JPS61167652U - - Google Patents
Info
- Publication number
- JPS61167652U JPS61167652U JP1985050919U JP5091985U JPS61167652U JP S61167652 U JPS61167652 U JP S61167652U JP 1985050919 U JP1985050919 U JP 1985050919U JP 5091985 U JP5091985 U JP 5091985U JP S61167652 U JPS61167652 U JP S61167652U
- Authority
- JP
- Japan
- Prior art keywords
- adhesive layer
- protection device
- support frame
- ventilation means
- photomask protection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012790 adhesive layer Substances 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 2
- 238000009423 ventilation Methods 0.000 claims 3
- 239000010410 layer Substances 0.000 claims 2
- 239000000853 adhesive Substances 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 claims 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Description
第１図は本考案のフオトマスク保護装置の一実
施例を示す斜視図、第２図は本考案のフオトマス
ク保護装置の別の実施例を示す斜視図、第３図は
従来のフオトマスク保護装置の一例を示す断面図
、第４図はその斜視図である。
１，１１……支持枠、２，１２……保護膜、３
，１３……接着層、４，１４……フオトマスク、
５……ガラス基板、６……薄膜パターン、１５…
…不連続部分、１６……微小多孔性シート。
Fig. 1 is a perspective view showing one embodiment of the photomask protection device of the present invention, Fig. 2 is a perspective view showing another embodiment of the photomask protection device of the invention, and Fig. 3 is an example of a conventional photomask protection device. FIG. 4 is a perspective view thereof. 1, 11... Support frame, 2, 12... Protective film, 3
, 13... adhesive layer, 4, 14... photomask,
5...Glass substrate, 6...Thin film pattern, 15...
...Discontinuous portion, 16...Microporous sheet.
Claims (1)
枠の上端部で接着され、且つ上部開口部を覆う透
明薄膜と、支持層と粘着剤からなり支持枠の下部
に設けられた接着層とから構成されるフオトマス
ク保護装置において、該接着層に通気手段を設け
たことを特徴とするフオトマスク保護装置。 ２ 接着層の通気手段が、不連続部分を設けるこ
とである実用新案登録請求の範囲第１項記載のフ
オトマスク保護装置。 ３ 接着層の通気手段が、支持層の一部を通気性
多孔質とすることである実用新案登録請求の範囲
第１項記載のフオトマスク保護装置。[Claims for Utility Model Registration] 1. A support frame consisting of a support frame with open upper and lower parts, a transparent thin film adhered to the upper end of the support frame and covering the upper opening, a support layer and an adhesive. What is claimed is: 1. A photomask protection device comprising an adhesive layer provided at the bottom thereof, characterized in that the adhesive layer is provided with ventilation means. 2. The photomask protection device according to claim 1, wherein the ventilation means of the adhesive layer is to provide a discontinuous portion. 3. The photomask protection device according to claim 1, wherein the ventilation means for the adhesive layer is to make a part of the support layer porous.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985050919U JPH0123137Y2 (en) | 1985-04-05 | 1985-04-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985050919U JPH0123137Y2 (en) | 1985-04-05 | 1985-04-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61167652U true JPS61167652U (en) | 1986-10-17 |
| JPH0123137Y2 JPH0123137Y2 (en) | 1989-07-17 |
Family
ID=30569500
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985050919U Expired JPH0123137Y2 (en) | 1985-04-05 | 1985-04-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0123137Y2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998002783A1 (en) * | 1996-07-17 | 1998-01-22 | Mitsui Chemicals, Inc. | Mask protecting device |
| JP2001005169A (en) * | 1999-06-24 | 2001-01-12 | Shin Etsu Chem Co Ltd | Pellicle and production of pellicle |
| JP2006184817A (en) * | 2004-12-28 | 2006-07-13 | Fujitsu Ltd | Pellicle and transfer substrate |
| JP2020181212A (en) * | 2014-11-17 | 2020-11-05 | エーエスエムエル ネザーランズ ビー．ブイ． | Mask assembly |
-
1985
- 1985-04-05 JP JP1985050919U patent/JPH0123137Y2/ja not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998002783A1 (en) * | 1996-07-17 | 1998-01-22 | Mitsui Chemicals, Inc. | Mask protecting device |
| JP2001005169A (en) * | 1999-06-24 | 2001-01-12 | Shin Etsu Chem Co Ltd | Pellicle and production of pellicle |
| JP2006184817A (en) * | 2004-12-28 | 2006-07-13 | Fujitsu Ltd | Pellicle and transfer substrate |
| JP2020181212A (en) * | 2014-11-17 | 2020-11-05 | エーエスエムエル ネザーランズ ビー．ブイ． | Mask assembly |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0123137Y2 (en) | 1989-07-17 |