JP4583235B2 - TREATING LIQUID DISCHARGE DEVICE, ITS OPERATION VERIFICATION METHOD, AND DRIVE CONTROL METHOD - Google Patents

Description

  The present invention is used, for example, when a photoresist liquid or the like is applied onto a semiconductor substrate, and in particular, a processing liquid discharge apparatus capable of accurately monitoring the discharge state of a processing liquid such as a photoresist liquid on the substrate and the same The present invention relates to an operation verification method and a drive control method for the apparatus.

  For example, in the field of manufacturing technology of semiconductor devices or LCDs, a photoresist film is applied on a semiconductor wafer or LCD substrate to form a resist film, and the resist film is exposed in accordance with a circuit pattern and developed. The so-called photolithography technique is applied.

  As described above, when the photoresist solution is applied on the substrate, a predetermined amount of the resist solution is discharged onto the substrate surface from the processing solution discharge device located immediately above the substrate. In this case, in the current apparatus of this type, an indirect estimation is made that the resist solution has been discharged onto the substrate by the drive operation of an actuator such as a bellows pump or a diaphragm pump that is the resist solution pumping means. Relying on detection.

  Thus, in this type of conventional apparatus, since the processing liquid such as the resist liquid discharged to the substrate surface is not directly detected, the processing liquid is not discharged from the nozzle due to some trouble, Alternatively, there is a problem that there is no way of knowing even if a large amount of bubbles is mixed in the processing liquid to cause defective discharge of the processing liquid. For this reason, there is a problem that a large amount of coating failure occurs due to a delay in the detection of the processing liquid without being aware of the discharge failure of the processing liquid onto the semiconductor substrate or the like.

Therefore, in order to solve the technical problem described above, a processing liquid discharge apparatus that optically detects a state in which the processing liquid such as the resist liquid is discharged from the nozzle tip portion is disclosed in the following patent document. 1 and Patent Document 2 and the like. For example, according to the processing liquid discharge apparatus disclosed in Patent Document 1, an optical sensor including a light emitting unit and a light receiving unit is provided, and the sensor is disposed so as to cross the processing liquid discharge position slightly below the nozzle tip. A configuration in which the optical path is set is shown.
JP-A-3-278519 Japanese Utility Model Publication No. 2-133471

  By the way, in the disclosed contents of Patent Document 1, the light emitting part and the light receiving part that constitute the above-described optical sensor are shown in a floating state. Specific examples are not revealed. Therefore, in order to specifically realize the optical sensor disclosed in Patent Document 1, it can be considered that, for example, a configuration as shown in FIG. 1 is adopted.

  FIG. 1 is a cross-sectional view showing the central portion of the nozzle portion of the processing liquid discharge apparatus, which is cut in the vertical direction. For example, a treatment liquid delivery pipe 1 a is formed at the center of the nozzle holder 1 formed in a prismatic shape, and a treatment liquid discharge nozzle 2 is attached to the lower bottom portion of the nozzle holder 1 to form the nozzle 2. The shaft hole 2a is configured to communicate linearly with a delivery pipe 1a formed in the holder 1. Then, the processing liquid R such as a resist liquid is sent through a delivery pipe 1 a in the nozzle holder 1 through a processing liquid transport tube (not shown).

  On the other hand, a sensor fixing bracket 3 is attached to the lower bottom portion of the nozzle holder 1 so as to surround a substantially half circumferential surface of the processing liquid discharge nozzle 2, and this bracket 3 is formed into a cylindrical shape by a light-transmitting resin. A pair of formed cover members 3a and 3b is established downward. Optical fibers 4 and 5 are inserted through the nozzle holder 1 and the cover members 3a and 3b, respectively.

  A light projection surface 4a for projecting light in a direction orthogonal to the longitudinal direction of the optical fiber is formed at the distal end of the one optical fiber 4, and the longitudinal direction of the optical fiber is formed at the distal end of the other optical fiber 5. A light receiving surface 5a for receiving light from a direction orthogonal to the direction is formed. Each light projection surface 4a and the light receiving surface 5a are opposed to each other, and the light detection surface indicated by an arrow 6 crosses the discharge position of the processing liquid slightly below the tip of the nozzle 2 between the light projection surface 4a and the light receiving surface 5a. An optical path is formed. 1 indicates a substrate to be processed such as a semiconductor wafer to which the processing liquid discharged from the nozzle 2 is applied.

  According to the configuration described above, the tip portions of the pair of cover members 3a and 3b are formed so as to form the optical path indicated by the arrow 6 so as to cross the processing liquid discharge position slightly below the tip portion of the nozzle 2. It has to protrude below the tip of the nozzle 2. On the other hand, when the above-described photoresist liquid as the processing liquid is discharged onto the substrate 7 to be processed, the distance between the tip of the nozzle 2 and the substrate 7 is set to about 5 mm.

  In this case, in order to eliminate the delay time until the liquid discharged from the nozzle tip reaches the substrate, it is better that the distance between the two is closer, but if the distance between the two is too close, dirt due to the splashing of the liquid etc. on the nozzle. Will adhere. Therefore, the interval between the nozzle tip and the substrate is determined for the above-described conflicting reasons. However, when the interval between the two is set to about 5 mm, the tip of each of the cover members 3a and 3b described above. The distance between the substrate 7 and the substrate 7 must be set to a smaller interval, and very strict accuracy is required for the position control of the nozzle 2 with respect to the substrate 7.

  In order to solve the technical problem as described above, it is conceivable to employ the configuration shown in FIG. In FIG. 2, parts that perform the same functions as the parts shown in FIG. 1 already described are denoted by the same reference numerals, and therefore detailed descriptions thereof are omitted. In the configuration shown in FIG. 2, the optical path indicated by the arrow 6 is configured to cross the vicinity of the tip of the nozzle 2. In this case, at least the nozzle 2 is formed of a light transmissive resin material or the like. Then, every time the operation of each cycle in which the processing liquid is discharged from the nozzle 2 is completed, a suck back operation is performed in which the processing liquid is slightly sucked from the tip of the nozzle 2 by the decompression means. FIG. 2 shows a state in which the aforementioned suckback operation is executed.

  The suck back function described above is frequently used in this type of apparatus for the purpose of preventing the treatment liquid remaining at the nozzle tip from dripping, but in the configuration shown in FIG. The optical path indicated by the arrow 6 is set so as to cross the portion where the processing liquid is drawn by the back. According to this configuration, it is not necessary to arrange the positions of the light projection surface 4a and the light receiving surface 5a that function as an optical sensor before (below) the tip portion of the nozzle 2, and therefore in the configuration shown in FIG. The above-described technical problem can be solved.

  In the configuration shown in FIG. 2, in order to verify whether or not the processing liquid R exists in the optical path 6, that is, whether or not the processing liquid R is discharged from the nozzle 2, the lens effect is generally used. It is possible. 3 to 5 illustrate the principle of verifying whether or not the processing liquid R exists at a predetermined position (position where the optical path 6 crosses) of the nozzle 2 using the lens effect described above.

  3 to 5, reference numerals 4 a and 5 a indicate the light projection surface and the light receiving surface formed at the tip of each optical fiber, and the optical path 6 formed therebetween is near the tip of the nozzle 2. Is set to cross. 3 to 5, the nozzle 2 is cut by a plane orthogonal to the axial direction at a position where the optical path 6 crosses, and the cut end face is visible.

  FIG. 3 schematically shows a state where the processing liquid R does not exist at the nozzle position traversed by the optical path 6, that is, a state where the processing liquid is sucked back as shown in FIG. In this case, the light beam that spreads somewhat radially from the light projection surface 4a toward the nozzle 2 passes through the nozzle 2 and spreads radially in the same direction, so that the amount of light reaching the light receiving surface 5a is very small. . Therefore, it can be determined that the processing liquid R does not exist at the light detection position by the optical sensor (or the processing liquid R is not discharged from the nozzle).

  On the other hand, FIG. 4 shows a state where the processing liquid R exists at the nozzle position crossed by the optical path 6. In this case, the light beam that spreads somewhat radially from the light projection surface 4a toward the nozzle 2 is converged by the lens effect when passing through the nozzle 2 and the treatment liquid R. As a result, the amount of light reaching the light receiving surface 5a is very large. Thereby, it can be determined that the processing liquid R exists (or the processing liquid R is ejected from the nozzle) at the light detection position by the optical sensor.

  The detection function based on the above action basically guarantees the reliability of the detection operation when the processing liquid discharged from the nozzle 2 is almost transparent. However, for example, the above-mentioned photoresist solution is generally colored, and when it passes through the processing solution R, a light attenuating action occurs.

  FIG. 5 schematically shows, for example, a case where a dark-colored processing liquid is discharged. In this case, the lens effect is obtained as in FIG. 4, but the dark-colored processing liquid R is transmitted. However, the attenuation of light is so great that the total amount of light reaching the light receiving surface 5a is very small. Accordingly, there may be almost no difference in the amount of light received by the light receiving surface 5a between the state shown in FIG. 3 and the state shown in FIG. 5, and the detection function using the lens effect described above loses its reliability. Become.

  The present invention has been made on the basis of the technical viewpoint as described above, and a processing liquid discharged from a nozzle while using a light detection means that forms an optical path across the vicinity of the nozzle tip. It is an object of the present invention to provide a processing liquid discharge apparatus capable of sufficiently ensuring the reliability of the processing liquid detection operation without depending on the color density of the liquid.

  Further, the present invention uses the above-described light detection means, and further, an operation verification method for a processing liquid ejection apparatus having an expanded function that can contribute to improving the reliability of operation in this type of apparatus, and driving of the apparatus It is another object to provide a control method.

The processing liquid discharge apparatus according to the present invention made to solve the above-described problems forms an optical path by the first optical sensor so as to cross the processing liquid discharge nozzle formed of the light transmissive material, at a position deviated from the straight line connecting the light projecting means and light receiving means constituting the first optical sensor, Rutotomoni to position the axis of the treatment liquid ejection nozzle, the set position of the optical path by the first optical sensor An optical path by the second optical sensor is formed on the upstream side so as to cross the flow path of the processing liquid, and from a straight line connecting the light projection means and the light receiving means constituting the second optical sensor. In the processing liquid flow path between the optical path by the first optical sensor and the optical path by the second optical sensor, the axial center of the flow path being located at a position that is out of position and crossing the processing liquid discharge nozzle Volume, characterized in that it is set to a larger volume than the volume of the processing solution in the processing liquid ejection operation of each cycle is discharged from the nozzle.

In this case, the cross-sectional shape perpendicular to the axial center of the processing liquid discharge nozzle traversed by the optical path by the first optical sensor is formed in an annular shape, and the axis of the flow path traversed by the optical path by the second optical sensor The cross-sectional shape orthogonal to the core is preferably formed in an annular shape . Further preferably light transmissive slits for limiting the width of the optical path to the light receiving unit side from the light projection means constituting the first optical sensor, as well as arranged between the processing liquid discharge nozzle and said light projecting means The light transmission slit for limiting the width of the optical path from the light projection means constituting the second optical sensor to the light receiving means side is arranged between the light projection means and the flow path. .

  Further, in a preferred embodiment, a suck back operation for slightly sucking up the processing liquid from the tip of the nozzle is performed at the end of each cycle of discharging the processing liquid from the processing liquid discharge nozzle. The Preferably, in the above-described processing liquid discharge apparatus, the light receiving unit in the optical sensor determines that no processing liquid exists in the optical path position in the processing liquid discharge nozzle in the light receiving state of a predetermined light amount, The light receiving means is configured to determine that the processing liquid is present at the optical path position in the processing liquid discharge nozzle in a light receiving state in which the light amount is less than a predetermined amount.

  On the other hand, the operation verification method of the processing liquid discharge apparatus according to the present invention uses the processing liquid discharge apparatus having the above-described configuration, and one preferable operation verification method is to supply the processing liquid to the processing liquid discharge nozzle. It is characterized in that the rise time of the dispense signal for driving the actuator to be pumped and the time lag of the rise of the sensor signal indicating the processing liquid detection state in the optical sensor are verified, and the suck back amount is estimated from the time lag.

  In another preferred operation verification method according to the present invention, the optical sensor is used within a predetermined time from the end of application of a dispense signal for driving an actuator for pumping the processing liquid to the processing liquid discharge nozzle. It is characterized in that it is verified whether or not a sensor signal indicating a non-detected state of the processing liquid is in a falling state, and whether or not a suckback operation is being executed is determined from the verification result.

  Furthermore, another preferable operation verification method according to the present invention shows a processing liquid detection state in the optical sensor corresponding to a duration of a dispense signal for driving an actuator for pumping the processing liquid to the processing liquid discharge nozzle. It is characterized by verifying whether or not there is a temporary falling state of the sensor signal during the rising time of the sensor signal and estimating the presence or absence of bubbles in the processing liquid pumped by the actuator. .

  The drive control method for the treatment liquid discharge apparatus according to the present invention uses the treatment liquid discharge apparatus having the above-described configuration, and the preferred drive control method is used during the execution of the treatment liquid discharge operation for each cycle. A verification step for verifying whether a falling state of the sensor signal indicating a non-detection state of the processing liquid by the second optical sensor occurs, and that the falling state of the sensor signal has occurred in the verification step In a state where the position of the processing liquid discharge nozzle is moved to a dummy dispensing position that is off the substrate to be processed, and in a state where the nozzle is moved to the dummy dispensing position, It is characterized in that a processing liquid discharging step for performing a processing liquid discharging operation is performed.

  According to the processing liquid ejection device having the above-described configuration, by utilizing the difference in the degree of light refraction between when the processing liquid is present and when the processing liquid is not present in the nozzle at the portion where the optical path by the optical sensor crosses, It acts to verify existence. Therefore, according to the processing liquid discharge apparatus described above, as will be described later in detail, the presence or absence of the processing liquid can be accurately verified without being influenced by the color density of the processing liquid in the nozzle. .

  Further, according to the operation verification method using the processing liquid discharge device, the processing liquid detection state in the optical sensor with respect to the rise and fall of the dispense signal that drives the actuator that pumps the processing liquid to the processing liquid discharge nozzle From the relationship between the rise and fall of the sensor signal indicating, it is possible to effectively verify whether or not the suck back amount and the suck back operation are performed, and the presence of bubbles in the processing liquid.

Furthermore, since the second optical sensor is provided in addition to the configuration of the processing liquid discharge device described above, it is ensured that bubbles exist in the processing liquid before one cycle of the operation of discharging the processing liquid from the nozzle. It becomes possible to grasp. Therefore, by using this configuration, it is possible to effectively execute the bubble removal operation at the dummy dispensing position.

  Hereinafter, a processing liquid discharge apparatus according to the present invention will be described based on an embodiment shown in the drawings. The processing liquid discharge apparatus according to the present invention basically employs the configuration shown in FIG. That is, the optical path indicated by the arrow 6 in the optical sensor including the light projection surface 4a as the light projection means and the light reception surface 5a as the light reception means crosses the vicinity of the tip of the nozzle 2 formed of the light-transmitting material. It is configured.

  In addition to this, in the processing liquid discharge apparatus according to the present invention, as described above, the processing liquid is discharged from the tip of the nozzle 2 by the decompression means (not shown) at the end of each cycle of discharging the processing liquid from the nozzle 2. A suck-back operation for sucking back a little is performed.

  And in the optical sensor employ | adopted as the process liquid discharge apparatus concerning this invention, the structure shown in FIGS. 6-8 is comprised further. In the configuration shown in FIGS. 6 to 8, the parts having the same functions as those shown in FIGS. 3 to 5 described above are indicated by the same reference numerals, and thus detailed descriptions thereof are omitted.

  In the configuration of the optical sensor shown in FIGS. 6 to 8, a shielding plate 8 is disposed between the light projection surface 4 a and the nozzle 2, and through a light transmission slit 8 a formed in the shielding plate 8, The light from the light projection surface 4a is configured to reach the light receiving surface 5a side. That is, the slit 8a functions to limit the width of the optical path 6 from the light projection surface 4a to the light receiving surface 5a side.

  Then, the relationship between the optical sensor and the nozzle 2 is set so that the axis C of the nozzle 2 is positioned on a straight line connecting the light projection surface 4a and the light receiving surface 5a, that is, at a position slightly deviated from the optical path 6. Has been. In the embodiment shown in FIGS. 6 to 8, the cross-sectional shape perpendicular to the axis of the nozzle 2 that the optical path 6 by the optical sensor crosses is formed in an annular shape.

  FIG. 6 schematically shows a state where the processing liquid R is not present at the nozzle position crossed by the optical path 6 by the optical sensor, that is, a state where the processing liquid is sucked back as shown in FIG. In this case, the light arriving on the nozzle 2 side through the slit 8a passes through the nozzle 2 without being refracted, and reaches the light receiving surface 5a as indicated by an arrow 6 as it is.

  Therefore, the level of the amount of light reaching the light receiving surface 5a is very large. Therefore, the light receiving surface 5a receives a predetermined amount or more of light, so that the processing liquid R does not exist (or the processing liquid R is not discharged from the nozzle) at the light detection position by the optical sensor. Can be determined.

