JPS6115734B2 - - Google Patents
Info
- Publication number
- JPS6115734B2 JPS6115734B2 JP5241280A JP5241280A JPS6115734B2 JP S6115734 B2 JPS6115734 B2 JP S6115734B2 JP 5241280 A JP5241280 A JP 5241280A JP 5241280 A JP5241280 A JP 5241280A JP S6115734 B2 JPS6115734 B2 JP S6115734B2
- Authority
- JP
- Japan
- Prior art keywords
- silica gel
- fluoride
- gelation
- gel
- stirring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 17
- 239000000741 silica gel Substances 0.000 claims description 13
- 229910002027 silica gel Inorganic materials 0.000 claims description 13
- 239000003054 catalyst Substances 0.000 claims description 9
- PFLUPZGCTVGDLV-UHFFFAOYSA-N acetone azine Chemical compound CC(C)=NN=C(C)C PFLUPZGCTVGDLV-UHFFFAOYSA-N 0.000 claims description 8
- 238000001879 gelation Methods 0.000 claims description 8
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 7
- 235000012239 silicon dioxide Nutrition 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 238000003786 synthesis reaction Methods 0.000 claims description 6
- -1 silicate ester Chemical class 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 2
- 239000005049 silicon tetrachloride Substances 0.000 claims description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims 1
- 230000007062 hydrolysis Effects 0.000 claims 1
- 238000006460 hydrolysis reaction Methods 0.000 claims 1
- 238000006386 neutralization reaction Methods 0.000 claims 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 14
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 9
- 239000000499 gel Substances 0.000 description 8
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 239000004115 Sodium Silicate Substances 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 6
- 229910052911 sodium silicate Inorganic materials 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 229910017855 NH 4 F Inorganic materials 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 4
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 4
- 238000006068 polycondensation reaction Methods 0.000 description 4
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 4
- AHLATJUETSFVIM-UHFFFAOYSA-M rubidium fluoride Chemical compound [F-].[Rb+] AHLATJUETSFVIM-UHFFFAOYSA-M 0.000 description 4
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 238000007664 blowing Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 150000002222 fluorine compounds Chemical class 0.000 description 3
- 239000011698 potassium fluoride Substances 0.000 description 3
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 230000003472 neutralizing effect Effects 0.000 description 2
- 235000003270 potassium fluoride Nutrition 0.000 description 2
- 235000019353 potassium silicate Nutrition 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 235000013024 sodium fluoride Nutrition 0.000 description 2
- 239000011775 sodium fluoride Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- POWFTOSLLWLEBN-UHFFFAOYSA-N tetrasodium;silicate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-][Si]([O-])([O-])[O-] POWFTOSLLWLEBN-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- LAWAERKRWYQEEN-FKJILZIQSA-N (e)-n-[(z)-butan-2-ylideneamino]butan-2-imine Chemical compound CC\C(C)=N/N=C(\C)CC LAWAERKRWYQEEN-FKJILZIQSA-N 0.000 description 1
- XWNSFEAWWGGSKJ-UHFFFAOYSA-N 4-acetyl-4-methylheptanedinitrile Chemical compound N#CCCC(C)(C(=O)C)CCC#N XWNSFEAWWGGSKJ-UHFFFAOYSA-N 0.000 description 1
- 239000004153 Potassium bromate Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- LRHPLDYGYMQRHN-UHFFFAOYSA-N butyl alcohol Substances CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 150000002221 fluorine Chemical class 0.000 description 1
- 239000003349 gelling agent Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229940094037 potassium bromate Drugs 0.000 description 1
- 235000019396 potassium bromate Nutrition 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【発明の詳細な説明】
本発明はケタジン合成用触媒の製造法に関す
る。本発明者らは先にケトンとアンモニア及び過
酸化物からケタジンを合成する反応において、シ
リカゲルが触媒として有効である事を見い出し
た。(特開昭54−135718)。シリカゲルの製造方法
としては水ガラス、メタケイ酸ナトリウム、オル
トケイ酸ナトリウムなどのケイ酸ナトリウムを水
溶液中で酸により中和しゲル化させる方法、四塩
化ケイ素を水溶液中で加水分解させてゲル化させ
る方法及び、ケイ酸エステル類を酸又はアルカリ
を触媒として加水分解し、ゲル化させる方法等が
知られているが、これらはいづれも原料を中和又
は加水分解して生成したケイ酸又はその重縮合物
が重縮合反応によりゲル化する事を利用した方法
である。又このケイ酸の重縮合反応において、従
来よりフツ素イオン、NaC、Na2SO4などの無
機質、メチルアミン、トリメチルアミンなどが重
縮合反応の促進剤効果を有する事が知られてい
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a catalyst for ketazine synthesis. The present inventors have previously discovered that silica gel is effective as a catalyst in the reaction of synthesizing ketazine from ketone, ammonia, and peroxide. (Japanese Patent Application Laid-Open No. 54-135718). Silica gel can be produced by neutralizing sodium silicate such as water glass, sodium metasilicate, or sodium orthosilicate with acid in an aqueous solution to form a gel, or by hydrolyzing silicon tetrachloride in an aqueous solution to form a gel. There are also known methods in which silicic acid esters are hydrolyzed using acid or alkali as a catalyst to form a gel, but these methods all involve silicic acid produced by neutralizing or hydrolyzing raw materials or their polycondensation. This is a method that takes advantage of the fact that substances gel through a polycondensation reaction. Furthermore, in this polycondensation reaction of silicic acid, it has been known that fluorine ions, inorganic substances such as NaC and Na 2 SO 4 , methylamine, trimethylamine, etc. have a promoter effect on the polycondensation reaction.
我々は種々のケイ素化合物よりシリカゲルを製
造し、これらをアジン合成の触媒として用いた場
合に、製造方法によりシリカゲルの触媒としての
効果が異なる事を発見し、シリカゲルの触媒効果
を大とするシリカゲルの製造法について種々検討
した。その結果フツ素の塩又はフツ素化水素の存
在下にケイ酸又はその重縮合物をゲル化させて製
造したシリカゲルは、これらフツ素化物を用いず
にゲル化させたり、他のゲル化促進剤を用いてゲ
ル化させて製造したシリカゲルよりもケタジンの
合成触媒としての効果が大である事を見い出し、
本発明を完成させた。 We manufactured silica gel from various silicon compounds and discovered that when these were used as catalysts for azine synthesis, the catalytic effects of silica gel differed depending on the manufacturing method. Various manufacturing methods were investigated. As a result, silica gel produced by gelling silicic acid or its polycondensate in the presence of fluorine salts or hydrogen fluoride can be produced by gelling without using these fluorides or by using other methods to promote gelation. We discovered that ketazine was more effective as a synthesis catalyst than silica gel produced by gelling it using a chemical agent.
The present invention has been completed.
本発明におけるフツ素の塩とは、フツ素のアル
カリ金属塩又は、アンモニウム塩及びこれらの酸
性塩であり、具体例に例示すれば、フツ化リチウ
ム、フツ化ナトリウム、フツ化カリウム、フツ化
ルビジウム、フツ化セシウム、フツ化アンモニウ
ム、酸性フツ化リチウム、酸性フツ化ナトリウ
ム、酸性フツ化カリウム、酸性フツ化ルビジウ
ム、酸性フツ化セシウム、酸性フツ化アンモニウ
ムである。ケイ酸ナトリウムはケイ酸又はその重
縮合物のナトリウム塩であり、通常珪曹比と呼ば
れるSiO2/Na2Oの比が0.5以上の化合物で、0.5
はオルトケイ酸ナトリウムに相当し、4は4号水
ガラスに相当する。ケイ酸エステルとはオルトケ
イ酸エステルと呼ばれるSi(OR)4〔Rは炭素数
1〜4の飽和炭化水素を表わす〕及びそのオリゴ
マーである。 The salt of fluorine in the present invention refers to an alkali metal salt of fluorine, an ammonium salt, and an acid salt thereof. Specific examples include lithium fluoride, sodium fluoride, potassium fluoride, and rubidium fluoride. , cesium fluoride, ammonium fluoride, acidic lithium fluoride, acidic sodium fluoride, acidic potassium fluoride, acidic rubidium fluoride, acidic cesium fluoride, and acidic ammonium fluoride. Sodium silicate is a sodium salt of silicic acid or its polycondensate, and is a compound with a SiO 2 /Na 2 O ratio, usually called the silica ratio, of 0.5 or more.
corresponds to sodium orthosilicate, and 4 corresponds to No. 4 water glass. The silicate ester is Si(OR) 4 (R represents a saturated hydrocarbon having 1 to 4 carbon atoms) called orthosilicate ester and its oligomer.
ゲル化の速度には液のPH、温度、溶液中のケイ
酸の濃度が影響し、更にゲル化促進剤を用いた場
合にはその種類及び量に影響される。そして、こ
れらの要因が相互に関連し合つてシリカゲルのケ
タジン合成用触媒としての効果に影響するがこれ
らの要因を詳細に検討した結果ゲル化促進剤とし
て前記のフツ素化合物を用いた場合には、用いな
い場合つまりゲル化促進剤を用いない場合や他の
ゲル化促進剤を用いた場合に比べて、出来たシリ
カゲルのケタジン合成触媒としての効果が大きい
事を発見した。 The rate of gelation is affected by the pH of the solution, temperature, and the concentration of silicic acid in the solution, and further by the type and amount of a gelling promoter, if used. These factors interact with each other to influence the effectiveness of silica gel as a catalyst for ketazine synthesis, and after a detailed study of these factors, it was found that when the above-mentioned fluorine compound is used as a gelation promoter, It was discovered that the resulting silica gel was more effective as a catalyst for ketazine synthesis than when no gelation promoter was used or when other gelation promoters were used.
フツ素化合物の用いる量は他の要因とも関連す
るもので単純には限定し難いが、少なすぎると効
果が小さく、又多すぎても、効果に限定があるの
みならず廃水処理等のコストもかかるため、おの
ずと限界がある。これらを考慮するとF-として
2×10-4mol/〜0.3mol/の範囲で用いるの
が好ましい。 The amount of fluorine compounds used is difficult to limit simply because it is related to other factors, but if it is too small, the effect will be small, and if it is too large, it will not only limit the effect but also increase the cost of wastewater treatment etc. Because of this, there are naturally limits. Taking these into consideration, it is preferable to use F - in a range of 2×10 −4 mol/ to 0.3 mol/.
なおゲル化温度については室温乃至沸点の範囲
で行なわれ、また、ケイ素分の濃度としては
SiO2として0.1〜10重量%程度である。 The gelation temperature is from room temperature to boiling point, and the silicon concentration is
It is about 0.1 to 10% by weight as SiO2 .
以下本発明の方法について代表的な例を示し更
に具体的に説明する。ただし、これらは単なる例
示であり、本発明はこれらのみに限定されないこ
とは言うまでもない。 The method of the present invention will be explained in more detail below by showing typical examples. However, these are merely examples, and it goes without saying that the present invention is not limited to these.
実施例 1
ケイ酸ナトリウム(関東化学製)134.5g及び濃
硫酸38.5gをそれぞれ0.6の水に溶かし、水0.4
にNH4F・HF1.2gを溶解した水溶液に撹拌下に
ケイ酸ナトリウム溶液及び硫酸溶液を同時に同じ
速度で加え、加え終つたあと更に撹拌を30分間行
つたあと、室温にて24時間放置した。生成したゲ
ルをくずして過水洗を充分に行い、水洗したゲ
ルをほぐして乾燥器にて150℃で一夜乾燥したあ
と減圧下(1〜2mmHg)、180℃で3時時間焼成
した。得られたシリカゲルを乳ばちにて粉砕して
12gを50mlの三角フラスコに採り、Scc−ブチル
アルコール27ml、90%過酸化水素1.133g
(30mmol)、EDTA.2Na.0.005g加え、撹拌下にア
ンモニアガスを毎分150mlの流速で6分間吹き込
み、メチルエチルケトン15mlを加え、更にアンモ
ニアガスを同じ流速で4分間吹き込む。次いで三
角フラスコを70℃の浴につけ、アンモニアガスの
吹き込み管及び還流冷却器を接続して、撹拌下に
アンモニアガスを毎分6mlの流速で吹き込みなが
ら6時間反応し、ガスクロマトグラフイーにより
メチルエチルケトンアジンを定量した所、加えた
過酸化水素の80.3%の収率で生成していた。な
お、2規定の塩酸中にて、臭素酸カリウムによる
ヒドラジンの定量を行つた所、ガスクロマトグラ
フイーによるアジンの量と一致した。Example 1 134.5g of sodium silicate (manufactured by Kanto Kagaku) and 38.5g of concentrated sulfuric acid were each dissolved in 0.6 parts of water, and 0.4 parts of water was dissolved.
A sodium silicate solution and a sulfuric acid solution were simultaneously added at the same speed while stirring to an aqueous solution in which 1.2 g of NH 4 F. . The resulting gel was broken and thoroughly washed with water, the water-washed gel was loosened, dried overnight at 150°C in a dryer, and then calcined at 180°C for 3 hours under reduced pressure (1 to 2 mmHg). The obtained silica gel is crushed with a pestle.
Transfer 12g to a 50ml Erlenmeyer flask, add 27ml of Scc-butyl alcohol, and 1.133g of 90% hydrogen peroxide.
(30 mmol) and 0.005 g of EDTA.2Na are added, and ammonia gas is blown in at a flow rate of 150 ml per minute for 6 minutes while stirring, 15 ml of methyl ethyl ketone is added, and ammonia gas is further blown in at the same flow rate for 4 minutes. Next, the Erlenmeyer flask was placed in a bath at 70°C, connected to an ammonia gas blowing tube and a reflux condenser, and reacted for 6 hours while stirring and blowing ammonia gas at a flow rate of 6 ml per minute. Methyl ethyl ketone azine was extracted by gas chromatography. Quantitative analysis showed that hydrogen peroxide was produced at a yield of 80.3% of the added hydrogen peroxide. In addition, when hydrazine was quantitatively determined using potassium bromate in 2N hydrochloric acid, the amount was consistent with the amount of azine determined by gas chromatography.
実施例 2
NH4F、HF1.20gの代りに10gを用いた以外は実
施例1と同じ方法で調製したシリカゲルを8g50
mlの三角フラスコに採り、イソプロピルアルコー
ル37ml、90%過酸化水素0.756g(20mmol)、
EDTA.2Na0.005g、を加え、温で撹拌下にアンモ
ニアガスを150ml/mmの流速で5分間吹き込み、
アセトンを2ml加えた後、三角フラスコを60℃の
浴につけ、アンモニアガスの吹き込み管、還流冷
却器を接続して、撹拌下にアンモニアガスを5
ml/mmの流速で流しながら反応する。反応開始後
30分、1,2,3,4,5,時間後にそれぞれア
セトンを0.25mlずつ追加した。反応開始後6時間
で分析した所アセトンアジンが最初に加えた過酸
化水素を基準にして69.3%の収率で生成してい
た。Example 2 8g50 of silica gel prepared in the same manner as in Example 1 except that 10g of NH 4 F was used instead of 1.20g of HF.
ml Erlenmeyer flask, 37 ml of isopropyl alcohol, 0.756 g (20 mmol) of 90% hydrogen peroxide,
Add 0.005 g of EDTA.2Na, and blow in ammonia gas at a flow rate of 150 ml/mm for 5 minutes while stirring at warm temperature.
