JPS6116263U - polishing equipment - Google Patents

polishing equipment

Info

Publication number
JPS6116263U
JPS6116263U JP1984099057U JP9905784U JPS6116263U JP S6116263 U JPS6116263 U JP S6116263U JP 1984099057 U JP1984099057 U JP 1984099057U JP 9905784 U JP9905784 U JP 9905784U JP S6116263 U JPS6116263 U JP S6116263U
Authority
JP
Japan
Prior art keywords
polishing
disk
polished
polishing equipment
holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1984099057U
Other languages
Japanese (ja)
Inventor
浩三 谷口
Original Assignee
富士通株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士通株式会社 filed Critical 富士通株式会社
Priority to JP1984099057U priority Critical patent/JPS6116263U/en
Publication of JPS6116263U publication Critical patent/JPS6116263U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図aおよびbは本考案の一実施例を示す平面図と側
断面図、第2図aおよびbは従来の研磨装置を説明する
ための平面図並びに側断面図である。 図中、1は円盤、2は軸、3は被研磨物、4は研磨剤、
5はノズル、6はリング、7は固定アーム、.8はロー
ラ、9はアーム固定ネジ、10は研磨部材、11は支持
円盤、12は貫通孔、13は限定された研磨コース、1
4は拡大された研磨コース、をそれぞれ示す。
1A and 1B are a plan view and a sectional side view showing an embodiment of the present invention, and FIGS. 2A and 2B are a plan view and a sectional side view illustrating a conventional polishing apparatus. In the figure, 1 is a disk, 2 is a shaft, 3 is an object to be polished, 4 is an abrasive,
5 is a nozzle, 6 is a ring, 7 is a fixed arm, . 8 is a roller, 9 is an arm fixing screw, 10 is a polishing member, 11 is a support disk, 12 is a through hole, 13 is a limited polishing course, 1
4 indicates an enlarged polishing course.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 回動する円盤に被研磨物を当接し、研磨剤によって研磨
を行う研磨装置であって、前記回動する円盤上に所定位
置で自転運動を行うリングを設置し、さらに陪リング中
で前記回動円盤面に接して自転する支持円盤を付設し、
該支持円盤の中心部を除いiコ部分に複数の貫通孔を設
け、該貫通孔中に前記被研磨物を取着した研磨部材を回
転自在に挿入して研磨を行うよう構成されてなることを
特徴とする研磨装置。
A polishing device that brings the object to be polished into contact with a rotating disk and performs polishing using an abrasive agent. A supporting disk that rotates in contact with the moving disk surface is attached,
A plurality of through holes are provided in the I part of the support disk except for the center part, and the polishing member having the object to be polished is rotatably inserted into the through holes to perform polishing. A polishing device featuring:
JP1984099057U 1984-06-29 1984-06-29 polishing equipment Pending JPS6116263U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1984099057U JPS6116263U (en) 1984-06-29 1984-06-29 polishing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1984099057U JPS6116263U (en) 1984-06-29 1984-06-29 polishing equipment

Publications (1)

Publication Number Publication Date
JPS6116263U true JPS6116263U (en) 1986-01-30

Family

ID=30658573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1984099057U Pending JPS6116263U (en) 1984-06-29 1984-06-29 polishing equipment

Country Status (1)

Country Link
JP (1) JPS6116263U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100339412B1 (en) * 1999-07-05 2002-05-31 박종섭 device for grinding of semiconductor wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100339412B1 (en) * 1999-07-05 2002-05-31 박종섭 device for grinding of semiconductor wafer

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