JPS61225797A - High frequency heater for nuclear fuser - Google Patents

High frequency heater for nuclear fuser

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Publication number
JPS61225797A
JPS61225797A JP6528285A JP6528285A JPS61225797A JP S61225797 A JPS61225797 A JP S61225797A JP 6528285 A JP6528285 A JP 6528285A JP 6528285 A JP6528285 A JP 6528285A JP S61225797 A JPS61225797 A JP S61225797A
Authority
JP
Japan
Prior art keywords
gas
high frequency
frequency heating
sfs
coupling system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6528285A
Other languages
Japanese (ja)
Inventor
池田 佳隆
賢治 横倉
重忠 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Japan Atomic Energy Agency
Original Assignee
Toshiba Corp
Japan Atomic Energy Research Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Japan Atomic Energy Research Institute filed Critical Toshiba Corp
Priority to JP6528285A priority Critical patent/JPS61225797A/en
Publication of JPS61225797A publication Critical patent/JPS61225797A/en
Pending legal-status Critical Current

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  • Waveguides (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は核融合装置のプラズマ加熱に用いられる高周波
加熱装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a high-frequency heating device used for plasma heating in a nuclear fusion device.

(発明の技術的背景) 周知のように、核融合装置のプラズマ加熱にはプラズマ
中にIR流を通して加熱するジュール加熱の他に、第2
段加熱法として中性粒子大割加熱法や高周波加熱法など
があり、高周波加熱法は高周波の電磁エネルギーをプラ
ズマ中に吸収させることによりプラズマ温度を上げる方
法である。
(Technical Background of the Invention) As is well known, plasma heating for nuclear fusion devices uses Joule heating, which heats the plasma by passing an IR flow through it, as well as second heating.
Stage heating methods include the neutral particle bulk heating method and the high frequency heating method. The high frequency heating method is a method of increasing the plasma temperature by absorbing high frequency electromagnetic energy into the plasma.

この高周波加熱法を利用した高周波加熱@回は、たとえ
ば第2図に示すようにill 11部1.電源部2゜高
周波励振増幅部3.N力増幅部4.給11WA5゜伝送
系6.高周波加熱結合系7.冷却部8等より構成され、
高周波励振増幅部3で発生した小電力の高周波は電力増
幅部4で電子管1本当りMW級まで層幅された後、給電
部5及び伝送系6を経て、高周波加熱結合系7によりプ
ラズマ9へ入射されるようになっている。なお図中−1
0はブラングしト、11はトロイダルコイルを示す。
High frequency heating using this high frequency heating method is described in ill 11 part 1. as shown in FIG. 2, for example. Power supply section 2° High frequency excitation amplification section 3. N force amplification section 4. Supply 11WA5° transmission system6. High frequency heating coupling system7. Consists of cooling section 8 etc.
The small power high frequency generated in the high frequency excitation amplification section 3 is amplified to a layer width of MW class per electron tube in the power amplification section 4, and then passed through the power supply section 5 and the transmission system 6 to the plasma 9 by the high frequency heating coupling system 7. It is designed to be incident. In addition, -1 in the figure
0 indicates a blank, and 11 indicates a toroidal coil.

この高周波加熱装置の高周波加熱結合系7は第3図に示
すように、電磁波をプラズマに入射するループアンテナ
12を含むランチャ13と、インピーダンス整合器14
および同軸給電線(又は導波管)15から構成され、こ
の同軸給電線15により伝送系6からの高周波電力をラ
ンチャ13へ伝送するようになっている。また、この高
周波加熱結合系7は炉側と直接結合しているために同軸
給電線15の内部にはセラミック等で形成された仕切壁
16が設けられ、この仕切壁16を境にして炉側を高真
空に保持している。そして、仕切壁16で仕切られた伝
送系6側の同軸給電線15内には絶縁耐圧を上昇させる
ために絶縁ガスとしてSFsガス17が充填されている
As shown in FIG. 3, the high-frequency heating coupling system 7 of this high-frequency heating device includes a launcher 13 including a loop antenna 12 for injecting electromagnetic waves into plasma, and an impedance matching device 14.
and a coaxial feed line (or waveguide) 15, through which high frequency power from the transmission system 6 is transmitted to the launcher 13. In addition, since this high frequency heating coupling system 7 is directly coupled to the furnace side, a partition wall 16 made of ceramic or the like is provided inside the coaxial feeder line 15, and with this partition wall 16 as a border, the furnace side is kept under high vacuum. The coaxial feed line 15 on the transmission system 6 side, which is partitioned by the partition wall 16, is filled with SFs gas 17 as an insulating gas in order to increase the dielectric strength.

