JPS6114652B2 - - Google Patents
Info
- Publication number
- JPS6114652B2 JPS6114652B2 JP54166183A JP16618379A JPS6114652B2 JP S6114652 B2 JPS6114652 B2 JP S6114652B2 JP 54166183 A JP54166183 A JP 54166183A JP 16618379 A JP16618379 A JP 16618379A JP S6114652 B2 JPS6114652 B2 JP S6114652B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- ions
- electric field
- substrate
- glow discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000002500 ions Chemical class 0.000 claims description 21
- 230000005684 electric field Effects 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 12
- 238000001947 vapour-phase growth Methods 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 5
- 230000001133 acceleration Effects 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- -1 silicon ions Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photovoltaic Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16618379A JPS5688315A (en) | 1979-12-20 | 1979-12-20 | Apparatus for gaseous phase growth |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16618379A JPS5688315A (en) | 1979-12-20 | 1979-12-20 | Apparatus for gaseous phase growth |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5688315A JPS5688315A (en) | 1981-07-17 |
| JPS6114652B2 true JPS6114652B2 (US20030204162A1-20031030-M00001.png) | 1986-04-19 |
Family
ID=15826604
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16618379A Granted JPS5688315A (en) | 1979-12-20 | 1979-12-20 | Apparatus for gaseous phase growth |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5688315A (US20030204162A1-20031030-M00001.png) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6364645U (US20030204162A1-20031030-M00001.png) * | 1986-10-15 | 1988-04-28 | ||
| JPS6388962U (US20030204162A1-20031030-M00001.png) * | 1986-11-27 | 1988-06-09 |
-
1979
- 1979-12-20 JP JP16618379A patent/JPS5688315A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6364645U (US20030204162A1-20031030-M00001.png) * | 1986-10-15 | 1988-04-28 | ||
| JPS6388962U (US20030204162A1-20031030-M00001.png) * | 1986-11-27 | 1988-06-09 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5688315A (en) | 1981-07-17 |
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