JPS61153337U - - Google Patents
Info
- Publication number
- JPS61153337U JPS61153337U JP3531785U JP3531785U JPS61153337U JP S61153337 U JPS61153337 U JP S61153337U JP 3531785 U JP3531785 U JP 3531785U JP 3531785 U JP3531785 U JP 3531785U JP S61153337 U JPS61153337 U JP S61153337U
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- reaction vessel
- heating source
- substrate
- manufacturing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
第１図、第２図はそれぞれ異なる実施例を示す
断面図、第３図は従来例の断面図である。 ４は反応容器、５はサセプタ、６は基質。
断面図、第３図は従来例の断面図である。 ４は反応容器、５はサセプタ、６は基質。
Claims (1)
- 反応容器４内にサセプタ５を回転自在に設け、
このサセプタ５に基質６を設けると共に、サセプ
タ５の内部には内部加熱源を設け、反応容器４の
外側には外部加熱源を設けたことを特徴とする半
導体製造装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985035317U JPH0445237Y2 (ja) | 1985-03-14 | 1985-03-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985035317U JPH0445237Y2 (ja) | 1985-03-14 | 1985-03-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61153337U true JPS61153337U (ja) | 1986-09-22 |
| JPH0445237Y2 JPH0445237Y2 (ja) | 1992-10-23 |
Family
ID=30539482
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985035317U Expired JPH0445237Y2 (ja) | 1985-03-14 | 1985-03-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0445237Y2 (ja) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5391084A (en) * | 1977-01-20 | 1978-08-10 | Gnii Pi Redkometa | Method and apparatus for evaporating source matter to evaporation portion |
| JPS5637296A (en) * | 1979-09-05 | 1981-04-10 | Toshiba Ceramics Co Ltd | Epitaxially growing apparatus |
-
1985
- 1985-03-14 JP JP1985035317U patent/JPH0445237Y2/ja not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5391084A (en) * | 1977-01-20 | 1978-08-10 | Gnii Pi Redkometa | Method and apparatus for evaporating source matter to evaporation portion |
| JPS5637296A (en) * | 1979-09-05 | 1981-04-10 | Toshiba Ceramics Co Ltd | Epitaxially growing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0445237Y2 (ja) | 1992-10-23 |