〔背景技術の問題点〕[Problems with background technology]

ところで、このように構成された高周波加熱結合系7で
はSFsガスが充填されている部分(以下、SFsガス
充填部という)にプラズマと高周波電力の結合特性によ
り非常に大きな^周波電力が蓄積し、SFsガス充填部
の表面に大きな高周波損失が発生する。しかし、核融合
装置におけるプラズマ加熱は連続的には行なわず、極め
て短い時間にパルス的に行なわれ、次の加熱に至るまで
休止時間をとり、これを繰返すのが通常の方法であるた
め、従来の核融合実験装置では規模も小さく加熱時間も
短かったので、SFsガス充填部に高周波損失による大
きな温度上昇は起こらず、特別な冷却対策はなされてい
なかった。
By the way, in the high-frequency heating coupling system 7 configured as described above, a very large ^-frequency power is accumulated in the part filled with SFs gas (hereinafter referred to as the SFs gas-filled part) due to the coupling characteristics of plasma and high-frequency power. A large high frequency loss occurs on the surface of the SFs gas filled part. However, plasma heating in nuclear fusion devices is not performed continuously, but in pulses over extremely short periods of time, with a pause period before the next heating, and this process is repeated. Because the scale of the nuclear fusion experimental device was small and the heating time was short, a large temperature rise due to high frequency loss did not occur in the SFs gas-filled section, and no special cooling measures were taken.

しかしながら実験装置の規模が大きくなり、加熱時間が
1秒を越える運転を行なうようになると、自然冷却では
追いつかず大きな温度上昇を起こしてSFsガス充填部
各部に過大な熱応力が発生し、それに伴う熱膨張や熱変
形によって同軸給電線が瑳 破壜する可能性がある。この温度上昇を避けるためには
、例えば同軸給電線のサイズを大形化することも考えら
れるが、同軸給電線の設置箇所周辺には空間的な制約が
あり、別置の冷媒供給装置をつなぐなどして同軸給電線
の外壁を強制的に冷却することが必要になる。
However, as the scale of the experimental equipment increases and the heating time exceeds 1 second, natural cooling cannot keep up and a large temperature rise occurs, causing excessive thermal stress in various parts of the SFs gas filling section. There is a possibility that the coaxial power supply line may become damaged due to thermal expansion or thermal deformation. In order to avoid this temperature rise, for example, it is possible to increase the size of the coaxial power supply line, but there are spatial restrictions around the installation location of the coaxial power supply line, and a separate refrigerant supply device can be connected. It is necessary to forcibly cool the outer wall of the coaxial power supply line by doing something like this.

ところが、同軸給電線は外壁よりも内壁のほうが濃度上
昇が大きく、またSFsガスは断熱性の高いガスである
ため外壁のみの冷却では内壁の熱除去は極めて困難であ
る。したがって冷却対策としては、内壁の内側に冷媒を
流して冷却することが考えられるが、内壁の内部は空洞
とは限らず、内外壁間の絶縁性の維持に対する要求など
も考慮すると冷却構造が複雑になり、性能維持の面など
で高周波加熱装置としての信頼性が低下するおそれがあ
る。
However, in a coaxial feeder, the concentration increase is greater on the inner wall than on the outer wall, and SFs gas is a highly insulating gas, so it is extremely difficult to remove heat from the inner wall by cooling only the outer wall. Therefore, one possible cooling measure is to cool the inside of the inner wall by flowing a refrigerant, but the inside of the inner wall is not necessarily hollow, and the cooling structure is complicated considering the requirement to maintain insulation between the inner and outer walls. This may reduce the reliability of the high-frequency heating device in terms of maintaining performance.

