JPS6112675Y2 - - Google Patents
Info
- Publication number
- JPS6112675Y2 JPS6112675Y2 JP12375879U JP12375879U JPS6112675Y2 JP S6112675 Y2 JPS6112675 Y2 JP S6112675Y2 JP 12375879 U JP12375879 U JP 12375879U JP 12375879 U JP12375879 U JP 12375879U JP S6112675 Y2 JPS6112675 Y2 JP S6112675Y2
- Authority
- JP
- Japan
- Prior art keywords
- blanking
- circuit
- electron beam
- electrode
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 16
- 230000000630 rising effect Effects 0.000 claims description 4
- 230000003111 delayed effect Effects 0.000 claims description 3
- 230000001934 delay Effects 0.000 claims 1
- 101100425949 Mus musculus Tnfrsf13c gene Proteins 0.000 description 5
- 230000007423 decrease Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000010354 integration Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12375879U JPS6112675Y2 (enExample) | 1979-09-07 | 1979-09-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12375879U JPS6112675Y2 (enExample) | 1979-09-07 | 1979-09-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5640659U JPS5640659U (enExample) | 1981-04-15 |
| JPS6112675Y2 true JPS6112675Y2 (enExample) | 1986-04-19 |
Family
ID=29355686
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12375879U Expired JPS6112675Y2 (enExample) | 1979-09-07 | 1979-09-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6112675Y2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010232035A (ja) * | 2009-03-27 | 2010-10-14 | Fujifilm Corp | 電子ビーム描画方法、電子ビーム描画装置、モールドの製造方法および磁気ディスク媒体の製造方法 |
-
1979
- 1979-09-07 JP JP12375879U patent/JPS6112675Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5640659U (enExample) | 1981-04-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR950702743A (ko) | 래스터 주사 방식의 리소그래피를 위한 선량 변조 및 화소 편향 시스템(dose modulation and pixel deflection for raster scan lithography) | |
| US4511980A (en) | Electron beam exposure apparatus | |
| US4992807A (en) | Gray scale printhead system | |
| JPS6112675Y2 (enExample) | ||
| US4258265A (en) | Electron beam exposing apparatus | |
| US4710640A (en) | Electron beam lithography | |
| JPS61200655A (ja) | 結像管のゲ−テイング方法及び装置 | |
| JPS637024B2 (enExample) | ||
| US5450103A (en) | Charge imaging system with back electrode dot enhancement | |
| JP2904620B2 (ja) | 荷電粒子ビーム描画方法 | |
| JP3448623B2 (ja) | 荷電粒子ビーム露光方法及び装置 | |
| JPH07312338A (ja) | 荷電粒子ビーム露光方法及び装置 | |
| JPH048938B2 (enExample) | ||
| JP2690484B2 (ja) | 記録装置 | |
| JPS60165032A (ja) | 電子ビ−ムパルスを発生するためのパルスゲ−ト | |
| JPS6341186B2 (enExample) | ||
| JPH04171714A (ja) | 電子線描画装置 | |
| JPS5922369B2 (ja) | 電子線描画装置 | |
| JP2024127864A5 (enExample) | ||
| JPH0130625B2 (enExample) | ||
| JPS6249877B2 (enExample) | ||
| JPS6216193B2 (enExample) | ||
| JPS6182430A (ja) | 荷電ビ−ム露光装置 | |
| JPS6249190B2 (enExample) | ||
| JPS5814756A (ja) | 磁性流体記録装置 |