch of a four- wheel drive vehicle |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9297085A JPS61251587A (en) | 1985-04-30 | 1985-04-30 | Formation of inorganic coating |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61251587A true JPS61251587A (en) | 1986-11-08 |
Family
ID=14069264
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9297085A Pending JPS61251587A (en) | 1985-04-30 | 1985-04-30 | Formation of inorganic coating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61251587A (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5090620A (en) * | 1973-12-15 | 1975-07-19 | ||
JPS5516080A (en) * | 1978-07-19 | 1980-02-04 | Taptrust Ltd | Lubricant composition |
JPS5994470A (en) * | 1982-11-19 | 1984-05-31 | Sanyo Electric Co Ltd | Manufacture of photosemiconductor device |
JPS5999798A (en) * | 1982-11-29 | 1984-06-08 | 日本写真印刷株式会社 | Method of producing ceramic board with conductive film and dielectric film |
-
1985
- 1985-04-30 JP JP9297085A patent/JPS61251587A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5090620A (en) * | 1973-12-15 | 1975-07-19 | ||
JPS5516080A (en) * | 1978-07-19 | 1980-02-04 | Taptrust Ltd | Lubricant composition |
JPS5994470A (en) * | 1982-11-19 | 1984-05-31 | Sanyo Electric Co Ltd | Manufacture of photosemiconductor device |
JPS5999798A (en) * | 1982-11-29 | 1984-06-08 | 日本写真印刷株式会社 | Method of producing ceramic board with conductive film and dielectric film |
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