JPS6110212A - Characteristic improvement of amorphous alloy thin band - Google Patents

Characteristic improvement of amorphous alloy thin band

Info

Publication number
JPS6110212A
JPS6110212A JP13014884A JP13014884A JPS6110212A JP S6110212 A JPS6110212 A JP S6110212A JP 13014884 A JP13014884 A JP 13014884A JP 13014884 A JP13014884 A JP 13014884A JP S6110212 A JPS6110212 A JP S6110212A
Authority
JP
Japan
Prior art keywords
amorphous alloy
alloy thin
thin band
alloy ribbon
mgo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13014884A
Other languages
Japanese (ja)
Inventor
Nobuyuki Morito
森戸 延行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP13014884A priority Critical patent/JPS6110212A/en
Publication of JPS6110212A publication Critical patent/JPS6110212A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/12Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
    • H01F1/14Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
    • H01F1/147Alloys characterised by their composition
    • H01F1/153Amorphous metallic alloys, e.g. glassy metals
    • H01F1/15383Applying coatings thereon

Abstract

PURPOSE:To improve an iron loss without deterioration of space factor by applying insulating coat of an inorganic oxide consisting of at least one from among SiO2, Al2O3 and MgO on an amorphous alloy thin band by ion plating. CONSTITUTION:An insulating coat consisting of at least one from among SiO2, Al2O3 and MgO is applied to the surface of an amorphous alloy thin band, which is used for an iron core material for laminated or wound transformer by ion plating. It is appropriate that mean film thickness of an inorganic oxide is 0.01-0.5mum. Thus, the insulating material of the inorganic oxide can be coated with ion plating without heating the amorphous alloy thin band, thereby the insulating coat can be formed without embrittlement and crystallization of the amorphous alloy thin band by itself.

Description

【発明の詳細な説明】 (技術分野) 積み又は巻きトランス用の鉄心(以下単にコアという)
材料に使用する非晶質合金薄帯の4?注改善に関しこの
明細書で述べる技術内容は、該薄帯の表面に施す絶縁被
膜の適合についての開発成果1に提案すると仁ろKある
[Detailed description of the invention] (Technical field) Iron core for laminated or wound transformers (hereinafter simply referred to as core)
4?Amorphous alloy ribbon used for material? Note: The technical contents described in this specification regarding improvements are proposed in Development Results 1 regarding the suitability of the insulating coating applied to the surface of the ribbon.

(背景技術〕 Fe −B系およびFe−B−8i系などの溶融合金を
105〜NO’℃/秒程度の冷却速度で急冷凝固させる
と、無秩序な原子配列をもつ板厚20〜50μm程度の
非晶質合金薄帯が得られる。
(Background technology) When molten alloys such as Fe-B-based and Fe-B-8i-based alloys are rapidly solidified at a cooling rate of about 105 to NO'°C/sec, a plate with a thickness of about 20 to 50 μm with a disordered atomic arrangement is formed. An amorphous alloy ribbon is obtained.

このような非晶質合金薄帯は、軟磁性に優れ、殊に極め
て低い鉄損を有することからコア材料として現在使用さ
れている方向性けい素鋼板の有力な競合材料として注目
されている。
Such amorphous alloy ribbons have excellent soft magnetism and especially extremely low core loss, and are therefore attracting attention as a potential competitive material to grain-oriented silicon steel sheets currently used as core materials.

従来この非晶質合金薄帯に、絶縁被膜を施すことなく、
裸のままでコア九組立て変圧器などに用いるのが常であ
り、その理由な適切な絶縁被膜が開発されていなかった
ためもあるが、非晶質合金自身の筒い比抵抗とその薄帯
の表面粗度が大きいため、積層したとき層間抵抗が比較
的高く、全損失への渦流損の影響が小さかったからであ
る。
Conventionally, this amorphous alloy ribbon was not coated with an insulating coating.
It was customary to use the bare core in nine-core assembly transformers, etc., and the reason for this was that an appropriate insulating coating had not been developed, but the cylindrical resistivity of the amorphous alloy itself and the thin strip's This is because the surface roughness is large, so when laminated, the interlayer resistance is relatively high, and the influence of eddy current loss on the total loss is small.

(問題点〕 ところが、近時非晶質合金薄帯の製造技術の進歩に伴い
、その表面が平滑になって占積率が向上するとともに、
層間抵抗は減少しコアに加工したとき渦流損が増加する
傾向にある。
(Problem) However, with recent advances in manufacturing technology for amorphous alloy ribbons, the surface has become smoother and the space factor has improved.
Interlayer resistance tends to decrease and eddy current loss increases when processed into a core.

