JPS61100476A - サ−マルヘツドおよびその製造方法 - Google Patents
サ−マルヘツドおよびその製造方法Info
- Publication number
- JPS61100476A JPS61100476A JP59221244A JP22124484A JPS61100476A JP S61100476 A JPS61100476 A JP S61100476A JP 59221244 A JP59221244 A JP 59221244A JP 22124484 A JP22124484 A JP 22124484A JP S61100476 A JPS61100476 A JP S61100476A
- Authority
- JP
- Japan
- Prior art keywords
- thermal head
- tantalum
- melting point
- heating resistor
- point metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 238000010438 heat treatment Methods 0.000 claims abstract description 40
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims abstract description 23
- 238000002844 melting Methods 0.000 claims abstract description 22
- 230000008018 melting Effects 0.000 claims abstract description 21
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 13
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 8
- 239000011651 chromium Substances 0.000 claims abstract description 8
- 239000010936 titanium Substances 0.000 claims abstract description 8
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 7
- 239000011733 molybdenum Substances 0.000 claims abstract description 7
- 239000000758 substrate Substances 0.000 claims abstract description 7
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 7
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 6
- 239000010955 niobium Substances 0.000 claims abstract description 6
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims abstract description 6
- 230000001681 protective effect Effects 0.000 claims abstract description 6
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 6
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 6
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 5
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910001362 Ta alloys Inorganic materials 0.000 claims abstract description 4
- 238000004544 sputter deposition Methods 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 10
- 239000007789 gas Substances 0.000 claims description 9
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 8
- 229910052721 tungsten Inorganic materials 0.000 claims description 8
- 239000010937 tungsten Substances 0.000 claims description 8
- 239000004020 conductor Substances 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 5
- 239000002131 composite material Substances 0.000 claims description 4
- 238000005299 abrasion Methods 0.000 claims description 2
- 230000001105 regulatory effect Effects 0.000 claims 3
- 229910045601 alloy Inorganic materials 0.000 abstract description 17
- 239000000956 alloy Substances 0.000 abstract description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000919 ceramic Substances 0.000 abstract description 3
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052814 silicon oxide Inorganic materials 0.000 abstract description 3
- 229910001936 tantalum oxide Inorganic materials 0.000 abstract description 3
- 229910052782 aluminium Inorganic materials 0.000 abstract description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 2
- 239000010410 layer Substances 0.000 abstract 5
- 239000011241 protective layer Substances 0.000 abstract 1
- 230000000630 rising effect Effects 0.000 abstract 1
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 31
- 239000010409 thin film Substances 0.000 description 31
- 239000010408 film Substances 0.000 description 24
- 238000012360 testing method Methods 0.000 description 14
- 230000007423 decrease Effects 0.000 description 12
- 238000010586 diagram Methods 0.000 description 11
- 230000000694 effects Effects 0.000 description 9
- 238000001953 recrystallisation Methods 0.000 description 9
- 229910001199 N alloy Inorganic materials 0.000 description 8
- 238000005530 etching Methods 0.000 description 6
- -1 hubnium Chemical compound 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 238000000137 annealing Methods 0.000 description 5
- 238000002441 X-ray diffraction Methods 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- HDXIKOLXEOBGAP-UHFFFAOYSA-N [N].[Mo].[Ta] Chemical compound [N].[Mo].[Ta] HDXIKOLXEOBGAP-UHFFFAOYSA-N 0.000 description 3
- 239000003870 refractory metal Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 241000519995 Stachys sylvatica Species 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000005381 potential energy Methods 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- DZZDTRZOOBJSSG-UHFFFAOYSA-N [Ta].[W] Chemical compound [Ta].[W] DZZDTRZOOBJSSG-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- JZLMRQMUNCKZTP-UHFFFAOYSA-N molybdenum tantalum Chemical compound [Mo].[Ta] JZLMRQMUNCKZTP-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electronic Switches (AREA)
- Non-Adjustable Resistors (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59221244A JPS61100476A (ja) | 1984-10-23 | 1984-10-23 | サ−マルヘツドおよびその製造方法 |
| US06/790,415 US4709243A (en) | 1984-10-23 | 1985-10-23 | Thermal head and method for manufacture thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59221244A JPS61100476A (ja) | 1984-10-23 | 1984-10-23 | サ−マルヘツドおよびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61100476A true JPS61100476A (ja) | 1986-05-19 |
| JPH0312551B2 JPH0312551B2 (enExample) | 1991-02-20 |
Family
ID=16763721
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59221244A Granted JPS61100476A (ja) | 1984-10-23 | 1984-10-23 | サ−マルヘツドおよびその製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4709243A (enExample) |
| JP (1) | JPS61100476A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6527813B1 (en) | 1996-08-22 | 2003-03-04 | Canon Kabushiki Kaisha | Ink jet head substrate, an ink jet head, an ink jet apparatus, and a method for manufacturing an ink jet recording head |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3810667A1 (de) * | 1988-03-29 | 1989-10-19 | Siemens Ag | Elektrisches widerstandsmaterial fuer elektrothermische wandler in duennschichttechnik |
| EP0408342B1 (en) * | 1989-07-12 | 1995-09-27 | Mitsubishi Denki Kabushiki Kaisha | Thin high temperature heater and method for manufacturing the same |
| JPH05275162A (ja) * | 1992-03-26 | 1993-10-22 | Rohm Co Ltd | ライン型加熱体 |
| EP0630749B1 (en) * | 1993-06-28 | 1998-12-23 | Canon Kabushiki Kaisha | Heat generating resistor containing TaN0.8, substrate provided with said heat generating resistor for liquid jet head, liquid jet head provided with said substrate, and liquid jet apparatus provided with said liquid jet head |
| US7344218B2 (en) * | 2003-11-06 | 2008-03-18 | Canon Kabushiki Kaisha | Printhead driving method, printhead substrate, printhead, head cartridge and printing apparatus |
| TWI267446B (en) * | 2003-11-06 | 2006-12-01 | Canon Kk | Printhead substrate, printhead using the substrate, head cartridge including the printhead, method of driving the printhead, and printing apparatus using the printhead |
| EP2978608B1 (en) * | 2013-07-12 | 2021-05-19 | Hewlett-Packard Development Company, L.P. | Thermal inkjet printhead stack with amorphous thin metal resistor |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4232213A (en) * | 1979-01-15 | 1980-11-04 | Matsushita Electric Industrial Co., Ltd. | Thermal head |
-
1984
- 1984-10-23 JP JP59221244A patent/JPS61100476A/ja active Granted
-
1985
- 1985-10-23 US US06/790,415 patent/US4709243A/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6527813B1 (en) | 1996-08-22 | 2003-03-04 | Canon Kabushiki Kaisha | Ink jet head substrate, an ink jet head, an ink jet apparatus, and a method for manufacturing an ink jet recording head |
| US6769762B2 (en) | 1996-08-22 | 2004-08-03 | Canon Kabushiki Kaisha | Ink jet head substrate, an ink jet head, an ink jet apparatus, and a method for manufacturing an ink jet recording head |
Also Published As
| Publication number | Publication date |
|---|---|
| US4709243A (en) | 1987-11-24 |
| JPH0312551B2 (enExample) | 1991-02-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0150579B1 (en) | Thermal head | |
| JPS61100476A (ja) | サ−マルヘツドおよびその製造方法 | |
| US4845339A (en) | Thermal head containing an insulating, heat conductive layer | |
| US4786916A (en) | Thermal head | |
| US4734709A (en) | Thermal head and method for fabricating | |
| US4751518A (en) | Heating resistor as a thermal head resistive element | |
| JPS62167056A (ja) | サ−マルヘツド | |
| US4742361A (en) | Thermal print head | |
| JPS63213902A (ja) | サ−マルヘツド | |
| JPS6018299B2 (ja) | サ−マルヘツド | |
| JPH01112702A (ja) | サーマルヘッド | |
| JPS63213901A (ja) | サ−マルヘツド | |
| JPS62202753A (ja) | 薄膜型サ−マルヘツド | |
| JPS63177401A (ja) | 薄膜サ−マルヘツド | |
| JPS62202754A (ja) | 薄膜型サ−マルヘツド | |
| JPS63157401A (ja) | 発熱抵抗体およびこれを用いたサ−マルヘツド | |
| JPS6311991B2 (enExample) | ||
| JPH01112701A (ja) | サーマルヘッド | |
| JPS6367319B2 (enExample) | ||
| JPS6271666A (ja) | サ−マルヘツド | |
| JPS62202756A (ja) | 薄膜型サ−マルヘツド | |
| JPH01150301A (ja) | サーマルヘッド | |
| JPS6016354B2 (ja) | サ−マルヘツド | |
| JPH0673966B2 (ja) | サーマルヘッド | |
| JPS6156111B2 (enExample) |