JPS61138231A - Orientation treating method of liquid-crystal display element - Google Patents

Orientation treating method of liquid-crystal display element

Info

Publication number
JPS61138231A
JPS61138231A JP26044884A JP26044884A JPS61138231A JP S61138231 A JPS61138231 A JP S61138231A JP 26044884 A JP26044884 A JP 26044884A JP 26044884 A JP26044884 A JP 26044884A JP S61138231 A JPS61138231 A JP S61138231A
Authority
JP
Japan
Prior art keywords
electrode substrate
liquid
polymer resin
resin film
injection nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26044884A
Other languages
Japanese (ja)
Other versions
JPH0723935B2 (en
Inventor
Hisashi Ubukata
生方 寿
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Casio Computer Co Ltd
Original Assignee
Casio Computer Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Casio Computer Co Ltd filed Critical Casio Computer Co Ltd
Priority to JP26044884A priority Critical patent/JPH0723935B2/en
Publication of JPS61138231A publication Critical patent/JPS61138231A/en
Publication of JPH0723935B2 publication Critical patent/JPH0723935B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)

Abstract

PURPOSE:To orient uniformly a liquid-crystal display element regardless of the size of an electrode substrate without contaminating the electrode substrate by injecting fluid to a high polymer resin film with which the electrode substrate is coated at a specific angle under high pressure, and forming a fine grooved uneven surface on the high polymer resin film. CONSTITUTION:An injection nozzle 2 in a thin and long tube shape is arranged above a belt conveyor A in the breadthwise direction of the belt conveyor A. Many injection ports 2a... are formed at one side part of the injection nozzle 2 in its lengthwise direction and the liquid is injected to the electrode substrate 1 which is conveyed as shown by an arrow under high pressure slantingly above. In this case, the angle of the injection is about 30 deg. to the surface of the electrode substrate 1 and the liquid injected from the injection nozzle 2 uses a solvent having a low boiling point such as freon. Consequently, the fine grooved uneven surface is formed on the high polymer resin film 3 on the electrode substrate 1.

Description

【発明の詳細な説明】 〔発明の技術分野〕 この発明は、液晶表示素子の配向処理方法に関する。[Detailed description of the invention] [Technical field of invention] The present invention relates to an alignment treatment method for a liquid crystal display element.

〔従来技術〕[Prior art]

従来、液晶分子を電極基板の表面に対して所定の方向に
配向させるための処理方法としては、ラビング法と斜方
蒸着法が知られている。この場合、ラビング法は、電極
基板の表面を綿で一方向にこすり微細な溝を形成する方
法であり、また、斜方蒸着法は電極基板の表面に対して
一定の斜め上方より酸化シリコン(SiO)等を蒸着し
、基板表面上に膳化シリコン分子を斜めにそろえて配列
形成する方法である。
Conventionally, a rubbing method and an oblique evaporation method are known as processing methods for aligning liquid crystal molecules in a predetermined direction with respect to the surface of an electrode substrate. In this case, the rubbing method is a method in which the surface of the electrode substrate is rubbed in one direction with cotton to form fine grooves, and the oblique evaporation method is a method in which silicon oxide ( In this method, SiO) or the like is vapor-deposited to form an array of diagonally aligned silicon molecules on the surface of the substrate.

〔従来技術の問題点〕[Problems with conventional technology]

しかしながら、上記ラビング法によれば、綿の繊維が電
極基板に付着して配向不良を起すおそれがある。また、
斜方蒸着法によれば、コスト高となる他、一定の位置か
ら蒸着するため大型の基板に対しては、全体を均一に蒸
着することはできず、蒸着方向のずれから配向方向がず
れるという欠点があった。
However, according to the above-mentioned rubbing method, there is a risk that cotton fibers may adhere to the electrode substrate and cause alignment defects. Also,
According to the oblique evaporation method, in addition to being expensive, it is not possible to uniformly evaporate the entire surface of a large substrate because the evaporation is performed from a fixed position, and the alignment direction may shift due to deviations in the evaporation direction. There were drawbacks.

〔発明の目的〕[Purpose of the invention]

この発明は、上述した事情を背景になされたもので、そ
の目的とするところは、配向処理する過程で電極基板を
汚さず、また電極基板の大きさに拘らず、均一な配向処
理を可能とした液晶表示素子の配向処理方法を提供する
ことにある。
This invention was made against the background of the above-mentioned circumstances, and its purpose is to avoid contaminating the electrode substrate during the alignment process and to enable uniform alignment regardless of the size of the electrode substrate. An object of the present invention is to provide a method for aligning a liquid crystal display element.

〔発明の要点〕[Key points of the invention]

この発明は、上述した目的を達成するために、電極基板
上にコーティングされた高分子樹脂膜に対して流体を所
定角度で高圧噴射して高分子樹脂膜に微細な溝状凹凸面
を形成する点を要旨とするものである。
In order to achieve the above-mentioned object, this invention sprays a fluid at high pressure at a predetermined angle onto a polymer resin film coated on an electrode substrate to form a fine groove-like uneven surface on the polymer resin film. The main points are the main points.

〔実施例〕〔Example〕

以下、この発明を図面に示す一実施例に基づいて具体的
に説明する。第1図は配向処理部の外観斜視図で、液晶
セルが製造される過程において、電極基板の表面に高分
子樹脂jl(〆リイミド、シラン等)をコーティングす
る工程が経過すると、第1図に示すように、ベルトコン
ベアA上に支持固定された電極基板1が配向処理部に搬
送される。
Hereinafter, the present invention will be specifically described based on an embodiment shown in the drawings. Figure 1 is an external perspective view of the alignment processing section. In the process of manufacturing a liquid crystal cell, after the process of coating the surface of the electrode substrate with a polymer resin (limide, silane, etc.), the process shown in Figure 1. As shown, an electrode substrate 1 supported and fixed on a belt conveyor A is conveyed to an alignment processing section.

この配向処理部はベルトコンベア人の上方に細長い管状
の噴射ノズル2がベルトコンベア人の幅方向に沿って配
置されてなるもので、この噴射ノズル2は高圧で圧縮し
た液体をベルトコンベアA上の電極基板1の表面(高分
子樹脂膜3の表面ンに対して斜め上方から噴射するため
に、噴射ノズル2の一側部には、その長手方向に沿って
多数の噴射口2a・・・が形成されている。この場合、
ベルトコンペア人に乗って矢印方向く図中、左方向〕に
搬送されて来る電極基板1に対して噴射ノズル2は、電
極基板1の搬送方向に対向する斜め上方から液体を噴射
する。この場合、本実施例においては、液晶の噴射角度
が11112図に示すように電極基板1の表面に対して
30度程度となるように設定されている。また、噴射ノ
ズル2から放出される液体は、7レオン等の低沸点の溶
剤が用いられている。
This orientation processing section consists of an elongated, tubular injection nozzle 2 arranged above the belt conveyor person along the width direction of the belt conveyor person. In order to spray from diagonally above the surface of the electrode substrate 1 (the surface of the polymer resin film 3), one side of the spray nozzle 2 has a large number of spray ports 2a along its longitudinal direction. formed. In this case,
The spray nozzle 2 sprays liquid onto the electrode substrate 1, which is conveyed by a belt comparer in the direction of the arrow (to the left in the figure), from diagonally above, facing the direction of conveyance of the electrode substrate 1. In this case, in this embodiment, the injection angle of the liquid crystal is set to be approximately 30 degrees with respect to the surface of the electrode substrate 1, as shown in FIG. 11112. Further, the liquid discharged from the injection nozzle 2 uses a low boiling point solvent such as 7 Leon.

このように電極基板1の表面に高分子樹脂膜3をコーテ
ィングした後、配向処理が施されるが、この配向処理は
液体を高圧噴射することにより行なわれる。この結果、
電極基板1上の高分子樹脂M3に微細な溝状凹凸面を容
易に形成することができ、また、液体によってゴ膚等を
洗い流すことができるので、ゴ4等による配向不良がな
く、更に電極基板1の大きさに拘らず、電極基板全体に
均一した配向処理が可能となる。
After coating the surface of the electrode substrate 1 with the polymer resin film 3 in this manner, an alignment process is performed, and this alignment process is performed by jetting a liquid at high pressure. As a result,
It is possible to easily form a fine groove-like uneven surface on the polymer resin M3 on the electrode substrate 1, and since the dirt can be washed away with the liquid, there is no alignment defect caused by the dirt etc., and the electrode Regardless of the size of the substrate 1, uniform alignment processing can be performed on the entire electrode substrate.

次に、fIIIi3図を参照して本実施例に係る配向処
理システムについて説明する。配向処理槽Bにおいて、
噴射ノズル2から放出された液体は、この配向処理槽B
の底部傾斜面を通って配向処理槽Bと連続するペーパー
乾燥槽0に流入し、その底部に溜められる。また、ベル
)コンベア人および電極基板1上に付着している液体は
、配向処理槽Bからペーパー乾燥槽0に送られると、ベ
ルトコンベアAの下方に配置されたヒータDで加熱され
る。
Next, the alignment processing system according to this embodiment will be explained with reference to FIG. fIIIi3. In the orientation treatment tank B,
The liquid ejected from the injection nozzle 2 is transferred to the alignment treatment tank B.
It flows into the paper drying tank 0 which is continuous with the orientation treatment tank B through the bottom slope of the paper drying tank 0, and is stored at the bottom of the paper drying tank 0. Further, when the liquid adhering to the belt conveyor and the electrode substrate 1 is sent from the orientation processing tank B to the paper drying tank 0, it is heated by a heater D arranged below the belt conveyor A.

この場合、液体はフレオン等の低沸点の液体であるため
、加熱されると部座に気化蒸発し、ペーパー乾燥槽C内
に充満するようになるが、ペーパー乾燥槽Cの上部に設
けられた冷却管Bで凝縮され、ペーパー乾燥槽Cの底部
に溜められる。このようにしてペーパー乾燥槽Cの底部
に溜められた液体は、ドレインrから導出され、水分を
分離する処理、次でフィルターで濾過する処理が行なわ
れたのち、コンプレッサで圧縮され、噴射ノズル2かも
放出される。なお、ペーパー乾燥槽0を通過した電極基
板lは、ベルトコンベア人に乗って次の工程に送られる
In this case, the liquid is a low boiling point liquid such as Freon, so when it is heated, it vaporizes in the area and fills the paper drying tank C. It is condensed in the cooling pipe B and stored at the bottom of the paper drying tank C. The liquid accumulated at the bottom of the paper drying tank C in this way is led out from the drain r, subjected to a process of separating moisture and then a process of filtration with a filter, and then compressed by a compressor and sent to the injection nozzle 2. It may also be released. Note that the electrode substrate 1 that has passed through the paper drying tank 0 is sent to the next process on a belt conveyor.

このように電極基板1がベルトコンベア人に乗ってペー
パー乾燥槽0を通過することにより、電極基板1上の液
体が気化されるので、汚れのないきれいな配向処理され
た電極基板が連続的に得られる。また、上記システムに
おいては、液体を循環させて再使用するようにしたので
、経済的である。
As the electrode substrate 1 passes through the paper drying tank 0 on the conveyor belt in this manner, the liquid on the electrode substrate 1 is vaporized, so that clean, clean, aligned electrode substrates are continuously obtained. It will be done. Further, in the above system, the liquid is circulated and reused, so it is economical.

なお、上記実施例においては、液体のみを噴射して配向
処理を行うようにしたが気体を噴射するようにしても良
く、また、液体にアルミナ等の微粒子を混合させて噴射
するようにすれば、より一層効果的な配向処理が可能と
なる。その他、この発明を逸脱しない範囲内において、
種々変形応用可能である。
In the above embodiment, only the liquid was injected to perform the alignment process, but gas may also be injected, or fine particles such as alumina may be mixed with the liquid and injected. , even more effective alignment treatment becomes possible. In addition, within the scope of this invention,
Various modifications and applications are possible.

〔発明の効果〕〔Effect of the invention〕

この発明は、以上詳細に説明したように、電極基板上に
コーティングされた高分子樹脂膜に対して流体を所定角
度で高圧噴射するようにしたから、高分子樹脂膜に微細
な溝状凹凸面を容易に形成することができ、また、流体
によってゴし等をも洗い流すことができるためゴミ等に
よる配向不良がなく、また電極基板の大きさに拘らず、
電極基板全体に均一した配向処理が可能となる。更に、
連続処理による大量生産に適するなど、コスト的にも有
利である。
As explained in detail above, this invention sprays fluid at high pressure at a predetermined angle onto the polymer resin film coated on the electrode substrate, so that the polymer resin film has fine groove-like uneven surfaces. In addition, since dirt and grime can be washed away with fluid, there is no orientation defect due to dust, etc., and regardless of the size of the electrode substrate,
Uniform alignment treatment can be performed over the entire electrode substrate. Furthermore,
It is also advantageous in terms of cost, as it is suitable for mass production through continuous processing.

【図面の簡単な説明】[Brief explanation of drawings]

図面はこの発明の一実施例を示し、第1図は配向処理部
の外観斜視図、第2図はその側面図、第3図は配向処理
システムを説明するための図である。 1・・・・・・電極基板、2・・・・・・噴射ノズル、
3・・・・・・高分子樹脂膜。 特許出願人 カシオ計算機株式会社 第1図 第2図 第3図
The drawings show an embodiment of the present invention; FIG. 1 is an external perspective view of an alignment processing section, FIG. 2 is a side view thereof, and FIG. 3 is a diagram for explaining an alignment processing system. 1... Electrode substrate, 2... Injection nozzle,
3...Polymer resin film. Patent applicant Casio Computer Co., Ltd. Figure 1 Figure 2 Figure 3

Claims (1)

【特許請求の範囲】[Claims] 電極基板の表面に高分子樹脂膜をコーティングした後、
液晶分子を所定の方向に配向させるために前記電極基板
上の高分子樹脂膜に対して噴射ノズルから流体を所定角
度で高圧噴射して前記高分子樹脂膜に微細な溝状凹凸面
を形成したことを特徴とする液晶表示素子の配向処理方
法。
After coating the surface of the electrode substrate with a polymer resin film,
In order to orient the liquid crystal molecules in a predetermined direction, a fluid was jetted at a high pressure at a predetermined angle from an injection nozzle to the polymer resin film on the electrode substrate to form a fine groove-like uneven surface on the polymer resin film. A method for aligning a liquid crystal display element, characterized in that:
JP26044884A 1984-12-10 1984-12-10 Liquid crystal display device alignment treatment method Expired - Lifetime JPH0723935B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26044884A JPH0723935B2 (en) 1984-12-10 1984-12-10 Liquid crystal display device alignment treatment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26044884A JPH0723935B2 (en) 1984-12-10 1984-12-10 Liquid crystal display device alignment treatment method

Publications (2)

Publication Number Publication Date
JPS61138231A true JPS61138231A (en) 1986-06-25
JPH0723935B2 JPH0723935B2 (en) 1995-03-15

Family

ID=17348074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26044884A Expired - Lifetime JPH0723935B2 (en) 1984-12-10 1984-12-10 Liquid crystal display device alignment treatment method

Country Status (1)

Country Link
JP (1) JPH0723935B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6396631A (en) * 1986-10-13 1988-04-27 Matsushita Electric Ind Co Ltd Preparation of liquid crystal display element
JPH0346625A (en) * 1989-07-14 1991-02-27 Matsushita Electric Ind Co Ltd Production of oriented film for liquid crystal display
JPH0359622A (en) * 1989-07-28 1991-03-14 Hoechst Japan Ltd Liquid crystal display element
JPH03163527A (en) * 1989-11-22 1991-07-15 Matsushita Electric Ind Co Ltd Production of liquid crystal element
JPH05281542A (en) * 1992-03-31 1993-10-29 Nec Corp Liqid crystal orientation processing method and device therefor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6396631A (en) * 1986-10-13 1988-04-27 Matsushita Electric Ind Co Ltd Preparation of liquid crystal display element
JPH0346625A (en) * 1989-07-14 1991-02-27 Matsushita Electric Ind Co Ltd Production of oriented film for liquid crystal display
JPH0359622A (en) * 1989-07-28 1991-03-14 Hoechst Japan Ltd Liquid crystal display element
JPH03163527A (en) * 1989-11-22 1991-07-15 Matsushita Electric Ind Co Ltd Production of liquid crystal element
JPH05281542A (en) * 1992-03-31 1993-10-29 Nec Corp Liqid crystal orientation processing method and device therefor

Also Published As

Publication number Publication date
JPH0723935B2 (en) 1995-03-15

Similar Documents

Publication Publication Date Title
US7806986B2 (en) Substrate cleaning apparatus and substrate cleaning method using the same
US6118511A (en) Manufacturing method of liquid crystal display panel and cleaning apparatus for use therein
JP3070511B2 (en) Substrate drying equipment
KR20060040559A (en) Cleaning equipment and methods for wave glass plate producing flat-lightening lamp
JP2572915B2 (en) Liquid crystal display device and method of manufacturing the same
JPS61138231A (en) Orientation treating method of liquid-crystal display element
KR101736783B1 (en) An eco-friendly Steam Cleaning System
JP2000105078A (en) Airknife and drying treatment apparatus using the same
KR20020096997A (en) Method of fabricating liquid crystal display device
KR20040110783A (en) Air knife apparatus
JP2007317802A (en) Apparatus and method of dry-processing substrate
JP3050957B2 (en) Liquid crystal display element manufacturing method
JP2002043266A (en) Substrate processing apparatus and method, liquid cutting mist-knife
JP2003002694A (en) Post-sealing single wafer cleaning device and method for cleaning
US6625836B1 (en) Apparatus and method for cleaning substrate
JP2000349059A (en) Manufacture of semiconductor device and manufacturing device therefor
US20200026130A1 (en) Method of producing glass substrate for liquid crystal display device
KR20040061813A (en) cleaning and dry device and the method
JP2001314827A (en) Method and apparatus for cleaning substrate
JPH0764091A (en) Method for cleaning square substrate after rubbing treatment and device therefor
KR101184063B1 (en) Apparatus For Fabricating Liquid Crystal Display Panel
JPH0329919A (en) Method for washing glass substrate of liquid crystal display element
JP3198504B2 (en) Manufacturing method of liquid crystal display device
JP2001284310A (en) Apparatus and method for treating substrate
KR100206573B1 (en) Liquid crystal display device manufacture method