  On the other hand, FIG. 7 shows a state in which the processing liquid R exists at the nozzle position crossed by the optical path 6. In this case, when the light beam traveling from the light projection surface 4a to the nozzle 2 through the slit 8a passes through the processing liquid R, it undergoes a refracting action as indicated by 6a in the figure. This is because there is an angle other than an orthogonal relationship between the traveling direction of light passing through a position avoiding the axial center C of the nozzle 2 having a circular cross-sectional shape and the interface between the nozzle 2 and the treatment liquid R. This is because it is formed.

  As a result, the amount of light reaching the light receiving surface 5a is very small. Therefore, the light receiving surface 5a is in a light receiving state with less than a predetermined amount of light, and it can be determined that the processing liquid R exists (or the processing liquid R is ejected from the nozzle) at the light detection position by the optical sensor. .

  Further, FIG. 8 schematically shows an example in which the processing liquid R exists at the nozzle position traversed by the optical path 6 and a dark processing liquid exists. Also in this case, as in the example shown in FIG. 7, the light beam traveling toward the nozzle 2 through the slit 8 a is refracted as indicated by reference numeral 6 a when passing through the processing liquid R. Although the attenuation of light increases because it passes through the dark-colored processing solution R, the amount of light reaching the light receiving surface 5a is very small as a result. Thereby, it can be determined that the processing liquid R exists (or the processing liquid R is discharged from the nozzle).

  As described above, according to the optical configuration shown in FIGS. 6 to 8, whether or not the processing liquid R exists at the nozzle position traversed by the optical path 6 without depending on the color density of the processing liquid R. Can be verified with high accuracy.

  9A and 9B illustrate a verification method for verifying the operation state of the processing liquid ejection apparatus using the processing liquid ejection apparatus having the optical configuration shown in FIGS. 6 to 8. In this verification method, a dispense signal for driving an actuator, which is a pumping means for processing liquid such as a bellows pump or a diaphragm pump (not shown), and a sensor signal by an optical sensor including the light projection surface 4a and the light receiving surface 5a. Thus, it is possible to verify the operation state of the processing liquid discharge apparatus as described below.

  A signal a shown in FIG. 9B represents the above-described dispense signal, and shows a state in which the actuator is driven in its rising state. Further, a signal b in the figure shows a sensor signal from the optical sensor, and its rising state indicates that the processing liquid R exists at the optical detection position (or the processing liquid R is discharged from the nozzle). Is.

  Therefore, when the suck back operation is normally performed as shown in FIG. 9A, the sensor signal b rises with a time lag of ta1 with respect to the rise of the dispense signal shown as a in FIG. 9B. Then, every time the operation of each cycle for discharging the processing liquid from the nozzle 2 is completed, a suck-back operation is performed in which the processing liquid is slightly sucked from the tip of the nozzle. The sensor signal b also falls with a time lag.

  10A and 10B illustrate the same operation as in FIGS. 9A and 9B, but FIG. 10A illustrates a case where the suckback amount is larger than that in FIG. 9A. In this case, as shown in FIG. 10B, the rise time lag ta2 of the sensor signal b with respect to the rise of the dispense signal a becomes larger. In short, the amount of suckback at that time can be estimated by grasping the time lag of the rise of the sensor signal b with respect to the rise of the dispense signal a.

  Therefore, a stable processing liquid discharge operation on the substrate to be processed can be realized by controlling so as to maintain an appropriate suck back amount based on the rising time lag of the sensor signal b with respect to the dispense signal a. Further, by detecting a state in which the sensor signal b falls in response to the fall of the dispense signal a, it is possible to confirm that the suck back operation is being performed.

  Similarly, if the time lag (tr1 shown in FIG. 9B or tr2 shown in FIG. 10B) of the sensor signal b with respect to the fall of the dispense signal a changes, it can be detected that the suckback speed has changed. This also detects a mechanical change of the suck back mechanism, and an alarm can be issued to notify the operator of this fact.

  9B and 10B, when the sensor signal indicated by b does not rise even though the dispense signal indicated by a rises, a discharge failure of the processing liquid occurs due to some trouble. Can be recognized. Therefore, in this case, the problem of causing a large amount of defective coating on the substrate to be processed can be avoided by immediately stopping the operation of the processing liquid discharge apparatus.

