JPS61187247A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS61187247A
JPS61187247A JP60028060A JP2806085A JPS61187247A JP S61187247 A JPS61187247 A JP S61187247A JP 60028060 A JP60028060 A JP 60028060A JP 2806085 A JP2806085 A JP 2806085A JP S61187247 A JPS61187247 A JP S61187247A
Authority
JP
Japan
Prior art keywords
pellets
wafer
defective
wafer ring
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60028060A
Other languages
Japanese (ja)
Inventor
Goro Ikegami
五郎 池上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Original Assignee
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Semiconductor Manufacturing Co Ltd, Kansai Nippon Electric Co Ltd filed Critical Renesas Semiconductor Manufacturing Co Ltd
Priority to JP60028060A priority Critical patent/JPS61187247A/en
Publication of JPS61187247A publication Critical patent/JPS61187247A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67132Apparatus for placing on an insulating substrate, e.g. tape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding

Abstract

PURPOSE:To increase the yield in manufacturing the titled device, make it easy to discriminate whether products are defective and moreover make the automatic peeling process possible, by fixing all of the defective pellets whose external shape is not square and the pellets having high probability being defective in spite of having square shape on the adhesion sheet of the wafer with resin. CONSTITUTION:Pellets 7', 7',... on the peripheral part of the wafer ring 10 are coated with as fixing material, humidifying type vulcanized silicon rubber 17 as sealing resin. To peel-off the pellets 7, 7 by employing such a wafer ring 10, the wafer ring 10 is at first inverted, and placed on the solvent storing tank 19 which stores the solvent 18 to dissolve the adhesive agent. While applying pressure on the surface of the adhesive sheet whereon wafer is not in contact, that is, the upper surface thereof by using squeegee 20, the sheet travels and releases only the pellets 7, 7,... placed on the central part, which drop into the solvent 18. Accordingly, on the adhesion sheet 11 of the wafer ring 10, the defective pellets 7', 7',... whose external shape is not normal square remain.

Description

【発明の詳細な説明】 −の1 この発明は、半導体装置の製造方法に関し、詳しくは、
半導体素子が形成されたウェーハを、接着シートを利用
してペレットに細分割後、ペレットの良品と不良品とを
分離する方法に関するものである。
[Detailed Description of the Invention]-1 The present invention relates to a method for manufacturing a semiconductor device, and in detail,
The present invention relates to a method of dividing a wafer on which semiconductor elements are formed into pellets using an adhesive sheet, and then separating good and defective pellets.

従」Jl支術− 半導体装置の製造においては、ペレットを得るには、周
知の通り、熱拡散やイオン注入、エツチング処理等の工
程を経て、ウェーハに多数の素子を形成し、その素子を
ウェーハ状態のままで特性チェックし、その後細分割し
て個々のペレットとしている。この場合に、ペレットの
不良発生率は、ウェーハの外周部が圧倒的に高い。その
理由は、第6図を参照して説明するとウェーハ1の外周
縁は、ウェーハ1をスライスする以前の単結晶インゴッ
トを製作する際に、結晶欠陥が外周縁に集中すること、
及び、区画線2,2.・・・と3,3.・・・で区画さ
れる素子4,4.・・・中で外周縁部の4′は、区画不
良、つまり完全な方形とは限らず、必然的に素子パター
ン欠損を招いたりするからである。そして、特性チェッ
クの結果不良であった素子4′や4”には、不良マーキ
ングが施され、さらに、第7図に示すようにワックス5
にてガラス板等の基板6に貼り付けられた後、第8図の
ようにダイシングにより個々のペレット7.7.・・・
毎に完全カットしている。
In the production of semiconductor devices, in order to obtain pellets, as is well known, a large number of elements are formed on a wafer through processes such as thermal diffusion, ion implantation, and etching, and the elements are then transferred to the wafer. The properties of the pellets are checked in their original state, and then they are finely divided into individual pellets. In this case, the rate of defective pellets is overwhelmingly high at the outer periphery of the wafer. The reason for this is explained with reference to FIG. 6. The reason for this is that crystal defects are concentrated on the outer peripheral edge of the wafer 1 when a single crystal ingot is manufactured before slicing the wafer 1.
and lot line 2, 2. ...and 3,3. . . . Elements 4, 4 . . . . Among them, the outer peripheral edge portion 4' is not necessarily a perfect square and inevitably causes element pattern defects. Elements 4' and 4'' that were found to be defective as a result of the characteristic check are marked with defective markings, and are further marked with wax marks as shown in FIG.
After being pasted onto a substrate 6 such as a glass plate, the pellets 7.7. are diced into individual pellets 7.7. ...
Completely cut each time.

そしてダイシング後のウェーハ1を、基板に貼り付けた
まま、第9図の通り、ワックス5を溶融する溶剤8、例
えば、アビニシンワックスに対しては、トリクレン貯溜
槽9中に立掛・保持させて、ワックス5を溶かして、個
々のペレット7.7.7’。
Then, as shown in FIG. 9, the wafer 1 after dicing is placed and held in a trichlene storage tank 9 with a solvent 8 for melting the wax 5, for example, for avinisine wax, while the wafer 1 is still attached to the substrate. melt the wax 5 and separate the pellets 7.7.7'.

7′、・・・を基板から剥離させるとともに洗浄してい
る。
7', . . . are peeled off from the substrate and also cleaned.

ロ  (よ ′        o  JLところで、
基板6上のウェーハ1から、個々のペレッ)7,7.7
’、7′、・・・に剥離させるとき、溶剤8中には、良
品ペレット7.7.・・・と、不良品ペレット7Z71
.・・・が不都合なことに、混じり合ったままである。
ro (yo ′ o JL By the way,
Individual pellets from wafer 1 on substrate 6) 7,7.7
', 7', . . ., good pellets 7.7. ...and defective pellet 7Z71
.. ... remain mixed together, unfortunately.

したがって、ペレットの良否選別が必要となるが、ペレ
ッ)7,7,7°、7゛、・・・は微小であり、不良マ
ーキングの有無、完全な方形か否かを判別する作業は困
難であった。
Therefore, it is necessary to sort out whether the pellets are good or bad, but since the pellets (7, 7, 7°, 7゛, etc.) are minute, it is difficult to determine whether there are defective markings or whether they are perfectly square. there were.

この発明は、−に記問題解決のために提案されたもので
ある。
This invention was proposed to solve the problems mentioned in -.

r、   −た  の − − °  □この発明は、以−JLの縁線があり、次の手段
を採用してペレットの良否判別作業を改善するものであ
る。つまりこの発明は、多数の半導体素子が形成された
ウェーハを、可撓性接着ソートに接着し、スクライビン
グして接着シートを引伸ばすか、あるいは又、ウェーハ
を完全カントして、個々のペレットに細分割後、不良ペ
レット固着用の樹脂を、ウェーハ外周縁部に塗着させ、
」二記接着シートのウェーハ非接着の裏面より、押当冶
具等により押圧鳴しごきして、ウェーハ中央部のペレッ
トと外周縁部のペレットとを分離するものである。
r, -ta no - - ° □This invention has an edge line of -JL, and improves the work of determining the quality of pellets by adopting the following means. In other words, the present invention involves bonding a wafer on which a large number of semiconductor devices are formed to a flexible adhesive sort and stretching the adhesive sheet by scribing, or alternatively, completely canting the wafer to finely separate the wafer into individual pellets. After dividing, a resin for fixing defective pellets is applied to the outer edge of the wafer.
2) From the back side of the adhesive sheet to which the wafer is not bonded, the adhesive sheet is pressed and squeezed using a pressing jig or the like to separate the pellets in the center of the wafer from the pellets in the outer periphery.

すなわち、この発明は、確率的に不良となるウェーハ周
縁部のペレットは、−割して不良と見做して除去する方
式とするのである。
In other words, the present invention employs a method in which pellets at the periphery of the wafer that are probabilistically defective are divided into pieces, regarded as defective, and removed.

1批 この発明では、外形が方形でないすべての不良ペレット
及び、方形であっても特性不良となる確率が高いペレッ
トは、ウェーハの接着ソートに、樹脂にて固着されるの
で、押圧・しどきされて得られるペレットは、製作歩留
りが著しく増し、良否選別作業が容易となる。しかもこ
の発明では、樹脂にて接着シートに固着されたまま除去
されるペレットは、ウェーハ状態のままの配列で残すこ
とができるので、特性不良解析に役立てることが可能と
なる。
1. In this invention, all defective pellets whose outer shape is not rectangular, as well as pellets with a high probability of having defective characteristics even if they are rectangular, are fixed with resin to the wafer adhesive sort, so they are not pressed or squeezed. The pellets obtained by this process have a significantly increased manufacturing yield and are easier to sort out. Moreover, in this invention, the pellets that are removed while being fixed to the adhesive sheet with resin can be left in the same arrangement as the wafer, which can be useful for analyzing characteristic defects.

災1バ 第1図は、この発明の一実施例を説明するためのペレッ
トウェーハ剥離作業工程におけるペレ。
Figure 1 shows pellets in a pellet wafer peeling process for explaining one embodiment of the present invention.

