JPS61231197A - Production of mixed film of tungsten oxide-molybdenum oxide - Google Patents

Production of mixed film of tungsten oxide-molybdenum oxide

Info

Publication number
JPS61231197A
JPS61231197A JP60070293A JP7029385A JPS61231197A JP S61231197 A JPS61231197 A JP S61231197A JP 60070293 A JP60070293 A JP 60070293A JP 7029385 A JP7029385 A JP 7029385A JP S61231197 A JPS61231197 A JP S61231197A
Authority
JP
Japan
Prior art keywords
film
mixed
acid
substrate
tungstic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60070293A
Other languages
Japanese (ja)
Other versions
JPH058277B2 (en
Inventor
Norinaga Baba
馬場 宣良
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP60070293A priority Critical patent/JPS61231197A/en
Publication of JPS61231197A publication Critical patent/JPS61231197A/en
Publication of JPH058277B2 publication Critical patent/JPH058277B2/ja
Granted legal-status Critical Current

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  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To obtain an electrochromic film of a tungsten oxide-molybdenum oxide mixture at a low cost by bringing a colloidal mixed soln. of tungstic acid and molybdic acid into contact with an electrically conductive substrate, electrodepositing a thin film on the substrate and baking the film. CONSTITUTION:The mixed soln. of tungstate and molybdate is brought into contact with a cation exchange resin to prepare the mixed soln. of tungstic acid and molybdic acid contg. mixed colloid of tungstic acid and molybdic acid by cation-hydrogen ion exchange. The molar ratio of tungstic acid to molybdic acid in the mixed soln. is 1-4. The mixed soln. is brought into contact with the substrate whose surface is at least electrically conductive to said mixture and DC voltage is applied by using the substrate as a cathode to deposit a film on the surface of the substrate. The film is then baked at about 150-350 deg.C to improve the adhesion, mechanical strength and electrochromic property.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、少なくとも表面に導電性を有する基板の表面
に電解析出法によってエレクトロクロミック性(以下E
C性と略称する)を有する酸化タングステンと酸化モリ
ブデンの混合被膜を製造する方法に関する。
Detailed Description of the Invention [Industrial Application Field] The present invention provides electrochromic properties (hereinafter referred to as E
The present invention relates to a method for manufacturing a mixed film of tungsten oxide and molybdenum oxide that has a carbon property (abbreviated as C-type).

〔従来の技術〕[Conventional technology]

EC表示素子又はEC調光体に応用される無機材料系E
C物質は、現在タングステン酸化物が主であった。しか
しながら近年酸化タングステンおよび酸化モリブデンの
混合物被膜が良好な着色効率を示すことが報告されてい
る。これはこの被膜の着色状態(青色)での光吸収スペ
クトルが酸化タングステンおよび酸化モリブデンのそれ
よりも可視光領域寄りであるためであり、上記混合物被
膜を用いたEC素子なWO3を用いたEC素子と同じ電
気量で透明から青色への着色変化をさせると、WO3を
用いたEC素子よりも上記混合物の被膜を用いたEC素
子の方が大きな着色変化を起こしたものとして認知され
るためである。(例えばJ、 J、 A、 P、JLL
(12>、/62’ll(/りJV))従来、この酸化
タングステンおよび酸化モリブデンの混合物被膜の製造
には蒸着法、スパッター法の真空法が用いられている。
Inorganic material system E applied to EC display elements or EC light control bodies
Currently, tungsten oxide is the main C material. However, it has recently been reported that a mixture film of tungsten oxide and molybdenum oxide exhibits good coloring efficiency. This is because the light absorption spectrum of this coating in its colored state (blue) is closer to the visible light region than that of tungsten oxide and molybdenum oxide. This is because if a color change from transparent to blue is caused with the same amount of electricity as , an EC element using a film of the above mixture will be perceived as having a larger color change than an EC element using WO3. . (For example, J, J, A, P, JLL
(12>, /62'll (/JV)) Conventionally, vacuum methods such as vapor deposition and sputtering have been used to produce this mixture film of tungsten oxide and molybdenum oxide.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記従来の酸化タングステンおよび酸化モリブデンの混
合物被膜(以後MOαw1−a03膜と略称する)の製
造方法である真空法は、一般的に言って■大面積にわた
って均一な被膜を作成することができない。■真空列き
等の繁雑な操作を必要とする。■大型で高価な装置を必
要とする。■そのために製造コストが割高となる。等の
問題点があった。
Generally speaking, the vacuum method, which is the conventional method for manufacturing the above-mentioned tungsten oxide and molybdenum oxide mixture film (hereinafter abbreviated as MOαw1-a03 film), cannot produce a uniform film over a large area. ■Requires complicated operations such as vacuum lining. ■Requires large and expensive equipment. ■This makes manufacturing costs relatively high. There were problems such as.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、上記問題点を解決するためにタングステン酸
とモリブデン酸との混合コロイドを含むタングステン酸
およびモリブデン酸の混合溶液と少なくとも表面に導電
性を有する基板とを接触させて該基板をカソードとして
電解析出を行ない、析出した該被膜を焼成する方法を用
いている。
In order to solve the above problems, the present invention brings a mixed solution of tungstic acid and molybdic acid containing a mixed colloid of tungstic acid and molybdic acid into contact with a substrate having conductivity at least on the surface, and uses the substrate as a cathode. A method is used in which electrolytic deposition is performed and the deposited film is fired.

