JPS61179440A - パターン形成方法 - Google Patents

パターン形成方法

Info

Publication number
JPS61179440A
JPS61179440A JP61041246A JP4124686A JPS61179440A JP S61179440 A JPS61179440 A JP S61179440A JP 61041246 A JP61041246 A JP 61041246A JP 4124686 A JP4124686 A JP 4124686A JP S61179440 A JPS61179440 A JP S61179440A
Authority
JP
Japan
Prior art keywords
resist
pattern
light
film
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61041246A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0245325B2 (cs
Inventor
Masaru Sasako
勝 笹子
Masataka Endo
政孝 遠藤
Kenichi Takeyama
竹山　健一
Noboru Nomura
登 野村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP61041246A priority Critical patent/JPS61179440A/ja
Publication of JPS61179440A publication Critical patent/JPS61179440A/ja
Publication of JPH0245325B2 publication Critical patent/JPH0245325B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61041246A 1986-02-26 1986-02-26 パターン形成方法 Granted JPS61179440A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61041246A JPS61179440A (ja) 1986-02-26 1986-02-26 パターン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61041246A JPS61179440A (ja) 1986-02-26 1986-02-26 パターン形成方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP59078868A Division JPS60223121A (ja) 1984-04-19 1984-04-19 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS61179440A true JPS61179440A (ja) 1986-08-12
JPH0245325B2 JPH0245325B2 (cs) 1990-10-09

Family

ID=12603080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61041246A Granted JPS61179440A (ja) 1986-02-26 1986-02-26 パターン形成方法

Country Status (1)

Country Link
JP (1) JPS61179440A (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0335238A (ja) * 1989-06-30 1991-02-15 Matsushita Electric Ind Co Ltd マスクパターン検証方法
JP2009105218A (ja) * 2007-10-23 2009-05-14 Toshiba Corp パターン形成方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5955019A (ja) * 1982-09-24 1984-03-29 Oki Electric Ind Co Ltd 微細パタ−ン形成方法
JPS59168637A (ja) * 1983-03-15 1984-09-22 Nec Corp 微細パタ−ンの形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5955019A (ja) * 1982-09-24 1984-03-29 Oki Electric Ind Co Ltd 微細パタ−ン形成方法
JPS59168637A (ja) * 1983-03-15 1984-09-22 Nec Corp 微細パタ−ンの形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0335238A (ja) * 1989-06-30 1991-02-15 Matsushita Electric Ind Co Ltd マスクパターン検証方法
JP2009105218A (ja) * 2007-10-23 2009-05-14 Toshiba Corp パターン形成方法

Also Published As

Publication number Publication date
JPH0245325B2 (cs) 1990-10-09

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