JPS61129626A - Electrochromic apparatus - Google Patents

Electrochromic apparatus

Info

Publication number
JPS61129626A
JPS61129626A JP59250515A JP25051584A JPS61129626A JP S61129626 A JPS61129626 A JP S61129626A JP 59250515 A JP59250515 A JP 59250515A JP 25051584 A JP25051584 A JP 25051584A JP S61129626 A JPS61129626 A JP S61129626A
Authority
JP
Japan
Prior art keywords
lead wire
electrode
substrates
wire attachment
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59250515A
Other languages
Japanese (ja)
Inventor
Hisashi Nishiyama
久司 西山
Mamoru Mizuhashi
水橋 衞
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP59250515A priority Critical patent/JPS61129626A/en
Publication of JPS61129626A publication Critical patent/JPS61129626A/en
Pending legal-status Critical Current

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  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)

Abstract

PURPOSE:To improve an electrical reliability between an electrode and a fitting part of a lead wire, thereby increasing a yield of production and also to prevent a deterioration of a cell and to ensure a sealing of the titled apparatus by forming an electrode which coats a specific portion of the fitting part of the lead wire fixed on a tapered end surface of pair substrates. CONSTITUTION:In the titled apparatus in which an electrolyte is interposed between two substrates facing each other, and at least one of said two substrates provides an electrode and the fitting part of the lead wire supplying a voltage to the electrode from an external power source, and also the layer of electrochromics is formed on at least one of the substrates. the electrode 93 is formed on at least one of the two substrates by coating the specific portion of the fitting part of the lead wire 92 fixed on an end surface of the tapered substrate 91 with a specific angle.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明はエレクトロクロミック(以下r ECJと略記
する)装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an electrochromic (hereinafter abbreviated as rECJ) device.

[従来の技術] 電界を加えるとイオン交換反応が起り発消色現象を程す
るEC物質を用いた表示装置、調光窓、調光鏡等のEC
装置が用いられている。通常、第2図にその断面図を示
すように、EC装置は、相対向する二枚の基板1,2間
に電解質3を挟持して構成される。二枚の基板1,2に
は、表面に電極4,5が形成され、端面には該電極4,
5〜外部より電圧を印e”b t h 1,1−ド線6
,7.Qllヶける帯状のリード線取付部8.8が形成
される。
[Prior art] EC for display devices, dimming windows, dimming mirrors, etc., using EC substances that cause ion exchange reactions to occur when an electric field is applied to suppress the coloring and fading phenomenon.
equipment is used. Generally, as shown in a cross-sectional view in FIG. 2, an EC device is constructed by sandwiching an electrolyte 3 between two opposing substrates 1 and 2. Electrodes 4 and 5 are formed on the surfaces of the two substrates 1 and 2, and the electrodes 4 and 5 are formed on the end surfaces.
5 ~ Apply voltage from outside e”b t h 1, 1- wire 6
,7. A belt-shaped lead wire attachment portion 8.8 is formed.

また二枚の基板1,2のうち少くとも一枚の基板上には
EC物質層!Oが形成される。なお、二枚の基板1.2
の端部はシール材11.12で封止され、更に該基板1
.2の端面が被覆される形で周辺封止材13.14で封
止される。
Also, an EC material layer is formed on at least one of the two substrates 1 and 2! O is formed. In addition, two boards 1.2
The ends of the substrate 1 are sealed with sealants 11 and 12, and the substrate 1
.. The peripheral sealing material 13, 14 covers the end faces of the two.

C発明が解決しようとする問題点コ 従来のEC装置では、第2図からも明らかなように、電
極4.5とリード線取付部8.9とが線接触であり、か
つ、電極4.5としては通常酸化インジウム−酸化錫(
I TO)等の透明導電性薄膜が使用されるためその膜
厚は例えば約2000人程度と極めて薄く、リード線取
付部8.9との接触面積はごく小さなものであった。そ
のため、電極4,5とリード線取付部8,8との十分な
接触がl。
C Problems to be Solved by the Invention In the conventional EC device, as is clear from FIG. 2, the electrode 4.5 and the lead wire attachment portion 8.9 are in line contact, and the electrode 4.5 is in line contact with the lead wire attachment portion 8.9. 5 is usually indium oxide-tin oxide (
Since a transparent conductive thin film such as ITO) is used, the film thickness is extremely thin, for example, about 2000, and the contact area with the lead wire attachment portion 8.9 is extremely small. Therefore, sufficient contact between the electrodes 4 and 5 and the lead wire attachment parts 8 and 8 is maintained.

得られず、場所によっては点接触となったり断線状態と
なってしまう所があり、電気的接続の上で十分な@頼性
が得られなかった。
However, depending on the location, there may be point contact or disconnection, making it impossible to obtain sufficient reliability in electrical connection.

