JPS61153339U - - Google Patents
Info
- Publication number
- JPS61153339U JPS61153339U JP3604685U JP3604685U JPS61153339U JP S61153339 U JPS61153339 U JP S61153339U JP 3604685 U JP3604685 U JP 3604685U JP 3604685 U JP3604685 U JP 3604685U JP S61153339 U JPS61153339 U JP S61153339U
- Authority
- JP
- Japan
- Prior art keywords
- plasma etching
- etching apparatus
- drive
- section
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001020 plasma etching Methods 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 3
- 230000005540 biological transmission Effects 0.000 claims description 2
- 239000012212 insulator Substances 0.000 claims description 2
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Description
第１図は、本考案によるプラズマエツチング袋
置の一実施例を示す断面図である。
１……対向電極、２……試料電極、３……エツ
チング試料、４……絶縁物、５……エツチングチ
ヤンバー、６ａ，６ｂ……駆動伝達部、７ａ，７
ｂ……駆動部、８ａ，８ｂ……駆動制御部、９…
…ガス吹出し口、１０……ガス排気口。
FIG. 1 is a sectional view showing an embodiment of a plasma etching bag holder according to the present invention. DESCRIPTION OF SYMBOLS 1... Counter electrode, 2... Sample electrode, 3... Etching sample, 4... Insulator, 5... Etching chamber, 6a, 6b... Drive transmission section, 7a, 7
b... Drive section, 8a, 8b... Drive control section, 9...
...Gas outlet, 10...Gas exhaust port.
Claims (1)
及びこれらを絶縁する絶縁物を設けたプラズマエ
ツチング装置において、上記両電極を回転させる
ための駆動部、駆動伝達部及び駆動制御部をそれ
ぞれの電極に設けたことを特徴とするプラズマエ
ツチング装置。 ２ 実用新案登録請求の範囲第１項において、両
電極の回転方向及び回転数をそれぞれ独立して制
御できる機構を駆動制御部に設けたプラズマエツ
チング装置。[Claims for Utility Model Registration] 1. In a plasma etching apparatus in which an etching chamber is provided with a counter electrode, a sample electrode, and an insulator that insulates them, a drive section, a drive transmission section, and a drive control for rotating the above-mentioned electrodes. 1. A plasma etching apparatus characterized in that a portion is provided on each electrode. 2. A plasma etching apparatus as set forth in claim 1 of the utility model registration claim, in which the drive control section is provided with a mechanism that can independently control the rotational direction and rotational speed of both electrodes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3604685U JPS61153339U (en) | 1985-03-15 | 1985-03-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3604685U JPS61153339U (en) | 1985-03-15 | 1985-03-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61153339U true JPS61153339U (en) | 1986-09-22 |
Family
ID=30540879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3604685U Pending JPS61153339U (en) | 1985-03-15 | 1985-03-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61153339U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016122491A (en) * | 2014-12-24 | 2016-07-07 | 東京エレクトロン株式会社 | Plasma processing apparatus |
-
1985
- 1985-03-15 JP JP3604685U patent/JPS61153339U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016122491A (en) * | 2014-12-24 | 2016-07-07 | 東京エレクトロン株式会社 | Plasma processing apparatus |