JPS61173496A - プラズマx線発生装置 - Google Patents
プラズマx線発生装置Info
- Publication number
- JPS61173496A JPS61173496A JP60012510A JP1251085A JPS61173496A JP S61173496 A JPS61173496 A JP S61173496A JP 60012510 A JP60012510 A JP 60012510A JP 1251085 A JP1251085 A JP 1251085A JP S61173496 A JPS61173496 A JP S61173496A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- short circuit
- electrode
- discharge
- discharge switch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/007—Production of X-ray radiation generated from plasma involving electric or magnetic fields in the process of plasma generation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60012510A JPS61173496A (ja) | 1985-01-28 | 1985-01-28 | プラズマx線発生装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60012510A JPS61173496A (ja) | 1985-01-28 | 1985-01-28 | プラズマx線発生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61173496A true JPS61173496A (ja) | 1986-08-05 |
JPH0250600B2 JPH0250600B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-11-02 |
Family
ID=11807339
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60012510A Granted JPS61173496A (ja) | 1985-01-28 | 1985-01-28 | プラズマx線発生装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61173496A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6240163B1 (en) | 1998-06-19 | 2001-05-29 | Advanced Laser & Fusion Technology | Radiation E.G. X-ray pulse generator mechanisms |
WO2006059275A2 (en) | 2004-12-04 | 2006-06-08 | Philips Intellectual Property & Standards Gmbh | Method and apparatus for operating an electrical discharge device |
WO2006120942A1 (ja) * | 2005-05-06 | 2006-11-16 | Tokyo Institute Of Technology | プラズマ発生装置及びプラズマ発生方法 |
WO2007066239A3 (en) * | 2005-10-18 | 2007-11-22 | Alft Inc | Soft x-ray generator |
US8617072B2 (en) | 2004-05-28 | 2013-12-31 | Koninklijke Philips N.V. | System for the noninvasive determination of tracer concentration in blood |
JP2016031796A (ja) * | 2014-07-28 | 2016-03-07 | 株式会社Ihi | プラズマ光源システム |
-
1985
- 1985-01-28 JP JP60012510A patent/JPS61173496A/ja active Granted
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6240163B1 (en) | 1998-06-19 | 2001-05-29 | Advanced Laser & Fusion Technology | Radiation E.G. X-ray pulse generator mechanisms |
US8617072B2 (en) | 2004-05-28 | 2013-12-31 | Koninklijke Philips N.V. | System for the noninvasive determination of tracer concentration in blood |
US20090173896A1 (en) * | 2004-12-04 | 2009-07-09 | Koninklijke Philips Electronics, N.V. | Method and apparatus for operating an electricl discharge device |
WO2006059275A2 (en) | 2004-12-04 | 2006-06-08 | Philips Intellectual Property & Standards Gmbh | Method and apparatus for operating an electrical discharge device |
WO2006059275A3 (en) * | 2004-12-04 | 2006-08-31 | Philips Intellectual Property | Method and apparatus for operating an electrical discharge device |
JP2008522379A (ja) * | 2004-12-04 | 2008-06-26 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 電気放電装置を動作させる方法及び機器 |
US8227777B2 (en) * | 2004-12-04 | 2012-07-24 | Koninklijke Philips Electronics N.V. | Method and apparatus for operating an electrical discharge device |
WO2006120942A1 (ja) * | 2005-05-06 | 2006-11-16 | Tokyo Institute Of Technology | プラズマ発生装置及びプラズマ発生方法 |
JP5114711B2 (ja) * | 2005-05-06 | 2013-01-09 | 国立大学法人東京工業大学 | プラズマ発生装置及びプラズマ発生方法 |
JP2009512173A (ja) * | 2005-10-18 | 2009-03-19 | アルフト インコーポレイテッド | 軟x線発生器 |
US7502446B2 (en) | 2005-10-18 | 2009-03-10 | Alft Inc. | Soft x-ray generator |
WO2007066239A3 (en) * | 2005-10-18 | 2007-11-22 | Alft Inc | Soft x-ray generator |
JP2016031796A (ja) * | 2014-07-28 | 2016-03-07 | 株式会社Ihi | プラズマ光源システム |
Also Published As
Publication number | Publication date |
---|---|
JPH0250600B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-11-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |