JPS61179535A - パターン形成方法 - Google Patents
パターン形成方法Info
- Publication number
- JPS61179535A JPS61179535A JP60015949A JP1594985A JPS61179535A JP S61179535 A JPS61179535 A JP S61179535A JP 60015949 A JP60015949 A JP 60015949A JP 1594985 A JP1594985 A JP 1594985A JP S61179535 A JPS61179535 A JP S61179535A
- Authority
- JP
- Japan
- Prior art keywords
- organic film
- water
- photosensitive resin
- pattern
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 41
- 229920005989 resin Polymers 0.000 claims abstract description 36
- 239000011347 resin Substances 0.000 claims abstract description 36
- 238000004061 bleaching Methods 0.000 claims abstract description 29
- 230000000694 effects Effects 0.000 claims abstract description 12
- 230000005855 radiation Effects 0.000 claims abstract description 10
- 238000005562 fading Methods 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 10
- 238000002845 discoloration Methods 0.000 claims description 7
- 230000008569 process Effects 0.000 abstract description 15
- 239000007864 aqueous solution Substances 0.000 abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 7
- 229920001218 Pullulan Polymers 0.000 abstract description 6
- 239000004373 Pullulan Substances 0.000 abstract description 6
- 235000019423 pullulan Nutrition 0.000 abstract description 6
- 150000008049 diazo compounds Chemical class 0.000 abstract description 5
- 239000008367 deionised water Substances 0.000 abstract description 3
- 229910021641 deionized water Inorganic materials 0.000 abstract description 3
- 150000004676 glycans Chemical class 0.000 abstract description 3
- 239000007788 liquid Substances 0.000 abstract description 3
- 229920001282 polysaccharide Polymers 0.000 abstract description 3
- 239000005017 polysaccharide Substances 0.000 abstract description 3
- 239000002244 precipitate Substances 0.000 abstract description 2
- 238000002844 melting Methods 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 230000007261 regionalization Effects 0.000 description 8
- 230000009467 reduction Effects 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- 230000009471 action Effects 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 6
- 238000011161 development Methods 0.000 description 5
- 230000018109 developmental process Effects 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 238000004090 dissolution Methods 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- YPKJPFXVPWGYJL-UHFFFAOYSA-N naphthalene-1,4-dione;sulfuryl dichloride;diazide Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].ClS(Cl)(=O)=O.C1=CC=C2C(=O)C=CC(=O)C2=C1 YPKJPFXVPWGYJL-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 2
- 229920003169 water-soluble polymer Polymers 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 101100506034 Fibrobacter succinogenes (strain ATCC 19169 / S85) cel-3 gene Proteins 0.000 description 1
- 240000002329 Inga feuillei Species 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229920005601 base polymer Polymers 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000007844 bleaching agent Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60015949A JPS61179535A (ja) | 1985-01-30 | 1985-01-30 | パターン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60015949A JPS61179535A (ja) | 1985-01-30 | 1985-01-30 | パターン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61179535A true JPS61179535A (ja) | 1986-08-12 |
| JPH0416106B2 JPH0416106B2 (enrdf_load_stackoverflow) | 1992-03-23 |
Family
ID=11903007
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60015949A Granted JPS61179535A (ja) | 1985-01-30 | 1985-01-30 | パターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61179535A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62133444A (ja) * | 1985-12-04 | 1987-06-16 | Matsushita Electric Ind Co Ltd | パタ−ン形成有機材料 |
| EP0639450A4 (en) * | 1993-03-01 | 1995-12-27 | Affinity Co Ltd | AUTONOMOUS REACTION LAMINATE, METHOD FOR PRODUCING THE SAME, AND WINDOW COMPRISING THE SAME. |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60238829A (ja) * | 1984-05-14 | 1985-11-27 | Toshiba Corp | パタ−ン形成方法 |
| JPS6184644A (ja) * | 1984-09-04 | 1986-04-30 | マイクロサイ，インコーポレイテッド | 写真製版方法及びバリヤ−層を含む組合せ |
-
1985
- 1985-01-30 JP JP60015949A patent/JPS61179535A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60238829A (ja) * | 1984-05-14 | 1985-11-27 | Toshiba Corp | パタ−ン形成方法 |
| JPS6184644A (ja) * | 1984-09-04 | 1986-04-30 | マイクロサイ，インコーポレイテッド | 写真製版方法及びバリヤ−層を含む組合せ |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62133444A (ja) * | 1985-12-04 | 1987-06-16 | Matsushita Electric Ind Co Ltd | パタ−ン形成有機材料 |
| EP0639450A4 (en) * | 1993-03-01 | 1995-12-27 | Affinity Co Ltd | AUTONOMOUS REACTION LAMINATE, METHOD FOR PRODUCING THE SAME, AND WINDOW COMPRISING THE SAME. |
| US5615040A (en) * | 1993-03-01 | 1997-03-25 | Affinity Co., Ltd. | Self-responding laminated bodies, their production process and windows using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0416106B2 (enrdf_load_stackoverflow) | 1992-03-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |