JPS61193449A - 照明光学装置 - Google Patents

照明光学装置

Info

Publication number
JPS61193449A
JPS61193449A JP60033280A JP3328085A JPS61193449A JP S61193449 A JPS61193449 A JP S61193449A JP 60033280 A JP60033280 A JP 60033280A JP 3328085 A JP3328085 A JP 3328085A JP S61193449 A JPS61193449 A JP S61193449A
Authority
JP
Japan
Prior art keywords
alignment
beam splitter
light
excimer laser
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60033280A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0513371B2 (enrdf_load_stackoverflow
Inventor
Ichiro Kano
一郎 加納
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60033280A priority Critical patent/JPS61193449A/ja
Priority to US06/708,784 priority patent/US4667109A/en
Publication of JPS61193449A publication Critical patent/JPS61193449A/ja
Publication of JPH0513371B2 publication Critical patent/JPH0513371B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60033280A 1984-03-09 1985-02-21 照明光学装置 Granted JPS61193449A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60033280A JPS61193449A (ja) 1985-02-21 1985-02-21 照明光学装置
US06/708,784 US4667109A (en) 1984-03-09 1985-03-06 Alignment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60033280A JPS61193449A (ja) 1985-02-21 1985-02-21 照明光学装置

Publications (2)

Publication Number Publication Date
JPS61193449A true JPS61193449A (ja) 1986-08-27
JPH0513371B2 JPH0513371B2 (enrdf_load_stackoverflow) 1993-02-22

Family

ID=12382112

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60033280A Granted JPS61193449A (ja) 1984-03-09 1985-02-21 照明光学装置

Country Status (1)

Country Link
JP (1) JPS61193449A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63296339A (ja) * 1987-05-28 1988-12-02 Nikon Corp 位置合わせ方法及び装置
JPH05243122A (ja) * 1992-07-23 1993-09-21 Nec Corp 干渉露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63296339A (ja) * 1987-05-28 1988-12-02 Nikon Corp 位置合わせ方法及び装置
JPH05243122A (ja) * 1992-07-23 1993-09-21 Nec Corp 干渉露光装置

Also Published As

Publication number Publication date
JPH0513371B2 (enrdf_load_stackoverflow) 1993-02-22

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term