また、運転中の高周波特性の変動などで同軸給電線内部
にスパーク等が発生すると、SFsガスが分解してガス
中に不純物が混在し、この不純物によりSFsガスの絶
縁特性を低下させる可能性があるが、発生頻度が少ない
こともあって従来の規模の小さい核融合実験装置では特
別な対策はせず、必要に応じてSFsガスを交換するな
どの方法がとられていた。しかし、実験装置以上の規模
の大きい核融合装置になればガス交換により運転を休止
させることは稼働率も下がり、運転コストの面からも好
ましくない。
In addition, if sparks occur inside the coaxial power supply line due to fluctuations in high frequency characteristics during operation, the SFs gas will decompose and impurities will be mixed in the gas, and these impurities may deteriorate the insulation properties of the SFs gas. However, due to the infrequent occurrence of these incidents, conventional small-scale nuclear fusion experimental equipment did not take any special measures, instead replacing the SFs gas as necessary. However, if the scale of the fusion device is larger than that of an experimental device, stopping operation for gas exchange will lower the operating rate and is not desirable from the standpoint of operating costs.

〔発明の目的〕[Purpose of the invention]

本発明は以上のような事情にもとづいてなされたもので
あり、その目的とするところは、絶縁ガスが充填されて
いる同軸給電線又は導波管の設置箇所周辺に空間的拡大
を必要とせず、かつ簡単な構成により高周波損失による
温度上昇を抑えることができ、またガス中に不純物が発
生しても絶縁特性が劣化しない信頼性の高い核融合装置
用高周波加熱装置を提供することにある。
The present invention has been made based on the above circumstances, and its purpose is to eliminate the need for spatial expansion around the installation location of a coaxial feeder or waveguide filled with insulating gas. An object of the present invention is to provide a highly reliable high-frequency heating device for a nuclear fusion device, which can suppress temperature rise due to high-frequency loss with a simple configuration, and whose insulation properties do not deteriorate even if impurities are generated in the gas.

〔発明の概要〕[Summary of the invention]

本発明は上記の目的を達成するために、SFsガス充填
部にガス循環装置を接続し、このガス循環装置によりS
Fsガスを循環させて循環経路に設けられたガス冷却器
によりSFsガスを冷却するとともに、同じく循環経路
に設けられた吸着塔およびフィルタによりガス中の不純
物や微粉を除去するようにしたものである。
In order to achieve the above object, the present invention connects a gas circulation device to the SFs gas filling section, and uses this gas circulation device to
The Fs gas is circulated and cooled by a gas cooler installed in the circulation path, and impurities and fine particles in the gas are removed by an adsorption tower and filter also installed in the circulation path. .

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の一実施例を図面の簡単な説明する。 Hereinafter, one embodiment of the present invention will be briefly described with reference to the drawings.

第1図は本発明の一実施例を示すガス循環装置のブロッ
ク図で、このガス循環装置は第3図に示す高周波加熱結
合系7のSF6ガス排出ノズル7aとSFsガス供給ノ
ズル7bとを循環ループ21で接続し、この循環ループ
21にガス循環用送風機22.熱交換器(ガス冷却器)
23.吸着塔24.およびフィルタ25を設けて構成さ
れている。したがって、高周波加熱結合系7のSFsガ
ス充填部に充填されているSFaガス17は、ガス循環
用法lIt機22によりSFsガス排出ノズル7aから
循環ループ21に流入し、熱交換器23、吸着塔24.
フィルタ25を経て、SFsガス供給ノズル7bより高
周波加熱結合系7のSFsガス充填部へ戻るようになっ
ている。
FIG. 1 is a block diagram of a gas circulation device showing an embodiment of the present invention, and this gas circulation device circulates through the SF6 gas discharge nozzle 7a and the SFs gas supply nozzle 7b of the high frequency heating coupling system 7 shown in FIG. A gas circulation blower 22 is connected to the circulation loop 21 through a loop 21 . Heat exchanger (gas cooler)
23. Adsorption tower 24. and a filter 25. Therefore, the SFs gas 17 filled in the SFs gas filling part of the high frequency heating coupling system 7 flows into the circulation loop 21 from the SFs gas discharge nozzle 7a by the gas circulation machine 22, and flows into the circulation loop 21 through the heat exchanger 23 and the adsorption tower 24. ..
The gas passes through the filter 25 and returns to the SFs gas filling section of the high frequency heating coupling system 7 from the SFs gas supply nozzle 7b.

