JPS61185806A - Conductive resin paste - Google Patents

Conductive resin paste

Info

Publication number
JPS61185806A
JPS61185806A JP2488185A JP2488185A JPS61185806A JP S61185806 A JPS61185806 A JP S61185806A JP 2488185 A JP2488185 A JP 2488185A JP 2488185 A JP2488185 A JP 2488185A JP S61185806 A JPS61185806 A JP S61185806A
Authority
JP
Japan
Prior art keywords
powder
conductive resin
resin paste
metal
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2488185A
Other languages
Japanese (ja)
Inventor
龍 前田
城山 魁助
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP2488185A priority Critical patent/JPS61185806A/en
Publication of JPS61185806A publication Critical patent/JPS61185806A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は印刷配線や電子部品用の電極形成等に使用する
導電性レジンペーストに関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a conductive resin paste used for printed wiring, electrode formation for electronic components, and the like.

〔従来の技術〕[Conventional technology]

!子回路を印刷法によシ簡便に形成するとか或は電子部
品を半田などの金属鑞付けに替えて行う目的で高導電性
レジンペーストが広く用いられるようになって来ている
! Highly conductive resin pastes have come into widespread use for the purpose of easily forming subcircuits by printing or for the purpose of replacing electronic parts with metal brazing such as soldering.

この導電性レジンペーストは熱硬化性樹脂に銀、カー?
ン、銅などの金属微粉末を混練したものが使用されてい
る。しかし銀粉末を用いた銀ペーストは導電性と、その
安定性に優れているが、価格が高く且つ変動が大きいこ
と及び多層集積化の際銀マイグレーシヨンによシ回路短
絡現象をおこすという欠点があった。
This conductive resin paste is made of thermosetting resin with silver and carbon.
A mixture of fine powders of metals such as carbon and copper is used. However, although silver paste using silver powder has excellent conductivity and stability, it has the drawbacks of high price and large fluctuations, and short circuit phenomenon due to silver migration during multilayer integration. there were.

一方カー?ンペーストは低価格であるが、導電性に劣る
ため限られた用途にしか使用することが出来ないもので
あった。
Car on the other hand? Although the paste was inexpensive, it had poor conductivity and could only be used for limited purposes.

これに対し銅ペーストはマイグレーションの心配も少な
く低価格であるため近年その開発が進んでいるが、銅粉
の酸化のため導電性やハンダ付性において劣るという問
題があった。
On the other hand, copper paste has been developed in recent years because it is less susceptible to migration and is inexpensive, but it has had the problem of poor conductivity and solderability due to oxidation of the copper powder.

又ガラスピースや銅粉に銀メッキを施した粉末を用いた
ペーストも提案されているが、前者のものけメッキが剥
離したシ、ハンダ付は性に劣シ、後者のものは銅粉がフ
レーク或は樹枝状であるため比表面積が大きく多量のメ
ッキ液を必要とすると共に粉末の分散性が悪く均一なメ
ッキ膜をうろことが出来ない等の問題があった。
Pastes using silver-plated glass pieces or copper powder have also been proposed, but the former's Mononoke plating peels off and the soldering is poor, while the latter's copper powder flakes. Alternatively, since it is dendritic, it has a large specific surface area and requires a large amount of plating solution, and has problems such as poor dispersibility of the powder and inability to spread over a uniform plating film.

なおこれらの4−スト用銀、銅粉末はその形状がフレー
ク状或は樹枝状に限定されているためイーストとしての
印刷性、接着性、熱伝導性等に劣るものであった。
These 4-stroke silver and copper powders are limited in shape to flakes or dendritic forms, and are therefore inferior in printability, adhesion, thermal conductivity, etc. as yeast.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

本発明はかかる現状に鑑みこれを改善せんとして鋭意研
究を行った結果、品質、信頼性と経済性とに優れた高導
電性レジンペーストを開発し得たものである。
The present invention has been made in view of the current situation and as a result of extensive research aimed at improving this, we have developed a highly conductive resin paste that is excellent in quality, reliability, and economic efficiency.

〔問題点を解決するための手段〕 本発明は熱硬化性樹脂に導電性附与材を配合されてなる
導電性レジンペーストにおいて上記導電性附与材として
見掛密度2.01//lyn”以上で、0、5〜20μ
の平均粒径を有する粒状金属粉末、例えば銅、銅合金、
ニッケル、ニッケル合金、鉄、鉄合金等の金属粉末に、
該金属と異なる金属例えば金、白金、ツクラジウム、銀
、錫、ハンダの内少くとも1種をその表面にメッキした
粒状金属粉末を用いたことを特徴とするものである。
[Means for Solving the Problems] The present invention provides a conductive resin paste in which a conductive additive is blended with a thermosetting resin, and the conductive additive has an apparent density of 2.01//lyn". Above, 0,5~20μ
Granular metal powders, such as copper, copper alloys, with an average particle size of
For metal powders such as nickel, nickel alloys, iron, and iron alloys,
The present invention is characterized in that it uses granular metal powder whose surface is plated with at least one metal different from the metal, such as gold, platinum, tsucladium, silver, tin, and solder.

本発明において被メツキ粒状金属粉末を上記の如き金属
を選定した理由は、これらの金属が何れも安価にして導
電性に優れ且つ化学メッキを容易に行うことが出来るた
めである。又該金属粉末としては球状微粉末或は球に近
い長球状粉末またはこれらを混合したものであシ、その
平均粒径を0.5〜20μ好ましくは1〜10μに限定
しているものであるが、その理由は、平均粒径が0.5
μ未満の場合には被メツキ金属の表面酸化が顕著となシ
均一なメッキ皮膜を形成することが困難になると共にメ
ッキに際し多量のメッキ液を必要とする。又20μを越
した場合にはペースト塗布時にスクリーンの目づまシな
どが原因して印刷性を阻害するためである。
The reason why the above metals are selected as the granular metal powder to be plated in the present invention is that these metals are inexpensive, have excellent conductivity, and can be easily subjected to chemical plating. The metal powder may be a fine spherical powder, a long spherical powder close to a sphere, or a mixture thereof, and the average particle size is limited to 0.5 to 20μ, preferably 1 to 10μ. However, the reason is that the average particle size is 0.5
If it is less than .mu., the surface of the metal to be plated will be significantly oxidized, making it difficult to form a uniform plating film and requiring a large amount of plating solution during plating. If the thickness exceeds 20 μm, the screen may become clogged during paste application, which may impede printability.

又見掛密度を21/ 7cm3以上のものに限定した理
由については211/(7)3未満の場合には粉末のメ
ッキ特性、ペーストの印刷性、基板との密着性、硬化塗
膜の熱伝導性に劣るためである。
The reason for limiting the apparent density to 21/7cm3 or more is that if it is less than 211/(7)3, the plating properties of the powder, the printability of the paste, the adhesion to the substrate, and the thermal conductivity of the cured coating film. This is because they are inferior in sex.

なお核金属粉末は、その表面がなるべく平滑にして且つ
酸化されないものが好ましい。
The nuclear metal powder preferably has a surface as smooth as possible and is not oxidized.

又導電性附与材において上記の被メツキ粒状金属粉末に
メッキを施す金属としては上記の如く金、白金、パラジ
ウム、銀、錫、又はハンダの金属を選定したが、その理
由は、該金属として金、白金、パラジウムの場合にはマ
イグレーションや被メツキ金属粉末の酸化に起因する問
題がほとんどないため、水晶振動子や半導体シリコン素
子の導電接着等の高信頼性が要求される分野に使用され
る。又銀の場合には銀マイグレーションの心配はあるが
ペースト自体のコストが安く導電性に優れ且つ表面のみ
が銀にて被覆されているため、ハンダ付けに際し表面の
銀のみがハンダ食われによシ皺少するのみにて被メツキ
金属は僅んど変化しない。従って良好なハンダ付は性と
ハンダ耐熱性を示すものである。
As the conductive material, gold, platinum, palladium, silver, tin, or solder was selected as the metal to be plated on the granular metal powder to be plated. In the case of gold, platinum, and palladium, there are almost no problems caused by migration or oxidation of the metal powder to be plated, so they are used in fields that require high reliability, such as conductive bonding of crystal resonators and semiconductor silicon devices. . In the case of silver, there is a concern about silver migration, but since the paste itself is cheap and has excellent conductivity, and only the surface is coated with silver, only the silver on the surface is protected from being eaten away by the solder during soldering. The metal to be plated does not change at all, only the wrinkles are reduced. Therefore, good soldering indicates good soldering properties and soldering heat resistance.

又ハンダ或はスズメッキの場合にはマイグレーションの
竜険性もなく且つ安定であると共にハンダの組成を変え
ることにより100〜300℃の塗膜の硬化条件下で粉
末の焼結化が進むため極めて良好にして安定な導体回路
を形成することが出来る。特にスズメッキを施したもの
は優れた半田付性を示す・ なおこのメッキは通常の化学メッキにより容易に行うこ
とが出来、メッキによる被着量は被メツキ金属粉末の粒
度にもよるが、被メツキ金属粉末重量の1〜20 wt
%が好ましい。
In addition, in the case of solder or tin plating, there is no risk of migration and it is stable, and by changing the composition of the solder, sintering of the powder progresses under the curing conditions of the coating film at 100 to 300°C, so it is extremely good. It is possible to form a stable conductor circuit by using In particular, tin-plated products exhibit excellent solderability. This plating can be easily done by ordinary chemical plating, and the amount of plating applied depends on the particle size of the metal powder to be plated, but 1-20 wt of metal powder weight
% is preferred.

本発明において導電性附与材が配合される熱硬化性樹脂
は300℃以下の高温雰囲気において安定した硬化塗膜
を形成し、150〜300℃の溶融ハンダ中にて10秒
間程度の耐熱性を有し且つ紙、フェノール、ガラスエポ
キシ、セラミックス及び金属基板と十分に密着するもの
であれば何れのものでもよく、例えばフェノール樹脂、
エポキシ樹脂、ポリイミド樹脂、ポリアミドイミド樹脂
等の熱硬化性樹脂又はこれらの樹脂の混合物などが挙げ
られる。
In the present invention, the thermosetting resin to which the conductive additive is blended forms a stable cured coating in a high temperature atmosphere of 300°C or less, and has heat resistance for about 10 seconds in molten solder at 150 to 300°C. Any material may be used as long as it has the same properties and adheres sufficiently to paper, phenol, glass epoxy, ceramics, and metal substrates, such as phenol resin,
Examples include thermosetting resins such as epoxy resins, polyimide resins, and polyamideimide resins, and mixtures of these resins.

なお熱硬化性樹脂の配合量は導電性附与材に対し5〜2
5wt%の範囲が望ましく、この両者を3本ロールミル
等にて十分に混練してうるものである。
The blending amount of the thermosetting resin is 5 to 2 with respect to the conductive material.
The content is preferably in the range of 5 wt%, and can be obtained by thoroughly kneading the two in a three-roll mill or the like.

〔作 用〕[For production]

本発明は導電性附与材が球状金属粉表面を化学メッキし
たものであることを第1の特徴とするものでア夛、この
球状金属粉は同一粒度分布を有するフレーク或は樹枝状
粉末と比較した場合、比表面積が小さく等量のメッキ液
に対し最も厚いメッキ皮膜を形成することが出来る。ま
た球状金属粉は分散性に優れているためメッキ中に溶液
を攪拌するだけで均一な皮膜を作ることができる。
The first feature of the present invention is that the conductive material is formed by chemically plating the surface of spherical metal powder, and this spherical metal powder is different from flakes or dendritic powder having the same particle size distribution. When compared, it has a small specific surface area and can form the thickest plating film for the same amount of plating solution. Furthermore, since spherical metal powder has excellent dispersibility, a uniform film can be created by simply stirring the solution during plating.

この導電性附与材を熱硬化性樹脂に混練した導電性ペー
ストは印刷時においてスクリーンの目づまシがなく良好
な印刷性を示すと同時に基板との密着性においてもフレ
ーク状粉を含有するペーストに比べ樹脂と基板との接着
面積が大きくなるため密着強度が向上する。
A conductive paste made by kneading this conductive additive material into a thermosetting resin exhibits good printability without clogging the screen during printing, and also has good adhesion to the substrate as a paste containing flaky powder. Since the bonding area between the resin and the substrate is larger than that in the conventional method, the adhesion strength is improved.