After adding 2 ml of acetone, place the Erlenmeyer flask in a 60°C bath, connect the ammonia gas blowing tube and reflux condenser, and add 5 ml of ammonia gas while stirring.
React while flowing at a flow rate of ml/mm. After starting the reaction
After 30 minutes, 1, 2, 3, 4, and 5 hours, 0.25 ml of acetone was added. Analysis conducted 6 hours after the start of the reaction revealed that acetoneazine was produced in a yield of 69.3% based on the hydrogen peroxide initially added.
実施例 3
NH4F.HF1.20gの代りにKF.HFを0.1g用いた以
外は実施例1と同様にして調製したシリカゲルを
用いて、実施例2と同じ反応を行つた所アセトン
アジンの収率は最初に加えた過酸化水素を基準に
して65.0%であつた。Example 3 The same reaction as in Example 2 was carried out using silica gel prepared in the same manner as in Example 1 except that 0.1 g of KF.HF was used instead of 1.20 g of NH 4 F.HF. The yield was 65.0% based on the initially added hydrogen peroxide.
実施例 4
ケイ酸ナトリウム(関東化学製)140.9g、濃硫
酸35.3gをそれぞれ0.6の水に溶解し、1.2の
水に両水溶液を同時に同じ速度で撹拌下に加え、
更に撹拌を続け、30分後にNH4F.HF1.2gを加え
撹拌後67時間室温で放置した後、生成したゲルを
くずして水洗、過を充分に行い、180〜190%て
真空乾燥を8時間行つた。得られたシリカゲルを
乳ばちでですりつぶし、これを触媒として実施例
2と同じ反応を行つた所、アセトンアジンの収率
は最初に加えた過酸化水素を基準にして63.5%で
あつた。Example 4 140.9 g of sodium silicate (manufactured by Kanto Kagaku) and 35.3 g of concentrated sulfuric acid were each dissolved in 0.6 g of water, and both aqueous solutions were added to 1.2 g of water simultaneously at the same speed while stirring.
Stirring was continued, and after 30 minutes, 1.2 g of NH 4 F.HF was added. After stirring, the gel was left at room temperature for 67 hours. The resulting gel was broken, thoroughly washed with water, filtered, and dried in vacuum at 180-190%. Time passed. The obtained silica gel was ground with a mortar and the same reaction as in Example 2 was carried out using this as a catalyst, and the yield of acetoneazine was 63.5% based on the hydrogen peroxide initially added.
Claims (1)
四塩化ケイ素の加水分解により生成するケイ酸又
はその重縮合物をゲル化促進剤としてフツ化素水
素又はその塩の存在下にゲル化させることを特徴
とするケタジン合成用シリカゲル触媒の製造法。1. Gelation of silicic acid or its polycondensate produced by neutralization of silicate or hydrolysis of silicate ester or silicon tetrachloride in the presence of hydrogen fluoride or its salt as a gelation promoter. Characteristic method for producing silica gel catalyst for ketazine synthesis.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5241280A JPS56149311A (en) | 1980-04-22 | 1980-04-22 | Manufacture of catalyst for synthesizing ketazine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5241280A JPS56149311A (en) | 1980-04-22 | 1980-04-22 | Manufacture of catalyst for synthesizing ketazine |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56149311A JPS56149311A (en) | 1981-11-19 |
JPS6115734B2 true JPS6115734B2 (en) | 1986-04-25 |
Family
ID=12914065
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5241280A Granted JPS56149311A (en) | 1980-04-22 | 1980-04-22 | Manufacture of catalyst for synthesizing ketazine |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56149311A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2511784B2 (en) * | 1993-04-20 | 1996-07-03 | 旭マシナリー株式会社 | Rotary cutter |
-
1980
- 1980-04-22 JP JP5241280A patent/JPS56149311A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS56149311A (en) | 1981-11-19 |
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