JPS61112085A - アルキルハロシランの製造方法 - Google Patents
アルキルハロシランの製造方法Info
- Publication number
- JPS61112085A JPS61112085A JP60239659A JP23965985A JPS61112085A JP S61112085 A JPS61112085 A JP S61112085A JP 60239659 A JP60239659 A JP 60239659A JP 23965985 A JP23965985 A JP 23965985A JP S61112085 A JPS61112085 A JP S61112085A
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- fluidized bed
- chloride
- reactor
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical group ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 claims description 20
- 229910052710 silicon Inorganic materials 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 16
- 239000010703 silicon Substances 0.000 claims description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- 229940050176 methyl chloride Drugs 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 9
- 229910021485 fumed silica Inorganic materials 0.000 claims description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- WCCJDBZJUYKDBF-UHFFFAOYSA-N copper silicon Chemical compound [Si].[Cu] WCCJDBZJUYKDBF-UHFFFAOYSA-N 0.000 claims description 4
- 150000001350 alkyl halides Chemical class 0.000 claims description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 2
- 238000011065 in-situ storage Methods 0.000 claims description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 18
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 18
- 229940045803 cuprous chloride Drugs 0.000 description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 14
- 239000002245 particle Substances 0.000 description 11
- 238000005054 agglomeration Methods 0.000 description 7
- 230000002776 aggregation Effects 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- 239000011856 silicon-based particle Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 6
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 2
- 239000005751 Copper oxide Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- QJXRQZKOCJPXGW-UHFFFAOYSA-N [Cu].[Si](Cl)(Cl)(Cl)Cl Chemical compound [Cu].[Si](Cl)(Cl)(Cl)Cl QJXRQZKOCJPXGW-UHFFFAOYSA-N 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- 229910000431 copper oxide Inorganic materials 0.000 description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000005243 fluidization Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 229910002016 Aerosil® 200 Inorganic materials 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001348 alkyl chlorides Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- -1 methylchloro-O-silane Chemical compound 0.000 description 1
- SNMVRZFUUCLYTO-UHFFFAOYSA-N n-propyl chloride Chemical compound CCCCl SNMVRZFUUCLYTO-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical class C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical class Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/16—Preparation thereof from silicon and halogenated hydrocarbons direct synthesis
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US665878 | 1984-10-29 | ||
| US06/665,878 US4554370A (en) | 1984-10-29 | 1984-10-29 | Method for making alkylhalosilanes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61112085A true JPS61112085A (ja) | 1986-05-30 |
| JPH035396B2 JPH035396B2 (enExample) | 1991-01-25 |
Family
ID=24671926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60239659A Granted JPS61112085A (ja) | 1984-10-29 | 1985-10-28 | アルキルハロシランの製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4554370A (enExample) |
| JP (1) | JPS61112085A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6395917B1 (en) | 2000-10-20 | 2002-05-28 | Shin-Etsu Chemical Co., Ltd. | Preparation of organohalosilanes |
| JP2018513824A (ja) * | 2015-03-24 | 2018-05-31 | ダウ シリコーンズ コーポレーション | ケイ化銅の流動化方法及び同方法を用いたハロシランの調製プロセス |
| JP2022517459A (ja) * | 2019-03-12 | 2022-03-09 | ワッカー ケミー アクチエンゲゼルシャフト | オルガノクロロシランの調製方法 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5061672A (en) * | 1990-01-30 | 1991-10-29 | Elkem Metals Company | Active mass for making organohalosilanes |
| US5312948A (en) * | 1993-10-08 | 1994-05-17 | Dow Corning Corporation | Particle size distribution for fluidized-bed process for making alkylhalosilanes |
| JP3159029B2 (ja) * | 1996-01-12 | 2001-04-23 | 信越化学工業株式会社 | シラン類の製造方法 |
| DE19919337C1 (de) * | 1999-04-27 | 2000-05-18 | Wacker Chemie Gmbh | Verfahren zur Herstellung von Organochlorsilanen |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU130882A1 (ru) * | 1959-11-30 | 1960-11-30 | Я.И. Вабель | Способ получени метилхлорсиланов |
| US3133109A (en) * | 1960-11-28 | 1964-05-12 | Gen Electric | Silicon compound process and apparatus |
| SU400594A1 (ru) * | 1962-06-08 | 1973-10-01 | Способ получения метил- и диметилдихлорсиланов | |
| US4487950A (en) * | 1982-04-16 | 1984-12-11 | General Electric Company | Method for making methylchlorosilanes |
-
1984
- 1984-10-29 US US06/665,878 patent/US4554370A/en not_active Expired - Lifetime
-
1985
- 1985-10-28 JP JP60239659A patent/JPS61112085A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6395917B1 (en) | 2000-10-20 | 2002-05-28 | Shin-Etsu Chemical Co., Ltd. | Preparation of organohalosilanes |
| JP2018513824A (ja) * | 2015-03-24 | 2018-05-31 | ダウ シリコーンズ コーポレーション | ケイ化銅の流動化方法及び同方法を用いたハロシランの調製プロセス |
| JP2022517459A (ja) * | 2019-03-12 | 2022-03-09 | ワッカー ケミー アクチエンゲゼルシャフト | オルガノクロロシランの調製方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4554370A (en) | 1985-11-19 |
| JPH035396B2 (enExample) | 1991-01-25 |
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