JPS61246701A - Formation of diffraction grating - Google Patents

Formation of diffraction grating

Info

Publication number
JPS61246701A
JPS61246701A JP5745585A JP5745585A JPS61246701A JP S61246701 A JPS61246701 A JP S61246701A JP 5745585 A JP5745585 A JP 5745585A JP 5745585 A JP5745585 A JP 5745585A JP S61246701 A JPS61246701 A JP S61246701A
Authority
JP
Japan
Prior art keywords
diffraction grating
medium
transparent body
forming
regions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5745585A
Other languages
Japanese (ja)
Other versions
JPH0322602B2 (en
Inventor
Masataka Shirasaki
白崎 正孝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5745585A priority Critical patent/JPS61246701A/en
Priority to CA000504383A priority patent/CA1270934A/en
Priority to US06/841,801 priority patent/US4806442A/en
Priority to DE8686400592T priority patent/DE3687845T2/en
Priority to EP86400592A priority patent/EP0195724B1/en
Publication of JPS61246701A publication Critical patent/JPS61246701A/en
Publication of JPH0322602B2 publication Critical patent/JPH0322602B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To form easily and surely a diffraction grating having phase differences with a simple device by changing the optical path length of a transparent body to be placed between a light source and a medium for forming the diffraction grating and irradiating inclinedly luminous fluxes to the medium. CONSTITUTION:The medium 4 for forming the diffraction grating is provided and the transparent body 3 consisting of glass, etc. is imposed thereon. This transparent body 3 is provided with a step in the oscillation center part C so that the optical path lengths on both sides thereof vary. The two luminous fluxes 5 and 6 are irradiated via the transparent body 3 onto the surface of the medium 4. The luminous fluxes 5 and 6 are made incident at 2theta angle on the medium and the interference of the two luminous fluxes takes place on the medium 4. The two luminous fluxes 5 and 6 are irradiated in the asymmetrical state in which the central axis A constituted by the fluxes is inclined by the angle phi with the normal V. The phases of the interference fringes are consequently shifted with the step part 11 as the boundary. As a result, the phases of the diffraction grating 8 formed by exposing the interference fringes of the two luminous fluxes are also shifted with the step part 1 as the boundary.

Description

【発明の詳細な説明】 〔概要〕 DFBレーザなどを製造する際の回折格子を形成する方
法であって、2つの光束を照射して干渉縞を形成する際
に、媒体との間に透明体を配置し、かつ該透明体に段差
をつけるなどの手法で光路長を変え、しかも2つの光束
を非対称に照射することにより、回折格子に位相シフト
を与える。
[Detailed Description of the Invention] [Summary] A method for forming a diffraction grating when manufacturing a DFB laser, etc., in which a transparent material is placed between the medium and the medium when irradiating two light beams to form interference fringes. By arranging the transparent body, changing the optical path length by adding steps to the transparent body, and irradiating the two light beams asymmetrically, a phase shift is imparted to the diffraction grating.

〔産業上の利用分野〕[Industrial application field]

第8図に示すようにDFBレーザは、半導体チップ7上
に、回折格子8を形成し、その上にレーザ9が作成され
た構造に成っている。このレーザに通電すると回折格子
8およびレーザ9の部分でレーザ発振を起こし、レーザ
光を放出する。
As shown in FIG. 8, the DFB laser has a structure in which a diffraction grating 8 is formed on a semiconductor chip 7, and a laser 9 is formed on the diffraction grating 8. When this laser is energized, the diffraction grating 8 and the laser 9 cause laser oscillation and emit laser light.

ところが単に回折格子を形成しただけでは、回折格子に
おける位相関係がずれるために、DFBレーザの縦モー
ドが2つ発生するという不都合がある。これを解消する
には、第9図のように、回折格子8のピンチをレーザ発
振の中心部Cを境にしてずらすことで、左右の位相関係
を予めずらしておくことが知られている。本発明は、こ
のように回折格子の位相をずらして形成する方法に関す
る。
However, simply forming a diffraction grating causes a problem in that two longitudinal modes of the DFB laser are generated because the phase relationship in the diffraction grating is shifted. In order to solve this problem, it is known to shift the pinch of the diffraction grating 8 with the center C of laser oscillation as a boundary, as shown in FIG. 9, thereby shifting the left and right phase relationship in advance. The present invention relates to a method of forming a diffraction grating with the phase shifted in this manner.

〔従来の技術〕[Conventional technology]

ところでDFBレーザの回折格子を形成するには、従来
は電子ビームで回折格子を描画する手法が採られている
。ところがこのように電子ビームで露光する方法は、作
業が複雑なうえに、時間を要し、量産的でない。また別
の方法として、光の当たった領域が食刻されるレジスト
と光の当たらない領域が食刻されるレジストを隣接して
配置し、露光することで回折格子を作成することも知ら
れている。しかしながらこのような特性を発揮できる2
種のレジストの特性が異なり、実用化に至っていない。
By the way, in order to form a diffraction grating for a DFB laser, a method of drawing the diffraction grating using an electron beam has conventionally been adopted. However, this method of exposing with an electron beam is complicated and time-consuming, and is not suitable for mass production. Another method is to create a diffraction grating by arranging a resist in which the areas exposed to light are etched and a resist in which areas not exposed to light are etched adjacent to each other and exposing them to light. There is. However, there are two types that can exhibit these characteristics.
The characteristics of each type of resist are different, and it has not been put into practical use.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

本発明の技術的課題は、従来の回折格子の形成方法にお
けるこのような問題を解消し、簡単な装   ・置で容
易に、かつ確実に位相差をもった回折格子を作成できる
ようにすることにある。
The technical problem of the present invention is to solve these problems in the conventional method of forming a diffraction grating, and to make it possible to easily and reliably create a diffraction grating with a phase difference using a simple device. It is in.

〔問題点を解決するための手段〕[Means for solving problems]

第1図は本発明による回折格子の形成方法の基本原理を
示す側面図で、(イ)は全容を示し、(ロ)は要部の拡
大図である。4は回折格子を形成する媒体であり、その
上にガラスなどの透明体3が載置される。この透明体3
は、発振中心部C上で段差がつき、その両側の光路長が
異なる。あるいは発振中心部C上を境にして、左右の屈
折率が異なる構成としてもよい。
FIG. 1 is a side view showing the basic principle of the method for forming a diffraction grating according to the present invention, in which (a) shows the entire structure and (b) is an enlarged view of the main part. 4 is a medium forming a diffraction grating, on which a transparent body 3 such as glass is placed. This transparent body 3
has a step above the oscillation center C, and the optical path lengths on both sides thereof are different. Alternatively, the refractive index may be different on the left and right sides with the oscillation center C as a boundary.

この媒体4の面に、前記透明体3を介して、2つの光束
5と6が照射される。その際光束5と6が角度2θの角
度をなして入射し、媒体4上で2つの光束の干渉が行な
われる。また2つの光束5と6の成す中心軸Aは、法線
Vに対し角度φだけ傾き、非対称の状態で照射される。
Two light beams 5 and 6 are irradiated onto the surface of this medium 4 through the transparent body 3. At this time, the light beams 5 and 6 are incident at an angle of 2.theta., and interference between the two light beams occurs on the medium 4. Moreover, the central axis A formed by the two light beams 5 and 6 is inclined by an angle φ with respect to the normal line V, and the light beams are irradiated in an asymmetrical state.

〔作用〕[Effect]

第1図(ロ)に示すように、透明体3の厚さは、段差部
11を境にして異なり、左側の厚さtlより右側の厚さ
t2が小さい。そのため段差部11の左側と右側とでは
、光路長が異なり、また2つの光束5.6が角度φだけ
傾き非対称に照射されるので、段差部11を境にして干
渉縞の位相がずれる。
As shown in FIG. 1(b), the thickness of the transparent body 3 varies across the stepped portion 11, with the thickness t2 on the right side being smaller than the thickness tl on the left side. Therefore, the optical path lengths are different on the left and right sides of the stepped portion 11, and the two light beams 5.6 are irradiated asymmetrically with an angle φ, so that the phase of the interference fringes is shifted with the stepped portion 11 as a boundary.

その結果、2つの光束による干渉縞を露光して形成され
る回折格子8も、段差部11を境にして位相がずれる。
As a result, the phase of the diffraction grating 8, which is formed by exposing the interference fringes of the two light beams, is also shifted across the stepped portion 11.

〔実施例〕〔Example〕

第2図は本発明による回折格子の形成方法を使用して、
DFBレーザを製造する例を示す側面図である。同時に
多数のDFBレーザを製造できるように、透明体3に、
レーザの寸法lと同じピッチで多数の段差部11・・・
が形成されている。2つの光束5.6を照射すると、そ
れぞれの段差部11・・・を境にして、両側の光路長が
異なり、かつ光束5.6の入射方向を垂線Vに対し角度
φだけ傾けて非対称に照射することで、それぞれの段差
部11を境にして位相のずれた回折格子が形成される。
FIG. 2 shows that using the method of forming a diffraction grating according to the present invention,
FIG. 2 is a side view showing an example of manufacturing a DFB laser. In order to manufacture a large number of DFB lasers at the same time, the transparent body 3 is
A large number of stepped portions 11 with the same pitch as the laser dimension l...
is formed. When two light beams 5.6 are irradiated, the optical path lengths on both sides are different with each stepped portion 11 as a boundary, and the incident direction of the light beams 5.6 is tilted by an angle φ with respect to the perpendicular V, making it asymmetrical. By irradiating it, a diffraction grating whose phase is shifted with each stepped portion 11 as a boundary is formed.

露光して回折格子を形成した後に、段差部11が中心に
くるように、鎖線12・・・の位置で切り離される。
After exposing to light to form a diffraction grating, it is separated at the positions indicated by chain lines 12 so that the stepped portion 11 is in the center.

次に第3図において、段差寸法tと2光束5.6の傾き
角φを求める。透明体3として、屈折率がnのガラスを
使用し、DFBレーザの寸法(キャビティ長)をl、段
差寸法をtとする。いま回折格子の周期を八とすると、 2八sinθcosφ=λ ・(1) となる。光源として、波長λが3250人のHeCdレ
ーザ光を使用し、θ=54.3度、φ=5度とすると、
A=2009人となる。ガラスの屈折率n =1.5の
とき、段差寸法t=2.03μ爾とすれば、段差部11
を境にして、回折格子の位相を反転できることになる。
Next, in FIG. 3, the step size t and the inclination angle φ of the two light beams 5.6 are determined. Glass with a refractive index of n is used as the transparent body 3, the dimension (cavity length) of the DFB laser is l, and the step dimension is t. Now, if the period of the diffraction grating is 8, then 28 sin θcosφ=λ ・(1). Assuming that a HeCd laser beam with a wavelength λ of 3250 is used as a light source, and θ=54.3 degrees and φ=5 degrees,
A = 2009 people. When the refractive index of glass is n = 1.5, and the step size t = 2.03μ, the step portion 11
This means that the phase of the diffraction grating can be inverted at .

ガラスとしては、紫外光の吸収の少ない石英を用いるの
が良い。
As the glass, it is preferable to use quartz, which absorbs little ultraviolet light.

なお透明体3の両面にARコートと呼ばれる反射防止処
理を行なえば、透明体3中で光が多重反射して回折格子
が乱れるのを防止できる。
Note that by applying an anti-reflection treatment called AR coating to both sides of the transparent body 3, it is possible to prevent multiple reflections of light in the transparent body 3 and disorder of the diffraction grating.

第4図は透明体の段差形成方法の第1実施例である。3
1は石英ガラスであり、その表面に、幅がlで、厚さt
の5i02の膜13を形成する。すると、11*13の
領域の板厚がtl、膜13の無い領域の板厚がt2とな
る。この膜13は、蒸着やスパッタリングなどの手法で
形成される。
FIG. 4 shows a first embodiment of a method for forming a step in a transparent body. 3
1 is a quartz glass with a width l and a thickness t on its surface.
A film 13 of 5i02 is formed. Then, the plate thickness in the 11*13 area becomes tl, and the plate thickness in the area without the film 13 becomes t2. This film 13 is formed by a method such as vapor deposition or sputtering.

第5図は段差形成方法の別の実施例で、透明体32を幅
lの領域だけ、エツチングによって除去し、深さがtの
窪みを形成することで、段差部11を形成している。
FIG. 5 shows another embodiment of the step forming method, in which the step portion 11 is formed by etching away a region of the transparent body 32 having a width l and forming a recess having a depth t.

以上は、透明体に段差部11を形成することで光路長を
変えているが、第6図のように、発振中心部を境にして
、両側の透明体33と34の屈折率を変えることでも同
様な効果が得られる。すなわち同図(イ)のような石英
ガラスなどの透明平板35に、それと屈折率の異なるZ
rO2などの膜33を被着形成し、(ロ)の形状にする
。次に(ハ)のように、膜33の無い領域に、石英ガラ
ス35と屈折率の等しい5i02の膜34をZrO2膜
33膜間3厚さまで成膜する。この構成は、透明体の板
厚は一定であるが、ZrO2膜33膜間3と5i02膜
34の領域とで屈折率が異なるので、照射される光束の
光路長も異なる。
In the above, the optical path length is changed by forming the stepped portion 11 in the transparent body, but as shown in FIG. But you can get the same effect. In other words, a transparent flat plate 35 made of quartz glass or the like as shown in FIG.
A film 33 of rO2 or the like is deposited and formed into the shape of (b). Next, as shown in (c), a film 34 of 5i02 having the same refractive index as the quartz glass 35 is formed to a thickness of 3 between the ZrO2 films 33 in an area where there is no film 33. In this configuration, although the thickness of the transparent body is constant, the refractive index differs between the interlayer 3 of the ZrO2 film 33 and the region of the 5i02 film 34, so the optical path length of the irradiated light beam also differs.

第7図は三角柱形状をした透明体の例であり、光路長の
異なる2つの領域1.2を有する面36と光束5の入射
面37と光束6の入射面38によって囲まれる三角柱状
を成している。
FIG. 7 shows an example of a triangular prism-shaped transparent body, which forms a triangular prism shape surrounded by a surface 36 having two regions 1.2 with different optical path lengths, an incident surface 37 for the light beam 5, and an incident surface 38 for the light beam 6. are doing.

