JPS61158335A - Amorphous silicon electrophotographic sensitive body - Google Patents

Amorphous silicon electrophotographic sensitive body

Info

Publication number
JPS61158335A
JPS61158335A JP27565884A JP27565884A JPS61158335A JP S61158335 A JPS61158335 A JP S61158335A JP 27565884 A JP27565884 A JP 27565884A JP 27565884 A JP27565884 A JP 27565884A JP S61158335 A JPS61158335 A JP S61158335A
Authority
JP
Japan
Prior art keywords
layer
amorphous silicon
gas
vessel
photoreceptor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27565884A
Other languages
Japanese (ja)
Inventor
Hiroshi Osame
浩史 納
Kohei Kiyota
航平 清田
Makoto Araki
荒木 信
Yuji Uehara
裕二 上原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP27565884A priority Critical patent/JPS61158335A/en
Publication of JPS61158335A publication Critical patent/JPS61158335A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08214Silicon-based
    • G03G5/08278Depositing methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE:To obtain the sensitive body having a high reliability without giving any injury for a continuous duty during long periods by forming a fluoro- amorphous silicon layer on a surface protective layer of the amorphous silicon sensitive layer in the amorphous silicon electrophotographic sensitive body which provides said layer on the conductive substrate. CONSTITUTION:A glow discharge is induced by impressing a high frequency voltage between the electrode 16 and the drum 12 using a high frequency electric source 17. At the same time, a valve 32 of a vacuum is opened, and a gas for forming a charge holding layer is fed to a vessel 13 so as to reach 0.5torr degree of vacuum in the vessel. The fed gas makes in a plasma state by discharging, thereby adhering a decomposed product of said gas on the drum 12 to form the charge holding layer 41 on the substrate 12. Then the valves 19, 20 are closed, and then an Si2H6 gas is fed to the vessel 13 to form the amorphous silicon sensitive body layer 42 on said layer 41. Then, the valves 23, 24 are closed, and the valves 27, 28 are opened to feed an SiF4 gas to the vessel 13, thereby forming in the vessel 13 a surface protective layer 43 which has an alpha-Si:F structure and terminates an Si atom with an F atom.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は導電性支持体上に形成したアモルファスシリコ
ン層の表面を保護する表面保護層の改良に関するもので
ある。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to improvement of a surface protective layer that protects the surface of an amorphous silicon layer formed on a conductive support.

光導電層を周囲に形成した記録ドラムの前記光導電層を
一様に帯電させ、前記光導電層に対して印字情報に基づ
いてレーザ光を選択的に照射してこの光導電層の帯電電
位を選択的に低下させて潜像を形成後、この潜像形成箇
所に帯電トナーを付着させて現像し、この現像した印字
画像を記録紙に転写記録するレーザプリンタの如き電子
写真装置は周知である。
The photoconductive layer of a recording drum having a photoconductive layer formed around it is uniformly charged, and the photoconductive layer is selectively irradiated with laser light based on printed information to change the charged potential of the photoconductive layer. Electrophotographic devices such as laser printers are well known, which selectively lower the latent image to form a latent image, develop the latent image by attaching charged toner to the area where the latent image is formed, and transfer and record the developed printed image onto recording paper. be.

〔従来の技術〕[Conventional technology]

このような光導電層としては、従来よりセレン(Se)
系の材料が用いられていたが、このSeは有毒であり、
長時間使用した後、廃棄する場合に公害問題が発生する
恐れがあり、また機械的強度が小さく光導電層の表面に
傷が発生して、長時間使用すると印字品位の低下を招く
等問題が多い。
Conventionally, selenium (Se) has been used as such a photoconductive layer.
Se-based materials were used, but this Se is toxic;
There is a risk of pollution problems when discarded after long-term use, and the mechanical strength is low, causing scratches on the surface of the photoconductive layer, leading to problems such as deterioration of printing quality when used for a long time. many.

そこで最近はアルミニウム(AD)よりなる回転ドラム
の周囲に光導電層としてSe0代わりに、人体に無害で
且つ機械的強度の大きいアモルファスシリコン感光体層
を形成した記録ドラムが開発されている。
Therefore, recently, a recording drum has been developed in which an amorphous silicon photoreceptor layer, which is harmless to the human body and has high mechanical strength, is formed as a photoconductive layer around a rotating drum made of aluminum (AD) instead of Se0.

ところでこのような電子写真感光体の特性として、感光
体表面に必要゛な電荷を蓄積するためには、光を照射し
ない場合の抵抗、即ち暗抵抗が10 〜1今 10  Ω−1以上必要である。ところがアモルファス
シリコンの場合、少量の■族環子、例えばボロン(B)
をドープすることにより、高抵抗化を図っても10  
Ω−口の抵抗しか得られず、感光体として必要である1
013〜10)1Ω−ロの値は得られない。従ってアモ
ルファスシリコンを感光体として使用するためには、従
来第4図に示すように導電性支持体1とアモルファスシ
リコン感光体層2の間にエネルギーギャップの大きい、
Siと炭素(C)との化合物よりなる炭化珪素系化合物
、或いはSiと窒素(N)との化合物よりなる窒化珪素
系化合物等を形成して電荷保持層3.4を設け、この電
荷保持N3,4にて導電性支持体1および感光体表面5
よりアモルファスシリコン感光体層2に注入される電荷
を阻止している。
By the way, as a characteristic of such an electrophotographic photoreceptor, in order to accumulate the necessary charge on the surface of the photoreceptor, the resistance when no light is irradiated, that is, the dark resistance, must be 10 to 10 Ω-1 or more. be. However, in the case of amorphous silicon, a small amount of group III rings, such as boron (B)
Even if you try to increase the resistance by doping 10
Ω - Only the resistance of the mouth can be obtained, and it is necessary as a photoreceptor.
013-10) A value of 1Ω-b cannot be obtained. Therefore, in order to use amorphous silicon as a photoreceptor, conventionally, as shown in FIG.
A charge retention layer 3.4 is provided by forming a silicon carbide compound made of a compound of Si and carbon (C), or a silicon nitride compound made of a compound of Si and nitrogen (N), and this charge retention layer N3 is formed. , 4, the conductive support 1 and the photoreceptor surface 5
This prevents charges from being injected into the amorphous silicon photoreceptor layer 2.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところがこのようなアモルファスシリコン感光体層2は
一般にモノシラン(SiH4)ガス、或いはジシラン(
Si2Hs )ガスのようなSiの水素化合物をプラズ
マCVD法を用いて形成しており、その構造はa−Si
:Hの如き構造を採っており、アモルファスシリコンの
Si原子のダングリングボンドが、H原子によってター
ミネイトされた構造となっている。このH原子とSi原
子の結合エネルギーは、3.leVと小さい。そのため
このH原子でターミネイトされているアモルファスシリ
コン感光体層を電子写真感光体として用いた場合、帯電
時のコロナ放電によってその感光体層の周囲の空気が分
解されてオゾン、酸素イオン窒素イオン等が発生し、こ
れ等の生成物と4Si : HのSi原子とが反応して
、この感光体層の表面にSiの酸化物、或いはSiの窒
化物が形成される問題がある。またこのコロナ放電に依
ってSi原子とH原子の結合が切れるような問題もある
However, such amorphous silicon photoreceptor layer 2 is generally made of monosilane (SiH4) gas or disilane (SiH4) gas.
A hydrogen compound of Si, such as Si2Hs) gas, is formed using the plasma CVD method, and its structure is a-Si.
:H has a structure in which dangling bonds of Si atoms of amorphous silicon are terminated by H atoms. The bond energy between this H atom and Si atom is 3. It is as small as leV. Therefore, when an amorphous silicon photoreceptor layer terminated with H atoms is used as an electrophotographic photoreceptor, the air around the photoreceptor layer is decomposed by corona discharge during charging, producing ozone, oxygen ions, nitrogen ions, etc. There is a problem in that these products and the Si atoms of 4Si:H react to form Si oxide or Si nitride on the surface of the photoreceptor layer. There is also the problem that the bonds between Si atoms and H atoms are broken due to this corona discharge.

このような現象により、dsi:Hの如き構造を有する
アモルファスシリコン感光体層を電子写真感光体として
用いた時、印字画像の品位が低下する問題がある。
Due to this phenomenon, when an amorphous silicon photoreceptor layer having a structure such as dsi:H is used as an electrophotographic photoreceptor, there is a problem that the quality of the printed image deteriorates.

C問題点を解決するための手段〕 上記問題点は、導電性支持体上にアモルファスシリコン
感光層を設けたアモルファスシリコン電子写真感光体の
前記アモルファスシリコン感光層の表面保護層が、弗素
化アモルファスシリコン層で形成されている本発明のア
モルファスシリコン電子写真感光体によって解決される
Means for Solving Problem C] The above problem lies in the fact that the surface protective layer of the amorphous silicon photosensitive layer of the amorphous silicon electrophotographic photoreceptor in which the amorphous silicon photosensitive layer is provided on a conductive support is made of fluorinated amorphous silicon. This problem is solved by the amorphous silicon electrophotographic photoreceptor of the present invention, which is formed of layers.

〔作用〕[Effect]

即ち本発明のアモルファスシリコン電子写真感光体は、
StとHとの結合エネルギーが3.leVで有るのに対
し、SiとFとの結合エネルギーが5.1eVと大きく
なることを利用する。そしてアモルファスシリコン感光
体層の表面保護層を、isi:Hの構造を有するアモル
ファスシリコンのH原子を弗素(F)原子で置換し、a
−5i:Fの構造を有するアモルファスシリコンで表面
保護層を形成して、コロナ放電器の放電に対しても劣化
し難いア、モルファスシリコン電子写真感光体を形成す
るようにしたものである。
That is, the amorphous silicon electrophotographic photoreceptor of the present invention is
The bond energy between St and H is 3. leV, whereas the bond energy between Si and F is as large as 5.1 eV. Then, the surface protective layer of the amorphous silicon photoreceptor layer is made of amorphous silicon having a structure of isi:H by replacing the H atoms with fluorine (F) atoms.
-5i: A surface protective layer is formed of amorphous silicon having a structure of F to form an amorphous silicon electrophotographic photoreceptor that does not easily deteriorate even when discharged from a corona discharger.

〔実施例〕〔Example〕

以下、図面を用いながら本発明の一実施例につき詳細に
説明する。
Hereinafter, one embodiment of the present invention will be described in detail with reference to the drawings.

第1図は本発明のアモルファスシリコン電子写真感光体
を製造するための装置を示す模式図である。
FIG. 1 is a schematic diagram showing an apparatus for manufacturing the amorphous silicon electrophotographic photoreceptor of the present invention.

図示するように加熱ヒータ11を内部に設け、導電性支
持体となる円筒状の〜のドラム12が、気密に封止した
容器13内に設置され、モータ14によって回転されて
いる。このドラム12の周囲には、中央部分が中空で側
面が二重構造となっている円筒状の電極15が設けられ
、この二重構造となっている電極15の内部には、アモ
ルファスシリコン感光体の形成用ガスが導入されるよう
になっており、その電極15のドラム12と対向する面
には多数のガス噴出口16が設けられている。この電極
15に接続されている導出端部は容器13の外部に導出
され、この導出端部に高周波電源17が接続されている
As shown in the figure, a cylindrical drum 12 with a heater 11 provided therein and serving as a conductive support is placed in an airtightly sealed container 13 and rotated by a motor 14 . A cylindrical electrode 15 having a hollow center and a double structure on the sides is provided around the drum 12. Inside the double structure electrode 15, an amorphous silicon photoreceptor is placed. A forming gas is introduced into the electrode 15, and a large number of gas outlets 16 are provided on the surface of the electrode 15 facing the drum 12. The lead-out end connected to this electrode 15 is lead out to the outside of the container 13, and a high-frequency power source 17 is connected to this lead-out end.

またこの導出端部はガス導入管1日となっており、バル
ブ19.20 、ガス流量計21を介してアンモニア(
NHa)ガスボンベ22に接続され、更にバルブ23、
24、流量計25を介してジシラン(Si2H6)ガス
ボンベ26に接続され、更にバルブ27.38 、流量
計29を介して四弗化珪素(SiF4)ガスボンベ30
に接続されている。
In addition, this outlet end is a gas inlet pipe, and ammonia (
NHa) is connected to the gas cylinder 22, and further includes a valve 23,
24, connected to a disilane (Si2H6) gas cylinder 26 via a flowmeter 25, and further connected to a silicon tetrafluoride (SiF4) gas cylinder 30 via a valve 27.38 and a flowmeter 29.
It is connected to the.

また容器13の排気口31には真空バルブ32を介して
メカニカルブースタポンプ33、およびロータリーポン
プ34が接続され、また真空バルブ35を介してディフ
ュージョンポンプ36が接続され、更に真空バルブ37
を介してロータリーポンプ38が接続されている。
Further, a mechanical booster pump 33 and a rotary pump 34 are connected to the exhaust port 31 of the container 13 via a vacuum valve 32, and a diffusion pump 36 is connected via a vacuum valve 35.
A rotary pump 38 is connected via.

このような装置を用いて本発明のアモルファスシリコン
電子写真感光体を形成する場合について述べる。
The case where the amorphous silicon electrophotographic photoreceptor of the present invention is formed using such an apparatus will be described.

まず容器13内に感光ドラムの回転体となる八Ωの支持
体12を設置し、真空バルブ35,37を開放にしてデ
ィフュージョンポンプ36、ロータリーポンプ38を用
い容器13内を1O−6torrの真空度になるまで排
気する。次いで加熱ヒータ11を用いてドラム12を2
00〜300℃の温度になるまで加熱する。更にバルブ
19.20.23.24を開放にしてNH,ガス、Si
2H6ガスを容器13内に導入し、周波数が13.56
MHzの高周波電源17を用いて、電極16とドラム1
2間に高周波電圧を印加してグロー放電を発生させる。
First, an 8-ohm support 12 that becomes a rotating body of the photosensitive drum is installed in the container 13, the vacuum valves 35 and 37 are opened, and the interior of the container 13 is vacuumed to a vacuum of 10-6 torr using the diffusion pump 36 and the rotary pump 38. Exhaust until the Next, using the heater 11, the drum 12 is
Heat until the temperature reaches 00-300°C. Furthermore, valves 19, 20, 23, and 24 are opened to supply NH, gas, and Si.
2H6 gas is introduced into the container 13, and the frequency is 13.56.
The electrode 16 and the drum 1 are connected using a MHz high frequency power source 17.
A high frequency voltage is applied between the two to generate glow discharge.

この時真空バルブ32を開放にしてメカニカルブースタ
ーポンプ33、ロータリーポンプ34を用いて容器13
内に電荷保持層形成用ガスが素早く導入されて内部の真
空度が0.5torrに到達するようにする。
At this time, the vacuum valve 32 is opened and the container 13 is pumped using the mechanical booster pump 33 and the rotary pump 34.
A gas for forming a charge retention layer is quickly introduced into the chamber so that the degree of vacuum inside reaches 0.5 torr.

この放電によっ導入されたガスをプラズマ状態にしてド
ラム12上にそのガスの分解した成分を付着させ、第2
図に示すように支持体12上に厚さが0.01〜1μm
の電荷保持層41を形成する。
The gas introduced by this discharge is turned into a plasma state, and the decomposed components of the gas are deposited on the drum 12.
As shown in the figure, the thickness is 0.01 to 1 μm on the support 12.
A charge retention layer 41 is formed.

次いでバルブ19.20を閉じて容器13内にSi2 
H6ガスを導入して第2図に示す電荷保持層41の上に
アモルファスシリコン感光体層42を5〜30μmの厚
さに形成する。
Then, valves 19 and 20 are closed to fill the container 13 with Si2.
H6 gas is introduced to form an amorphous silicon photoreceptor layer 42 with a thickness of 5 to 30 .mu.m on the charge retention layer 41 shown in FIG.

更にバルブ23.24を閉じ、バルブ27.28を開放
にして容器13内にSiF4ガスを導入してアモルファ
スシリコン感光体層42の上にMSi:Fの構造を有し
、Si原子がF原子でターミネイトされた表面保護層4
3を0.01〜1μmの厚さに形成する。
Furthermore, the valves 23 and 24 are closed, and the valves 27 and 28 are opened to introduce SiF4 gas into the container 13 to form an MSi:F structure on the amorphous silicon photoreceptor layer 42, with Si atoms being F atoms. Terminated surface protective layer 4
3 to a thickness of 0.01 to 1 μm.

このようにして形成され、表面保護層がa−5i:Fの
構造を有する本発明のアモルファスシリコン電子写真感
光体と、従来のαSi:Hの構造のアモルファスシリコ
ン電子写真感光体を比較するため、正極性のコロナ放電
よりオゾンの発生量が数倍多い負極性のコロナ放電によ
って、上記2種の感光体をそれぞれ帯電させて、連続印
字を行ってこの印字濃度が低下する状態を調査した。
In order to compare the amorphous silicon electrophotographic photoreceptor of the present invention formed in this way and having a surface protective layer with an a-5i:F structure, and the conventional amorphous silicon electrophotographic photoreceptor with an αSi:H structure, The two types of photoreceptors were charged by a negative corona discharge, which generates several times more ozone than a positive corona discharge, and continuous printing was performed to investigate the state in which the print density decreases.

記録用紙としてはA4サイズの記録用紙を用い、一枚の
記録紙に400字を印刷して連続印字した処、従来の4
Si:Hの構造のアモルファスシリコン感光体を電子写
真感光体として用いた時には、数100枚程度の印字で
も印字濃度の低下が見られた。これに対し、本発明のt
LSi:Fの構造を有するアモルファスシリコン感光体
を表面保護層としてアモルファスシリコン感光体層の上
に形成したものを電子写真感光体として用いた時には、
数万枚の記録紙に連続印字した場合でも印字濃度の低下
は見られなかった。
A4 size recording paper was used as the recording paper, and 400 characters were printed continuously on one recording paper, compared to the conventional 4
When an amorphous silicon photoreceptor having a Si:H structure was used as an electrophotographic photoreceptor, a decrease in print density was observed even after printing on several hundred sheets. On the other hand, in the present invention, t
When an amorphous silicon photoreceptor having an LSi:F structure is formed on an amorphous silicon photoreceptor layer as a surface protective layer as an electrophotographic photoreceptor,
No decrease in print density was observed even when printing was performed continuously on tens of thousands of sheets of recording paper.

また本実施例の他に、第3図に示すように導電性支持体
上に電荷保持層を介さずに直接アモルファスシリコン層
51を分厚(形成することで高抵抗化を図ったアモルフ
ァスシリコン電子写真感光体の構造においても、4Si
:Fを表面保護層52として用いれば同様の効果がある
In addition to this embodiment, as shown in FIG. 3, an amorphous silicon electrophotograph is used in which high resistance is achieved by forming a thick amorphous silicon layer 51 directly on a conductive support without intervening a charge retention layer. Also in the structure of the photoreceptor, 4Si
A similar effect can be obtained by using :F as the surface protective layer 52.

また本実施例の他に、dsi:Fを形成する際にNH3
ガスを容器内に同時に導入して窒素(N)を添加してN
が添加された4Si:Fや、また例えば炭化水素系のエ
チレン(C2H4)ガスを容器内に同時に導入して炭素
(C)を添加して、Cが添加されたLSi:Fとしても
良い。これら両者のアモルファスシリコンは抵抗値が高
くバンドギャップが大きく絶縁体のアモルファスシリコ
ンとなる。
In addition to this example, when forming dsi:F, NH3
Gas is simultaneously introduced into the container and nitrogen (N) is added.
4Si:F to which is added, or LSi:F to which carbon (C) is added may be obtained by simultaneously introducing hydrocarbon-based ethylene (C2H4) gas into the container and adding carbon (C). Both of these amorphous silicons have a high resistance value and a large band gap, making them insulator amorphous silicon.

またLSi : Fを形成する際にジボラン(B2 H
s )ガスを容器内に同時に導入してポロン(B)が添
加された■型またはP型の4Si:Fや、ホスフィン(
PH3)ガスを容器内に同時に導入して燐(P)が添加
されたN型のc5i : Fとしても良い。
Also, when forming LSi:F, diborane (B2H
s) Gas is simultaneously introduced into the container to prepare ■-type or P-type 4Si:F to which poron (B) is added, or phosphine (
PH3) gas may be simultaneously introduced into the container to form an N-type c5i:F to which phosphorus (P) is added.

このような絶縁体、燐が添加されたN型、Bが添加され
た■型またはP型のASi:Fとすることにより、コロ
ナ放電器の放電による影響を、下部のアモルファスシリ
コン感光層に及ぼすのを防ぐ表面保護の機能の他に、ア
モルファスシリコン感光体の帯電電位を高める電荷保持
層としての効果も併せて生じる。
By using such an insulator, phosphorous-doped N-type, B-doped ■-type, or P-type ASi:F, the influence of the discharge of the corona discharger is exerted on the amorphous silicon photosensitive layer below. In addition to the surface protection function of preventing the amorphous silicon photoreceptor from being damaged, it also functions as a charge retention layer that increases the charging potential of the amorphous silicon photoreceptor.

またその他の実施例として、表面保護層43とアモルフ
ァスシリコン感光体層42の間に、C1またはNを添加
してエネルギーバンドギャップの大きいa−3i:HN
、或いはB、P等を高濃度に添加したP型、N型の高抵
抗の久Si:H層を挟んで、これ等の、4Si:H層を
電荷保持層としても良い。
As another example, C1 or N is added between the surface protection layer 43 and the amorphous silicon photoreceptor layer 42 to form a-3i:HN with a large energy band gap.
Alternatively, a 4Si:H layer such as these may be used as a charge retention layer by sandwiching a P-type or N-type high-resistance Si:H layer doped with B, P, etc. at a high concentration.

更に他の実施例で表面保護層となるdsi:F膜の形成
方法として、SiF4ガスの他にSiH4ガスやSi2
H6ガスのようなシラン系(St S、 H層に+z)
ガスと四弗化炭素(CFa)等の弗化炭素系ガスとの混
合ガスを用いても良い。
In addition to SiF4 gas, SiH4 gas or Si2
Silane type like H6 gas (St S, +z in H layer)
A mixed gas of a gas and a carbon fluoride gas such as carbon tetrafluoride (CFa) may be used.

〔発明の効果〕〔Effect of the invention〕

以上述べたような本発明のアモルファスシリコン電子写
真感光体によれば、コロナ放電による表面劣化を防止で
きるので、長時間連続使用しても損傷しない高信頼度の
電子写真感光体が得られる効果がある。
According to the amorphous silicon electrophotographic photoreceptor of the present invention as described above, since surface deterioration due to corona discharge can be prevented, a highly reliable electrophotographic photoreceptor that will not be damaged even when used continuously for a long time can be obtained. be.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明のアモルファスシリコン電子写真感光体
を形成する装置の模式図、 第2図および第3図は本発明のアモルファスシリコン電
子写真感光体の構成を示す断面図、第4図は従来のアモ
ルファスシリコン電子写真感光体の構成を示す断面図で
ある。 図に於いて11はヒータ、12は導電性支持体、13は
容器、14はモータ、15は電極、16はガス噴出孔、
17は高周波電源、18はガス導入管、19.20,2
3,24゜27、28はバルブ、21,25.29は流
量針、22はアンモニアガスボンベ、26はジシランガ
スボンベ、30は四弗化珪素ボンベ、31は排気口、3
2.35. ’t7は真空バルブ、33はメカニカルブ
ースタポンプ、34.38はロータリーポンプ、36は
ディフュージョンポンプ、41は電荷保持層、42.5
1はアモルファスシリコン感光層、43.52は表面保
護層を示す。
FIG. 1 is a schematic diagram of an apparatus for forming an amorphous silicon electrophotographic photoreceptor of the present invention, FIGS. 2 and 3 are cross-sectional views showing the structure of the amorphous silicon electrophotographic photoreceptor of the present invention, and FIG. 4 is a conventional 1 is a cross-sectional view showing the structure of an amorphous silicon electrophotographic photoreceptor. In the figure, 11 is a heater, 12 is a conductive support, 13 is a container, 14 is a motor, 15 is an electrode, 16 is a gas outlet,
17 is a high frequency power supply, 18 is a gas introduction pipe, 19.20,2
3, 24° 27, 28 are valves, 21, 25.29 are flow rate needles, 22 is an ammonia gas cylinder, 26 is a disilane gas cylinder, 30 is a silicon tetrafluoride cylinder, 31 is an exhaust port, 3
2.35. 't7 is a vacuum valve, 33 is a mechanical booster pump, 34.38 is a rotary pump, 36 is a diffusion pump, 41 is a charge retention layer, 42.5
1 is an amorphous silicon photosensitive layer, and 43.52 is a surface protective layer.

Claims (1)

【特許請求の範囲】[Claims] 導電性支持体上にアモルファスシリコン感光層を設けた
アモルファスシリコン電子写真感光体の前記アモルファ
スシリコン感光層の表面保護層が、弗素化アモルファス
シリコン層で形成されていることを特徴とするアモルフ
ァスシリコン電子写真感光体。
An amorphous silicon electrophotographic photoreceptor comprising an amorphous silicon photosensitive layer provided on a conductive support, wherein a surface protective layer of the amorphous silicon photosensitive layer is formed of a fluorinated amorphous silicon layer. Photoreceptor.
JP27565884A 1984-12-29 1984-12-29 Amorphous silicon electrophotographic sensitive body Pending JPS61158335A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27565884A JPS61158335A (en) 1984-12-29 1984-12-29 Amorphous silicon electrophotographic sensitive body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27565884A JPS61158335A (en) 1984-12-29 1984-12-29 Amorphous silicon electrophotographic sensitive body

Publications (1)

Publication Number Publication Date
JPS61158335A true JPS61158335A (en) 1986-07-18

Family

ID=17558532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27565884A Pending JPS61158335A (en) 1984-12-29 1984-12-29 Amorphous silicon electrophotographic sensitive body

Country Status (1)

Country Link
JP (1) JPS61158335A (en)

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