JPS61245527A - Photosensitive material applicator - Google Patents
Photosensitive material applicatorInfo
- Publication number
- JPS61245527A JPS61245527A JP8715085A JP8715085A JPS61245527A JP S61245527 A JPS61245527 A JP S61245527A JP 8715085 A JP8715085 A JP 8715085A JP 8715085 A JP8715085 A JP 8715085A JP S61245527 A JPS61245527 A JP S61245527A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive material
- detector
- photosensitive
- photosensitive agent
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 50
- 239000003795 chemical substances by application Substances 0.000 claims description 33
- 239000003504 photosensitizing agent Substances 0.000 claims description 17
- 239000011248 coating agent Substances 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 13
- 238000011084 recovery Methods 0.000 claims description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 8
- 229920002554 vinyl polymer Polymers 0.000 abstract description 8
- 238000010276 construction Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明はたとえば回転される被塗布材の表面に一様に感
光剤を塗布する感光剤塗布装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a photosensitive agent coating device that uniformly applies a photosensitive agent to the surface of a rotating material to be coated, for example.
感光剤塗布装置としては、従来たとえば、第３図に示す
ようなものが知られている。すなわち、図中１は駆動シ
リンダーで、この駆動シリンダー１にはポンプ２、バル
ブ３を介してノズル４が接続されている。そして、前記
ノズル４には被塗布材５が対向され、この被塗布材５は
モータ６によって回転される真空吸着式のターンテーブ
ル７上に載置されている。また、上記ポンプ２にはバル
ブ８、フィルター９を介して感光剤１０ａを収容する感
光剤容器１０が接続されている。As a photosensitive agent coating device, for example, the one shown in FIG. 3 is known. That is, 1 in the figure is a drive cylinder, and a nozzle 4 is connected to this drive cylinder 1 via a pump 2 and a valve 3. A material to be coated 5 is opposed to the nozzle 4, and the material to be coated 5 is placed on a vacuum suction type turntable 7 rotated by a motor 6. Further, a photosensitive agent container 10 containing a photosensitive agent 10a is connected to the pump 2 via a valve 8 and a filter 9.
しかして、被塗布材５に感光剤１０ａを塗布する場合に
は、駆動シリンダー１が駆動され、これにより、ポンプ
２が作動されて、感光剤容器１０から、フィルター９お
よびバルブ８を介してポンプ２内に感光剤１０ａが吸引
される。そして、この吸引された感光剤１０ａはポンプ
２から吐出され、バルブ３を介して、ノズル４から、被
塗布材５上に吹き付けられる。この被塗布材５はモータ
６の駆動により回転され、その表面に一様に感光剤１０
ａが塗布されることになる。When applying the photosensitizer 10a to the material 5 to be coated, the drive cylinder 1 is driven, thereby operating the pump 2, which pumps the photosensitizer from the photosensitizer container 10 through the filter 9 and the valve 8. The photosensitive agent 10a is sucked into the interior of the photosensitive material 2. The sucked photosensitive agent 10a is then discharged from the pump 2 and sprayed onto the material 5 to be coated from the nozzle 4 via the valve 3. This material 5 to be coated is rotated by the drive of a motor 6, and the photosensitive agent 10 is uniformly spread over the surface of the material 5.
a will be applied.
しかしながら、従来においては、感光剤供給ルートＲの
リークおよびフィルター９にて発生するガスなどにより
、感光剤１０ａ中に気泡が混入され、この気泡が混入さ
れた感光剤１０ａが被塗布材５に滴下され、塗布膜厚が
前記気泡の径よりも薄くなった場合には、気泡が破裂し
て塗布不良（塗布むら）を誘発する欠点があった。However, in the conventional method, air bubbles are mixed into the photosensitizer 10a due to leakage in the photosensitizer supply route R and gas generated in the filter 9, and the photosensitizer 10a mixed with the air bubbles is dropped onto the material 5 to be coated. However, if the thickness of the coating film becomes thinner than the diameter of the bubbles, the bubbles may burst, resulting in poor coating (uneven coating).
（発明の目的）
本発明は上記事情に着目してなされたもので、その目的
とするところは、気泡を混入した感光剤を被塗布材上に
供給することのないようにした感光材塗布装置を提供し
ようとするものである。(Object of the Invention) The present invention has been made in view of the above-mentioned circumstances, and its object is to provide a photosensitive material coating device which prevents the supply of a photosensitive material containing air bubbles onto a material to be coated. This is what we are trying to provide.
本発明は上記目的を達成するため、感光剤の供給ルート
に検知器を設け、この検知器によって気泡を検知したと
き、感光剤を被塗布材以外の場所に逃がことにより、気
泡を混入した感光剤を被塗布材に供給しないようにした
ものである。In order to achieve the above object, the present invention provides a detector in the supply route of the photosensitizer, and when the detector detects air bubbles, the air bubbles are mixed in by letting the photosensitizer escape to a place other than the material to be coated. The photosensitive agent is not supplied to the material to be coated.
（発明の実施例）
以下、本発明を第１図および第２図に示す一実施例を参
照して説明する。図中１１は駆動シリンダーで、この駆
動シリンダー１１によって定量吐出ポンプ１２が駆動さ
れるようになっている。前記定量吐出ポンプ１２には供
給ルートとしての配管系を構成するビニールパイプａを
介して、バルブ１３、検知器２１、切換え弁１４、およ
びノズル１５が順次接続されている。そして、前記ノズ
ル１５には被塗布材１６が対向されている。この被塗布
材１６はモータ１７によって回転されるターンテーブル
１８上に載置されている。また、上記定量吐出ポンプ１
２には供給ルートとしてのビニールバイブｂを介してバ
ルブ２３、フィルタ２２および供給源としての感光剤容
器１９が順次接続されている。前記バルブ１３．２３は
上記駆動シリンダー１１と連動して交互に開閉するよう
になっている。また、上記切換え弁１４と感光剤容器１
９とは回収ルートとしての戻し管２０を介して接続され
ている。(Embodiment of the Invention) The present invention will be described below with reference to an embodiment shown in FIGS. 1 and 2. In the figure, reference numeral 11 denotes a drive cylinder, and the drive cylinder 11 drives a metering discharge pump 12. A valve 13, a detector 21, a switching valve 14, and a nozzle 15 are sequentially connected to the quantitative discharge pump 12 via a vinyl pipe a constituting a piping system as a supply route. A material to be coated 16 is opposed to the nozzle 15 . The material to be coated 16 is placed on a turntable 18 rotated by a motor 17. In addition, the above-mentioned fixed quantity discharge pump 1
A valve 23, a filter 22, and a photosensitive agent container 19 as a supply source are successively connected to 2 via a vinyl vibrator b as a supply route. The valves 13.23 are arranged to alternately open and close in conjunction with the drive cylinder 11. In addition, the switching valve 14 and the photosensitive agent container 1
9 through a return pipe 20 as a recovery route.
上記検出器２１としてはたとえば、第２図に示すような
光電スイッチが用いられる。すなわち、この光電スイッ
チはビニールパイプａの一部を薄く広げ、−次元イメー
ジセンサ−２４でビニールパイプａ内を流れる感光剤１
９ａ中に混入する気泡を検知するようになっている。こ
の検出器２１によって気泡が検知されると、図示しない
制御部により、上記切り替え弁１４が作動され、感光剤
流路を上記ノズル１５側あるいは上記戻し管２０側に切
換えるようになっている。As the detector 21, for example, a photoelectric switch as shown in FIG. 2 is used. That is, this photoelectric switch spreads a part of the vinyl pipe a thinly, and uses the -dimensional image sensor 24 to detect the photosensitive agent 1 flowing inside the vinyl pipe a.
It is designed to detect air bubbles mixed into 9a. When air bubbles are detected by the detector 21, a control section (not shown) operates the switching valve 14 to switch the photosensitive agent flow path to the nozzle 15 side or the return pipe 20 side.
なお、当然ながら、検出器２１と切換え弁１４との間に
保有される感光剤１９ａの容量は一回の塗布量を上回る
。また、検出器２１と切換え弁１４との間の感光剤保有
量と１回の塗布量との関係から、検出後の何回目に気泡
が切換え弁１４に達するかで決まるので、そのタイミン
グで１回ないし２回ダミー吐出する。なお、感光剤１９
ａは粘性が高いため、気泡は感光剤１９ａ中を自由に動
かない。Note that, as a matter of course, the capacity of the photosensitizer 19a held between the detector 21 and the switching valve 14 exceeds the amount of one application. Also, from the relationship between the amount of photosensitizer held between the detector 21 and the switching valve 14 and the amount applied at one time, it is determined how many times the bubbles reach the switching valve 14 after detection, so the timing Discharge dummy water once or twice. In addition, photosensitizer 19
Since a has a high viscosity, bubbles do not move freely in the photosensitive agent 19a.
しかして、被塗布材１６に感光剤１９ａを塗布する場合
には、駆動シリンダー１１により、定量吐出ポンプ１２
が作動される。これにより、感光剤容器１９からフィル
ター２２、バルブ２３を介して、感光剤１９ａが吸引さ
れて吐出され、バルブ１３、検知器２１、切換え弁１４
を介してノズル１５から、被塗布材１６上に感光剤が滴
下される。被塗布材１６はモータ１７の作動により、タ
ーンテーブル１８とともに回転しその表面に一様に塗布
されることになる。Therefore, when applying the photosensitive agent 19a to the material 16 to be applied, the drive cylinder 11 drives the metering discharge pump 12.
is activated. As a result, the photosensitizer 19a is sucked and discharged from the photosensitizer container 19 through the filter 22 and the valve 23, and
The photosensitive agent is dripped onto the material 16 to be coated from the nozzle 15 through the nozzle 15 . The material 16 to be coated is rotated together with the turntable 18 by the operation of the motor 17, and the surface of the material 16 is uniformly coated.
ところで、この感光剤１９ａの塗布時において、ビニー
ルバイブａＳｂのリークおよびフィルター２２にて発生
するガスなどにより、感光剤１９ａ中に気泡が混入され
ると、検知器２１よって気泡が検知される。この検知に
より、切換え弁１４が作動され、感光剤１９ａは切換え
弁１４を介して戻し管２０に流されて感光剤容器１９に
回収される。By the way, when the photosensitive agent 19a is applied, if air bubbles are mixed into the photosensitive agent 19a due to leakage from the vinyl vibrator aSb and gas generated in the filter 22, the air bubbles are detected by the detector 21. Upon this detection, the switching valve 14 is actuated, and the photosensitive agent 19a is passed through the switching valve 14 into the return pipe 20 and collected into the photosensitive agent container 19.
このように、この実施例によれば、気泡を混入した感光
剤１９ａを感光剤容器１９に回収するため、被塗布材１
６には供給されることがなく、気泡の混入しない感光剤
１９ａのみが供給されることになる。また、気泡の混入
した感光剤１９ａは感光材容器１９に回収するため、感
光剤１９ａの再利用が可能である。As described above, according to this embodiment, in order to collect the photosensitive agent 19a mixed with air bubbles into the photosensitive agent container 19, the material to be coated is
6 is not supplied, and only the photosensitive agent 19a containing no air bubbles is supplied. Further, since the photosensitive agent 19a containing air bubbles is collected into the photosensitive material container 19, the photosensitive agent 19a can be reused.
なお、上記一実施例においては、気泡を混入した感光剤
１９ａを切換え弁１４から感光剤容器１９に逃がしたが
、これに限られることなくアクチュエイターなどを用い
て、ノズル１５を被塗布材１６以外の場所に移動させて
、ダミー吐出させてもよい。 また、気泡の大きさを知
ることにより、塗布不良に至らない径の気泡に対しては
上述したダミー吐出を行なわないように調節することも
可能である。In the above embodiment, the photosensitive agent 19a mixed with air bubbles is released from the switching valve 14 into the photosensitive agent container 19, but the nozzle 15 is moved to the material to be coated 16 using an actuator or the like. Dummy discharge may be performed by moving to a location other than the above location. Furthermore, by knowing the size of the bubbles, it is possible to adjust so that the above-mentioned dummy discharge is not performed for bubbles with a diameter that does not cause coating defects.
その他、本発明はその要旨の範囲内で種々変形実施可能
なことは勿論である。In addition, it goes without saying that the present invention can be modified in various ways within the scope of its gist.
本発明は以上説明したように、供給ルートに検知器を設
け、この検知器により、気泡を検知したときは感光剤を
被塗布剤以外の場所に逃がす構成としたから、気泡を混
入した感光剤を被塗布材上に供給することがなく、良好
に塗布できるという効果を奏する。As explained above, the present invention has a configuration in which a detector is provided in the supply route, and when air bubbles are detected by this detector, the photosensitizer is released to a place other than the material to be coated. There is an effect that the coating can be performed satisfactorily without being supplied onto the material to be coated.
第１図は本発明の一実施例である感光剤塗布装置を示す
概略的構成図、第２図はその検知器を示す概略的構成図
、第３図は従来の感光剤塗布装置を示す概略的構成図で
ある。
１９ａ・・・感光剤、１９・・・感光剤容器（供給源）
、１６・・・被塗布材、ａ、ｂ・・・ビニールパイプ（
供給ルート）２１・・・検知器。FIG. 1 is a schematic configuration diagram showing a photosensitive agent coating device according to an embodiment of the present invention, FIG. 2 is a schematic configuration diagram showing its detector, and FIG. 3 is a schematic configuration diagram showing a conventional photosensitive agent coating device. It is a configuration diagram. 19a... Photosensitive agent, 19... Photosensitive agent container (supply source)
, 16... Material to be coated, a, b... Vinyl pipe (
Supply route) 21...Detector.
Claims (3)
された感光剤を被塗布材に供給する供給ルートと、この
供給ルートに設けられ感光剤に混入する気泡を検知する
検知器とを具備し、前記検知器が気泡を検知したとき、
感光剤を被塗布材以外の場所に逃がす構成としたことを
特徴とする感光剤塗布装置。(1) A supply source that supplies a photosensitizer, a supply route that supplies the photosensitizer supplied from this supply source to the material to be coated, and a detector installed in this supply route that detects air bubbles mixed into the photosensitizer. and when the detector detects air bubbles,
A photosensitive agent coating device characterized by having a configuration that allows the photosensitive agent to escape to a location other than the material to be coated.
ルートの中途部から回収ルートを介して供給源に回収す
ることを特徴とする特許請求の範囲の第１項記載の感光
材塗布装置。(2) The photosensitive material coating device according to claim 1, wherein when a bubble is detected by a detector, the photosensitive material is recovered from a midway point of a supply route to a supply source via a recovery route. .
させて被塗布材から逃がすことを特徴とする特許請求の
範囲第１項記載の感光材塗布装置。(3) The photosensitive material coating apparatus according to claim 1, wherein when the detector detects bubbles, the supply route is moved to release the bubbles from the material to be coated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8715085A JPS61245527A (en) | 1985-04-23 | 1985-04-23 | Photosensitive material applicator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8715085A JPS61245527A (en) | 1985-04-23 | 1985-04-23 | Photosensitive material applicator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61245527A true JPS61245527A (en) | 1986-10-31 |
Family
ID=13906948
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8715085A Pending JPS61245527A (en) | 1985-04-23 | 1985-04-23 | Photosensitive material applicator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61245527A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0294517A (en) * | 1988-09-30 | 1990-04-05 | Tokyo Electron Ltd | Applying method of resist liquid |
| JPH02119929A (en) * | 1988-10-28 | 1990-05-08 | Tokyo Electron Ltd | Liquid treating device |
| JP2006313822A (en) * | 2005-05-09 | 2006-11-16 | Tokyo Electron Ltd | Processing liquid discharge device, verification method of its operation, and driving/controlling method thereof |
| JP2008205478A (en) * | 2007-02-21 | 2008-09-04 | Toshiba Corp | Resist discharging method and resist discharging apparatus |
| CN103721894A (en) * | 2014-01-07 | 2014-04-16 | 成都拓利化工实业有限公司 | Horizontal glue injection machine |
| CN104452558A (en) * | 2014-12-01 | 2015-03-25 | 中国民航科学技术研究院 | Automatic pointing glue injection machine of single-component glue |
| JP2016103590A (en) * | 2014-11-28 | 2016-06-02 | 東京エレクトロン株式会社 | Substrate processing method and substrate processing device |
| CN115213062A (en) * | 2021-04-15 | 2022-10-21 | 株式会社小金井 | Liquid supply device |
-
1985
- 1985-04-23 JP JP8715085A patent/JPS61245527A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0294517A (en) * | 1988-09-30 | 1990-04-05 | Tokyo Electron Ltd | Applying method of resist liquid |
| JPH02119929A (en) * | 1988-10-28 | 1990-05-08 | Tokyo Electron Ltd | Liquid treating device |
| JP2006313822A (en) * | 2005-05-09 | 2006-11-16 | Tokyo Electron Ltd | Processing liquid discharge device, verification method of its operation, and driving/controlling method thereof |
| JP4583235B2 (en) * | 2005-05-09 | 2010-11-17 | 東京エレクトロン株式会社 | TREATING LIQUID DISCHARGE DEVICE, ITS OPERATION VERIFICATION METHOD, AND DRIVE CONTROL METHOD |
| JP2008205478A (en) * | 2007-02-21 | 2008-09-04 | Toshiba Corp | Resist discharging method and resist discharging apparatus |
| CN103721894A (en) * | 2014-01-07 | 2014-04-16 | 成都拓利化工实业有限公司 | Horizontal glue injection machine |
| JP2016103590A (en) * | 2014-11-28 | 2016-06-02 | 東京エレクトロン株式会社 | Substrate processing method and substrate processing device |
| CN104452558A (en) * | 2014-12-01 | 2015-03-25 | 中国民航科学技术研究院 | Automatic pointing glue injection machine of single-component glue |
| CN115213062A (en) * | 2021-04-15 | 2022-10-21 | 株式会社小金井 | Liquid supply device |
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