ト剥離装置の略断面視概念図である。ます、IOは、ウ
ェーハ1を貼り付けした接着シート11を固着したウェ
ーハリングで、次の工程を経て、ペレット7.7.7’
、7’、・・・とじたものである。すなわち、はじめに
第2図のように、可視性、例えば上面に接着剤層を設け
たポリ塩化ビニル製の接着シーH1を用意し、ウェーハ
1を貼り付固定し、従来通りに1スクライブ溝+2.1
2.・・・及び+3.13.・・・を形成してペレット
区画を設けたウェーハ貼付体14を作る。つぎにその接
着シーH1の外端縁11”を、第3図のように、両端開
口筒杖体15の」1端に掛けて、弾力性があるリング状
体16で弛めつけながら、第4図の状態まで引き下げる
。すると、接着シート11が放射状に引き伸ばされるこ
とになり、ウェーハ1は、ペレット7.7.7’、7’
、・・・にブレーキングされる。
FIG. 2 is a schematic cross-sectional conceptual diagram of a peeling device. First, the IO is a wafer ring to which the adhesive sheet 11 to which the wafer 1 is attached is fixed, and through the following process, pellets 7.7.7'
, 7', ... are bound. That is, first, as shown in FIG. 2, a visible adhesive sheet H1 made of polyvinyl chloride with an adhesive layer provided on its upper surface is prepared, a wafer 1 is pasted and fixed, and 1 scribe groove + 2. 1
2. ...and +3.13. . . . to produce a wafer attachment body 14 provided with pellet sections. Next, as shown in FIG. 3, the outer edge 11'' of the adhesive sheath H1 is hung on one end of the cane body 15 which is open at both ends, and while being loosened with the elastic ring-shaped body 16, Lower it to the state shown in Figure 4. Then, the adhesive sheet 11 is stretched radially, and the wafer 1 is formed into pellets 7.7.7', 7'.
The brakes are applied to...

このようにして得られたウェーハリング10は、第5図
に示す通り、その外周縁のペレット7“、7′、・・・
に、固着用樹脂として、例えば加湿加硫型シリコンゴム
17を塗着させる。
As shown in FIG. 5, the wafer ring 10 thus obtained has pellets 7'', 7', . . . on its outer periphery.
For example, a humidified vulcanized silicone rubber 17 is applied as a fixing resin.

さて、以」乙のようにして得られたウェーハリング10
を用いてペレット7.7を剥離するには、第1図のよう
に、ますウェーハリング10を反転させて、接着剤を溶
解する溶剤18を溜めた溶剤貯溜槽19上に載置する。
Now, 10 wafer rings obtained as in
To peel off the pellets 7.7 using the wafer ring 10, as shown in FIG. 1, the wafer ring 10 is inverted and placed on a solvent reservoir 19 containing a solvent 18 for dissolving the adhesive.

それから接着シーN+のウェーハ非接着面、つまり上面
を、スキージ20で押圧させたままで移動させて扱くこ
とにより、中央部のペレット7.7.・・・のみを剥離
し、溶剤18中に落下させるのである。したがって、ウ
ェーハリング10の接着シーN+には、樹脂I7に固着
され正規の方形になっていない不良ペレット7”、7′
、・・・が残される。
Then, by moving and handling the wafer non-adhesive surface, that is, the upper surface, of the adhesive sheet N+ while keeping it pressed with the squeegee 20, the central pellet 7.7. ... is peeled off and dropped into the solvent 18. Therefore, the adhesive sheet N+ of the wafer ring 10 contains defective pellets 7", 7' which are fixed to the resin I7 and are not in a regular square shape.
,... are left behind.

尚、つづいて行われる特性良否選別工程以降は、従来通
りであるので、説明を省く。
Incidentally, the subsequent step of character quality selection and subsequent steps are the same as before, and therefore will not be described.

以」二の実施例ては、ウェーハはスクライビングして接
着シート引伸ばし後ペレットに分割した場合を示したが
、この発明は、この場合に限らす、都合によっては、接
着シート上でウェーハを完全カットするようにしてもよ
い。
In the second embodiment, the wafer is divided into pellets after being scribed and stretched on the adhesive sheet, but the present invention is limited to this case. It may also be cut.

発訓塚と祢呆− この発明によれば、不良品となることが自明なペレット
は、ウェーハリングに残し、除去されるので、製作歩留
りが向上するとともに、ペレット良否選別作業を容易と
し、さらに自動剥離作業も可能とする。さらにこの発明
では、製造中に、不良ペレットか固着されているウェー
ハリングをサンプル抽出することができ、不良解析に役
立ち、よって信頼性向」二にも貢献させることができる
According to this invention, pellets that are obviously defective are left on the wafer ring and removed, which improves the manufacturing yield and makes it easier to sort out the quality of the pellets. Automatic peeling work is also possible. Further, in the present invention, a wafer ring to which a defective pellet is stuck can be sampled during manufacturing, which is useful for failure analysis, and thus contributes to reliability.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、この発明の一実施例を説明するためのペレ7
)剥離装置の略断面視概念図、第2図はそのウェーハ貼
付体の斜視図、第3図及び第4図は、ウェーハリングの
断面図、第5図は、樹脂塗着済ウェーハリングの斜視図
である。第6図は、一般的な半導体ウェーハの平面図、
第7図及び第8図は、従来のウェーハ貼付体の断面図、
第9図は接着を溶解する溶剤貯溜槽の断面図である。 ■・・・ウェーハ、 4・・・素子、 7.7′・・・ペレット、 IO・・・ウェーハリング、 11・・・接着シート、 17・・・樹脂、 20・・・スキージ。 第 3 図  矢−ハリ>7”(−7しN〉7゛躬)第
 4Fl!1   ヤ上−へす> 7”(プレーキン7
オ支)第 5 図 朴掃塗風済ブ癖ハl)>7”2  
  ・ ゛  ・    4・ 4′ /” ゛  2 4パ 第6図 ■
FIG. 1 shows a Pelle 7 for explaining one embodiment of the present invention.
) Schematic cross-sectional conceptual diagram of the peeling device, Figure 2 is a perspective view of the wafer-attached body, Figures 3 and 4 are cross-sectional views of the wafer ring, and Figure 5 is a perspective view of the resin-coated wafer ring. It is a diagram. FIG. 6 is a plan view of a general semiconductor wafer,
FIG. 7 and FIG. 8 are cross-sectional views of a conventional wafer-attached body;
FIG. 9 is a cross-sectional view of the solvent reservoir for dissolving the adhesive. ■...Wafer, 4...Element, 7.7'...Pellet, IO...Wafer ring, 11...Adhesive sheet, 17...Resin, 20...Squeegee. Fig. 3 Arrow - tension >7" (-7 and N >7") 4th Fl!
Fig. 5 Pak-san-painted wind-finishing habit ha l)>7”2
・ ゛ ・ 4・ 4′ /” ゛ 2 4p Figure 6■

Claims (1)

【特許請求の範囲】[Claims]  多数の半導体素子が形成されたウェーハを、可撓性接
着シートに接着し、スクライビングして接着シートを引
伸ばすか/ウェーハを完全カットして、個々のペレット
に細分割後、不良ペレット固着用の樹脂を、ウェーハ外
周縁部に塗着させ、上記接着シートのウェーハ非接着の
裏面より、押当治具等により押圧・しごきして、ウェー
ハ中央部のペレットと外周縁部のペレットとを分離する
ことを特徴とする半導体装置の製造方法。
A wafer on which a large number of semiconductor devices have been formed is adhered to a flexible adhesive sheet, and the adhesive sheet is stretched by scribing.The wafer is completely cut and divided into individual pellets, and then a The resin is applied to the outer peripheral edge of the wafer, and the pellets at the center of the wafer and the pellets at the outer peripheral edge are separated by pressing and squeezing with a pressing jig or the like from the back side of the adhesive sheet where the wafer is not bonded. A method for manufacturing a semiconductor device, characterized in that:
JP60028060A 1985-02-14 1985-02-14 Manufacture of semiconductor device Pending JPS61187247A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60028060A JPS61187247A (en) 1985-02-14 1985-02-14 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60028060A JPS61187247A (en) 1985-02-14 1985-02-14 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS61187247A true JPS61187247A (en) 1986-08-20

Family

ID=12238216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60028060A Pending JPS61187247A (en) 1985-02-14 1985-02-14 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS61187247A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63178333U (en) * 1987-05-09 1988-11-18
JPH03286553A (en) * 1990-04-03 1991-12-17 Furukawa Electric Co Ltd:The Dicing method
US5725728A (en) * 1995-09-18 1998-03-10 Kabushiki Kaisha Shinkawa Pellet pick-up device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63178333U (en) * 1987-05-09 1988-11-18
JPH03286553A (en) * 1990-04-03 1991-12-17 Furukawa Electric Co Ltd:The Dicing method
US5725728A (en) * 1995-09-18 1998-03-10 Kabushiki Kaisha Shinkawa Pellet pick-up device

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