  11A and 11B illustrate a case where bubbles are included in the processing liquid discharged from the nozzle. That is, as shown in FIG. 11A, when a bubble passes at the optical detection position in the nozzle 2, a temporary falling state (ai) of the sensor signal occurs as shown in FIG. 11B. When bubbles are present in the processing liquid ejected from the nozzle 2 as described above, it cannot be said that the processing substrate 7 immediately becomes defective in application of the processing liquid. By marking with software on the controller side, it is possible to take measures such as raising the rank of the inspection for inspecting the application state of the processing liquid on the marked substrate to be processed.

  Next, FIG. 12 shows a second embodiment of the processing liquid discharge apparatus according to the present invention. 12, the configuration shown in FIG. 2 described above is basically adopted. In the optical sensor including the light projection surface 4a and the light receiving surface 5a, the configuration shown in FIGS. Is adopted. Therefore, these components are denoted by the same reference numerals, and detailed description thereof is omitted.

  The processing liquid discharge apparatus shown in FIG. 12 includes a second optical sensor in addition to the configuration shown in FIG. This second optical sensor is disposed upstream of the set position of the optical path 6 by the optical sensor including the light projection surface 4a and the light receiving surface 5a (referred to as the first optical sensor for convenience). . That is, in the embodiment shown in FIG. 12, the nozzle holder indicated by reference numeral 1 is made of a light-transmitting material, and the optical fibers 11 and 11 are sandwiched between the processing liquid delivery pipes 1a formed on the nozzle holder 1. Twelve tip portions are embedded.

  A light projection surface 11 a that projects light in a direction orthogonal to the longitudinal direction of the optical fiber 11 is formed at the tip of one optical fiber 11, similarly to the configuration of the first optical sensor. A light receiving surface 12a for receiving light from a direction orthogonal to the longitudinal direction of the optical fiber is formed at the tip of the optical fiber. Each light projection surface 11a and the light receiving surface 12a face each other, and an optical path for light detection indicated by an arrow 13 is formed so as to cross the processing liquid delivery tube 1a formed in the nozzle holder 1.

  The positional relationship among the light projection surface 11a and the light receiving surface 12a and the processing liquid delivery tube 1a is configured in the same manner as the optical detection means described with reference to FIGS. The relationship between the optical sensor and the nozzle 2 is set so that the axis of the processing liquid delivery tube 1a is positioned on a straight line connecting the light receiving surfaces 12a, that is, at a position slightly deviated from the optical path 13. Therefore, also in the second optical sensor including the light projection surface 11a and the light receiving surface 12a, it is possible to realize a detection operation by the same action as the optical detection means described based on FIGS.

  Therefore, the second optical sensor including the light projection surface 11a and the light receiving surface 12a can effectively detect bubbles passing through the processing liquid delivery tube 1a, and the second optical sensor can detect bubbles. It can also be called a sensor. In the processing liquid ejection apparatus shown in FIG. 12, the volume in the processing liquid flow path between the optical path 6 by the first optical sensor and the optical path 13 by the second optical sensor is set for each cycle. The volume is set larger than the volume of the processing liquid discharged from the nozzle 2 in the processing liquid discharging operation.

  FIGS. 13 to 15 explain the operation of the processing liquid ejection apparatus shown in FIG. 12, and a and b in FIGS. 13 to 15 are similar to a and b in FIG. The sensor signal by these optical sensors is shown. Further, c in FIGS. 13 to 15 shows a sensor signal by the second optical sensor, and this sensor output falls when bubbles are detected in the processing liquid by the second optical sensor. .

  The example shown in FIG. 13 shows a normal state where no bubbles are present in the processing liquid. The example shown in FIG. 14 shows a state in which bubbles exist in the processing liquid and the presence of bubbles is detected by the second optical sensor (bubble detection sensor). Further, in the example shown in FIG. 15, during the operation of one cycle in which the processing liquid is discharged from the processing liquid discharge nozzle 2, the bubbles are discharged from the nozzle 2, and the presence of bubbles is also detected by the second optical sensor. Shows the state.

  By utilizing the combination of the detection patterns by the first and second optical sensors described above, it is possible to realize the drive control method for the processing liquid ejection apparatus as shown in FIG. 16, for example. In FIG. 16, since the illustration is complicated, the reference numerals of the respective parts in the processing liquid ejection apparatus shown in FIG. 12 are omitted.

  FIG. 16A shows an example in which the presence of bubbles in the processing liquid is detected by the second optical sensor during the operation of one cycle in which the processing liquid is discharged from the processing liquid discharge nozzle 2. In this case, as shown in FIG. 14 described above, the sensor output by the second optical sensor is instantaneously lowered.

Here, as described above, the volume in the processing liquid flow path between the optical path by the first optical sensor and the optical path by the second optical sensor is discharged from the nozzle in the processing liquid discharge operation for each cycle. Since the volume is set to be larger than the volume of the processing liquid to be produced, before the bubbles detected by the second optical sensor are discharged from the nozzle 2 as shown in FIG. The processing liquid discharge operation ends. FIG. 16C shows a resting state in which the above-described suck back operation is performed after the end of one cycle of the processing liquid discharge operation.

  As described above, when the presence of bubbles in the processing liquid is detected by the second optical sensor, an operation is performed to move the processing liquid ejection device to a dummy dispense position that is off the substrate to be processed. The operation of discharging the processing liquid is executed at this dummy dispensing position. This state is shown in FIG. Then, it is detected that the bubbles are discharged by the first optical sensor as shown in FIG. 16D, and when the bubbles are discharged from the nozzle as shown in FIG. By stopping the discharge, the bubble removal operation can be completed. After completion of the bubble removal operation, the processing liquid discharge device is moved from the dummy dispense position onto the substrate to be processed, and a normal processing liquid discharge operation is performed.

  In addition, a counter that counts the number of times the above operation has been performed is constructed by software, and when the number of counts by the counter exceeds a predetermined number, the connection part of the piping system, the attachment part of the filter, the liquid bottle connection It is desirable to have a configuration in which an alarm is output because there may be a defect such as a part.

  In addition, as shown in FIG. 16D, before the bubble detection is detected again by the second optical sensor before the bubble discharge is detected by the first optical sensor, that is, in FIG. When the detection pattern as shown by c occurs, control is performed so that the processing liquid discharge operation is executed while the processing liquid discharge device is continuously positioned at the dummy dispense position. By executing the drive control method described above, it is possible to realize the bubble removing action without discharging bubbles to the surface of the substrate to be processed and with a minimum discharge amount of the processing liquid.

  The present invention is not limited to the case where a photoresist solution is applied to a semiconductor substrate such as a silicon wafer, a photomask, or an LCD substrate described above. For example, a developer discharge operation to the substrate, other electronic devices, It can also be suitably used in coating apparatuses such as organic solvent liquids and polyimide resin liquids in the printed circuit board manufacturing field.

It is the longitudinal cross-sectional view which showed the example of the processing liquid discharge apparatus with the solution subject of this invention. It is the longitudinal cross-sectional view which showed the basic composition of the process liquid discharge apparatus concerning this invention. It is a schematic diagram explaining the principle of the optical detection sensor using a lens effect. It is a schematic diagram explaining the example in case a process liquid exists similarly. It is a schematic diagram explaining an example in case the processing liquid with a deep color similarly exists. It is a schematic diagram explaining the principle of the optical detection sensor utilized in the processing liquid discharge apparatus concerning this invention. It is a schematic diagram explaining the example in case a process liquid exists similarly. It is a schematic diagram explaining an example in case the processing liquid with a deep color similarly exists. It is a longitudinal cross-sectional view which shows one state of a process liquid discharge apparatus. It is a timing diagram explaining the verification result in the state shown in FIG. 9A. It is a longitudinal cross-sectional view which shows another one state of a process liquid discharge apparatus. It is a timing diagram explaining the verification result in the state shown in FIG. 10A. It is a longitudinal cross-sectional view which shows another one state of a process liquid discharge apparatus. It is a timing diagram explaining the verification result in the state shown in FIG. 11A. It is the longitudinal cross-sectional view which showed the other structural example of the process liquid discharge apparatus concerning this invention. It is a timing diagram explaining one verification result by the apparatus shown in FIG. It is a timing diagram explaining another one verification result similarly. It is a timing diagram explaining another another verification result similarly. FIG. 13 is an operation transition diagram for explaining an example of a control method using the processing liquid discharge apparatus shown in FIG. 12.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Nozzle holder 1a Processing liquid delivery pipe 2 Processing liquid discharge nozzle 2a Shaft hole 3 Sensor fixing bracket 3a, 3b Cover member 4,5 Optical fiber 4a Light projection surface (light projection means)
5a Light receiving surface (light receiving means)
6 Optical path for light detection 7 Substrate 8 Shield plate 8a Light transmission slit 11, 12 Optical fiber 11a Light projection surface 12a Light reception surface C Nozzle core R Processing liquid