従来インポリタングステン酸(以下タングステン庁と略
称する)の水溶液はすぐに沈殿を生じて安定な水溶液と
しては存在しない。しかしながらタングステン酸をモリ
ブデン酸と混合しておくと比較的安定に水溶液中に存在
し、この溶液を用いて電解析出を行なえることが判明し
た。
Conventional aqueous solutions of impolitungstic acid (hereinafter abbreviated as tungsten acid) readily precipitate and do not exist as stable aqueous solutions. However, it has been found that when tungstic acid is mixed with molybdic acid, it exists relatively stably in an aqueous solution, and that this solution can be used for electrolytic deposition.

本発明のタングステン酸およびモリブデン酸の混合溶液
は、タングステン酸塩およびモリブデン酸塩の混合溶液
をカチオン交換樹脂と接触させてカチオン−水素イオン
のイオン交換を行なう方法によって作成することができ
る。
The mixed solution of tungstic acid and molybdate of the present invention can be prepared by a method in which a mixed solution of tungstate and molybdate is brought into contact with a cation exchange resin to perform ion exchange of cations and hydrogen ions.

又上記方法で作成した溶液に、モリブデン酸溶液を加え
て濃度の調整を行なうことも可能であるが、初期に作成
するタングステン酸塩およびモリブデン酸塩の混合溶液
濃度により得られるタングステン酸およびモリブデン酸
の混合溶液の濃度が決定できるので、最初にその濃度を
適度な値としておくことが好ましい。
It is also possible to adjust the concentration by adding a molybdic acid solution to the solution prepared by the above method, but the concentration of tungstic acid and molybdic acid obtained by the concentration of the mixed solution of tungstate and molybdate prepared initially is Since the concentration of the mixed solution can be determined, it is preferable to initially set the concentration to an appropriate value.

上記混合塩溶液の作成に用いることのできるタングステ
ン酸塩およびモリブデン酸塩としては、Li、Na、K
IRblC8,Be、Mg、Cia、SrまたはNH4
等とWO4+ M ()04の塩が例示できる。
Tungstates and molybdates that can be used to create the above mixed salt solution include Li, Na, K
IRblC8, Be, Mg, Cia, Sr or NH4
etc. and the salt of WO4+ M ()04 can be exemplified.

上記比較的安定なタングステン酸とモリブデン酸との混
合溶液は、溶液中のモリブデン酸に対するタングステン
酸のモル比が7んダであることが好まれる。
In the comparatively stable mixed solution of tungstic acid and molybdic acid, the molar ratio of tungstic acid to molybdic acid in the solution is preferably 7.