〔発明の効果〕〔Effect of the invention〕

以上のように本発明によれば、光源と回折格子を形成す
る媒体との間に置く透明体の光路長を変え、かつ光束を
傾けて照射するだけで、位相差をもった回折格子を形成
できるので、簡単な装置で容易にかつ確実に回折格子が
得られる。
As described above, according to the present invention, a diffraction grating with a phase difference can be formed by simply changing the optical path length of the transparent body placed between the light source and the medium forming the diffraction grating and irradiating the light beam at an angle. Therefore, a diffraction grating can be easily and reliably obtained using a simple device.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明による回折格子の形成方法の基本立理を
示す側面図、第2図は本発明による回折格子の形成方法
の実施例を示す側面図、第3図は段差寸法の算出例を示
す側面図、第4図〜第7図は透明体の各実施例を示す断
面図、第8図はDFBレーザの断面図、第9図は位相差
をもった回折格子を示す断面図である。 図において、3は透明体、4は回折格子を形成する媒体
、5.6は光束、Cは発振中心部、■は法線、11は段
差部をそれぞれ示す。 特許出願人      富士通株式会社代理人 弁理士
    青 柳   稔第1図 第2図 第3図 透明体実施例 第4図 透明体実施例 第5図 透明体実施例 第6図 第7図 DFBシーデー断面 第8図 第9図
FIG. 1 is a side view showing the basic principle of the method for forming a diffraction grating according to the present invention, FIG. 2 is a side view showing an embodiment of the method for forming a diffraction grating according to the present invention, and FIG. 3 is an example of calculating step dimensions. 4 to 7 are cross-sectional views showing each embodiment of the transparent body, FIG. 8 is a cross-sectional view of a DFB laser, and FIG. 9 is a cross-sectional view showing a diffraction grating with a phase difference. be. In the figure, 3 is a transparent body, 4 is a medium forming a diffraction grating, 5.6 is a luminous flux, C is an oscillation center, ■ is a normal line, and 11 is a stepped portion. Patent Applicant Fujitsu Limited Agent Minoru Aoyagi Figure 1 Figure 2 Figure 3 Transparent Body Example Figure 4 Transparent Body Example Figure 5 Transparent Body Example Figure 6 Figure 7 DFB Sea Day Cross Section Figure 8 Figure 9

Claims (6)

【特許請求の範囲】[Claims] (1)、2つの光束の干渉露光により回折格子を形成す
る方法において、回折格子を形成する媒体(4)の上に
、光の光路長の異なる2つの領域(1)(2)を有する
透明体(3)を該表面が媒体(4)と同じ側となるよう
に媒体(4)に接触させ、かつ2つの光束(5)(6)
を角度(2θ)をつけて照射し、 しかも2つの光束(5)(6)のなす中心軸(A)を、
媒体(4)の上面および透明体(3)の領域(1)(2
)の面の法線Vに対し、相対的に角度φだけ傾けること
で、2つの光束5と6の入射方向を、法線Vに対し非対
称とすることを特徴とする回折格子の形成方法。
(1) In a method of forming a diffraction grating by interference exposure of two light beams, a transparent material having two regions (1) and (2) with different optical path lengths on the medium (4) forming the diffraction grating. The body (3) is brought into contact with the medium (4) such that its surface is on the same side as the medium (4), and the two light beams (5) (6)
is irradiated at an angle (2θ), and the central axis (A) formed by the two light beams (5) and (6) is
The upper surface of the medium (4) and the regions (1) (2) of the transparent body (3)
) A method for forming a diffraction grating, characterized in that the directions of incidence of the two light beams 5 and 6 are made asymmetrical with respect to the normal V by tilting the surface by an angle φ relative to the normal V of the surface.
(2)、前記光の光路長の異なる2つの領域が、表面の
高さが異なる2つの領域よりなることを特徴とする特許
請求の範囲第(1)項記載の回折格子の形成方法。
(2) The method for forming a diffraction grating according to claim (1), wherein the two regions having different optical path lengths of the light are comprised of two regions having different surface heights.
(3)、前記光の光路長の異なる2つの領域が、異なる
屈折率よりなる層を選択的に設けることより形成される
ことを特徴とする特許請求の範囲第(1)項記載の回折
格子の形成方法。
(3) The diffraction grating according to claim (1), wherein the two regions having different optical path lengths of the light are formed by selectively providing layers having different refractive indexes. How to form.
(4)、前記透明体(3)が、領域(1)(2)および
それに平行な平面により挟まれた平板状であることを特
徴とする特許請求の範囲第(1)項記載の回折格子の形
成方法。
(4) The diffraction grating according to claim (1), wherein the transparent body (3) has a flat plate shape sandwiched between the regions (1) and (2) and a plane parallel thereto. How to form.
(5)、前記透明体(3)が、領域(1)(2)および
光束(5)、光束(6)の各々の入射面より成る三角柱
形状であることを特徴とする特許請求の範囲第(1)項
記載の回折格子の形成方法。
(5) The transparent body (3) has a triangular prism shape consisting of the regions (1) and (2) and the incident surfaces of the light beams (5) and (6), respectively. The method for forming a diffraction grating as described in (1).
(6)、前記透明体(3)の光束入射面および領域(1
)(2)に該光束の偏光状態、入射角、波長に対応した
反射防止膜を形成したことを特徴とする特許請求の範囲
第(1)項記載の回折格子の形成方法。
(6), the light beam incidence surface and region (1) of the transparent body (3);
2) A method for forming a diffraction grating according to claim 1, wherein an antireflection film corresponding to the polarization state, incident angle, and wavelength of the light beam is formed in (2).
JP5745585A 1985-03-20 1985-03-20 Formation of diffraction grating Granted JPS61246701A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP5745585A JPS61246701A (en) 1985-03-20 1985-03-20 Formation of diffraction grating
CA000504383A CA1270934A (en) 1985-03-20 1986-03-18 Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings
US06/841,801 US4806442A (en) 1985-03-20 1986-03-20 Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings
DE8686400592T DE3687845T2 (en) 1985-03-20 1986-03-20 SPATIAL PHASE MODULATION MASKS, METHOD FOR THE PRODUCTION THEREOF AND METHOD FOR THE FORMATION OF PHASE-SHIFTED GRADES.
EP86400592A EP0195724B1 (en) 1985-03-20 1986-03-20 Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5745585A JPS61246701A (en) 1985-03-20 1985-03-20 Formation of diffraction grating

