JPS61135211A - Microwave semiconductor amplifier - Google Patents

Microwave semiconductor amplifier

Info

Publication number
JPS61135211A
JPS61135211A JP25865984A JP25865984A JPS61135211A JP S61135211 A JPS61135211 A JP S61135211A JP 25865984 A JP25865984 A JP 25865984A JP 25865984 A JP25865984 A JP 25865984A JP S61135211 A JPS61135211 A JP S61135211A
Authority
JP
Japan
Prior art keywords
electrode
microstrip line
line
source
bonding pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25865984A
Other languages
Japanese (ja)
Inventor
Susumu Sakamoto
進 阪本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP25865984A priority Critical patent/JPS61135211A/en
Publication of JPS61135211A publication Critical patent/JPS61135211A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0237High frequency adaptations
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/341Surface mounted components
    • H05K3/3421Leaded components

Abstract

PURPOSE:To eliminate the cause of deterioration in a high frequency characteristic and reduction of the yield of mass production, by positioning the bonding pad side of an FET against a microstrip line and connecting the bonding pad and the microstrip line by means of a metallic thin plate having a low level of resistance. CONSTITUTION:An FET7 is set with its side containing the bonding pads of electrodes of a gate electrode 8, source electrode 9 and a drain electrode 10 respectively set against the microstrip line of an MIC substrate 1. These electrodes 8-10 of the FET7 are connected to a gate electrode transmission line 5, a source earthed electrode 3 and a drain transmission line 6 via gold ribbons 16-18 respectively. The spaces among the electrodes 8-10 and the line 5, the electrode 3 and the line 6 can be reduced down to the thickness of the gold ribbon. This can avoid the reduction of yield due to the variance of length of a bonding wire as well as the deterioration of high frequency characteristic.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、マイクル波集積回路基板(Micr。[Detailed description of the invention] [Industrial application field] This invention relates to a microwave integrated circuit board (Micr).

wave  I C1、以下MIC基板という)上へ電
界効果トランジスタ(以下FITという)を装着したマ
イクロ波半導体増幅器に関するもの、である。・〔従来
の技術〕 第3図は従来のMIC基板を用いたマイクロ波半導体増
幅器の平面図であり、第4図(a)は第3図の破線で囲
ったA部の拡大平面図であり、第4図(b)は第4図(
a)のa−c’s<おける断面図である。第3図および
第4図(a)(b)において、1はマイク−波帯におけ
る低誘電体損失を有するセラミックからなるMIC基板
、2はこのMIC基板1の裏面に同時焼成法やメッキ法
で形成されたタングステン、ニラグル、金の多層金属膜
からなる接地導体、3はこの接地導体2と同株の多層金
S膜からなるソース接地電極、4は前記接地導体2と、
ソース接地電極3とヲ接続するスルーホー→シ ル、5は前記接地導体2と同株の多層金属からなり、マ
イクロストリップ線路によって増幅器の入出力整合回路
を構成するゲート電極伝送線路、6はこのゲート電極伝
送線路5と同様にして構成されたトンイン電極伝送線路
、1は前記ソース接地電極3上に装着されたFET、8
・、9および10はそれぞれこのFET7のゲート電極
、ソース電極、トノイン電極であり、このゲート電極8
.ソース電極9.トノイン電極10のそれぞれのボンデ
ィングパッド面を上面に向けている。1.1.12およ
び13はそれぞれゲート電極8とゲート電極伝送線路5
の間、ソース電極9とソース接地電極30間、トノイン
電極10とトノイン電極伝送線路60間l接続するゲー
トポンディングワイヤ。
This invention relates to a microwave semiconductor amplifier in which a field effect transistor (hereinafter referred to as FIT) is mounted on a wave I C1 (hereinafter referred to as MIC substrate). - [Prior art] Fig. 3 is a plan view of a microwave semiconductor amplifier using a conventional MIC substrate, and Fig. 4 (a) is an enlarged plan view of part A surrounded by a broken line in Fig. 3. , Fig. 4(b) is shown in Fig. 4(
It is a sectional view taken along a-c's< of a). In Fig. 3 and Fig. 4 (a) and (b), 1 is an MIC substrate made of ceramic having low dielectric loss in the microwave band, and 2 is a MIC substrate formed by co-firing or plating on the back side of this MIC substrate 1. A ground conductor made of a multilayer metal film of tungsten, Nilaglu, and gold, 3 a source ground electrode made of a multilayer gold S film made of the same material as the ground conductor 2, 4 the ground conductor 2,
5 is made of the same multilayer metal as the ground conductor 2, and is a gate electrode transmission line that constitutes an input/output matching circuit of the amplifier using a microstrip line. A tunnel-in electrode transmission line configured in the same manner as the transmission line 5; 1 is an FET mounted on the source grounded electrode 3; 8;
, 9 and 10 are the gate electrode, source electrode, and tonoin electrode of this FET 7, respectively, and this gate electrode 8
.. Source electrode 9. The bonding pad surface of each of the Tonoin electrodes 10 faces upward. 1.1.12 and 13 are the gate electrode 8 and gate electrode transmission line 5, respectively.
A gate bonding wire is connected between the source electrode 9 and the source grounded electrode 30, and between the Tonoin electrode 10 and Tonoin electrode transmission line 60.

