JPS61118614U - - Google Patents
Info
- Publication number
- JPS61118614U JPS61118614U JP132385U JP132385U JPS61118614U JP S61118614 U JPS61118614 U JP S61118614U JP 132385 U JP132385 U JP 132385U JP 132385 U JP132385 U JP 132385U JP S61118614 U JPS61118614 U JP S61118614U
- Authority
- JP
- Japan
- Prior art keywords
- gas
- impurity removal
- removal device
- container
- liquid metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012535 impurity Substances 0.000 claims description 9
- 229910001338 liquidmetal Inorganic materials 0.000 claims description 5
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
Landscapes
- Gas Separation By Absorption (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
第1図は本考案に係る不純物除去装置の一実施
例の構成を示す断面図であり、第2図はこの不純
物除去装置を用いたMOCVD装置の構成を示す
模式図である。第3図は本考案の不純物除去装置
の他の例を示す概略的な断面図であり、第4図は
本考案のさらに他の例を示す概略的な断面図であ
る。第5図ないし第7図はそれぞれ2種類の液体
金属を充填することが可能な不純物除去装置の構
成例を示す概略的な断面図である。第8図および
第9図はそれぞれ液体金属の観察用の窓を設けた
不純物除去装置の構成例を示す概略的な断面図で
ある。第10図は不純物除去装置にパージ用ガス
供給するための接続状態を示す模式図である。
1……容器本体、2……容器蓋体、30,40
,54……容器、5,35,38,39,43,
45,56……液体金属、12,34,49,5
2……フイルタ。
FIG. 1 is a cross-sectional view showing the structure of an embodiment of an impurity removing apparatus according to the present invention, and FIG. 2 is a schematic diagram showing the structure of an MOCVD apparatus using this impurity removing apparatus. FIG. 3 is a schematic cross-sectional view showing another example of the impurity removal device of the present invention, and FIG. 4 is a schematic cross-sectional view showing still another example of the present invention. 5 to 7 are schematic cross-sectional views showing examples of the configuration of an impurity removal device that can be filled with two types of liquid metals, respectively. FIGS. 8 and 9 are schematic sectional views each showing an example of the configuration of an impurity removal apparatus provided with a window for observing liquid metal. FIG. 10 is a schematic diagram showing a connection state for supplying purge gas to the impurity removal device. 1... Container body, 2... Container lid, 30, 40
, 54... Container, 5, 35, 38, 39, 43,
45,56...liquid metal, 12,34,49,5
2...Filter.
Claims (1)
中の不純物を除去する不純物除去装置において、
上記ガスを上記液体金属に接触させたことにより
生ずる反応生成物を除去するためのフイルタを上
記容器内に内蔵してなる不純物除去装置。 An impurity removal device that removes impurities in the gas by bringing the gas into contact with liquid metal in a container,
An impurity removal device comprising a filter built into the container for removing reaction products produced by bringing the gas into contact with the liquid metal.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985001323U JPH0418655Y2 (en) | 1985-01-09 | 1985-01-09 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985001323U JPH0418655Y2 (en) | 1985-01-09 | 1985-01-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61118614U true JPS61118614U (en) | 1986-07-26 |
JPH0418655Y2 JPH0418655Y2 (en) | 1992-04-27 |
Family
ID=30473965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985001323U Expired JPH0418655Y2 (en) | 1985-01-09 | 1985-01-09 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0418655Y2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4749792B2 (en) * | 2005-08-03 | 2011-08-17 | 国立大学法人東京農工大学 | Method for producing aluminum group III nitride crystal and crystal laminated substrate |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60197221A (en) * | 1983-06-30 | 1985-10-05 | ジエ−ムズ ア−ル.シエリ− | Device and method for improved gettering of reactive gas |
-
1985
- 1985-01-09 JP JP1985001323U patent/JPH0418655Y2/ja not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60197221A (en) * | 1983-06-30 | 1985-10-05 | ジエ−ムズ ア−ル.シエリ− | Device and method for improved gettering of reactive gas |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4749792B2 (en) * | 2005-08-03 | 2011-08-17 | 国立大学法人東京農工大学 | Method for producing aluminum group III nitride crystal and crystal laminated substrate |
Also Published As
Publication number | Publication date |
---|---|
JPH0418655Y2 (en) | 1992-04-27 |
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