JPS61200700A - Electronic wave ring - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed Description of the Invention] [Field of Industrial Application] This invention is an electronic wave ring that utilizes the wave characteristics of high-energy electrons that are accelerated and accumulated in a high-frequency acceleration cavity while rotating along a designed orbit. Regarding super L
This makes it possible to irradiate a large area with high-intensity photons suitable for fine processing such as transferring SI circuit patterns.

[Conventional technology]

FIG. 12 is a schematic diagram showing the configuration of an example of a conventional electron storage ring, with 1a to 1h having an orbit radius of 2 m and a deflection angle of 45°.
, 2 is a septum electromagnet for incidence, 3 is a Kitzker coil, 4 is a high-frequency cavity, 5 is a quadrupole electromagnet (hereinafter referred to as Qd) with a vertical focusing force, and 6 is a horizontal focusing force. The quadrupole electromagnet (hereinafter referred to as Qf) 7 is a set of three triplets in which the Qr 6 is placed on both sides of Qd5. Note that 11 indicates a designed electron orbit, and 12 indicates an electron.

The conventional electron storage ring is constructed as described above, and the electron beam incident on the entrance septum electromagnet 2 is only 8 mm.
40+ outward from the design trajectory through the x10mm square entrance
The electron beam is incident parallel to the stable designed electron trajectory 11 at a position deviated from sm. The incident electrons 12 collide with the partition plate between the input septum electromagnet 2 and dissipate while making several rounds around the designed electron orbit 11, so an extremely short pulse synchronized with the electron beam is sent to the Kitzker coil 3 half a turn downstream. A current is applied to correct the trajectory of the electrons. And electron 12 is further 1/4
The electrons are accelerated by the high-frequency cavity 4 located downstream of the circumference, and are stored while being replenished with the energy lost by light radiation.

Next, the characteristics of synchrotron radiation SR (hereinafter simply referred to as synchrotron radiation SR) generated from the storage ring shown in FIG. 12 will be explained with reference to FIG.

In this figure, 11 is a designed electron trajectory of the storage ring, and 12 is an electron accelerated in the direction of the orbital radius center in the designed electron trajectory 11.

The synchrotron radiation SR is a diverging light source that has sharp directivity only in the direction perpendicular to the plane of the designed electron trajectory 11 and diffuses in the tangential direction of the circular designed electron trajectory 11.

[Problem that the invention seeks to solve]

In the conventional electron storage ring as described above, the irradiation field is narrow, as shown by the shaded area in Fig. 13, so there is a problem in using it for lithography technology that requires large-area irradiation with synchrotron radiation SR. there were.

This invention was made to solve the above-mentioned problems, and it can move an electron beam stably in the horizontal and vertical directions by undulating it around a designed electron trajectory, and it can also generate high-intensity synchrotron radiation. The aim is to obtain an electronic wave ring that can be generated.

[Means for solving problems]

The electron wave ring according to the present invention is provided with vertical deflection means for causing the electrons accumulated on the designed orbit to perform vertical wave motion around the designed electron orbit.

Further, an electronic wave ring according to another invention of the present invention is
Separate vertical deflection means and horizontal deflection means are provided for causing the electrons accumulated at any position on the designed electron trajectory to undergo wave motion in the vertical and horizontal directions around the electron trajectory. It is equipped with an undulator that generates photons with high brightness in the range from infrared rays to X-rays on electrons that move in wave motion simultaneously or separately in the vertical and horizontal directions.

[Effect]

In this invention, the accumulated electrons are caused to undergo vertical wave motion around the designed electron trajectory by the vertical deflection means, thereby expanding the irradiation field of synchrotron radiation.

Further, an electronic wave ring according to another invention of the present invention is
The vertical deflection means, the horizontal deflection means and the undulator provide a high brightness light source with a wide irradiation field.

〔Example〕

FIG. 1 is a schematic diagram showing the structure of an electronic wave ring which is an embodiment of the present invention, and is a schematic diagram 1a to Ih.

2-7. and 11.12 are the same as in FIG.

In this figure, 21 is an undulator that converts part of the energy of electrons translated or deflected by the wave motion of the electron beam into photons in the range from infrared rays to X-rays;
22a is a variable vertical deflection electromagnet provided on the triplet 7, and 22b is a variable horizontal deflection electromagnet also provided on the triplet 7. Hereinafter, the orbital deflection of the electron beam will be described in the order of vertical deflection and horizontal deflection.

First, to perform the vertical deflection, e.g. triplet 7
Qt of 6. Qd5. Qr6- on the downstream side of Qr6
A variable vertical deflection electromagnet 22a is provided between Q and +5. Due to the magnetic field (of the order of tens of Gauss) of the variable vertical deflection electromagnet 22a, the trajectory of the electron beam incident on Qr 6 on the downstream side is changed due to the vertical divergence force of Qr 6, as shown in FIG. The deflection electromagnet 1d is amplified and deflected upward or downward depending on the direction, and then enters the deflection electromagnet 1d with a deflection angle of 45° (Fig. 1).
is the oblique incidence angle θ, (11,
7°) and has a longitudinal focusing force as shown in Figure 3(b), so the incident electron beam deflected upward or downward will be deflected downward or upward, respectively. The beam is corrected in trajectory, passes through the bending electromagnet 1d, and is vertically focused by the tilting radiation angle θ2 (11, 7 degrees) on the downstream side of the bending electromagnet 1d, correcting the trajectory. In addition, the bending electromagnet 1d
As shown in FIG. 4, the electron beam passes approximately horizontally at a distance of dxcm vertically from the stable orbit, and passes through the deflection electromagnets 1e to 1h on the downstream side while being similarly subjected to a longitudinal focusing force. At that time, the electron beam incident on the downstream triplet 7 intersects the stable orbit at Qd5 of that triplet 7, and the electron beam deflected upward is directed downward, and the electron beam deflected downward is directed upward. As shown in FIG. 2, a vertical wave motion is performed with the third bending electromagnets 1a and 1f, which are located approximately at the center of the variable vertical bending electromagnet 22a, serving as nodes No. 1 and 1f.

Figure 5 is a three-dimensional diagram of this vertically undulating electron beam, where H is the vertical width of the irradiation field and W is the horizontal width, showing that the vertical irradiation field of the synchrotron radiation SR is expanded. It is shown. Note that the shaded area in Figure 1 is the conventional irradiation field.

Next, stable movement in the horizontal direction by horizontal wave motion of the electron beam will be explained.

Note that a variable horizontal deflection electromagnet 22 is used to perform horizontal deflection.
The installation position b may be the installation position of the variable vertical deflection electromagnet 22a or the position of another triplet 7, but for example, it is set between Qd5 and Qr6 on the downstream side.

Due to the magnetic field (approximately ±100 Gauss) of the variable horizontal deflection electromagnet 22b, the trajectory of the electron beam incident on the Qr 6 on the downstream side is directed to the left (inward) depending on the direction of the magnetic field of the variable horizontal deflection electromagnet 22b, as shown in FIG. Or, it is deflected in the right direction (outside) H, and is roughly corrected in the opposite direction by the horizontal focusing force of Qr 6, and is incident horizontally on the bending electromagnet 1d, but at an inclined incidence angle θ1 (1
1.

7°), the left and right deviations do not significantly affect the orbit radius R in the magnetic field, and the electron beam orbit stably moves outward or inward parallel to the stable orbit. Then, the electron beam is further horizontally focused by Qr 8 located downstream.

As shown in FIG. 6, the wave characteristics of the electron beam in the horizontal direction have four vibration node numbers. At the position of the undulator 21, the electron trajectory is almost parallel to the electron beam, and as shown in FIG.
It shifts by m.

FIG. 7 is a three-dimensional diagram of an electron beam moving in parallel vertically and horizontally, and shows that a large area can be irradiated with high-intensity photons with good directionality generated in the undulator 21. dx is the amount of movement in the horizontal direction, dz is the amount of movement in the vertical direction, and H and W are the same as in FIG. 5.

Such electron wave characteristics are achieved not only by the storage ring using the triplet 7 as a focusing lens shown in FIG. Alternatively, if the storage ring is equipped with two quadruple-like electromagnets 23 and can store electrons, the electron wave characteristics can be adjusted according to the betatron oscillation specific to the storage ring by using the electron wave deflection means described above. have
It can be used as an electronic wave ring.

This point can also be said to be one of the major features of this invention.

Next, wave amplitude control of the electron beam will be explained with reference to the excitation current waveform diagram in FIG. 10.

In this figure, the horizontal axis is time t, the vertical axis is exciting current 0,
Time to-t for the variable vertical deflection electromagnet 22a and the variable horizontal deflection electromagnet 22b in FIG. 1! An arbitrarily variable excitation current of 0 is applied during this period.

In this case, the electron beam is displaced at a constant speed in the vertical and horizontal directions with maximum amplitude in dzam and dxc layers for to seconds, and after stopping for t1 seconds, it is moved again at a constant speed to t.
-d zc+s, -d at maximum amplitude during o seconds, respectively
The excitation current Io is controlled so as to displace at a constant speed up to x cm, stop for t1 seconds, and then return to the original position. By doing so, it is possible to irradiate the radiation light SR almost uniformly over a large area.

Next, the structure and operation of the undulator 21 which causes the wave electron beam to emit photons in the range from infrared rays to X-rays will be described with reference to FIGS. 11(a), (b), and (c).

FIG. 11(a) is a schematic diagram of the undulator 21,
31 is a small permanent magnet in which magnets of different polarity are alternately arranged one above the other. 32 is an electron beam, and input 0 is a period length.