上記の構成において、例えば高周波加熱結合系7のSF
sガス充填部に充填されているSFsガス17が高周波
電力の蓄積により昇温すると、本実施例のガス循環装置
が作動してSFsガス17を循環させる。このとき、ガ
ス循環用送風機22により循環ループ21を流れるSF
sガス17は熱交換器23で冷却され、さらに吸着塔2
4及びフィルタ25によりSFsガス17中に発生した
不純ガスや微粉などが除去された後、SFsガス供給ノ
ズル7bより再び高周波加熱結合系7のSF6ガス充填
部に戻される。
In the above configuration, for example, the SF of the high frequency heating coupling system 7
When the temperature of the SFs gas 17 filled in the s gas filling section rises due to accumulation of high frequency power, the gas circulation device of this embodiment is activated to circulate the SFs gas 17. At this time, the SF flowing through the circulation loop 21 by the gas circulation blower 22
The s gas 17 is cooled in a heat exchanger 23, and further passed through an adsorption tower 2.
After impurity gas and fine powder generated in the SFs gas 17 are removed by the SFs gas 17 and the filter 25, the SFs gas 17 is returned to the SF6 gas filling part of the high frequency heating coupling system 7 through the SFs gas supply nozzle 7b.

このように高周波加熱結合系7のSFsガス充填部にガ
ス循環装置を接続することにより、高周波加熱結合系7
のSFsガス充填部には常に冷却されかつ精製されたS
Fsガス17が供給されることになるので、発熱による
濃度上昇を防止でき杢 る共に不純物による絶縁特性の劣化を防止することがで
きる。また、SFsガス17をそのまま冷媒として使用
するので複雑な冷却構造を必要とせず、しかもガス循環
装置は別置できるので結合系周辺の空間区域を拡大する
必要もない。さらに、不純物や微粉の発生があっても除
去されるのでSFsガス17の清浄度を長時間にわたり
維持でき、ガス交換の時期を大幅に延長することができ
る。
By connecting the gas circulation device to the SFs gas filling part of the high frequency heating coupling system 7 in this way, the high frequency heating coupling system 7
The SFs gas filling section is always filled with cooled and purified S.
Since the Fs gas 17 is supplied, an increase in concentration due to heat generation can be prevented, and at the same time, deterioration of insulation properties due to impurities can be prevented. Furthermore, since the SFs gas 17 is used as a refrigerant as it is, there is no need for a complicated cooling structure, and since the gas circulation device can be placed separately, there is no need to expand the space around the coupling system. Furthermore, even if impurities or fine powder are generated, they are removed, so the cleanliness of the SFs gas 17 can be maintained for a long time, and the period of gas exchange can be significantly extended.

なお、本発明は上記実施例に限定されるものではない。Note that the present invention is not limited to the above embodiments.

たとえば、前記吸着塔24およびフィルタ25は循環ル
ープ21に必ずしも設置する必要はなく、運転条件に応
じて適宜膜ければよい。また、上記実施例では同軸給電
線を用いた高周波加熱結合系について述べたが、導波管
を用いた高周波加熱結合系でも同様の効果を得ることが
できる。
For example, the adsorption tower 24 and filter 25 do not necessarily need to be installed in the circulation loop 21, and may be appropriate membranes depending on the operating conditions. Further, in the above embodiment, a high frequency heating coupling system using a coaxial feeder was described, but a similar effect can be obtained with a high frequency heating coupling system using a waveguide.

さらに、本発明は伝送系6にSF6ガスが充填されてい
るものについても適用できることは言うまでもない。
Furthermore, it goes without saying that the present invention can also be applied to a transmission system 6 filled with SF6 gas.

