JPS61117271A - レ−ザ蒸着法 - Google Patents
レ−ザ蒸着法Info
- Publication number
- JPS61117271A JPS61117271A JP23926284A JP23926284A JPS61117271A JP S61117271 A JPS61117271 A JP S61117271A JP 23926284 A JP23926284 A JP 23926284A JP 23926284 A JP23926284 A JP 23926284A JP S61117271 A JPS61117271 A JP S61117271A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- laser beam
- evaporation
- vapor deposition
- particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 5
- 238000007740 vapor deposition Methods 0.000 title abstract description 10
- 238000001704 evaporation Methods 0.000 claims abstract description 38
- 239000010419 fine particle Substances 0.000 claims abstract description 5
- 238000000151 deposition Methods 0.000 claims description 14
- 230000008021 deposition Effects 0.000 claims description 11
- 239000007789 gas Substances 0.000 claims description 4
- 239000011882 ultra-fine particle Substances 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 9
- 239000000758 substrate Substances 0.000 abstract description 8
- 239000002245 particle Substances 0.000 abstract description 7
- 239000012535 impurity Substances 0.000 abstract description 3
- 239000010409 thin film Substances 0.000 abstract description 2
- 230000008020 evaporation Effects 0.000 description 27
- 238000010438 heat treatment Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000003779 heat-resistant material Substances 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23926284A JPS61117271A (ja) | 1984-11-13 | 1984-11-13 | レ−ザ蒸着法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23926284A JPS61117271A (ja) | 1984-11-13 | 1984-11-13 | レ−ザ蒸着法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61117271A true JPS61117271A (ja) | 1986-06-04 |
| JPS6245306B2 JPS6245306B2 (enrdf_load_stackoverflow) | 1987-09-25 |
Family
ID=17042145
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23926284A Granted JPS61117271A (ja) | 1984-11-13 | 1984-11-13 | レ−ザ蒸着法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61117271A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0328202A3 (en) * | 1988-02-12 | 1991-03-27 | Philips Electronics Uk Limited | Method of forming a quantum dot structure |
| JP2018502994A (ja) * | 2014-12-23 | 2018-02-01 | ピコデオン リミティド オサケユイチア | 回転ミラーと円形リングターゲットとを伴う灯台形スキャナ |
-
1984
- 1984-11-13 JP JP23926284A patent/JPS61117271A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0328202A3 (en) * | 1988-02-12 | 1991-03-27 | Philips Electronics Uk Limited | Method of forming a quantum dot structure |
| JP2018502994A (ja) * | 2014-12-23 | 2018-02-01 | ピコデオン リミティド オサケユイチア | 回転ミラーと円形リングターゲットとを伴う灯台形スキャナ |
| US10927447B2 (en) | 2014-12-23 | 2021-02-23 | Pulsedeon Oy | Lighthouse scanner with a rotating mirror and a circular ring target |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6245306B2 (enrdf_load_stackoverflow) | 1987-09-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |