JPS61182238A - Inspection device for residue of organic compound of resist or the like - Google Patents

Abstract

PURPOSE:To attempt automation and labor saving in inspection by irradiating ultraviolet rays on a substrate after removal of a resist, detecting fluorescence emitted from a residue of an organic compound on the substrate and discriminating the residue of the organic compound on the substrate. CONSTITUTION:Ultraviolet rays 3 exclusive of visible rays are irradiated on a substrate 4 to be inspected from a light source 1 through a filter 2. When a residue 5 of an organic compound of a resist and the like is made to adhere to the substrate 4, the residue 5 absorbs the ultraviolet rays 3 and emits fluorescence of visible rays. This fluorescence 6 is received by a light receiver 7 provided over the substrate 4. The light receiver 7 converts the received fluorescence into an electrical signal, which is sent to a signal processing unit 8. The processing unit 8 processes the signal sent from the light receiver 7 and discriminates the presence or absence of the residue of the organic compound of the resist and the like. This allows automation and labor saving in inspection as well as presence or absence of the residue of the organic compound to be discriminated correctly and quickly.

Description

Detailed Description of the Invention (Industrial Application Field) The present invention relates to a resist or other organic compound residue inspection device that inspects resist or other organic compound residue on a substrate during a photolithography process when manufacturing a semiconductor device. .

(Prior Art) In a photolithography process when manufacturing a semiconductor device, upon completion of etching, unnecessary organic compounds such as resist are removed from the substrate. However, if organic compounds such as resist remain on the substrate without being completely removed, there will be problems such as adverse effects on the semiconductor device.

Therefore, it is necessary to inspect whether organic compound residues such as resist are attached to the substrate, and conventionally, this inspection has been performed by observing with an optical microscope.

(Problems to be Solved by the Invention) The above-mentioned conventional inspection method is performed by the eyes of two people, so it has poor work efficiency, is prone to oversights, and is also an obstacle to automation of the entire production line.

(Means for solving problems) The present invention provides an apparatus for inspecting organic compound residues such as resist.

an ultraviolet irradiation means for irradiating ultraviolet rays onto the substrate after the resist has been removed; and detecting fluorescence emitted by organic compound residues such as the resist upon receiving the ultraviolet rays irradiated from the ultraviolet irradiation means;
The apparatus is equipped with a discrimination means for discriminating organic compound residues such as resist on the substrate.

(Function) Organic compounds such as resists have the property of absorbing ultraviolet rays and emitting fluorescence when irradiated with ultraviolet rays. Therefore, when ultraviolet rays are irradiated onto the substrate after the resist has been removed using an ultraviolet irradiation means, If the residue of an organic compound such as a resist adheres to the substrate, the residue emits fluorescence when exposed to ultraviolet rays. The discrimination means detects the fluorescent light and discriminates organic compound residues such as resist on the substrate.

(Example) The configuration of the present invention will be described with reference to the drawings.

FIG. 1 shows an outline of an apparatus for inspecting organic compound residues such as resists according to the present invention. In FIG. 2, reference numeral 1 indicates a light source that emits ultraviolet rays, such as a mercury lamp. The substrate 4 to be inspected is irradiated with light.

Here, if a residue 5 of an organic compound such as a resist adheres to the substrate 4, the residue 5 absorbs the ultraviolet ray 3 and emits visible fluorescence 6. and.

This fluorescent light 6 is received by a light receiver 7 provided diagonally above the substrate 4.

The photoreceiver 7 converts the received fluorescent light 6 into an electrical signal and sends it to the signal processing section 8. The signal processing unit 8 processes the signal from the light receiver 7 and determines whether there is a residue of an organic compound such as a resist.

Since the wavelength of the fluorescent light emitted differs depending on the type of organic compound, as shown in FIG.
The type of residue 5 attached thereto may be determined.

(Effect of the invention) The present invention provides an apparatus for inspecting organic compound residues such as resist.

It is possible to accurately and quickly determine whether or not organic compound residues such as resist are attached to the substrate, and it is also possible to automate the inspection and save labor, and furthermore, to automate the entire manufacturing line.

[Brief explanation of the drawing]

FIG. 1 is a schematic configuration diagram showing an embodiment of an organic compound residue inspection apparatus such as a resist according to the present invention, and FIG. 2 is a schematic configuration diagram showing another embodiment. 1...Light source, 2...Filter, 3...Ultraviolet light 4.
... Substrate, 5... Organic compound residue such as resist 6...
Fluorescence, 7... Light receiver, 8... Signal processing section 9...
・Filter and 1 other person Figure 7

Claims (1)

[Scope of Claims] 1) Ultraviolet irradiation means for irradiating ultraviolet rays onto the substrate after resist removal, and detection of fluorescence emitted by organic compound residues such as resist on the substrate upon receiving the ultraviolet rays irradiated from the ultraviolet irradiation means. and a determination means for determining organic compound residue such as resist on a substrate.