The synchrotron radiation UR emitted from the undulator 21 has a high luminance of 1 when compared with the synchrotron radiation SR from a conventional storage ring.
It is synchrotron radiation with quasi-monochromaticity of 02 to 103 times. Synchrotron radiation S
As shown in FIG. 11(b), the directivity from R is only in the direction perpendicular to the electron orbital plane, and it is a diverging light source that diffuses in the tangential direction of the circular orbit on the orbital plane. However, as shown in FIG. 11(C), the emitted light UR from the undulator 21 is a emitted light with linear directivity in which electrons are emitted while meandering. Then, the relative brightness ratio between the radiation light UR and the radiation light SR is expressed as follows: 2N<[UR]/[SR]<4N2. N in the above formula is the number of cycles of the undulator 21. Here, the minimum value of the relative brightness ratio is equal to the number of antinodes of the meandering electron orbit, and the maximum value is the value when the interference effect of the synchrotron radiation occurs at the antinodes where the directions of the electron beams are aligned. In the case of a permanent magnet undulator 21 using SmCO5 or the like as a magnetic material, the period length λO is 3 to 4 cm.
If the period N at this time is 10, then the synchrotron radiation UR
400 times the brightness is obtained compared to the synchrotron radiation SR, and if the number of cycles N is 16, the synchrotron radiation UR is 1 times brighter than the synchrotron radiation SR.
000 times the brightness is obtained, and in this way the undulator 2
Electrons passing through 1 emit photons with high brightness in the range from infrared to X-rays. Note that the undulator 21 is installed at a straight line portion excluding the electron incidence part and the high frequency cavity due to the structure of the electron wave ring.

〔Effect of the invention〕

As explained above, the present invention has the following advantages: Firstly, the irradiation field of the synchrotron radiation from the storage ring is improved by undulating the electron beam using a variable vertical deflection electromagnet installed on the orbit of the electron storage ring. can be expanded. In addition, secondly, an individual horizontal
By using vertically deflecting electromagnets and undulators, it is possible to obtain a high-brightness light source with a wider irradiation field than conventional synchrotron radiation, and it is also possible to stably change the amplitude of the wave electron beam trajectory in the vertical and horizontal directions at arbitrary speeds. Since it can be used in lithography technology, etc., its industrial significance is extremely large.

[Brief explanation of the drawing]

FIG. 1 is a schematic configuration diagram showing an embodiment of the present invention, FIG. 2 is a diagram explaining the relationship between a variable vertical deflection electromagnet and an electron beam, FIG. 3(a) is a plan view of the deflection electromagnet, and FIG. Figure (b)
is a side view of the bending electromagnet, Figure 4 is a vertical wave characteristic diagram of the electron beam, and Figure 5 is a three-dimensional diagram of the electron beam waving up and down, and the irradiation field of the synchrotron radiation SR is expanded. Figure 6 is a horizontal wave characteristic diagram of the electron beam, and Figure 7 is a three-dimensional diagram of the electron beam moving vertically and horizontally, showing the directivity generated in the undulator. 8 and 9 are schematic configuration diagrams showing other embodiments of the present invention, FIG. 10 is an excitation current waveform diagram, and FIG. 11 (a
) is a schematic diagram of the undulator, FIG. 11(b) is a diagram explaining the directivity of the synchrotron radiation SR, and FIG. 11(C) is a diagram illustrating the directivity of the synchrotron radiation U.
FIG. 12 is a schematic diagram showing the configuration of a conventional electron storage ring, and FIG. 13 is a diagram explaining the radiation light SR from the electron storage ring. In the figure, 1a to 1h are bending electromagnets, 2 is an injection septum electromagnet, 3 is a Kitzker coil, 4 is a high frequency cavity, 5 and 6 are quadrupole electromagnets, 7 is a triplet, 11 is a designed electron orbit, 12 is an electron, 21 is an undulator, 22a is a variable vertical deflection magnet, 22b is a variable horizontal deflection electromagnet, and 31 is a small permanent magnet. Figure 12

Claims (4)

[Claims] (1) A predetermined number of bending electromagnets are placed at predetermined locations on the designed electron trajectory, and between these bending electromagnets, a high-frequency cavity and a predetermined number of multipole electromagnets that focus incident electrons in the horizontal and vertical directions are installed. an electron storage ring provided at a predetermined position on the electron orbit to accumulate the incident electrons; and a deflection ring that causes the electrons accumulated at any position on the electron orbit to perform wave motion in a vertical direction around the electron orbit. An electronic wave ring characterized by comprising means. (2) The electronic wave ring according to claim (1), wherein the deflection means arbitrarily changes the amplitude of the wave electrons. (3) A predetermined number of bending electromagnets are placed at predetermined locations on the designed electron trajectory, and between these bending electromagnets, a high-frequency cavity and a predetermined number of multipole electromagnets that focus incident electrons in the horizontal and vertical directions are installed. an electron storage ring provided at a predetermined position on the electron orbit to accumulate the incident electrons; and an electron storage ring that causes the electrons accumulated at any position on the electron orbit to move in vertical and horizontal directions around the electron orbit. a vertical deflection means and a horizontal deflection means; and further, each of the deflection means generates photons with high brightness in the range from infrared to An electronic wave ring characterized by comprising an undulator and an undulator. (4) Claim (3) characterized in that each deflection means arbitrarily changes the amplitude of the wave electrons.
Electron wave ring described in section.