JPS61118614U - - Google Patents

Info

Publication number
JPS61118614U
JPS61118614U JP132385U JP132385U JPS61118614U JP S61118614 U JPS61118614 U JP S61118614U JP 132385 U JP132385 U JP 132385U JP 132385 U JP132385 U JP 132385U JP S61118614 U JPS61118614 U JP S61118614U
Authority
JP
Japan
Prior art keywords
gas
impurity removal
removal device
container
liquid metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP132385U
Other languages
Japanese (ja)
Other versions
JPH0418655Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985001323U priority Critical patent/JPH0418655Y2/ja
Publication of JPS61118614U publication Critical patent/JPS61118614U/ja
Application granted granted Critical
Publication of JPH0418655Y2 publication Critical patent/JPH0418655Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Gas Separation By Absorption (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案に係る不純物除去装置の一実施
例の構成を示す断面図であり、第2図はこの不純
物除去装置を用いたMOCVD装置の構成を示す
模式図である。第3図は本考案の不純物除去装置
の他の例を示す概略的な断面図であり、第4図は
本考案のさらに他の例を示す概略的な断面図であ
る。第5図ないし第7図はそれぞれ2種類の液体
金属を充填することが可能な不純物除去装置の構
成例を示す概略的な断面図である。第8図および
第9図はそれぞれ液体金属の観察用の窓を設けた
不純物除去装置の構成例を示す概略的な断面図で
ある。第10図は不純物除去装置にパージ用ガス
供給するための接続状態を示す模式図である。 1……容器本体、2……容器蓋体、30,40
,54……容器、5,35,38,39,43,
45,56……液体金属、12,34,49,5
2……フイルタ。
FIG. 1 is a cross-sectional view showing the structure of an embodiment of an impurity removing apparatus according to the present invention, and FIG. 2 is a schematic diagram showing the structure of an MOCVD apparatus using this impurity removing apparatus. FIG. 3 is a schematic cross-sectional view showing another example of the impurity removal device of the present invention, and FIG. 4 is a schematic cross-sectional view showing still another example of the present invention. 5 to 7 are schematic cross-sectional views showing examples of the configuration of an impurity removal device that can be filled with two types of liquid metals, respectively. FIGS. 8 and 9 are schematic sectional views each showing an example of the configuration of an impurity removal apparatus provided with a window for observing liquid metal. FIG. 10 is a schematic diagram showing a connection state for supplying purge gas to the impurity removal device. 1... Container body, 2... Container lid, 30, 40
, 54... Container, 5, 35, 38, 39, 43,
45,56...liquid metal, 12,34,49,5
2...Filter.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ガスを容器内の液体金属と接触させて上記ガス
中の不純物を除去する不純物除去装置において、
上記ガスを上記液体金属に接触させたことにより
生ずる反応生成物を除去するためのフイルタを上
記容器内に内蔵してなる不純物除去装置。
An impurity removal device that removes impurities in the gas by bringing the gas into contact with liquid metal in a container,
An impurity removal device comprising a filter built into the container for removing reaction products produced by bringing the gas into contact with the liquid metal.
JP1985001323U 1985-01-09 1985-01-09 Expired JPH0418655Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985001323U JPH0418655Y2 (en) 1985-01-09 1985-01-09

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985001323U JPH0418655Y2 (en) 1985-01-09 1985-01-09

Publications (2)

Publication Number Publication Date
JPS61118614U true JPS61118614U (en) 1986-07-26
JPH0418655Y2 JPH0418655Y2 (en) 1992-04-27

Family

ID=30473965

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985001323U Expired JPH0418655Y2 (en) 1985-01-09 1985-01-09

Country Status (1)

Country Link
JP (1) JPH0418655Y2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4749792B2 (en) * 2005-08-03 2011-08-17 国立大学法人東京農工大学 Method for producing aluminum group III nitride crystal and crystal laminated substrate

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60197221A (en) * 1983-06-30 1985-10-05 ジエ−ムズ ア−ル.シエリ− Device and method for improved gettering of reactive gas

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60197221A (en) * 1983-06-30 1985-10-05 ジエ−ムズ ア−ル.シエリ− Device and method for improved gettering of reactive gas

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4749792B2 (en) * 2005-08-03 2011-08-17 国立大学法人東京農工大学 Method for producing aluminum group III nitride crystal and crystal laminated substrate

Also Published As

Publication number Publication date
JPH0418655Y2 (en) 1992-04-27

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