また本発明導電性レジンペースト中に含有する導電性附
与材の量は球状粉によるため硬化塗膜の熱伝導性に優れ
半導体素子の接着に好適である。なお半導体素子は発熱
するためその接着には熱伝導性の良い導電性接着剤が必
要とされる。
Furthermore, since the amount of the conductive additive contained in the conductive resin paste of the present invention is based on spherical powder, the cured coating film has excellent thermal conductivity and is suitable for bonding semiconductor elements. Note that since semiconductor elements generate heat, a conductive adhesive with good thermal conductivity is required for bonding them.

次に本発明の実施例について説明する。Next, examples of the present invention will be described.

実施例(1)〜(6) 第1表に示す金属及び合金各1kgを加熱溶解せしめ溶
湯アトマイズ法によシ微粉化し、これを分級機によシ分
級して平均粒径6〜8μ、見掛密度3.6〜4.0 I
 /lvn”の球状金属粉末をえた。
Examples (1) to (6) 1 kg of each of the metals and alloys shown in Table 1 was heated and melted and pulverized by the molten metal atomization method. Hanging density 3.6-4.0 I
/lvn'' spherical metal powder was obtained.

これらの金属粉末100.Fを銀メツキ液中(高純度化
学研究所[8−900)に浸漬し、40℃に加熱した状
態にて液及び粉末を攪拌して8〜10wt%メッキされ
たメッキ金属粉末をえた。
These metal powders 100. F was immersed in a silver plating solution (Kojundo Kagaku Kenkyujo [8-900)], heated to 40°C, and the solution and powder were stirred to obtain a plated metal powder coated with 8 to 10 wt%.

この粉末85重量部とレゾール型フェノール樹脂15重
量部とを混練して本発明導電性レジンペーストをえた。
85 parts by weight of this powder and 15 parts by weight of resol type phenolic resin were kneaded to obtain a conductive resin paste of the present invention.

実施例(7)〜(11) 純銅の溶湯をアトマイズし平均粒径8.1μ、見掛密度
4.2 、!i’ /an”の銅粉末を作製し、これを
金メッキ液(高純度化学研究所fiK−24)、白金メ
ッキ液(高純度化学研究新製Pt−5)、パラジウムメ
ッキ液(高純度化学研究新製Pd−5)、スズメッキ液
(高純度化学研究新製GLS−500B)、ハンダメッ
キ液(高純度化学研究所[5P−64El)などの中に
浸漬し、実施例(1)と同様にして夫々メッキ金属粉末
をえた。
Examples (7) to (11) Pure copper molten metal was atomized to have an average particle size of 8.1μ and an apparent density of 4.2! i'/an'' copper powder was prepared, and this was applied to gold plating solution (Kojundo Kagaku Kenkyujo fiK-24), platinum plating solution (Kojundo Kagaku Kenkyu Shinsei Pt-5), and palladium plating solution (Kojundo Kagaku Kenkyu Shinsei Pt-5). Pd-5, a new product), tin plating solution (GLS-500B, a new product of Kojundo Kagaku Kenkyu), solder plating solution (Kojundo Kagaku Kenkyujo [5P-64El), etc., and the same procedure as in Example (1) was carried out. and obtained plating metal powder.

次にこれらのメッキ金属粉末85重量部とレゾール型フ
ェノール樹脂15重量部とを混練して本発明導電性レジ
ンペーストをえた。
Next, 85 parts by weight of these plated metal powders and 15 parts by weight of resol type phenolic resin were kneaded to obtain a conductive resin paste of the present invention.

比較例(1)〜(4) 第1表に示す粒径及び見掛密度からなるフレーク状銀粉
、フレーク状銅粉、フレーク状銀メツキ銅粉、及び樹枝
状電解銅粉を夫々80wt*にレゾール型フェノール樹
脂20wt%を温体して比較例導電性レジンペーストを
えた0なお鋼イーストの場合には0.5 wt ’4の
有機酸を添加し九〇 斯くしてえた本発明品及び比較例品についてその性能を
試みるために200メツクエのスクリーンによりIm巾
、200sll長さのジグザクtJ?ターンを印刷し、
160℃、30分間加熱硬化せしめて厚さ30μの回路
を作製し、ジグデクノ譬ターンの回路体積抵抗率、印刷
性、密着強度、ハンダ特性ハンダ耐熱性、熱伝導率を夫
々測定した。その結果は第1表に併記した通シである。
Comparative Examples (1) to (4) Flake-like silver powder, flake-like copper powder, flake-like silver-plated copper powder, and dendritic electrolytic copper powder having particle sizes and apparent densities shown in Table 1 were each resol-formed to 80 wt*. A comparative example conductive resin paste was obtained by heating 20 wt % of type phenolic resin. In the case of steel yeast, 0.5 wt '4 of organic acid was added and the product of the present invention and comparative example were obtained in this manner. In order to test the performance of the product, a zigzag TJ? Im width and 200 sll length was used with a 200 mesh screen. print the turn,
A circuit with a thickness of 30 μm was prepared by heat curing at 160° C. for 30 minutes, and the circuit volume resistivity, printability, adhesion strength, solder properties, solder heat resistance, and thermal conductivity of the JigDekno pattern were measured. The results are summarized in Table 1.

表中の印刷性は同一回路にて連続500回行い回路抵抗
のバラツキから評価し回路抵抗の平均値の±30チ以内
にすべて入るものを0.±80チ以内にすべて入るもの
をΔ、その他のものを×とした。
The printability in the table is evaluated from the variation in circuit resistance by running the same circuit 500 times in a row, and 0. All values falling within ±80 degrees were marked Δ, and all others were marked ×.

又基板との密着性は3■φの銅線を加熱硬化した塗膜上
だハンダ付けし、引張試験器にて両者を引きけがし、塗
膜が基板から剥離する時点での強度を評価した。
Adhesion to the substrate was evaluated by soldering a 3 mm diameter copper wire onto the heat-cured coating film, pulling both together using a tensile tester, and evaluating the strength at the time the coating peeled off from the substrate.

またハンダ付は性は、回路を印刷した基板を口・シン系
フラックス液中に2秒間浸漬した後、Pb−63%Sn
からなる230℃溶融ハンダ中に2秒間浸漬しこれを取
出し印刷面積に対する半田濡れ面積を測定した。
In addition, for soldering, after immersing the board on which the circuit is printed for 2 seconds in a thin flux solution, the Pb-63%Sn
The sample was immersed in molten solder at 230° C. for 2 seconds, taken out, and the solder wetting area relative to the printed area was measured.

又ハンダ耐熱性は同回路を10秒間上記と同様の試験を
行ない回路抵抗の変化を測定した。
To determine the solder heat resistance, the same circuit was subjected to the same test as above for 10 seconds and the change in circuit resistance was measured.

なおハンダ付性及びハンダ耐熱性1cおいて、○は良好
、Δは稍良、×は不良を示すものである。
In the solderability and solder heat resistance 1c, ◯ indicates good, ∆ indicates fair, and × indicates poor.

上表より明らかな如く本発明による導電性レジンペース
トは優れた特性を有することが認められた。
As is clear from the above table, the conductive resin paste according to the present invention was found to have excellent properties.

〔効 果〕〔effect〕

本発明導電性レジンペーストは基板との密着性、ハンダ
特性等において優れていると共に安価な金属をペースと
するため極めて経済的である。従って電子部品の導電性
イーストとして極めて有用であり、工業的価値において
極めて大きいものである。
The conductive resin paste of the present invention has excellent adhesion to a substrate, soldering properties, etc., and is extremely economical because it uses an inexpensive metal as the paste. Therefore, it is extremely useful as a conductive yeast for electronic parts, and has extremely large industrial value.

出願人代理人  弁理士 鈴 江 武 彦手続補正書 41  年61.庁、11 特許庁長官  宇 賀 道 部 殿 1、事件の表示 特願昭60−24881号 2、発明の名称 導電性レジンペースト 3、補正をする者 事件との関係  特許出願人 (529)  古河域気工業株式会社 4、代理人 5、自発補正 6、捕市の対象              1.:、
−7、補正の内容 (1)明細書第12頁第1表において「熱伝導率」の欄
の数値を下記の如く訂正する。
Applicant's agent Patent attorney Takehiko Suzue Procedural amendment 41 Year 61. Office, 11 Commissioner of the Patent Office Michibe Uga1, Indication of the case, Patent Application No. 1988-248812, Name of the invention Conductive resin paste3, Person making the amendment Relationship to the case Patent applicant (529) Koga area Ki Kogyo Co., Ltd. 4, agent 5, voluntary amendment 6, subject to arrest 1. :,
-7. Contents of amendment (1) In Table 1, page 12 of the specification, the numerical value in the "Thermal conductivity" column is corrected as follows.

