JPS61117830A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS61117830A
JPS61117830A JP59238274A JP23827484A JPS61117830A JP S61117830 A JPS61117830 A JP S61117830A JP 59238274 A JP59238274 A JP 59238274A JP 23827484 A JP23827484 A JP 23827484A JP S61117830 A JPS61117830 A JP S61117830A
Authority
JP
Japan
Prior art keywords
mask
sample
ratio
reduction
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59238274A
Other languages
English (en)
Japanese (ja)
Other versions
JPH055162B2 (https=
Inventor
Satoshi Ido
井戸　敏
Toyoki Kitayama
北山　豊樹
Toa Hayasaka
早坂　東亜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP59238274A priority Critical patent/JPS61117830A/ja
Publication of JPS61117830A publication Critical patent/JPS61117830A/ja
Publication of JPH055162B2 publication Critical patent/JPH055162B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59238274A 1984-11-14 1984-11-14 露光装置 Granted JPS61117830A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59238274A JPS61117830A (ja) 1984-11-14 1984-11-14 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59238274A JPS61117830A (ja) 1984-11-14 1984-11-14 露光装置

Publications (2)

Publication Number Publication Date
JPS61117830A true JPS61117830A (ja) 1986-06-05
JPH055162B2 JPH055162B2 (https=) 1993-01-21

Family

ID=17027745

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59238274A Granted JPS61117830A (ja) 1984-11-14 1984-11-14 露光装置

Country Status (1)

Country Link
JP (1) JPS61117830A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS629632A (ja) * 1985-07-06 1987-01-17 Agency Of Ind Science & Technol 投影露光装置
JPS6362231A (ja) * 1986-09-02 1988-03-18 Nippon Telegr & Teleph Corp <Ntt> Ｘ線縮小投影露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS629632A (ja) * 1985-07-06 1987-01-17 Agency Of Ind Science & Technol 投影露光装置
JPS6362231A (ja) * 1986-09-02 1988-03-18 Nippon Telegr & Teleph Corp <Ntt> Ｘ線縮小投影露光装置

Also Published As

Publication number Publication date
JPH055162B2 (https=) 1993-01-21

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