ソースポンディングワイヤおよびドVインポンディング
ワイヤであり、14.15はそれぞれ前記FET7にD
Cバイアスを供給するために、ゲート電極伝送線135
.トノイン電極伝送線路6に接続されてマイクロ波特性
に影響を与えないように構成されたゲート亀源端子、ド
Vイン蝋源端子である。
14.15 is the source bonding wire and the source bonding wire, and 14.15 is the D
Gate electrode transmission line 135 to supply C bias
.. This is a gate source terminal and a dome source terminal which are connected to the inlet electrode transmission line 6 and configured so as not to affect the microwave characteristics.

従来のマイクロ波半導体増幅器は上記のように構成され
、ゲート電源端子14、ドVイン電源端子15よりFE
T7にDCバイアス電圧ン印加することにより動作させ
ることができる。このとき、FIT 7の入出力インピ
ーダンスはゲート’ML極伝送線路5、トノイン電極伝
送線路6により特定のインピーダンス(通常マイクロ波
帯では50オームが用いられる)に整合される。そして
、この整合状態はFET7とゲート電極伝送線路5の長
さ。
The conventional microwave semiconductor amplifier is configured as described above, and the FE is
It can be operated by applying a DC bias voltage to T7. At this time, the input/output impedance of the FIT 7 is matched to a specific impedance (usually 50 ohms is used in the microwave band) by the gate'ML pole transmission line 5 and the tonoin electrode transmission line 6. This matching state is the length of the FET 7 and the gate electrode transmission line 5.

形状、トノイン電極伝送線路6の長さ、形状により決定
される。
It is determined by the shape, length and shape of the Tonoin electrode transmission line 6.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記のような従来の半導体増幅器では、FET7とゲー
ト電極伝送線路5.トンイン電極伝送線路6.ソース接
地電極3との間がゲートポンディングワイヤ11.ソー
スポンディングワイヤ12゜ドVインポンディングワイ
ヤ13により接続されているため、ワイヤ長さにより整
合条件が変化し、マイクロ波半導体増幅器の動作周波数
が高くなるにつれてワイヤ長さの影響が大きくなるため
、ワイヤ長さの制御の精度が必要となると共に、歩留り
低下の原因であった。また、ソースポンディングワイヤ
12により、FET7のソースが高周波的に接地されな
いので、特硅が低下するため、ソースポンディングワイ
ヤ12の長さt短(する必要がある等の問題点があった
In the conventional semiconductor amplifier as described above, the FET 7 and the gate electrode transmission line 5. Ton-in electrode transmission line6. The gate bonding wire 11 is connected to the source ground electrode 3. Since the source bonding wire 12° is connected by the V imponding wire 13, the matching conditions change depending on the wire length, and as the operating frequency of the microwave semiconductor amplifier becomes higher, the influence of the wire length increases. This required precision control of the wire length and was a cause of a decrease in yield. Further, since the source of the FET 7 is not grounded at high frequency by the source bonding wire 12, the specific resistance is lowered, so there is a problem that the length of the source bonding wire 12 must be shortened by t.

この発明は、かかる問題点を解決するためになされたも
ので、ソースポンディングワイヤの長さを短くすること
により高周波特性の低下や、量産時の歩留まり低下の原
因を除去することができるマイクロ波半導体増幅器を得
ることを目的とする。
This invention was made to solve this problem, and by shortening the length of the source bonding wire, it is possible to eliminate the cause of deterioration of high frequency characteristics and the decrease in yield during mass production. The purpose is to obtain a semiconductor amplifier.

