JPS6113553Y2 - - Google Patents

Info

Publication number
JPS6113553Y2
JPS6113553Y2 JP1981051979U JP5197981U JPS6113553Y2 JP S6113553 Y2 JPS6113553 Y2 JP S6113553Y2 JP 1981051979 U JP1981051979 U JP 1981051979U JP 5197981 U JP5197981 U JP 5197981U JP S6113553 Y2 JPS6113553 Y2 JP S6113553Y2
Authority
JP
Japan
Prior art keywords
substrate
discharge
gas
sputtering
width direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1981051979U
Other languages
English (en)
Japanese (ja)
Other versions
JPS57167763U (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1981051979U priority Critical patent/JPS6113553Y2/ja
Publication of JPS57167763U publication Critical patent/JPS57167763U/ja
Application granted granted Critical
Publication of JPS6113553Y2 publication Critical patent/JPS6113553Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP1981051979U 1981-04-13 1981-04-13 Expired JPS6113553Y2 (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1981051979U JPS6113553Y2 (enExample) 1981-04-13 1981-04-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1981051979U JPS6113553Y2 (enExample) 1981-04-13 1981-04-13

Publications (2)

Publication Number Publication Date
JPS57167763U JPS57167763U (enExample) 1982-10-22
JPS6113553Y2 true JPS6113553Y2 (enExample) 1986-04-26

Family

ID=29848688

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1981051979U Expired JPS6113553Y2 (enExample) 1981-04-13 1981-04-13

Country Status (1)

Country Link
JP (1) JPS6113553Y2 (enExample)

Also Published As

Publication number Publication date
JPS57167763U (enExample) 1982-10-22

Similar Documents

Publication Publication Date Title
JPS6113553Y2 (enExample)
JPS57134555A (en) Method and device for forming thin film
FR2344642A1 (fr) Procede de realisation de depots metalliques sur des supports en nitrure de bore
JPS6214226B2 (enExample)
JP2004091821A5 (enExample)
JPH0217002Y2 (enExample)
JPH09292198A (ja) 熱交換器、熱交換器用管支持板及びその製造方法
Hamamura et al. Corrosion Resistant Permanent Magnet
JPH0132174Y2 (enExample)
JP2002129317A (ja) 反応性スパッタにおける反応性ガス導入装置
WO2020117725A3 (en) Method for deposition of highly selective metal films
JPH02131547U (enExample)
JPH0232949Y2 (enExample)
JPS63266071A (ja) 薄膜の形成方法
JPS6067656A (ja) 真空蒸着方法
JPH0259754A (ja) ロータリースクリーン印刷用メタルマスク材の製造方法
Moriya et al. Method of Forming Thin Film
JPS58134128A (ja) 蒸着膜の形成方法
JPH0350324U (enExample)
JPS57153411A (en) Magnetic recording medium and its manufacture
JPS57138128A (en) Cvd device
JPS5515285A (en) Forming method for indium-antimony thin film
JPS61270371A (ja) 真空蒸着装置
JPH0499021A (ja) 半導体製造装置
JPS63262459A (ja) スパツタリング装置