従って非晶質合金薄帯につき占積率を低下させることな
く、渦流損、換官すれば全鉄損を減少させることが委請
される。
Therefore, it is desired to reduce the eddy current loss, or in other words, the total iron loss, without reducing the space factor of the amorphous alloy ribbon.

ところで特開昭58−109171号公報には、加熱に
↓る非晶質合金薄帯の脆化を避けるため、電子線硬化性
樹脂被覆の適用が提案されている。しかしながら公知の
ようにまたとえばFe −B −Si系非晶賀合金のi
注を充分に発揮させるには、350゜ないし400℃で
磁場中焼鈍をすることが必要であるが、前jピ有機樹脂
ではこの焼鈍中に炭化し、所期の目的である層間抵抗を
維持することができない。
By the way, JP-A-58-109171 proposes applying an electron beam curable resin coating to avoid embrittlement of the amorphous alloy ribbon due to heating. However, as is well known, for example, the i of Fe-B-Si amorphous alloy is
In order to make full use of this property, it is necessary to perform annealing in a magnetic field at 350° to 400°C, but the former organic resin carbonizes during this annealing and maintains the desired interlayer resistance. Can not do it.

一方従来のけい素鋼板用の絶縁被膜は焼付けに400”
Cをこえる加熱を要するので非晶質合金の脆化、結晶化
などkもたらし、非晶質合金薄帯の絶縁被膜として使用
することはできない。
On the other hand, the insulation coating for conventional silicon steel sheets takes 40"
Since heating exceeding C is required, it causes embrittlement, crystallization, etc. of the amorphous alloy, and it cannot be used as an insulating coating for an amorphous alloy ribbon.

(発明の動機) 最近プレス金型や切削工具の寿命延長を目的としてTi
N lと硬賀物貿のイオンブレーティングが試みられて
、高密着性および良好な耐摩耗性が報告されている。こ
の被覆技術につき非晶質合金薄帯%注改善のための表面
処理に応用したところ後述するように優れた性能が得ら
れこの発明の成功を導くことができた。
(Motivation for the invention) Recently, Ti has been used for the purpose of extending the life of press dies and cutting tools.
Ion blating of Nl and Kogamonobo has been attempted and high adhesion and good wear resistance have been reported. When this coating technique was applied to surface treatment for improving the amorphous alloy ribbon, excellent performance was obtained as will be described later, leading to the success of this invention.

(発明の目的〕 この発明は、非晶質合金薄帯に適合する絶縁被膜とその
被成手段についての開発研究の結果に従って、該薄帯の
製造技術の発展に伴う表面注状の改善、とくに平滑化に
由来した眉間抵抗の低下金、非晶質合金薄帯の占積率の
劣化なく有利に補うことを目的とするものである。
(Objective of the Invention) The present invention is based on the results of research and development on insulating coatings suitable for amorphous alloy ribbons and means for forming the same. The object is to advantageously compensate for the decrease in glabellar resistance resulting from smoothing without deteriorating the space factor of the gold or amorphous alloy ribbon.

(発明の構成) この発明は、積み又は巻きトランス用の鉄心材料として
使用する非晶質合金薄帯の表面に5in2゜A4.08
およびMgOのうち少なくとも1鴇より成る無機酸化物
の絶縁被膜を、イオンブレーティングによって施すこと
を特徴とする非晶質合金薄帯の特性改善方法である。
(Structure of the Invention) This invention provides a 5in2°A4.08
This is a method for improving the characteristics of an amorphous alloy ribbon, characterized in that an insulating coating of an inorganic oxide consisting of at least one of MgO and MgO is applied by ion blasting.

ここに絶縁被膜の平均膜厚’i 0.01ないし0.5
μmVCすることが実施態様として好適である0この発
明にかいては、非晶質合金薄帯を加熱することなく、S
in、 、 AJ、O,およびMgOのうち少なくとも
1種よりなる無機酸化物の絶縁物質を被覆することがで
きるイオンブレーティングを用いる。
Here, the average film thickness of the insulating film 'i 0.01 to 0.5
According to the present invention, the amorphous alloy ribbon can be
Ion blating is used which can coat an inorganic oxide insulating material made of at least one of in, AJ, O, and MgO.