上記モリブデン酸に対するタングステン酸のモル比かび
よりも大きくなるとタングステン酸のみの水溶液と同様
の沈殿を生じゃすい溶液となるため好ましくない。又上
記モリブデン酸に対するタングステン酸のモル比が/よ
り小さくなると、同溶液を処理して得られる酸化タング
ステンおよび酸化モリブデンの混合物膜を用いてEC素
子を作成した時の着色特性にあまり改警効来が見られな
いので好ましくない。
If the molar ratio of tungstic acid to molybdic acid is greater than the molar ratio of molybdic acid, it is not preferable because the solution tends to produce precipitates similar to an aqueous solution of tungstic acid alone. Furthermore, if the molar ratio of tungstic acid to molybdic acid is smaller than /, the coloring properties will be less effective when an EC element is made using a mixture film of tungsten oxide and molybdenum oxide obtained by treating the same solution. I don't like this because I can't see it.

本発明の電解析出を行なうためにはタングステン酸およ
びモリブデン酸の混合溶液を熟成し溶液中にタングステ
ン酸およびモリブデン酸のコロイドを作成することが必
要である。
In order to carry out the electrolytic deposition of the present invention, it is necessary to ripen a mixed solution of tungstic acid and molybdic acid to form a colloid of tungstic acid and molybdic acid in the solution.

上記コロイドの生成していない混合溶液中に電極基板を
浸漬して電解析出を試みても、基板表面に被膜を得るこ
とはできない。(一部還元されてタングステンブルーが
生成するものの、溶液中に拡散してしまうため被膜は形
成されない。)タングステン酸およびモリブデン酸の混
合溶液は熟成することによりその溶液中にコロイドを生
成する。この熟成とは程度な温度に、程度な時間、溶液
を保持することであり、熟成時の温度は60″C未満で
あることが好まれ、又熟成時間は72時間よりも長いこ
とが好まれる。タングステン酸およびモリブデン酸の混
合溶液を10″C以上とすると熟成中の溶液中に沈殿を
生じやすくなり、又72時間以内に電解析出を試みても
コロイドの生成が不足であるために被膜が形成されにく
い。
Even if electrolytic deposition is attempted by immersing the electrode substrate in the mixed solution in which no colloid is produced, a film cannot be obtained on the surface of the substrate. (Although tungsten blue is partially reduced and produced, a film is not formed because it is diffused into the solution.) When a mixed solution of tungstic acid and molybdic acid is aged, a colloid is produced in the solution. This aging means maintaining the solution at a certain temperature for a certain amount of time, and the temperature during aging is preferably less than 60"C, and the aging time is preferably longer than 72 hours. If the temperature of the mixed solution of tungstic acid and molybdic acid exceeds 10"C, precipitation will easily occur in the solution during aging, and even if electrolytic deposition is attempted within 72 hours, colloid formation will be insufficient, resulting in a film failure. is difficult to form.

充分に熟成させてタングステン酸およびモリブデン酸の
コロイドを生成させたタングステン酸およびモリブデン
酸混合溶液と電極とを接触させて直流電圧を印加すると
カソード表面に被膜が析出する。
When a mixed solution of tungstic acid and molybdic acid, which has been sufficiently aged to form a colloid of tungstic acid and molybdic acid, is brought into contact with an electrode and a DC voltage is applied, a film is deposited on the surface of the cathode.

析出した被膜は電極基板との密着性が悪く機械強度が不
足しており、又EC特性も悪いので焼成操作を必要とす
る。焼成時の温度は750〜350°Cであることが好
まれる。焼成時の温度を35O℃よりも高くすると被膜
の結晶化が進み得られた被膜を用いて作成したEC素子
の可逆性が悪くなるので好ましくない。又焼成時の温度
を/ j O’Cよりも低くすると焼成による強度の向
上があまり望めず、又得られた被膜を用いて作成したE
C素子の消色速度が遅くなるので好ましくない。
The deposited film has poor adhesion to the electrode substrate, lacks mechanical strength, and also has poor EC characteristics, requiring a firing operation. The temperature during firing is preferably 750 to 350°C. If the firing temperature is higher than 350° C., the crystallization of the film will progress and the reversibility of the EC device made using the obtained film will deteriorate, which is not preferable. Furthermore, if the firing temperature is lower than /j O'C, the strength cannot be improved much by firing, and
This is not preferable because the decoloring speed of the C element becomes slow.

〔実 施 例〕〔Example〕

まず0.1モル/lのタングステン酸カリウム水溶液お
よび同濃度のモリブデン酸カリウム水溶液を調整した。
First, a potassium tungstate aqueous solution of 0.1 mol/l and a potassium molybdate aqueous solution of the same concentration were prepared.

次にタングステン酸カリウム水溶液およびモリブデン酸
カリウム水溶液を7=3で混合しこの溶液をカチオン交
換樹脂を滴したカラムに通して、遊離のタングステン酸
−モリブデン醗混合水溶液に変換した。次にこの溶液を
≠o′Cの恒温槽中で72時間熟成させて適度な粘度の
安定なコ四イド溶液とした。
Next, a potassium tungstate aqueous solution and a potassium molybdate aqueous solution were mixed in a ratio of 7=3, and this solution was passed through a column dripped with a cation exchange resin to convert it into a free tungstate-molybdenum mixed aqueous solution. Next, this solution was aged for 72 hours in a constant temperature bath at ≠o'C to obtain a stable cotetraid solution with an appropriate viscosity.

つぎに、この溶液中に5n02透明導電膜付ガラス板を
浸漬し、該ガラス板をカソードとして直流電源により定
電圧で電流を流して該ガラス板上に被膜を電解析出させ
た。析出膜の該ガラス板との密着性および得られた被膜
のEC特性の可逆性を良くするために、該ガラス板°に
2!;O′C,/時間の熱処理を施した。
Next, a glass plate with a 5n02 transparent conductive film was immersed in this solution, and a constant voltage current was applied from a DC power supply using the glass plate as a cathode to electrolytically deposit a film on the glass plate. In order to improve the adhesion of the deposited film to the glass plate and the reversibility of the EC characteristics of the resulting film, the glass plate was coated with 2°C. ; O'C,/hour heat treatment was performed.

このようにして得られた薄膜を用いて作成したEC素子
の光吸収スペクトルを第1図に示す。
FIG. 1 shows the light absorption spectrum of the EC device produced using the thin film thus obtained.

本実施例により得られた被膜を用いて作成したEC素子
の着色状態の吸収スペクトルのピークは、タングステン
酸化物またはモリブデン酸化物を用い+C素子の吸収ス
ペクトルのピークよりも可視領域に寄っており、本実施
例によって得られる被〜  膜を用いたEC素子の着色
効率の良さかうがかえる。
The absorption spectrum peak of the colored state of the EC element created using the film obtained in this example is closer to the visible region than the absorption spectrum peak of the +C element using tungsten oxide or molybdenum oxide, The coloring efficiency of the EC element using the film obtained in this example is impressive.

又得られた被膜の組成分析の結果を第1表に示す。Table 1 shows the results of compositional analysis of the obtained coating.

次に上記実施例と同様にタングステン酸カリウム水溶液
とモリブデン酸カリウム水溶液を6=4cおよび/:l
で混合し、同様の操作で酸化タングステン−酸化モリブ
デンの混合薄膜を得た。得られた被膜の組成を第1表に
示す。第1表から析出溶液と得られる被膜組成とはおよ
そ対応がとれており)析出溶液の制御によって得られる
被膜の組成の制御が可能であることがわかる。
Next, as in the above example, a potassium tungstate aqueous solution and a potassium molybdate aqueous solution were added at 6=4c and /:l.
A mixed thin film of tungsten oxide and molybdenum oxide was obtained by the same operation. The composition of the obtained film is shown in Table 1. From Table 1, it can be seen that the composition of the resulting film can be controlled by controlling the precipitation solution (there is approximately a correspondence between the precipitation solution and the composition of the film obtained).

ta1表 儀 〔発明の効果〕 本発明によれば、酸化タングステンと酸化モリブデンの
混合被膜の作成圧電解析出法を応用することができる。
ta1 Expression [Effects of the Invention] According to the present invention, it is possible to apply a piezoelectric deposition method for creating a mixed film of tungsten oxide and molybdenum oxide.

そのため大面積にわたり均一な膜を安価に形成させるこ
とができ、更に電解析出の条件を制御することにより得
られる被膜の膜厚を正確に制御することが可能である。
Therefore, a uniform film can be formed over a large area at low cost, and furthermore, by controlling the conditions of electrolytic deposition, it is possible to accurately control the thickness of the resulting film.

又本発明は従来の真空法などの製造方法とくらべて大規
模な設備を必要とせず、生産性が高いために酸化タング
ステンおよび酸化モリブデン混合被膜を安価に得ること
ができる。
In addition, the present invention does not require large-scale equipment and has high productivity compared to conventional manufacturing methods such as vacuum methods, so that a tungsten oxide and molybdenum oxide mixed film can be obtained at low cost.

又、従来のタングステン酸化物、モリブデン酸化物を用
いて作成されたEC素子よりもこの混合物膜を用いて作
成されたEC素子は光吸収スペクトルが可視光領域にシ
フトしているために着色時の青色の色調が従来のものと
異なり、EC素子の色調にも多様性を与えるものである
In addition, the light absorption spectrum of the EC device made using this mixture film is shifted to the visible light region compared to the EC device made using conventional tungsten oxide or molybdenum oxide, so it is difficult to color the EC device when colored. The blue color tone is different from the conventional one, and it provides diversity in the color tone of the EC element.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例により作成された酸化タングス
テンおよび酸化モリブデンの混合被膜を用いて作成した
エレクトロクロミックの分光透過率を示す図である。
FIG. 1 is a diagram showing the spectral transmittance of an electrochromic film created using a mixed film of tungsten oxide and molybdenum oxide created according to an example of the present invention.

Claims (2)

【特許請求の範囲】[Claims] (1)タングステン酸とモリブデン酸との混合コロイド
を含むタングステン酸およびモリブデン酸の混合溶液と
少なくとも表面に導電性を有する基板とを接触させて該
基板をカソードとして電解析出を行ない該基板の表面に
被膜を析出させ、その後該被膜を焼成して酸化タングス
テンと酸化モリブデンの混合被膜とする酸化タングステ
ンと酸化モリブデンの混合被膜の製造方法
(1) A mixed solution of tungstic acid and molybdic acid containing a mixed colloid of tungstic acid and molybdic acid is brought into contact with a substrate having conductivity at least on the surface, and electrolytic deposition is performed using the substrate as a cathode to perform electrolytic deposition on the surface of the substrate. A method for producing a mixed film of tungsten oxide and molybdenum oxide, in which a film is deposited on the substrate, and then the film is fired to obtain a mixed film of tungsten oxide and molybdenum oxide.
(2)前記タングステン酸およびモリブデン酸の混合溶
液のモリブデン酸に対するタングステン酸のモル比が1
〜4である特許請求の範囲第1項記載の酸化タングステ
ンと酸化モリブデンの混合被膜の製造方法。
(2) The molar ratio of tungstic acid to molybdic acid in the mixed solution of tungstic acid and molybdic acid is 1
4. A method for producing a mixed film of tungsten oxide and molybdenum oxide according to claim 1.
JP60070293A 1985-04-03 1985-04-03 Production of mixed film of tungsten oxide-molybdenum oxide Granted JPS61231197A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60070293A JPS61231197A (en) 1985-04-03 1985-04-03 Production of mixed film of tungsten oxide-molybdenum oxide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60070293A JPS61231197A (en) 1985-04-03 1985-04-03 Production of mixed film of tungsten oxide-molybdenum oxide

Publications (2)

Publication Number Publication Date
JPS61231197A true JPS61231197A (en) 1986-10-15
JPH058277B2 JPH058277B2 (en) 1993-02-01

Family

ID=13427277

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60070293A Granted JPS61231197A (en) 1985-04-03 1985-04-03 Production of mixed film of tungsten oxide-molybdenum oxide

Country Status (1)

Country Link
JP (1) JPS61231197A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108914183A (en) * 2018-07-09 2018-11-30 中国科学院上海硅酸盐研究所 Molybdenum doping amorphous Tungsten Trioxide Electrochromic Films and its electrochemical deposition method and application

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5411786A (en) * 1977-06-28 1979-01-29 Mitsubishi Electric Corp Peak detecting system of spectra

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5411786A (en) * 1977-06-28 1979-01-29 Mitsubishi Electric Corp Peak detecting system of spectra

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108914183A (en) * 2018-07-09 2018-11-30 中国科学院上海硅酸盐研究所 Molybdenum doping amorphous Tungsten Trioxide Electrochromic Films and its electrochemical deposition method and application

Also Published As

Publication number Publication date
JPH058277B2 (en) 1993-02-01

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