従来のEC装置は、基板1.2としてはガラスを用いる
のが通常であり、しか−伯灰型のガラス板(例えば尺角
サイズ)をそのまま洗浄後前述のITO薄膜(更には酸
化タングステン等のEC物質層10)を真空蒸着し、そ
の後所定の大きさく例えばlOcmX 10cm角)に
切断して、リード線取付部8.8及びリード線6,7を
端面に形成するようにしていた。
Conventional EC devices usually use glass as the substrate 1.2, and after cleaning a glass plate (for example, square size) as it is, the above-mentioned ITO thin film (or even tungsten oxide, etc.) is used. The EC material layer 10) was vacuum-deposited and then cut into a predetermined size, for example, 10 cm x 10 cm square, so that a lead wire attachment portion 8.8 and lead wires 6 and 7 were formed on the end face.

そのため、この様にして電極4,5(及びEC物質層1
0)を形成した基板1.2を相対向させシール材11.
12で封止しセルを形成するまでの工程で作業者の手指
の脂等による汚れが付着し易く、生産の歩上りが悪かっ
た。
Therefore, in this way, the electrodes 4 and 5 (and the EC material layer 1
0) formed with the sealing material 11.
During the process from step 12 to sealing and cell formation, dirt from workers' hands and fingers was likely to adhere, resulting in a poor production rate.

また、基板1,2の端面に形成するリード線取付部8.
8は通常ガラス用半田が用いられるが、該ガラス用半田
を基板1.2の端面に溶着する際超音波振動を加えなが
ら溶着するので、この超音波振動によりガラス用半田の
微粉末が飛散し、電極4,5とEC物質層10の表面に
付着する現象が見られた。このガラス用半田の微粉末は
、いったん付着すると除去しにくく、例えば高圧窒素ガ
スの噴射等の方法によっても際会4るのは容易でなくセ
ルの劣化の原因となっていた。
Also, lead wire attachment portions 8 formed on the end surfaces of the substrates 1 and 2.
8 usually uses glass solder, but since the glass solder is welded to the end face of the substrate 1.2 while applying ultrasonic vibration, the fine powder of the glass solder is scattered by the ultrasonic vibration. The phenomenon of adhesion to the surfaces of the electrodes 4 and 5 and the EC material layer 10 was observed. Once this fine glass solder powder has adhered, it is difficult to remove it, and even by methods such as high-pressure nitrogen gas injection, it is difficult to remove it, causing cell deterioration.

更に第3II!iに示すように、ガラス用半田を基板1
5の端面に溶着してリード線取付部17を形成する場合
には、該ガラス用半田が基板15の上下にはみ出し、は
み出し部17a 、 17bが出来、該基板15を対向
基板とセル化した場合に、基板間のセルギャップは通常
約504m程度で極めて狭いために、該はみ出し部17
aが対向電極と接触し、ショートする場合があった。
Furthermore, the third II! As shown in i, solder for glass is applied to substrate 1.
When the lead wire attachment part 17 is formed by welding to the end face of the substrate 15, the glass solder protrudes above and below the substrate 15, creating protruding parts 17a and 17b, and when the substrate 15 is formed into a cell with a counter substrate. In addition, since the cell gap between the substrates is usually about 504 m and extremely narrow, the protruding portion 17
There were cases where a came into contact with the counter electrode, causing a short circuit.

周辺封止剤13.14は、エポキシ系接着剤等が用いら
れるが、基板1.2を相対向させシール材11.12で
封止後該基板1.2の端面に塗布していたので、第2図
からも明らかなように、セルの端面から盛り上って形成
され、熱による膨張収縮や振動により剥離し易く、封止
の信頼性が悪かった。
The peripheral sealant 13.14 is an epoxy adhesive or the like, but since the substrate 1.2 was placed facing each other and sealed with the sealant 11.12, it was applied to the end surface of the substrate 1.2. As is clear from FIG. 2, it was formed to bulge from the end face of the cell and was easily peeled off due to expansion and contraction due to heat and vibration, resulting in poor sealing reliability.

本発明は、従来のEC装置の如上の欠点を解消するため
になされたもので、電極とリード線取付部の電気的接続
の信頼性が高く、生産の小止りが向上し、セルの劣化が
少く、対向電極どうしのシ=1− ト等の事故の発生の
ない、セルのシールの完全なEC装置を提供することを
目的とする。
The present invention was made in order to eliminate the above-mentioned drawbacks of conventional EC devices, and it has high reliability in electrical connection between electrodes and lead wire attachment parts, improves production stoppages, and reduces cell deterioration. It is an object of the present invention to provide an EC device with a complete cell seal, which does not cause accidents such as sheets between opposing electrodes.

c問題点を解決するための手段] 本発明のEC装置は、相対向する二枚の基板間に電解質
が挟持されて成り、該二枚の基板は電極と該電極へ外部
より電圧を印加するリード線取付部とを有し、少くとも
一枚の基板の電極上にはエレクトロクロミー、り物質層
が形成されているエレクトロクロミック装置において、
該二枚の基板には、所定の角度でテーパーをつけた該基
板の端面に固着されたリード線取付部の所定部分を被覆
して電極が形成されていることを特徴とする。
c. Means for Solving Problems] The EC device of the present invention is composed of an electrolyte sandwiched between two opposing substrates, and the two substrates have electrodes and a voltage is applied to the electrodes from the outside. In an electrochromic device, the device has a lead wire attachment portion, and an electrochromic material layer is formed on the electrode of at least one substrate,
The two substrates are characterized in that electrodes are formed to cover predetermined portions of lead wire attachment portions fixed to end faces of the substrates tapered at a predetermined angle.

本発明になるEC装置の代表的構成例の断面図を第1図
に示す、以下、第1図の代表的構成例を参照しながら本
発明のEC装置につき説明する。
A cross-sectional view of a typical configuration example of the EC device according to the present invention is shown in FIG. 1. Hereinafter, the EC device according to the present invention will be described with reference to the typical configuration example shown in FIG.

基板20.21はガラス又はプラスチック等から成ぢそ
の端面は、第4図、第5図に一部断面図を示すように、
所定の角度αでテーパーを付けられている。テーパー角
度αは10°ないL80’ 、好;I−L < ハ30
” ナイ1,80’ 、特ニ40”ないし50″ とす
ることが、取扱上あるいは■T。
The substrates 20 and 21 are made of glass, plastic, etc., and their end surfaces are as shown in partial cross-sections in FIGS. 4 and 5.
It is tapered at a predetermined angle α. Taper angle α is less than 10° L80', good; IL < Ha30
For handling purposes or ■T.

等の電極の形成上望ましい、85図の高さDEは基板5
1の厚さに応じて任意にとることができる。
The height DE in FIG. 85, which is desirable for forming electrodes such as
It can be arbitrarily set depending on the thickness of the layer 1.

基板41.51の端部A、B、C,D、Eは次のような
理由により丸みを持たせて形成することが望ましい。
It is desirable that the ends A, B, C, D, and E of the substrates 41.51 be formed with roundness for the following reasons.

即ち、 A、Cの部分では基板41.51の表面及び端
面のリード線取付部を被覆して形成される電極が鋭く折
曲せず電気的1機械的連続性が保たれる。
That is, in parts A and C, the electrodes formed by covering the lead wire attachment parts on the surface and end face of the substrate 41, 51 are not bent sharply, and electrical and mechanical continuity is maintained.

B、D、Eの部分では、第8図の一部断面図に示すよう
に、リード線取付部82を基板81の背面まで延長して
形成した場合に該リード線取付部82が鋭く折曲されず
電気的2機械的連続性が保たれる。
In the portions B, D, and E, as shown in the partial cross-sectional view of FIG. electrical and mechanical continuity is maintained.

基板2o、21Jjl、ssの端部が貝殻状に欠損する
いわゆる「ハマカケ」現象を防ぐことができる。
It is possible to prevent the so-called "hammer cut" phenomenon in which the ends of the substrates 2o, 21Jjl, and ss are damaged in a shell-like manner.

以上のような理由で端部A、B、C,D、Eは丸みを持
たせることが望ましいのである。
For the above reasons, it is desirable that the ends A, B, C, D, and E be rounded.

テーパーを形成された基板2G、21,41.51の端
面(第4図、第5図のイ9ロ面)の荒さは、凹凸差が1
5蒔ユ以下、好ましくは5ルm以下、特にlpm以下に
研磨することがリード線取付部22.23の固着上望ま
しい。
The roughness of the end surface of the tapered substrates 2G, 21, 41.51 (surface A9 in FIGS. 4 and 5) is as follows:
It is desirable for the lead wire attachment portions 22 and 23 to be polished to a polishing depth of 5 lpm or less, preferably 5 lpm or less, particularly 1pm or less.

基板20.21の端面にはリード線24.25を取り付
けるための帯状のリード線取付部22.23が固着され
る。 EC装置では、液晶表示装置等に比べて駆動電流
が大きくなるので、帯状の低抵抗導電体をリード線取付
部22.23として基板20.21の少くとも一端面全
体に固着して該端面の電位を同一に保たせるのである。
A strip-shaped lead wire attachment portion 22.23 for attaching lead wires 24.25 is fixed to the end surface of the substrate 20.21. In an EC device, the driving current is larger than that in a liquid crystal display device, etc., so a strip-shaped low resistance conductor is fixed to the entirety of at least one end surface of the substrate 20.21 as the lead wire attachment portion 22.23. This keeps the potential the same.

この様なリード線取付部22.23としては、前述のガ
ラス用半田の他金属蒸着膜や金属箔等が用いられ、ある
いは、例えば無電解メッキ法等のメッキ法によす金属を
前記端面に析場せて形成しても良いし、銀ペースト等の
導電性接着剤を該端面に塗布して形成しても良い。
For such lead wire attachment parts 22 and 23, in addition to the aforementioned glass solder, a metal vapor deposition film, metal foil, etc. may be used, or a metal plated by a plating method such as electroless plating may be applied to the end surface. It may be formed by depositing it in a field, or it may be formed by applying a conductive adhesive such as silver paste to the end surface.

ガラス用半田を用いる場合には、電極28.27として
ITO等の透明導電薄膜を蒸着する際の高温に耐えるた
めに、融点170℃以′上のものを用い、 200 ’
C以上のものを用いるのが特に好ましい。
When using solder for glass, use one with a melting point of 170°C or higher to withstand the high temperatures when depositing a transparent conductive thin film such as ITO as the electrode 28.27.
It is particularly preferable to use C or higher.

また、第6図に一部断面図を示すように。Further, as shown in a partially sectional view in FIG.

リード線取付部62の上端面Fは基板61の表面より上
方に出なければ良いが、該リード線取付部62の上面に
電極2B、2?を蒸着する際に、該電極26.27の電
気的9機械的連続性を良くするためにリード線取付部6
2の上端面Fを荒さ400番ないし800番程度のやす
りで研磨し、第7図の一部断面図のG点の様に、基板7
1の表面とリード線取付部72の上端面とが連続面とな
るようにするのが望ましい。
The upper end surface F of the lead wire attachment part 62 does not need to protrude above the surface of the substrate 61, but the electrodes 2B, 2? In order to improve the electrical and mechanical continuity of the electrodes 26 and 27 during vapor deposition, the lead wire attachment portion 6 is
The upper end surface F of the substrate 7 is polished with a file having a roughness of about 400 to 800, as shown at point G in the partial cross-sectional view of FIG.
1 and the upper end surface of the lead wire attachment portion 72 are preferably made to be a continuous surface.

リード線取付部22,23.62は基板20,21.8
1の一端面のみに形成しても良いが、他端面あるいは他
の全ての端面にも形成すル願薄膜−の電極は抵抗値が概
して大きいために、信頼性、応答性の面で好ましい。
The lead wire attachment parts 22, 23.62 are connected to the board 20, 21.8.
Although electrodes of the thin film may be formed only on one end surface of the electrode 1, electrodes of the thin film may be formed on the other end surface or all other end surfaces because the resistance value is generally large, so it is preferable in terms of reliability and responsiveness.

外部より電極28.27へ電圧を印加するリード線24
,25,73.83は銅、ニッケル等の金属細線が用い
られ、第7図、第8図の一部断面図に示すように、基板
20,21.71.81のテーパー面あるいは該基板7
1.81の背面のリード線取付部22,23,72.8
2へ固着される。
Lead wire 24 that applies voltage to the electrodes 28 and 27 from the outside
, 25, 73.83 are thin metal wires made of copper, nickel, etc., and as shown in the partial cross-sectional views of FIGS. 7 and 8, the tapered surfaces of the substrate 20, 21, 71.
1.81 back side lead wire attachment parts 22, 23, 72.8
Fixed to 2.

電極26.27は、金、銅、白金等の金属薄膜又はIT
O,@化錫等の透明導電膜が用いられる。導電ai28
.27は前記リード線取付部22.23の所定部分を被
覆するように基板20.21の表面に形成される。この
際、第9図の一部断面図に示すように、リード線取付部
92の先端部を基板81の表面より少し下げて形成し、
該リード線取付部92の上面を被覆するように電極θ3
を形成すれば、基板81の端面の電極93が盛り上がる
ことがなく、対向電極とのショートの心配がない。
The electrodes 26 and 27 are metal thin films such as gold, copper, platinum, etc.
A transparent conductive film such as O or tin oxide is used. conductive ai28
.. 27 is formed on the surface of the substrate 20.21 so as to cover a predetermined portion of the lead wire attachment portion 22.23. At this time, as shown in the partial cross-sectional view of FIG. 9, the tip of the lead wire attachment portion 92 is formed slightly lower than the surface of the substrate 81
The electrode θ3 is placed so as to cover the upper surface of the lead wire attachment portion 92.
By forming the electrode 93 on the end surface of the substrate 81, the electrode 93 will not swell, and there is no fear of short circuit with the counter electrode.

電極28.27は、真空蒸着法により形成すれば良いし
、フォトマスクを用いたエラチンh副スクリーン印刷法
等の公知の方法を用いて形成しても良い。
The electrodes 28 and 27 may be formed by a vacuum evaporation method, or may be formed by a known method such as an eratin h sub-screen printing method using a photomask.

EC物質M28は、電極2B又は27の上面に形成され
る。EC物質としては、酸化タングステンや酸化モリブ
デン等が用いられる。 EC物質層28は、真空蒸着法
や溶液を塗布し乾燥させる方法等により形成される。
The EC material M28 is formed on the upper surface of the electrode 2B or 27. As the EC material, tungsten oxide, molybdenum oxide, etc. are used. The EC material layer 28 is formed by a vacuum evaporation method, a method of applying a solution and drying it, or the like.

以上の様にして、リード線取付部22.’23.電極2
B、 2?、 EC物質層28の形成された基板20.
21は、電極26.27面を相対向して、端部をシール
材29.30で封止されセルが形成される。該シール材
29.30としては、エポキシ、シリコン、ウレタン、
酢酸ビニル等の樹脂や、フリット等が用いられあるいは
印刷法や形成シートを用いても良い。
As described above, the lead wire attachment portion 22. '23. Electrode 2
B. 2? , a substrate 20 on which an EC material layer 28 is formed.
21 has electrodes 26 and 27 facing each other, and ends thereof are sealed with sealing materials 29 and 30 to form a cell. The sealing material 29.30 includes epoxy, silicone, urethane,
A resin such as vinyl acetate, a frit, etc. may be used, or a printing method or a formed sheet may be used.

前記セル中に挟持される電解質31としては、硫酸など
の酸あるいはプロピレンカーボネートやγ−ブチロラク
トンなどの有機溶媒中に過塩素酸リチウムや沃化ナトリ
ウム等のアルカリ金属i溶解した溶液、あるいはこれら
にゲル化剤を添加してゲル化したもの又はフィルム電解
質などが用いられる。
The electrolyte 31 sandwiched in the cell may be a solution of an alkali metal such as lithium perchlorate or sodium iodide dissolved in an acid such as sulfuric acid or an organic solvent such as propylene carbonate or γ-butyrolactone, or a gel solution thereof. A gelling agent or a film electrolyte is used.

相対向する基板20.21のテーパーを付けられた端面
及び前記シール材29.30で形成されるV字形の凹溝
には、該シール材29.30の外側に、更に該V字形凹
溝を埋めるような形で周辺封止材32,33を固着して
も良い、該周辺封止材32,33としてはエポキシ系接
着剤やホットメルトブチル等の有機接着剤が用いられる
The V-shaped groove formed by the tapered end surfaces of the opposing substrates 20.21 and the sealing material 29.30 further includes a V-shaped groove on the outside of the sealing material 29.30. The peripheral sealing materials 32 and 33 may be fixed in a buried manner, and an organic adhesive such as an epoxy adhesive or hot melt butyl is used as the peripheral sealing materials 32 and 33.

[作用] 基板20.21のテーパーを付けられた端面上に形成さ
れたリード線取付部22.23と該リード線取付部22
 、23を被覆して形さされる電極26.27とは互い
に面接触している。従って、接触面潰が大きく、接触抵
抗も少なく、電気的2機械的接続の信頼性が高く、信号
伝達時間も短くなる。
[Function] The lead wire attachment portion 22.23 formed on the tapered end surface of the substrate 20.21 and the lead wire attachment portion 22.
, 23 are in surface contact with each other. Therefore, contact surface collapse is large, contact resistance is low, electrical and mechanical connection is highly reliable, and signal transmission time is shortened.

周辺封止材32,33は、相対向する基板20.21の
テーパーを付けられた端面で形成されるV字形の凹溝内
にi駿込む形となるので接着面積が増加し、外力や熱変
動による界面の剥離現象が発生しない、また、周辺封止
材32,33は、電極27及びEC物質層28とも接着
面が形成されるので、基板1.2の端面及びリード線取
付部8,8と接着面を形成する従来のEC装置の周辺封
止材13.14に比べてより強い接着力が得らるる。
The peripheral sealing materials 32 and 33 fit into the V-shaped groove formed by the tapered end surfaces of the opposing substrates 20 and 21, increasing the bonding area and preventing external force and heat. The interface peeling phenomenon due to fluctuation does not occur, and since the peripheral sealing materials 32 and 33 form adhesive surfaces with the electrodes 27 and the EC material layer 28, the end surfaces of the substrate 1.2 and the lead wire attachment portions 8, Stronger adhesive force can be obtained compared to the peripheral sealing materials 13 and 14 of conventional EC devices, which form an adhesive surface with 8.

[実施例] X11」− 厚さ 1.1mmのガラス板を10cmX 10c■の
大きさに切断する。該切断したガラス板の四端面を荒さ
800番のベルトφサングーで 第10図に一部断面図
を示すように、45°の角度にテーパーを付けた。しか
る後、端部H,Zを同じベルト・サングーで軽く面取り
し、丸みをつけた。
[Example] A glass plate having a thickness of 1.1 mm is cut into a size of 10 cm x 10 cm. The four end surfaces of the cut glass plate were tapered at an angle of 45° using a belt with a diameter of 800 as shown in a partial cross-sectional view in FIG. After that, the ends H and Z were lightly chamfered with the same belt and sangoo to make them rounded.

この様にしてテーパー加工したガラス基板を洗浄、乾燥
後、融点224℃のガラス用半田を四端面のテーパ一部
に融着した。その後、該ガラス用半田の上端面(H部分
)を更にベルト・サングーで研磨し、該端面とガラス基
板の表面が連続面となるようにした。
After cleaning and drying the glass substrate tapered in this manner, glass solder having a melting point of 224° C. was fused to a portion of the taper on the four end faces. Thereafter, the upper end surface (H portion) of the solder for glass was further polished with a belt polisher so that the end surface and the surface of the glass substrate became a continuous surface.

更に洗浄、乾燥後、該ガラス基板の表面とテーパ一部の
ガラス用半田層を被覆するようにITOと〔更に酸化タ
ングステン(WO3))を蒸着して電極(とEC物質層
)を形成した。
After further cleaning and drying, ITO and further tungsten oxide (WO3) were deposited to cover the surface of the glass substrate and the glass solder layer on a portion of the taper to form electrodes (and an EC material layer).

この様にした二枚のガラス基板を相対向させ、周辺をエ
ポキシ接着剤(スペーサを含む)で封止しセル状とした
。このセルに予め穿設した注入孔より該セル中にγ−ブ
チロラクトン溶液に沃化リチウムを1モル溶解した電解
質溶液を注入し、前記注入孔を封止した後前記ガラス用
半田層の端部に第8図に示す様な形で銅線をリード線と
して溶着した。
The two glass substrates thus prepared were placed facing each other, and the periphery was sealed with an epoxy adhesive (including spacers) to form a cell shape. An electrolyte solution containing 1 mole of lithium iodide dissolved in a γ-butyrolactone solution is injected into the cell through an injection hole previously drilled in the cell, and after the injection hole is sealed, the edge of the glass solder layer is injected into the cell. Copper wires were welded as lead wires in the form shown in Figure 8.

最後にホットメルトブチルを前記相対向するガラス基板
の端面のテーパ一部で形成されるV字形の凹溝部を埋め
る様に塗布し、略第1図に示すような断面形状のEC装
置を得た。
Finally, hot-melt butyl was applied so as to fill the V-shaped groove formed by the tapered part of the end surfaces of the opposing glass substrates to obtain an EC device having a cross-sectional shape approximately as shown in FIG. .

夫亙胴ヱ 実施例1と同様にガラス基板の四端面をテーパー加工し
た。該ガラス基板を洗浄後テーパー部に無電解メッキ法
で銅(Cu)を固矛篠卆、低抵抗とするため、前記無電
解メッキ法で形成したCu層上に電解メッキ法で更にC
u層を厚く電着した。
As in Example 1, the four end surfaces of the glass substrate were tapered. After cleaning the glass substrate, copper (Cu) is applied to the tapered portion by electroless plating to provide a strong and low resistance.
A thick U layer was electrodeposited.

この様にしてリード線取付部を形成したガラス基板を洗
浄、乾燥後、該リード線取付部の大半を被覆するように
ガラス基板の表面と端面にITO(ざらにwo3 )を
蒸着し、該ガラス基板上に電極(とEC物質層)を形成
した。   。
After cleaning and drying the glass substrate on which the lead wire attachment part was formed in this way, ITO (Zarani WO3) was vapor-deposited on the surface and end face of the glass substrate so as to cover most of the lead wire attachment part. Electrodes (and an EC material layer) were formed on the substrate. .

次に、該■TOを形成したガラス基板の表面の周辺部に
、2■幅でエチレン酢酸ビニル共重合樹脂を載置し堤を
形成し、この堤の内側に、γ−ブチロラクトンに1モル
の沃化リチウムとゲル化剤としてポリビニルブチラール
(50%)を溶解したゲル状電解質を塗布し、真空下に
おいて、もう一方のガラス基板(wo3を蒸着したもの
)を相対向させ、 100℃で両基板を熱圧着しセルを
形成した。該セルの端部の前記リード線取付部にCu線
を固着し、最後にエポキシ系接着剤を前記相対向するガ
ラス基板の端面のテーパ一部で形成されるV字形の凹溝
部を埋めるように塗布し、略第1図と同様の断面形状の
EC装置を得た。
Next, an ethylene-vinyl acetate copolymer resin is placed in a width of 2 cm on the periphery of the surface of the glass substrate on which the TO has been formed, to form a bank, and on the inside of this bank, 1 mol of γ-butyrolactone is added. A gel electrolyte containing lithium iodide and polyvinyl butyral (50%) as a gelling agent was applied, and the other glass substrate (on which WO3 was evaporated) was placed facing each other under vacuum, and both substrates were heated at 100°C. were thermocompressed to form a cell. A Cu wire is fixed to the lead wire attachment part at the end of the cell, and finally, an epoxy adhesive is applied so as to fill the V-shaped groove formed by the tapered part of the end face of the opposing glass substrate. An EC device having a cross-sectional shape substantially similar to that shown in FIG. 1 was obtained.

実施例3 実施例2の銅メッキの代りに、焼き付は用の銀ペースト
をテーパ一部に塗布し、焼成してリード線取付部を形成
した。該リード線取付部にリード線を接続するにはガラ
ス用ハンダを用いて半田付けした。その他は実施例2と
同様にして略第1図の断面形状状のEC装置を得た。
Example 3 Instead of the copper plating in Example 2, a silver paste for baking was applied to a part of the taper and fired to form a lead wire attachment part. To connect the lead wire to the lead wire attachment portion, it was soldered using glass solder. Otherwise, an EC device having the cross-sectional shape approximately shown in FIG. 1 was obtained in the same manner as in Example 2.

[発明の効果] 本発明のEC装置においては、二枚の基板の端面にテー
パーを付け、該テーパ一部に固着されたリード線取付部
の所定部分を被覆して電極を形成するようにしたので、
該電極とリード線取付部とは面接触となって大きな接触
面積が得られ、該接触部の電気的9機械的高信頼度が得
られ、また、接触抵抗も小さくなるので、電気的応答特
性も高速となる。
[Effects of the Invention] In the EC device of the present invention, the end surfaces of the two substrates are tapered, and a predetermined portion of the lead wire attachment portion fixed to a part of the taper is covered to form an electrode. So,
The electrode and the lead wire attachment part are in surface contact, and a large contact area is obtained, and high electrical and mechanical reliability of the contact part is obtained, and the contact resistance is also reduced, so that the electrical response characteristics are improved. It will also be faster.