イオンブレーティング法では10tOrr程度の減圧不
活性ガス雰囲気中で、被覆対象を陰極とするグロー放電
金主じさせ、蒸発物質をこのグロー放電中の通過に際し
イオン化して加速し、対象表面上に成長させ、同時にイ
オン化した不活性ガス粒子によって対象表面へのスパッ
タリングが行われるので、通常の真空蒸着よりも格段に
密着性の優れた被膜を、電子ビーム加熱を用いることに
よって極めて高速度に形成することができる。
In the ion blating method, in a reduced pressure inert gas atmosphere of about 10 tOrr, a glow discharge metal is applied to the coating target as a cathode, and the evaporated substances are ionized and accelerated as they pass through the glow discharge, causing them to grow on the target surface. At the same time, sputtering is performed on the target surface using ionized inert gas particles, making it possible to form a film with much better adhesion than normal vacuum deposition at an extremely high speed using electron beam heating. I can do it.

ちなみにいわゆるスパッタリング法によっても密着性の
良い被膜を形成することができたるにしても、被膜の生
長速度が遅く生産性に劣る不利がある。
Incidentally, even if a film with good adhesion can be formed by the so-called sputtering method, it has the disadvantage that the growth rate of the film is slow and productivity is poor.

上記のようにこの発明では、非晶質合金薄帯を加熱する
を豊しないので、上述のけい素鋼板用の絶縁被膜焼付け
を単に転用しようとするとき問題となる非晶質合金薄帯
自体の脆化や結晶化を伴うことなく、絶縁被膜を施すこ
とができるのである。
As mentioned above, in this invention, the heating of the amorphous alloy ribbon is not sufficient, so when trying to simply transfer the insulation coating baking for silicon steel sheets mentioned above, the problem arises because the amorphous alloy ribbon itself is heated. Insulating coatings can be applied without embrittlement or crystallization.

絶縁被膜の平均膜厚は、0.01〜0.5μmで非晶質
合金薄帯が元来極薄であることの故に、適合するが0.
05μmに満たないと眉間絶縁全確保することができず
、一方0.5μm’4こえると層間絶縁の面からは、好
適合であっても占積率を損なうので好ましくない。
The average thickness of the insulating coating is 0.01 to 0.5 μm, which is suitable because the amorphous alloy ribbon is originally extremely thin.
If it is less than 0.5 μm, complete glabellar insulation cannot be ensured, while if it exceeds 0.5 μm'4, it is not preferable from the viewpoint of interlayer insulation, since even if it is a good fit, the space factor will be impaired.

すなわち非晶質合金薄帯の板淳か20μmないし50μ
mのように極めて薄いために、非磁性の過大な絶縁被膜
による占積率低下の影響が著しいからでおる。
In other words, the thickness of the amorphous alloy ribbon is 20μm to 50μm.
This is because the non-magnetic, excessively large insulating film has a significant effect on reducing the space factor since it is extremely thin like m.

Fe、8B□。S1□2組成の合金を溶解して、単ロー
ル法で5の巾、30μ厚の非晶質合金薄帯を製造し次い
で約lo−” torrの減圧アルゴンガス中でHol
low Cathode法イオンプレーテイングニヨク
Sin、膜1に0.2μm厚みで形成させた。蒸着時間
はほぼ15秒でおった。
Fe, 8B□. An amorphous alloy ribbon with a width of 5 mm and a thickness of 30 μm was produced by a single roll method by melting an alloy with a composition of S1□2, and then Holi-rolled in a reduced pressure of argon gas at about 10-200 torr.
A low cathode method ion plating film 1 was formed to have a thickness of 0.2 μm. The deposition time was approximately 15 seconds.

無処理の上記薄帯の占積率は、81.8%、 5io2
膜付きリボンでは81.2%であり、絶縁被膜による占
積率の低下はほとんど無く、またこの被膜処理によって
非晶質合金薄帯の脆化することはもちろん無かった。
The space factor of the untreated ribbon is 81.8%, 5io2
It was 81.2% for the film-covered ribbon, and there was almost no decrease in the space factor due to the insulating film, and of course the film treatment did not cause embrittlement of the amorphous alloy ribbon.

この絶縁被膜を施した非晶質合金薄帯を、直径6cIn
のトロイダルコアとして、200 A/mの磁場下で、
370”0.1時間の焼鈍を行いそのまま冷却した。
This amorphous alloy ribbon coated with an insulating film was coated with a diameter of 6 cIn.
As a toroidal core, under a magnetic field of 200 A/m,
370'' was annealed for 0.1 hour and then cooled.