〔問題点を解決するための手段〕[Means for solving problems]

この発明に係るマイク−回生導体増幅器は、FETのボ
ンディングパッドのある面vMIc基板上のマイクロス
トリップ線路に面して位置させ、前記ボンディングパッ
ドと前記マイクロストリップ線路の間を金リボンまたは
金線等からなる低抵抗の金属薄板により接続したもので
ある。
In the microphone-regenerative conductor amplifier according to the present invention, a surface with a bonding pad of an FET is positioned facing a microstrip line on a vMIc substrate, and a gold ribbon or gold wire is connected between the bonding pad and the microstrip line. The connection is made using a thin metal plate with low resistance.

〔作用〕[Effect]

この発明においては、FETのボンディングパッドのあ
る面)2MIc基板上のマイクロストリップ線路に面し
て位置させ、前記ボンディングパッドと前記マイクロス
トリップ線路の間を金リボンまたは金線等からなる低抵
抗の金属薄板により長さに影響されずに接続される。
In this invention, the bonding pad of the FET is positioned facing the microstrip line on the 2MIc substrate, and a low-resistance metal such as a gold ribbon or gold wire is connected between the bonding pad and the microstrip line. The thin plates allow connections without being affected by length.

〔実施例〕〔Example〕

第1図はこの発明の一実施例を示す平面図であり、第2
図(a)は第1図の破線で囲ったA部の拡大平面図、第
2図(b)は第2図(a)のB −B’線にお(する断
面図である。第1図、第2図(a)、  (b)におい
て、符号1〜10および14.15は第3図、第4図(
a)、  (b)K示すものと同一であり。
FIG. 1 is a plan view showing one embodiment of the present invention, and FIG.
Figure (a) is an enlarged plan view of part A surrounded by the broken line in Figure 1, and Figure 2 (b) is a sectional view taken along line B-B' in Figure 2 (a). 2(a) and (b), the numbers 1 to 10 and 14.15 are shown in FIGS. 3 and 4 (
a), (b) are the same as those shown in K.

FET7はゲート電極8.ソース電極9.ドンイ:/[
極10の各電極のそれぞれのボンディングパッドのある
面YMIC基板1のマイクロストリップ線路に面して装
着されている。16は前記ゲート電極8とゲート電極伝
送線路5の間を接続する金製のゲートリボン、1γは前
記ソース電極9とソース接地電極3との間?後続する金
製のソースリボン、18は前記ドVイン屯極1Gとトン
イン電極伝送線路6との間?接続する金製のド/インリ
ボンである。そして、FETTVcDCバイアスを供給
するためのゲートil(源端子14.ドレイン電源端子
15はマイクロ波特性に影響を与えないように構成され
ている。
FET7 has a gate electrode 8. Source electrode 9. Dong Yi: / [
The surface of each electrode of the pole 10 with its respective bonding pad is mounted facing the microstrip line of the YMIC substrate 1. 16 is a gold gate ribbon connecting between the gate electrode 8 and the gate electrode transmission line 5, and 1γ is between the source electrode 9 and the source ground electrode 3. The subsequent gold source ribbon 18 is between the dovetail electrode 1G and the tone-in electrode transmission line 6? It is a gold do/in ribbon that connects. The gate il (source terminal 14 and drain power supply terminal 15) for supplying the FETTVcDC bias is configured so as not to affect the microwave characteristics.

上記のように構成されたマイクロ波半導体増幅器におい
ては、ゲート電極伝送線路5とトンイン電極伝送線6の
長さ、形状によりきまる整合回路により特定のインピー
ダンスに整合されたFET7にゲート電源端子14.ド
メイン電源端子15によりD’Cバイアス電圧を印加す
ることにより動作させることは従来例と同様であるが、
FET7の各電極YMIC基板1のマイクロストリップ
線路側に面して位置させ、ゲートリボン16.ソースリ
ボンIf  ド/インリボン1aにより接続させたため
、従来例ではポンディングワイヤの長さgFET7の厚
みd以下にすることおよびポンディングワイヤの長さの
制御tすることは困難であったが、この実施例によれば
、FET7の各電極とゲート電極伝送線路5.ソース接
地電極3.ドVイ/1jL極伝送巌路6との間隔は金リ
ボンの厚みまで縮少が可能であり、第3図、第4図の従
来例のポンディングワイヤの場合の長さに比べて金リボ
ンの厚みの制御が非常に容易となる。したがって、高周
波での特性の低下やポンディングワイヤの長さのバラツ
キによる歩留まりの低下の原因を除去することができる
In the microwave semiconductor amplifier configured as described above, the FET 7 is connected to the gate power terminal 14, which is matched to a specific impedance by a matching circuit determined by the length and shape of the gate electrode transmission line 5 and the tunnel electrode transmission line 6. Although it is operated by applying a D'C bias voltage from the domain power supply terminal 15 as in the conventional example,
Each electrode of the FET 7 is positioned facing the microstrip line side of the YMIC substrate 1, and the gate ribbon 16. In the conventional example, it was difficult to make the length of the bonding wire less than the thickness d of the FET 7 and to control the length of the bonding wire because the source ribbon If was connected by the do/in ribbon 1a. According to the embodiment, each electrode of the FET 7 and the gate electrode transmission line 5. Source ground electrode 3. The distance between the wire and the wire 6 can be reduced to the thickness of the gold ribbon, and compared to the length of the conventional bonding wire shown in FIGS. It becomes very easy to control the thickness. Therefore, it is possible to eliminate the causes of a decrease in yield due to deterioration of characteristics at high frequencies and variations in the length of bonding wires.

なお、上記実施例では、FET7の各電極とMIC基板
1のマイクロストリップ線路の接続を金製のリボンで行
ったが、金線やその他の金属でっ(られたリボンや細い
線であってもよい。
In the above embodiment, each electrode of the FET 7 and the microstrip line of the MIC board 1 were connected using a gold ribbon, but even ribbons or thin wires made of gold wire or other metals may be used. good.

〔発明の効果〕〔Effect of the invention〕

この発明は以上説明したとおり、FETのボンディング
パッドの面をマイクロストリップ線路に面して位置させ
、 II+前記ボンディングパッドと前記マイクロスト
リップ線路の間を低抵抗の金属薄板で接続したので、歩
留りのよい、高性能のマイクロ波半導体増幅器が得られ
る。
As explained above, in this invention, the surface of the bonding pad of the FET is located facing the microstrip line, and the bonding pad and the microstrip line are connected by a thin metal plate with low resistance, resulting in a high yield. , a high-performance microwave semiconductor amplifier can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の一実施例のマイクロ波半導体増幅器
の平面図、第2図(a)は第1図の破線で囲ったA部の
拡大平面図、第2図(b)は第2図偽)のB−B’紛に
おける断面図、第3図は従来のマイクロ波半導体増幅器
の平面図、第4図(&)は第3図の破線で囲ったA部の
拡大平面図、第4図(b)は第4図(IL)のC−G’
線にお1する・断面図である。 図において、1はMIC基板、2は接地導体、3はソー
ス接地電極、4はスルーホール、5はゲート電極伝送線
路、6はトンイン電極伝送線路。 TはFET、8はゲート電極、9はソース電極。 10はドVイン電極、14はゲート電源端子、15はド
Vイン電源端子、1Bはゲートリボン、17はソースリ
ボン、18はドレインリボンである。 なお、各図中同一符号は同一または相当部分を示す。 代理人 大 岩 増雄 (外2名) 第1図 1:MIC,1版          14:ゲートを
湧」褐子第2図 2:膝用導体 4ニスルーネール 8: ゲート41皐賑 第4図 手続補正書(自発) 彫 皐0看1h 1、事件の表示   特願昭59−258659号2、
発明の名称   マイクロ波半導体増幅器3、補正をす
る者 5゜補正の対象 明細書の発明の詳細な説明の欄 6、補正の内容 明細書第4頁19行、第5頁1行、2行の「ワイヤ長さ
」を、いずれも「ワイヤ長」と補正する。 以上
FIG. 1 is a plan view of a microwave semiconductor amplifier according to an embodiment of the present invention, FIG. 2(a) is an enlarged plan view of the section A surrounded by the broken line in FIG. Fig. 3 is a plan view of a conventional microwave semiconductor amplifier, Fig. 4 (&) is an enlarged plan view of part A surrounded by the broken line in Fig. 3, Figure 4 (b) is CG' in Figure 4 (IL).
It is a cross-sectional view along the line. In the figure, 1 is a MIC board, 2 is a ground conductor, 3 is a source ground electrode, 4 is a through hole, 5 is a gate electrode transmission line, and 6 is a tunnel electrode transmission line. T is an FET, 8 is a gate electrode, and 9 is a source electrode. 10 is a doV-in electrode, 14 is a gate power supply terminal, 15 is a doV-in power supply terminal, 1B is a gate ribbon, 17 is a source ribbon, and 18 is a drain ribbon. Note that the same reference numerals in each figure indicate the same or corresponding parts. Agent: Masuo Oiwa (2 others) Figure 1 1: MIC, 1st edition 14: Gate wo Yuuko 2 Figure 2: Knee conductor 4 Niss run nail 8: Gate 41 Satoshi Figure 4 Procedure amendment ( Voluntary) Carving 0 views 1h 1, Indication of the incident Patent Application No. 1982-258659 2,
Title of the invention: Microwave semiconductor amplifier 3, Person making the amendment: 5 Detailed description of the invention in the specification subject to amendment 6, Description of amendments, page 4, line 19, page 5, lines 1 and 2 "Wire length" is corrected to "wire length" in both cases. that's all

