JPS61179535A - パターン形成方法 - Google Patents

パターン形成方法

Info

Publication number
JPS61179535A
JPS61179535A JP60015949A JP1594985A JPS61179535A JP S61179535 A JPS61179535 A JP S61179535A JP 60015949 A JP60015949 A JP 60015949A JP 1594985 A JP1594985 A JP 1594985A JP S61179535 A JPS61179535 A JP S61179535A
Authority
JP
Japan
Prior art keywords
organic film
water
photosensitive resin
pattern
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60015949A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0416106B2 (enrdf_load_stackoverflow
Inventor
Masaru Sasako
勝 笹子
Masataka Endo
政孝 遠藤
Kenichi Takeyama
竹山　健一
Noboru Nomura
登 野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP60015949A priority Critical patent/JPS61179535A/ja
Publication of JPS61179535A publication Critical patent/JPS61179535A/ja
Publication of JPH0416106B2 publication Critical patent/JPH0416106B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP60015949A 1985-01-30 1985-01-30 パターン形成方法 Granted JPS61179535A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60015949A JPS61179535A (ja) 1985-01-30 1985-01-30 パターン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60015949A JPS61179535A (ja) 1985-01-30 1985-01-30 パターン形成方法

Publications (2)

Publication Number Publication Date
JPS61179535A true JPS61179535A (ja) 1986-08-12
JPH0416106B2 JPH0416106B2 (enrdf_load_stackoverflow) 1992-03-23

Family

ID=11903007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60015949A Granted JPS61179535A (ja) 1985-01-30 1985-01-30 パターン形成方法

Country Status (1)

Country Link
JP (1) JPS61179535A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62133444A (ja) * 1985-12-04 1987-06-16 Matsushita Electric Ind Co Ltd パタ−ン形成有機材料
EP0639450A4 (en) * 1993-03-01 1995-12-27 Affinity Co Ltd AUTONOMOUS REACTION LAMINATE, METHOD FOR PRODUCING THE SAME, AND WINDOW COMPRISING THE SAME.

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60238829A (ja) * 1984-05-14 1985-11-27 Toshiba Corp パタ−ン形成方法
JPS6184644A (ja) * 1984-09-04 1986-04-30 マイクロサイ，インコーポレイテッド 写真製版方法及びバリヤ−層を含む組合せ

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60238829A (ja) * 1984-05-14 1985-11-27 Toshiba Corp パタ−ン形成方法
JPS6184644A (ja) * 1984-09-04 1986-04-30 マイクロサイ，インコーポレイテッド 写真製版方法及びバリヤ−層を含む組合せ

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62133444A (ja) * 1985-12-04 1987-06-16 Matsushita Electric Ind Co Ltd パタ−ン形成有機材料
EP0639450A4 (en) * 1993-03-01 1995-12-27 Affinity Co Ltd AUTONOMOUS REACTION LAMINATE, METHOD FOR PRODUCING THE SAME, AND WINDOW COMPRISING THE SAME.
US5615040A (en) * 1993-03-01 1997-03-25 Affinity Co., Ltd. Self-responding laminated bodies, their production process and windows using the same

Also Published As

Publication number Publication date
JPH0416106B2 (enrdf_load_stackoverflow) 1992-03-23

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term