JPS61173496A - プラズマx線発生装置 - Google Patents

プラズマx線発生装置

Info

Publication number
JPS61173496A
JPS61173496A JP60012510A JP1251085A JPS61173496A JP S61173496 A JPS61173496 A JP S61173496A JP 60012510 A JP60012510 A JP 60012510A JP 1251085 A JP1251085 A JP 1251085A JP S61173496 A JPS61173496 A JP S61173496A
Authority
JP
Japan
Prior art keywords
plasma
short circuit
electrode
discharge
discharge switch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60012510A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0250600B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Ikuo Okada
岡田 育夫
Yasunao Saito
斉藤 保直
Hideo Yoshihara
秀雄 吉原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP60012510A priority Critical patent/JPS61173496A/ja
Publication of JPS61173496A publication Critical patent/JPS61173496A/ja
Publication of JPH0250600B2 publication Critical patent/JPH0250600B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001Production of X-ray radiation generated from plasma
    • H05G2/003Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001Production of X-ray radiation generated from plasma
    • H05G2/007Production of X-ray radiation generated from plasma involving electric or magnetic fields in the process of plasma generation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60012510A 1985-01-28 1985-01-28 プラズマx線発生装置 Granted JPS61173496A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60012510A JPS61173496A (ja) 1985-01-28 1985-01-28 プラズマx線発生装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60012510A JPS61173496A (ja) 1985-01-28 1985-01-28 プラズマx線発生装置

Publications (2)

Publication Number Publication Date
JPS61173496A true JPS61173496A (ja) 1986-08-05
JPH0250600B2 JPH0250600B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-11-02

Family

ID=11807339

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60012510A Granted JPS61173496A (ja) 1985-01-28 1985-01-28 プラズマx線発生装置

Country Status (1)

Country Link
JP (1) JPS61173496A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6240163B1 (en) 1998-06-19 2001-05-29 Advanced Laser & Fusion Technology Radiation E.G. X-ray pulse generator mechanisms
WO2006059275A2 (en) 2004-12-04 2006-06-08 Philips Intellectual Property & Standards Gmbh Method and apparatus for operating an electrical discharge device
WO2006120942A1 (ja) * 2005-05-06 2006-11-16 Tokyo Institute Of Technology プラズマ発生装置及びプラズマ発生方法
WO2007066239A3 (en) * 2005-10-18 2007-11-22 Alft Inc Soft x-ray generator
US8617072B2 (en) 2004-05-28 2013-12-31 Koninklijke Philips N.V. System for the noninvasive determination of tracer concentration in blood
JP2016031796A (ja) * 2014-07-28 2016-03-07 株式会社Ihi プラズマ光源システム

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6240163B1 (en) 1998-06-19 2001-05-29 Advanced Laser & Fusion Technology Radiation E.G. X-ray pulse generator mechanisms
US8617072B2 (en) 2004-05-28 2013-12-31 Koninklijke Philips N.V. System for the noninvasive determination of tracer concentration in blood
US20090173896A1 (en) * 2004-12-04 2009-07-09 Koninklijke Philips Electronics, N.V. Method and apparatus for operating an electricl discharge device
WO2006059275A2 (en) 2004-12-04 2006-06-08 Philips Intellectual Property & Standards Gmbh Method and apparatus for operating an electrical discharge device
WO2006059275A3 (en) * 2004-12-04 2006-08-31 Philips Intellectual Property Method and apparatus for operating an electrical discharge device
JP2008522379A (ja) * 2004-12-04 2008-06-26 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 電気放電装置を動作させる方法及び機器
US8227777B2 (en) * 2004-12-04 2012-07-24 Koninklijke Philips Electronics N.V. Method and apparatus for operating an electrical discharge device
WO2006120942A1 (ja) * 2005-05-06 2006-11-16 Tokyo Institute Of Technology プラズマ発生装置及びプラズマ発生方法
JP5114711B2 (ja) * 2005-05-06 2013-01-09 国立大学法人東京工業大学 プラズマ発生装置及びプラズマ発生方法
JP2009512173A (ja) * 2005-10-18 2009-03-19 アルフト インコーポレイテッド 軟x線発生器
US7502446B2 (en) 2005-10-18 2009-03-10 Alft Inc. Soft x-ray generator
WO2007066239A3 (en) * 2005-10-18 2007-11-22 Alft Inc Soft x-ray generator
JP2016031796A (ja) * 2014-07-28 2016-03-07 株式会社Ihi プラズマ光源システム

Also Published As

Publication number Publication date
JPH0250600B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-11-02

Similar Documents

Publication Publication Date Title
Prager et al. A high voltage nanosecond pulser with variable pulse width and pulse repetition frequency control for nonequilibrium plasma applications
US4473875A (en) Inductive storage pulse circuit device
JPS61173496A (ja) プラズマx線発生装置
Gilmour et al. The interruption of vacuum arcs at high DC voltages
RU2111607C1 (ru) Генератор импульсов высокого напряжения (варианты)
EP0379991B1 (en) Power supply circuit arrangement and method for supplying power to pulsed lasers
Gundersen et al. Nanosecond pulse generator using a fast recovery diode
Rim et al. Fast high-voltage pulse generation using nonlinear capacitors
US4912738A (en) Magnetically energized pulser
Lyubutin et al. Subnanosecond high-density current interruption in SOS diodes
Sack Marx-generator design and development for biomass electroporation
Kuthi et al. Nanosecond pulse generator using a fast recovery diode
US5048068A (en) Magnetically operated pulser
JP2996706B2 (ja) パルスレーザ発振装置
JP2647501B2 (ja) パルス発生装置
SU1561116A1 (ru) Устройство дл бездугового размыкани цепей посто нного тока
JP2532597B2 (ja) プラズマx線発生装置
Ibuka et al. SI-thyristor as a high power switching device for fast high voltage pulse generators
CN1635703A (zh) 大功率微波功率放大器高压脉冲电源
SU610271A1 (ru) Высоковольтный управл юмый источник напр жени ,преимущественно дл электропневматических и электрогидравлических преобразователей
RU1824655C (ru) Способ управлени импульсными газоразр дными приборами низкого давлени
CN116979935A (zh) 一种紧凑型强电流脉冲驱动源
JPH0316414A (ja) パルス発生回路
SU308599A1 (ru) УСТРОЙСТВО дл ПИТАНИЯ ИНДУКТИВНОСТИ ИМПУЛЬСАМИ ТОКА
JP2001327177A (ja) 電圧昇圧回路及びこれを用いたパルスパワー回路

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term