Claims (9)

An optical path is formed by the first optical sensor so as to cross the processing liquid discharge nozzle formed of the light transmissive material, and from the straight line connecting the light projection means and the light receiving means constituting the first optical sensor. the off position, Rutotomoni to position the axis of the processing liquid discharge nozzle,
An optical path formed by the second optical sensor is formed so as to cross the flow path of the processing liquid upstream of the set position of the optical path formed by the first optical sensor, and light constituting the second optical sensor. Position the axis of the flow path at a position off the straight line connecting the projection means and the light receiving means,
Further, the volume in the processing liquid flow path between the optical path by the first optical sensor crossing the processing liquid discharge nozzle and the optical path by the second optical sensor is the nozzle in the processing liquid discharge operation for each cycle. A processing liquid discharge apparatus, wherein the volume is set to be larger than the volume of the processing liquid discharged. A cross-sectional shape orthogonal to the axial center of the processing liquid discharge nozzle traversed by the optical path of the first optical sensor is formed in an annular shape, and orthogonal to the axial center of the flow path traversed by the optical path of the second optical sensor. The processing liquid discharge apparatus according to claim 1, wherein a cross-sectional shape of the processing liquid is formed in an annular shape . While disposing a light transmission slit for limiting the width of the optical path from the light projection means constituting the first optical sensor to the light receiving means side, between the light projection means and the treatment liquid discharge nozzle ,
A light transmission slit for limiting a width of an optical path from the light projecting unit constituting the second optical sensor to the light receiving unit side is disposed between the light projecting unit and the flow path. The processing liquid discharge apparatus according to claim 1.   The suck back operation for sucking up the processing liquid slightly from the tip of the nozzle is performed every time the operation of each cycle of discharging the processing liquid from the processing liquid discharge nozzle is completed. The processing liquid discharge apparatus according to claim 3. The light receiving means in the first optical sensor determines that no processing liquid is present at the optical path position in the processing liquid discharge nozzle in the light receiving state of a predetermined light quantity, and the light receiving means is in a light receiving state of less than the predetermined light quantity. 5. The processing liquid according to claim 1, wherein the processing liquid is determined to be present at the optical path position in the processing liquid discharge nozzle. Discharge device. An operation verification method for a processing liquid discharge apparatus using the processing liquid discharge apparatus according to any one of claims 1 to 5,
The rise time of the dispense signal that drives the actuator that pumps the treatment liquid to the treatment liquid discharge nozzle and the rise time lag of the sensor signal that indicates the detection state of the treatment liquid in the first optical sensor are verified. A method for verifying the operation of a processing liquid ejection apparatus, wherein the back amount is estimated. An operation verification method for a processing liquid discharge apparatus using the processing liquid discharge apparatus according to any one of claims 1 to 5,
A sensor signal indicating a non-detection state of the processing liquid in the first optical sensor is detected within a predetermined time from the end of application of the dispense signal for driving the actuator that pumps the processing liquid to the processing liquid discharge nozzle. A method for verifying an operation of a processing liquid ejection apparatus, comprising: verifying whether or not a falling state is reached and estimating whether or not a suckback operation is being performed based on the verification result. An operation verification method for a processing liquid discharge apparatus using the processing liquid discharge apparatus according to any one of claims 1 to 5,
During the rising duration of the sensor signal indicating the processing liquid detection state in the first optical sensor corresponding to the duration of the dispensing signal that drives the actuator that pumps the processing liquid to the processing liquid discharge nozzle, the sensor signal A method for verifying the operation of a processing liquid ejection apparatus, comprising: verifying whether or not a temporary falling state exists and estimating the presence or absence of bubbles in the processing liquid pumped by the actuator. A drive control method for the apparatus using the processing liquid discharge apparatus according to any one of claims 1 to 5 ,
A verification step of verifying whether a falling state of a sensor signal indicating a non-detection state of the processing liquid by the second optical sensor occurs during execution of the processing liquid discharge operation for each cycle;
In the verification step, when verifying that a falling state of the sensor signal has occurred, a moving step of moving the position of the processing liquid discharge nozzle to a dummy dispensing position that is off the substrate to be processed;
In a state where the nozzle is moved to the dummy dispensing position, a processing liquid discharging step for performing a processing liquid discharging operation of the next cycle from the nozzle,
The process control method of the processing liquid discharge apparatus characterized by performing this.

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