更に、電極の形成工程がテーパ一部にリード線取付1を
固着した後になるので、該リード線取付部としてガラス
用半田を用い、該ガラス用半田層の形成の際超音波振動
を加えて、ガラス用半田の微粉末が基板表面に付着した
としても、洗浄により該微粉末を容易に除去でき、セル
が劣化せず生産の歩止りは従来の歩止りに比して2〜3
割良好となる。
Furthermore, since the electrode formation process is performed after the lead wire attachment 1 is fixed to the taper part, glass solder is used as the lead wire attachment part, and ultrasonic vibration is applied during the formation of the glass solder layer. Even if fine glass solder powder adheres to the substrate surface, the fine powder can be easily removed by cleaning, the cell will not deteriorate, and the production yield will be 2 to 3 times lower than the conventional yield.
It will be relatively good.

また、電極あるいはF−C物質層を基板上に形成した後
直ちにセル化できるので0作業者の手指の脂等の汚れが
電極面あるいはEC物質面に付着することがなく、この
面からもEC装置としての品質上の信頼性、生産の歩止
りが向上する。
In addition, since cells can be formed immediately after electrodes or FC material layers are formed on a substrate, dirt such as oil from workers' fingers does not adhere to the electrode surface or EC material surface, and EC The reliability of the quality of the equipment and the production yield are improved.

周辺封止材は、相対向する二枚の基板の端面のテーパ一
部で形成されるV字形の凹溝へ埋め込んで形成するので
、塗布が容易であると同時に、シール面積が増加しシー
ルの信頼性が向上する。また、電極面やEC物質層との
接触面積も増大し、かつ、前述したように作業者の取扱
い時の手指の脂等の汚れの付着も防げるので、周辺封止
剤の界面接着力が増加し、熱変動や振動による周辺部d
の剥離が見られない。
The peripheral sealing material is formed by embedding it in a V-shaped groove formed by a tapered part of the end surfaces of two opposing substrates, so it is easy to apply, and at the same time, the sealing area increases and the sealing area is increased. Improved reliability. In addition, the contact area with the electrode surface and the EC material layer increases, and as mentioned above, it also prevents the adhesion of dirt such as oil from the hands of the operator during handling, increasing the interfacial adhesion of the peripheral sealant. However, the surrounding area due to thermal fluctuations and vibrations
No peeling is observed.

以上の如く本発明のEC装置は、電極とリード線の電気
的1機械的接続の信頼性が高く、生産の歩止りが良く、
セルの劣化も少く、対向電極同士のショート等の事故も
なく、シールも完全なものである。
As described above, the EC device of the present invention has high reliability in electrical and mechanical connections between electrodes and lead wires, and has a good production yield.
There is little deterioration of the cell, there are no accidents such as short circuits between opposing electrodes, and the seal is perfect.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明のEC装置の代表的構成例を示す断面図
、第2図は従来のEC装置の一例を示す断面図、第3図
は従来のEC装置の一例の一部断面図、第4図ないし第
9図は本発明の各種構成例の一部断面図、第10図は本
発明の一実施例の一部断面図である。 1.2,15,20,21,41,51,81,71,
81.91−−−一基板、3.3L−−−一電解質、 
4,5.18.2B、27.93−−−一電極、8.7
,24,25,73.83−−−− リード線、  8
,9.1?。 22.23,82,72,82.92−−−−リード線
取付部、10.28−−−−EC:物質層、 11,1
2,29.30−−−−シール材、 13 、14.3
2.33−−−一周辺封止材。 −−−p: tQ Q”; ;2、lrl 、Ikπ曝
yJ−III 染 3 目 峯61X!
FIG. 1 is a sectional view showing a typical configuration example of an EC device of the present invention, FIG. 2 is a sectional view showing an example of a conventional EC device, and FIG. 3 is a partial sectional view of an example of a conventional EC device. 4 to 9 are partial cross-sectional views of various configuration examples of the present invention, and FIG. 10 is a partial cross-sectional view of one embodiment of the present invention. 1.2, 15, 20, 21, 41, 51, 81, 71,
81.91---one substrate, 3.3L---one electrolyte,
4,5.18.2B, 27.93---one electrode, 8.7
, 24, 25, 73.83--- Lead wire, 8
,9.1? . 22.23, 82, 72, 82.92---Lead wire attachment part, 10.28---EC: material layer, 11,1
2, 29.30---Sealing material, 13, 14.3
2.33---One periphery sealing material. ---p: tQ Q”; ;2, lrl, Ikπ exposure yJ-III dyeing 3 Memine 61X!