このトロイダルコアの50 Hz 、 1.8Tでの鉄
損Wxa15oU、o、1oWAc9であり、無処理の
ままの非晶質合金薄帯のそれがo、15W/に4Iであ
ったのと比べてより優れていた。
The iron loss of this toroidal core at 50 Hz and 1.8 T was 15 o U, o, 1 o WAc9, which was higher than that of the untreated amorphous alloy ribbon, which was o, 15 W/4 I. It was excellent.

さらにこの絶縁被膜処理によって、トランス油中に長時
間浸漬したとき、無処理の場合に発生したa在方化も生
じることなく、耐油性の向上が認められた。
Furthermore, due to this insulating coating treatment, when immersed in transformer oil for a long time, an improvement in oil resistance was observed, without causing the a-sidedness that occurred in the case of no treatment.

(実施例〕 実施例1 中2cm、厚み28 μmのFe y 8 B 10 
S l □s非晶質合金薄帯に0.2μm厚みのMgO
絶縁被膜をイオングレープインクにより施した。占積率
は80.7%であり磁場中焼鈍後の鉄損W1a/soは
0.12WAg でめった。
(Example) Example 1 Fe y 8 B 10 with a medium diameter of 2 cm and a thickness of 28 μm
S l □s 0.2 μm thick MgO on amorphous alloy ribbon
An insulating coating was applied using ion grape ink. The space factor was 80.7%, and the iron loss W1a/so after annealing in a magnetic field was 0.12 WAg.

実施例2 絶縁被膜を0.1μm厚のSユ0□とする他は実施例1
と同様に処理した。占積率は80.8%、Wla/66
は0.12W/Icgであった。
Example 2 Example 1 except that the insulating coating was 0.1 μm thick Syu0□
processed in the same way. Occupancy rate is 80.8%, Wla/66
was 0.12 W/Icg.

比較例1 実施例1で用いた非晶質合金リボンに絶縁被膜を施すこ
となく同様の測定を行ったところ占積率は80.8%、
W z s/s oは0 、16 W%cyであった。
Comparative Example 1 When the same measurements were performed on the amorphous alloy ribbon used in Example 1 without applying an insulating coating, the space factor was 80.8%.
W z s/s o was 0, 16 W%cy.

(発明の効果〕 この発明によれば、非晶質合金薄帯が、それ自体著しく
薄層よりなることに有利に適合して、その占積率の事実
上の阻害なしに鉄損の著しい改讐を遂げることができる
(Effects of the Invention) According to the present invention, the amorphous alloy ribbon itself is advantageously adapted to consist of a significantly thin layer, and the core loss is significantly improved without actually inhibiting its space factor. You can take revenge.

−へ− to

Claims (1)

【特許請求の範囲】 1、積み又は巻きトランス用の鉄心材料として使用する
非晶質合金薄帯の表面に、SiO_2、Al_2O_3
およびMgOのうち少くとも1種より成る無機酸化物の
絶縁被膜を、イオンブレーティングによつて施すことを
特徴とする非晶質合金薄帯の特性改善方法。 2、絶縁被膜の平均膜厚を0.01ないし0.5μmに
する特許請求の範囲1記載の方法。
[Claims] 1. SiO_2, Al_2O_3 on the surface of an amorphous alloy ribbon used as a core material for laminated or wound transformers.
A method for improving the properties of an amorphous alloy ribbon, comprising applying an insulating coating of an inorganic oxide consisting of at least one of MgO and MgO by ion blasting. 2. The method according to claim 1, wherein the average thickness of the insulating coating is 0.01 to 0.5 μm.
JP13014884A 1984-06-26 1984-06-26 Characteristic improvement of amorphous alloy thin band Pending JPS6110212A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13014884A JPS6110212A (en) 1984-06-26 1984-06-26 Characteristic improvement of amorphous alloy thin band

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13014884A JPS6110212A (en) 1984-06-26 1984-06-26 Characteristic improvement of amorphous alloy thin band

Publications (1)

Publication Number Publication Date
JPS6110212A true JPS6110212A (en) 1986-01-17

Family

ID=15027119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13014884A Pending JPS6110212A (en) 1984-06-26 1984-06-26 Characteristic improvement of amorphous alloy thin band

Country Status (1)

Country Link
JP (1) JPS6110212A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0733324U (en) * 1993-11-29 1995-06-20 興生 黒岩 Bone certification plate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0733324U (en) * 1993-11-29 1995-06-20 興生 黒岩 Bone certification plate

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