JPS61230233A - Formation of evaporated film for color picture tube - Google Patents

Abstract

PURPOSE:To improve productivity with an evaporation period being shortened, by passing a panel, in which an intermediate film is formed on a phosphor film, through a heating furnace and carrying it into an evaporating chamber in order to vacuum-evaporate a photo-reflective metal thin film on the intermediate film. CONSTITUTION:An intermediate film 3 is formed on a phosphor film 2 attached to the inner surface of a panel 1, and a photo-reflective aluminium thin film 4 is evaporated on it, to form a fluorescent screen of a color picture tube. Then, a panel 1 formed of the intermediate film 3 is first located before an inlet chamber 6a of an evaporating device, and be passed through a tunnel-shape heating furnace 12 equipped with quartz-tube heaters 13 so that it is heated at the temperature of 60 deg.-80 deg.C to degas the fluorescent screen part. And it is carried into the inlet chamber 6a of the evaporating device, followed by reducing the pressure in chambers 6a-6c, and then it is sent to the evaporating chamber 6b to evaporate the aluminium thin film 4. Therefore, even in case of temporarily storing the panel outside the process, the evaporation period does not fall, with productivity being improved.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for shrinking and deforming a color picture tube, and in particular, it relates to a method for shrinking and deforming a color picture tube. Concerning the method of forming.

[Prior Art] The phosphor screen of a normal color picture tube has a phosphor film attached to the inner surface of a panel that constitutes a part of the tube body of the color picture tube.
A light reflective aluminum thin film is formed to directly extract the light emitted from the phosphor film to the front of the color picture tube, and is generally referred to as a metal back structure.

This metal back phosphor screen has the function of increasing the brightness of the color picture tube and preventing the phenomenon of ion burnout. The manufacturing process will be explained below with reference to FIG.

Figure @2 is a sectional view for explaining the manufacturing process of the phosphor screen portion of a color picture tube. In figure 82.

(1) is a panel, (2) is a phosphor film formed on the inner surface of this panel (1), and (3) is an organic material mainly used to smooth the surface of this phosphor film (2). The intermediate film (4) formed from the film lacquer material as a component is an aluminum thin film.

The phosphor film (2) is applied to the inner surface of the panel (1) to a uniform thickness and is formed by drying it.
The aluminum thin film (4) is formed by vapor-depositing aluminum on the intermediate film (3) in a vacuum. After the formation of this aluminum thin film (4), baking treatment is performed to form the intermediate film (3). removed.

FIG. 3 is a block diagram schematically showing an example of a conventional vapor deposition apparatus. The vapor deposition apparatus shown here includes a vacuum envelope having an inlet chamber (8a), an aluminum vapor deposition chamber (13b3), and an outlet chamber (6C). and a resistance heating element (7) whose main component is boron nitride, which supply the aluminum wire (9) for vapor deposition.Also, the inlet chamber (8a) and the outlet chamber (BC) are provided with , gate valves (10) and (10) are provided to separate the aluminum deposition chamber (6b) and the inlet chamber (6a) from the external atmosphere.
A gate valve (11
), (11) are provided.

In the above configuration, the panel (1) on which the interlayer film (3) is formed is carried into the inlet chamber (6a) of the vacuum envelope, and the inlet chamber of the vacuum envelope is removed by an evacuation device such as a vacuum pump (not shown). (6a) and exit chamber (6C) to 0°05~0
, 001 Torr vacuum, aluminum pre-evaporation chamber (6b
) to a vacuum of 1 to 2 X I O art, respectively.

Next, only the gate valve (11) was opened and the panel (1) was transported to a predetermined position in the aluminum deposition chamber (6b).

Close the gate valve (11) Next, bring the inlet chamber (6a) to atmospheric pressure and open the gate valve (10) to form the intermediate 111 (3) of another, i.e. the next panel to be pretreated. (
1) is carried in, and the entrance chamber (8a) and exit chamber ([1ic
) to a vacuum of 0.05 to 0.01 Torr, and the aluminum pre-evaporation chamber (6b) to a vacuum of 1 to 2 x 10 Torr.
The pressure is reduced to a degree of vacuum of r.

The resistance heating element (7) is installed at a predetermined position at the bottom of the aluminum deposition chamber (6b), and when energized once,
℃~1500℃. In the recess (7a) on which the vapor deposition material of this resistance heating body (7) is placed.

Insert the aluminum wire (8), which is a vapor deposition material, using the aluminum wire automatic inserter (8), and insert the aluminum wire (9).
is evaporated by the temperature rise caused by the heat generated by the resistance heating element (7). Due to this evaporation, aluminum scatters upward, and a thin aluminum film (0) is formed on the intermediate film (3).

When the vapor deposition is completed, the gate valves (lt) and (tl) are opened, and the panel (1) of the aluminum vapor deposition chamber (6b) is transferred to the outlet chamber (8C), and the next vapor deposition chamber waiting in the inlet chamber (6a) is moved. The panel to be processed (1) is placed in the aluminum deposition chamber (8).
b) respectively. Further, the inlet chamber (8a) and the outlet chamber (6c) are set to atmospheric pressure, and the panel (1) in the outlet chamber (8c) is carried out of the vacuum envelope to complete the vapor deposition process.

At the same time, another panel is carried into the entrance chamber (6a).

The steps as described above are repeated.

[Problem 1 to be Solved by the Invention The conventional vapor deposition film forming process as described above is directly connected to the intermediate film forming process, and during normal production, the aluminum vapor deposition process is repeated at a cycle of about 55 seconds. However, during maintenance or failure of the aluminum tombstone apparatus, the panels after the interlayer film formation process are completed are temporarily stored outside the process. When the materials temporarily stored in this way are carried into the aluminum vaporization:W apparatus, the vapor deposition process cycle becomes as slow as about 65 seconds.

This is due to the following reasons. That is, under normal conditions, the product with the intermediate film formed is immediately carried into the aluminum vapor deposition process, and the temperature of the panel at this time is between 35°C and 40°C.
℃, but temporarily stored panels have a temperature of 23℃ to 25℃, which is similar to room temperature, and in order to adsorb moisture in the atmosphere, gas is generated in the deposition chamber and it takes time to raise the vacuum in the aluminum deposition chamber. This is because it takes. As a result of this lengthening of the deposition process cycle, a problem has arisen in that the number of color picture tubes produced is significantly reduced.

This invention was made in order to solve the above-mentioned conventional problems, and is a collar that can accelerate the deposition cycle of the metal 51 film on products with intermediate film formation temporarily stored outside the process to the normal production cycle or even faster. It is an object of the present invention to provide a method for forming an i i I11 picture tube.

[Means for solving problems]

The method for forming a vapor deposited film for a color picture tube according to the present invention includes a heating step for the panel after completion of the intermediate film formation and before starting the vapor deposition step.

[Function] In the method for forming a vapor deposited film on a color picture tube according to the present invention, a tunnel heating furnace equipped with, for example, a quartz tube heater is provided in front of the entrance chamber of the grass R apparatus, and the panel is passed through the heating furnace. Since the panel is heated to a high temperature and preliminary gas is vented from the phosphor screen, the vacuum build-up in the deposition chamber is shortened, resulting in a shortened deposition period.

〔Example〕

Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a block diagram schematically showing the main parts of a vapor deposition apparatus used in an embodiment of the present invention.

In FIG. 1, the panel (1) on which the interlayer film (3) has been formed is placed in a tunnel-type panel heating furnace (12) equipped with a quartz tube heater (13) placed in front of the entrance chamber (θa).
be done. The quartz tube heaters (13) inside the panel heating furnace (12) at this time are straight tubes with a diameter of 15 mm and are arranged on the ceiling of the panel heating furnace (12), with an arrangement interval of 10 mm.
It was set to 0 mm. In addition, the total length of the panel heating furnace (12) is 5
It was set as m. The quartz tube heater (13) is energized to set the ambient temperature in the panel heating furnace (12) to 120°C to 160°C, and the temperature of the panel (1) at the outlet of the panel heating furnace (12) is 60°C to 80°C. Adjusted to ℃. This temperature range is set because large panels and small panels have different amounts of heat absorption.