〔発明の効果〕〔Effect of the invention〕

以上の説明から明らかなように本発明によれば、高周波
加熱装置の絶縁ガス充填部にガス循環装置を接続したこ
とにより、大きな高周波電力を長時間安定に伝送できる
核融合装置用高周波加熱装置を提供できる。
As is clear from the above description, the present invention provides a high-frequency heating device for a nuclear fusion device that can stably transmit large high-frequency power for a long time by connecting a gas circulation device to the insulating gas filling part of the high-frequency heating device. Can be provided.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示すガス循環装置のブロッ
ク図、第2図は高周波加熱装置の一例を示すブロック図
、第3図は同装置の高周波加熱結合系の一例を示す概略
構成図である。 1・・・制一部、2・・・電源部、3・・・高周波励振
増幅部、4・・・電力増幅部、5・・・給電部、6・・
・伝送系。 7・・・高周波加熱結合系、9・・・プラズマ、12・
・・ループアンテナ、13・・・ランチャ、14・・・
インピーダンス整合器、15・・・同軸給電線(又は導
波管)。 、、 16−・・仕切壁、17−8Fsガス、7a・S
Fsガス排出ノズル、7b・・・SFsガス供給ノズル
。 21・・・循環ループ、22・・・ガス循環用送風機。 23・・・熱交換器(ガス冷却器)、24・・・吸着塔
。 25・・・フィルタ。 出願人代理人 弁理士 鈴江武彦 第1図 第2図 第3図
Fig. 1 is a block diagram of a gas circulation device showing an embodiment of the present invention, Fig. 2 is a block diagram showing an example of a high frequency heating device, and Fig. 3 is a schematic configuration showing an example of a high frequency heating coupling system of the same device. It is a diagram. DESCRIPTION OF SYMBOLS 1... Control part, 2... Power supply part, 3... High frequency excitation amplification part, 4... Power amplification part, 5... Power supply part, 6...
・Transmission system. 7...High frequency heating coupling system, 9...Plasma, 12.
...Loop antenna, 13...Launcher, 14...
Impedance matching device, 15... coaxial feed line (or waveguide). ,, 16-...Partition wall, 17-8Fs gas, 7a・S
Fs gas discharge nozzle, 7b...SFs gas supply nozzle. 21... Circulation loop, 22... Gas circulation blower. 23... Heat exchanger (gas cooler), 24... Adsorption tower. 25...filter. Applicant's agent Patent attorney Takehiko Suzue Figure 1 Figure 2 Figure 3

Claims (4)

【特許請求の範囲】[Claims] (1)同軸給電線又は導波管の一部に絶縁ガスを充填し
た絶縁ガス充填部を有する高周波加熱装置において、前
記絶縁ガス充填部にガス循環装置を接続したことを特徴
とする核融合装置用高周波加熱装置。
(1) A high-frequency heating device having an insulating gas filling section in which a part of a coaxial feeder line or a waveguide is filled with insulating gas, characterized in that a gas circulation device is connected to the insulating gas filling section. High frequency heating equipment.
(2)前記ガス循環装置はガス循環用送風機と、ガス冷
却器と、ガス中の不純物を除去する手段とを備えている
ことを特徴とする特許請求の範囲第(1)項記載の核融
合装置用高周波加熱装置。
(2) The nuclear fusion according to claim (1), wherein the gas circulation device includes a gas circulation blower, a gas cooler, and means for removing impurities in the gas. High frequency heating device for equipment.
(3)前記不純物除去手段は吸着塔またはフィルタ、お
よびその両方であることを特徴とする特許請求の範囲第
(2)項記載の核融合装置用高周波加熱装置。
(3) The high-frequency heating device for a nuclear fusion device according to claim (2), wherein the impurity removing means is an adsorption tower or a filter, or both.
(4)前記絶縁ガスはSF_6ガスであることを特徴と
する特許請求の範囲第(1)項記載の核融合装置用高周
波加熱装置。
(4) The high-frequency heating device for a nuclear fusion device according to claim (1), wherein the insulating gas is SF_6 gas.
JP6528285A 1985-03-29 1985-03-29 High frequency heater for nuclear fuser Pending JPS61225797A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6528285A JPS61225797A (en) 1985-03-29 1985-03-29 High frequency heater for nuclear fuser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6528285A JPS61225797A (en) 1985-03-29 1985-03-29 High frequency heater for nuclear fuser

Publications (1)

Publication Number Publication Date
JPS61225797A true JPS61225797A (en) 1986-10-07

Family

ID=13282415

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6528285A Pending JPS61225797A (en) 1985-03-29 1985-03-29 High frequency heater for nuclear fuser

Country Status (1)

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JP (1) JPS61225797A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008305736A (en) * 2007-06-11 2008-12-18 Tokyo Electron Ltd Plasma processing apparatus, method for using plasma processing apparatus, and method for cleaning plasma processing apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008305736A (en) * 2007-06-11 2008-12-18 Tokyo Electron Ltd Plasma processing apparatus, method for using plasma processing apparatus, and method for cleaning plasma processing apparatus

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