JPS61137153A - 基材へのシ−トの密着方法 - Google Patents

基材へのシ−トの密着方法

Info

Publication number
JPS61137153A
JPS61137153A JP59258879A JP25887984A JPS61137153A JP S61137153 A JPS61137153 A JP S61137153A JP 59258879 A JP59258879 A JP 59258879A JP 25887984 A JP25887984 A JP 25887984A JP S61137153 A JPS61137153 A JP S61137153A
Authority
JP
Japan
Prior art keywords
plate
base material
disks
sheet
glass plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59258879A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0248108B2 (enrdf_load_stackoverflow
Inventor
Hideo Sato
英男 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KITAMURA KK
Original Assignee
KITAMURA KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KITAMURA KK filed Critical KITAMURA KK
Priority to JP59258879A priority Critical patent/JPS61137153A/ja
Publication of JPS61137153A publication Critical patent/JPS61137153A/ja
Publication of JPH0248108B2 publication Critical patent/JPH0248108B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59258879A 1984-12-07 1984-12-07 基材へのシ−トの密着方法 Granted JPS61137153A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59258879A JPS61137153A (ja) 1984-12-07 1984-12-07 基材へのシ−トの密着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59258879A JPS61137153A (ja) 1984-12-07 1984-12-07 基材へのシ−トの密着方法

Publications (2)

Publication Number Publication Date
JPS61137153A true JPS61137153A (ja) 1986-06-24
JPH0248108B2 JPH0248108B2 (enrdf_load_stackoverflow) 1990-10-24

Family

ID=17326296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59258879A Granted JPS61137153A (ja) 1984-12-07 1984-12-07 基材へのシ−トの密着方法

Country Status (1)

Country Link
JP (1) JPS61137153A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6327845A (ja) * 1986-07-22 1988-02-05 Kitamura:Kk 真空密着焼付機
JPH0850335A (ja) * 1995-07-07 1996-02-20 Dainippon Screen Mfg Co Ltd 焼枠装置の密着方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6327845A (ja) * 1986-07-22 1988-02-05 Kitamura:Kk 真空密着焼付機
JPH0850335A (ja) * 1995-07-07 1996-02-20 Dainippon Screen Mfg Co Ltd 焼枠装置の密着方法

Also Published As

Publication number Publication date
JPH0248108B2 (enrdf_load_stackoverflow) 1990-10-24

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