Publications (2)

Publication Number Publication Date
JPS61246701A true JPS61246701A (en) 1986-11-04
JPH0322602B2 JPH0322602B2 (en) 1991-03-27

Family

ID=13056139

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5745585A Granted JPS61246701A (en) 1985-03-20 1985-03-20 Formation of diffraction grating

Country Status (1)

Country Link
JP (1) JPS61246701A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5221429A (en) * 1990-04-19 1993-06-22 Kabushiki Kaisha Toshiba Method of manufacturing phase-shifted diffraction grating

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5221429A (en) * 1990-04-19 1993-06-22 Kabushiki Kaisha Toshiba Method of manufacturing phase-shifted diffraction grating

Also Published As

Publication number Publication date
JPH0322602B2 (en) 1991-03-27

Similar Documents

Publication Publication Date Title
EP0188919B1 (en) A method for the formation of a diffraction grating
KR0184278B1 (en) Reflection mask method of producing mask and method of forming pattern using the mask
US4806442A (en) Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings
JP2618875B2 (en) Waveguide
KR20020092416A (en) Selective deposition of material on a substrate according to an interference pattern
JPS6060042B2 (en) Method and device for creating a grating in an optical waveguide
JPS61190368A (en) Formation of fine pattern
JPS63106605A (en) Thin film waveguide type optical diffraction element
JPS61246701A (en) Formation of diffraction grating
JP2629671B2 (en) Holographic exposure method
JP3627093B2 (en) Resonant mode grating filter
JP2537596B2 (en) Method of manufacturing diffraction grating
JPH01270284A (en) Semiconductor laser element and its manufacture
JPH052142B2 (en)
JPH0225803A (en) Polarized beam splitter
JPH02310986A (en) Semiconductor laser element, photomask and manufacture thereof
JPS6325659B2 (en)
JPS62111203A (en) Mode refractive-index bimodulation type phase grating
JP2735589B2 (en) Manufacturing method of diffraction grating
JPH03296003A (en) Optical device and its manufacture
JPH033285A (en) Manufacture of semiconductor device
JPH02196202A (en) Formation of phase shift type diffraction grating
JPH06258534A (en) Optical device
JPH0685081B2 (en) Exposure method
JPS62109386A (en) Manufacture of diffraction grating of dfb laser

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term