The panel (1) heated in this manner is carried into a vapor deposition apparatus in the same manner as in the conventional method. That is, the heated panel (
1) is carried into the inlet chamber (8a), the inlet chamber (8a) and the outlet chamber (8c) are brought to a vacuum of 0, 05 to 0, OITarr, and the aluminum evaporation chamber (eb) is brought to a vacuum of 1 to 2 x 10-
The 0th order each reduces the pressure to a vacuum of 4 Torr,
Only the gate valve (11) is opened, the panel (1) is transported to a predetermined position in the aluminum deposition chamber (8b), and the gate valve (1) is closed.

Next, the inlet chamber (6a) is brought to atmospheric pressure, the gate valve (10) is opened, another heated panel (+) is carried in, and the inlet chamber (6a) and outlet chamber (6c) are again heated to 0.05 ~0. OIT.

The aluminum evaporation chamber (6b) is heated 1 to 2 times at a vacuum degree of rr.
The pressure was reduced to a vacuum degree of X l OTorr.

Next, the resistance heating element (7) is energized to 1350"C!~1
Heating it to 500°C, inserting the aluminum wire (3) using the aluminum wire automatic inserter (8), and inserting the aluminum wire (
8) is evaporated by the temperature rise caused by the heat generated by the resistance heating element (7). Due to this evaporation, aluminum scatters upward, and the middle 11! (3) An aluminum thin film (4) will be formed on top.

When vapor deposition is completed, open the gate valve (1t) (ID).

Connect the panel (1) of the aluminum front chamber (6b) to the exit chamber (
6C), and the panel (1) to be deposited next, which is waiting in the entrance chamber (6a), is transferred to the aluminum deposition chamber (8b).
) respectively. In addition, the inlet chamber (6a) and the outlet chamber (6c) are set to atmospheric pressure, and the panel of the outlet chamber (8c) (
1) is carried out of the vacuum envelope to complete the vapor deposition process.

At the same time, another heated panel (
1) is carried in and the steps described above are repeated.

According to the above embodiment, passing through the panel heating furnace (12),
The temperature of the panel (1) entering the aluminum deposition inlet chamber (8a) and the aluminum deposition cycle have a relationship as shown in FIG. In other words, as the panel temperature increases, the deposition period becomes shorter, but when the temperature exceeds about 100°C, the interlayer film (
3) is accompanied by a softening phenomenon, and the original purpose of the aluminum thin film (0), which is to effectively extract the light emitted from the phosphor film (2) forward, deteriorates.
The optimal temperature for 1) is 60°C to 80°C, and the deposition period in this case is about 45 seconds, which is about 10 seconds faster than the conventional method.

In addition, in the above embodiment, a quartz tube heater (13
) was used, but a radiant heat method using gas or steam may also be used, and various other heat sources can also be used.

[Effects of the Invention] As described above, according to the method for forming a vapor deposited film on a color picture tube according to the present invention, even if the panel is temporarily stored outside the process during maintenance or failure of the aluminum vapor deposition equipment,
By going through the panel heating process, the deposition period does not decrease and the period is further shortened, which is a good result, and has the effect of greatly increasing production volume.

[Brief explanation of drawings]

FIG. 1 is a diagram showing an embodiment of the method for forming a vapor deposited film for a color picture tube according to the present invention, and is a block diagram schematically showing the main parts of a vapor deposition apparatus and a panel heating furnace. FIG. 3 is a schematic configuration diagram showing an example of a conventional vapor deposition apparatus, and FIG. 4 is a graph showing the relationship between panel temperature and aluminum vapor deposition period in the present invention. mouth)...panel, (2)...phosphor film, (3)...
・Intermediate film, (4)...Aluminum thin film, (8b)・
...Aluminum leather front chamber, (12)...Panel heating furnace. In addition, in the figures, the same reference numerals indicate the same or corresponding parts. Second

Claims (2)

[Claims] (1) A method for forming a vapor deposited film for a color picture tube, in which a panel having an intermediate film formed on a phosphor film is intermittently carried into a vapor deposition chamber, and a light reflective metal thin film is vacuum vapor deposited on the intermediate film. A method for forming a vapor deposited film for a color picture tube, characterized in that the panel on which the intermediate film is formed is carried into the vapor deposition chamber through a heating process. (2) A method for forming a vapor deposited film on a color picture tube according to claim 1, wherein in the heating step, the panel is heated to 60°C to 80°C.