Claims (3)

【特許請求の範囲】[Claims] (1)マイクロ波集積回路基板上に形成したマイクロス
トリップ線路と、電界効果トランジスタと、前記マイク
ロストリップ線路により構成される整合回路を備えたマ
イクロ波半導体増幅器において、前記電界効果トランジ
スタのボンディングパッドの面を、前記マイクロストリ
ップ線路に面して位置させ、前記ボンディングパッドと
前記マイクロストリップ線路の間を低抵抗の金属薄板で
接続したことを特徴とするマイクロ波半導体増幅器。
(1) In a microwave semiconductor amplifier comprising a microstrip line formed on a microwave integrated circuit board, a field effect transistor, and a matching circuit constituted by the microstrip line, a surface of a bonding pad of the field effect transistor is located facing the microstrip line, and the bonding pad and the microstrip line are connected by a thin metal plate with low resistance.
(2)ボンディングパッドとマイクロストリップ線路の
間を接続する低抵抗の金属薄板として金リボンを用いた
ことを特徴とする特許請求の範囲第(1)項記載のマイ
クロ波半導体増幅器。
(2) The microwave semiconductor amplifier according to claim (1), characterized in that a gold ribbon is used as a low-resistance metal thin plate connecting between the bonding pad and the microstrip line.
(3)ボンディングパッドとマイクロストリップ線路の
間を接続する低抵抗の金属薄板として金ワイヤを用いた
ことを特徴とする特許請求の範囲第(1)項記載のマイ
クロ波半導体増幅器。
(3) The microwave semiconductor amplifier according to claim (1), characterized in that a gold wire is used as a low-resistance thin metal plate connecting between the bonding pad and the microstrip line.
JP25865984A 1984-12-05 1984-12-05 Microwave semiconductor amplifier Pending JPS61135211A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25865984A JPS61135211A (en) 1984-12-05 1984-12-05 Microwave semiconductor amplifier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25865984A JPS61135211A (en) 1984-12-05 1984-12-05 Microwave semiconductor amplifier

Publications (1)

Publication Number Publication Date
JPS61135211A true JPS61135211A (en) 1986-06-23

Family

ID=17323318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25865984A Pending JPS61135211A (en) 1984-12-05 1984-12-05 Microwave semiconductor amplifier

Country Status (1)

Country Link
JP (1) JPS61135211A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2655195A1 (en) * 1989-11-24 1991-05-31 Mitsubishi Electric Corp Device with semi-conductors including screening against electromagnetic radiation and method of fabrication
US5109270A (en) * 1989-04-17 1992-04-28 Matsushita Electric Industrial Co., Ltd. High frequency semiconductor device
US5256590A (en) * 1989-11-24 1993-10-26 Mitsubishi Denki Kabushiki Kaisha Method of making a shielded semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5109270A (en) * 1989-04-17 1992-04-28 Matsushita Electric Industrial Co., Ltd. High frequency semiconductor device
FR2655195A1 (en) * 1989-11-24 1991-05-31 Mitsubishi Electric Corp Device with semi-conductors including screening against electromagnetic radiation and method of fabrication
US5256590A (en) * 1989-11-24 1993-10-26 Mitsubishi Denki Kabushiki Kaisha Method of making a shielded semiconductor device

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