Claims (6)

【特許請求の範囲】[Claims] (1)相対向する二枚の基板間に電解質が挟持されて成
り、該二枚の基板は電極と該電極へ外部より電圧を印加
するリード線取付部とを有し、少くとも一枚の基板の電
極上にはエレ クトロクロミック物質層が形成されているエレクトロク
ロミック装置において、該二枚の基板には、所定の角度
でテーパーをつけた該基板の端面に固着されたリード線
取付部の所定部分を被覆して電極が形成されていること
を特徴とするエレクトロクロミック装置。
(1) An electrolyte is sandwiched between two opposing substrates, each of which has an electrode and a lead wire attachment part for applying a voltage to the electrode from the outside, and at least one In an electrochromic device in which an electrochromic material layer is formed on the electrodes of the substrates, the two substrates have predetermined lead wire attachment portions fixed to the end surfaces of the substrates that are tapered at a predetermined angle. An electrochromic device characterized in that an electrode is formed by covering a portion.
(2)リード線取付部は半田層である特許請求の範囲第
1項記載のエレクトロクロミック装 置。
(2) The electrochromic device according to claim 1, wherein the lead wire attachment portion is a solder layer.
(3)リード線取付部は金属蒸着膜又は金属箔により形
成される特許請求の範囲第1項記載のエレクトロクロミ
ック装置。
(3) The electrochromic device according to claim 1, wherein the lead wire attachment portion is formed of a metal vapor deposited film or metal foil.
(4)リード取付部はメッキ性により析出された金属層
である特許請求の範囲第1項記載のエレクトロクロミッ
ク装置。
(4) The electrochromic device according to claim 1, wherein the lead attachment portion is a metal layer deposited by plating.
(5)リード線取付部は導電性接着剤層である特許請求
の範囲第1項記載のエレクトロクロ ミック装置。
(5) The electrochromic device according to claim 1, wherein the lead wire attachment portion is a conductive adhesive layer.
(6)電極は透明導電膜である特許請求の範囲第1項記
載のエレクトロクロミック装置。
(6) The electrochromic device according to claim 1, wherein the electrode is a transparent conductive film.
JP59250515A 1984-11-29 1984-11-29 Electrochromic apparatus Pending JPS61129626A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59250515A JPS61129626A (en) 1984-11-29 1984-11-29 Electrochromic apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59250515A JPS61129626A (en) 1984-11-29 1984-11-29 Electrochromic apparatus

Publications (1)

Publication Number Publication Date
JPS61129626A true JPS61129626A (en) 1986-06-17

Family

ID=17209035

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59250515A Pending JPS61129626A (en) 1984-11-29 1984-11-29 Electrochromic apparatus

Country Status (1)

Country Link
JP (1) JPS61129626A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61270735A (en) * 1985-05-27 1986-12-01 Nippon Kogaku Kk <Nikon> Electrochromic element provided with leader electrode on its end surface
JPS62188736U (en) * 1986-05-20 1987-12-01
JPS6444425A (en) * 1987-07-24 1989-02-16 Alpine Polyvision Inc Light modulator
DE4007991A1 (en) * 1989-03-13 1990-09-20 Nikon Corp ELECTROCHROMIC COMPONENT
JPH0318516U (en) * 1989-07-04 1991-02-22
US6829074B2 (en) 2001-10-05 2004-12-07 Murakami Corporation Liquid type electrochromic element
JP2007227113A (en) * 2006-02-23 2007-09-06 National Institute Of Advanced Industrial & Technology Porous support for high-density integration of electrochemical reaction cell, and electrochemical reaction cell stack and electrochemical reaction system constituted of the same
JP2011103005A (en) * 2002-09-30 2011-05-26 Gentex Corp Electrochromic device having no positional offset between substrates
WO2014171470A1 (en) * 2013-04-19 2014-10-23 本田技研工業株式会社 Light-adjusting-panel structure
WO2017104466A1 (en) * 2015-12-15 2017-06-22 株式会社リコー Electrochromic apparatus

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61270735A (en) * 1985-05-27 1986-12-01 Nippon Kogaku Kk <Nikon> Electrochromic element provided with leader electrode on its end surface
JPH0578806B2 (en) * 1985-05-27 1993-10-29 Nippon Kogaku Kk
JPS62188736U (en) * 1986-05-20 1987-12-01
JPS6444425A (en) * 1987-07-24 1989-02-16 Alpine Polyvision Inc Light modulator
DE4007991A1 (en) * 1989-03-13 1990-09-20 Nikon Corp ELECTROCHROMIC COMPONENT
JPH0318516U (en) * 1989-07-04 1991-02-22
US6829074B2 (en) 2001-10-05 2004-12-07 Murakami Corporation Liquid type electrochromic element
JP2011103005A (en) * 2002-09-30 2011-05-26 Gentex Corp Electrochromic device having no positional offset between substrates
JP2007227113A (en) * 2006-02-23 2007-09-06 National Institute Of Advanced Industrial & Technology Porous support for high-density integration of electrochemical reaction cell, and electrochemical reaction cell stack and electrochemical reaction system constituted of the same
WO2014171470A1 (en) * 2013-04-19 2014-10-23 本田技研工業株式会社 Light-adjusting-panel structure
JPWO2014171470A1 (en) * 2013-04-19 2017-02-23 本田技研工業株式会社 Light control panel structure
US9586461B2 (en) 2013-04-19 2017-03-07 Honda Motor Co., Ltd. Light-adjusting-panel structure
WO2017104466A1 (en) * 2015-12-15 2017-06-22 株式会社リコー Electrochromic apparatus
JPWO2017104466A1 (en) * 2015-12-15 2018-10-04 株式会社リコー Electrochromic device
US11221533B2 (en) 2015-12-15 2022-01-11 Ricoh Company, Ltd. Electrochromic device

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