Record

Claims (3)

【特許請求の範囲】[Claims] (1)熱硬化性樹脂に導電性附与材を配合されてなる導
電性レジンペーストにおいて、上記導電性附与材が見掛
密度2.0g/cm^3以上で、0.5〜20μの平均
粒径を有する粒状金属粉末に、該金属と異なる金属をそ
の表面にメッキした粒状金属粉末からなることを特徴と
する導電性レジンペースト
(1) In a conductive resin paste made by blending a conductive additive into a thermosetting resin, the conductive additive has an apparent density of 2.0 g/cm^3 or more and a thickness of 0.5 to 20μ. A conductive resin paste characterized by being made of a granular metal powder having an average particle size and plated with a metal different from the metal on the surface of the granular metal powder.
(2)粒状金属粉末が銅、銅合金、ニッケル、ニッケル
合金、鉄、鉄合金の内何れか1種の金属からなることを
特徴とする特許請求の範囲第1項記載の導電性レジンペ
ースト
(2) The conductive resin paste according to claim 1, wherein the granular metal powder is made of any one of copper, copper alloy, nickel, nickel alloy, iron, and iron alloy.
(3)メッキ金属が金、白金、パラジウム、銀、錫、ハ
ンダの内何れか1種の金属からなることを特徴とする特
許請求の範囲第1項記載の導電性レジンペースト
(3) The conductive resin paste according to claim 1, wherein the plating metal is made of any one of gold, platinum, palladium, silver, tin, and solder.
JP2488185A 1985-02-12 1985-02-12 Conductive resin paste Pending JPS61185806A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2488185A JPS61185806A (en) 1985-02-12 1985-02-12 Conductive resin paste

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2488185A JPS61185806A (en) 1985-02-12 1985-02-12 Conductive resin paste

Publications (1)

Publication Number Publication Date
JPS61185806A true JPS61185806A (en) 1986-08-19

Family

ID=12150531

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2488185A Pending JPS61185806A (en) 1985-02-12 1985-02-12 Conductive resin paste

Country Status (1)

Country Link
JP (1) JPS61185806A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04101304A (en) * 1990-08-20 1992-04-02 Matsushita Electric Ind Co Ltd Electroconductive material
JPH0541113A (en) * 1990-11-13 1993-02-19 Nissei Plastics Ind Co Conductive compounding material and manufacture thereof
JPH07138549A (en) * 1993-11-15 1995-05-30 Tatsuta Electric Wire & Cable Co Ltd Conductive adhesive
JPH08217955A (en) * 1995-02-17 1996-08-27 Matsushita Electric Ind Co Ltd Conductive composition
JPH11302504A (en) * 1998-04-21 1999-11-02 Tatsuta Electric Wire & Cable Co Ltd Paste for filling hole
JP2005317351A (en) * 2004-04-28 2005-11-10 Alps Electric Co Ltd Conductive paste
JP2010244944A (en) * 2009-04-08 2010-10-28 Toyota Motor Corp Conductive paste material and semiconductor device using the same
JP2011201958A (en) * 2010-03-24 2011-10-13 Taiyo Holdings Co Ltd Electroconductive resin composition and electronic circuit board

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04101304A (en) * 1990-08-20 1992-04-02 Matsushita Electric Ind Co Ltd Electroconductive material
JPH0541113A (en) * 1990-11-13 1993-02-19 Nissei Plastics Ind Co Conductive compounding material and manufacture thereof
JPH07138549A (en) * 1993-11-15 1995-05-30 Tatsuta Electric Wire & Cable Co Ltd Conductive adhesive
JPH08217955A (en) * 1995-02-17 1996-08-27 Matsushita Electric Ind Co Ltd Conductive composition
JPH11302504A (en) * 1998-04-21 1999-11-02 Tatsuta Electric Wire & Cable Co Ltd Paste for filling hole
JP2005317351A (en) * 2004-04-28 2005-11-10 Alps Electric Co Ltd Conductive paste
JP2010244944A (en) * 2009-04-08 2010-10-28 Toyota Motor Corp Conductive paste material and semiconductor device using the same
JP2011201958A (en) * 2010-03-24 2011-10-13 Taiyo Holdings Co Ltd Electroconductive resin composition and electronic circuit board

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