JPS60945A - Continuous vacuum treatment device - Google Patents
Continuous vacuum treatment deviceInfo
- Publication number
- JPS60945A JPS60945A JP10787483A JP10787483A JPS60945A JP S60945 A JPS60945 A JP S60945A JP 10787483 A JP10787483 A JP 10787483A JP 10787483 A JP10787483 A JP 10787483A JP S60945 A JPS60945 A JP S60945A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- chamber
- preliminary
- reserve
- chambers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16J—PISTONS; CYLINDERS; SEALINGS
- F16J15/00—Sealings
- F16J15/16—Sealings between relatively-moving surfaces
- F16J15/168—Sealings between relatively-moving surfaces which permits material to be continuously conveyed
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は可撓性の被処理物、例えは、プラスチック成形
品を真空処理室内で連続的にプラズマ処理する真空連続
処理装置に１関するものであり、プラスチック成形品と
は、プラスチックフィルム。[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a vacuum continuous processing apparatus that continuously plasma-processes flexible processing objects, such as plastic molded products, in a vacuum processing chamber. Yes, plastic molded products are plastic films.
プラスチックシートあるいはプラスチック被覆電線など
を指す。Refers to plastic sheets or plastic-coated wires.
この種の真空連続処理装置は、本願出願人によりすでに
特Ｗｆ出願さｎている。この特許はプラスチック成形品
など可撓性の被処理物を真空処理室内で連続的忙プラズ
マ処理するものである。そし２てこの真空処理室の前後
廻りには複ｆ１個の予備真空室が段階的に真空度を下げ
るだめに設けら扛ており、この予備真空室は、上下方向
に対接し、被処理物の搬送方向に並置する一方のシール
ロールと、このシールロールの一部に軸方向に泪って連
Ｌｆｆ、的に対接するリップル部材と、シールロールの
両端面に対接するサイドピースなど管備えている。とこ
ろで、前記予備真空室を構成大る一対のシールロールは
、被処理物を正常に搬送するためにたわみ量を規定値以
下（例えば５ｏｍｍ）に押える必要がある。しかもシー
ルロールに加わる圧力差は、最大気側の予備真空室が真
空処理側の予備真空室に比較して非常に大きいため、最
大気側の予備真空室のシールロール径を大きくする必要
があり、従来の予備真空室においては、真空処理室の予
備真空室のシールロール径全最大気側の径と同じにして
いた。This type of vacuum continuous processing apparatus has already been filed by the applicant of the present application. This patent involves continuous plasma processing of flexible objects such as plastic molded products in a vacuum processing chamber. Two pre-vacuum chambers are installed around the front and rear of the vacuum processing chamber in order to lower the degree of vacuum in stages. One seal roll juxtaposed in the conveyance direction, a ripple member that is axially connected to a part of this seal roll, and a ripple member that is in contact with the target, and a side piece that is in contact with both end surfaces of the seal roll. There is. By the way, it is necessary to suppress the amount of deflection of the pair of seal rolls constituting the preliminary vacuum chamber to a specified value or less (for example, 5 omm) in order to properly convey the object to be processed. Moreover, the pressure difference applied to the seal roll is much larger in the preliminary vacuum chamber on the maximum air side than on the vacuum processing side, so it is necessary to increase the diameter of the seal roll in the preliminary vacuum chamber on the maximum air side. In the conventional pre-vacuum chamber, the diameter of the seal roll of the pre-vacuum chamber of the vacuum processing chamber was set to be the same as the diameter of the entire maximum air side.
このため、シールロールの両端面のサイドシールからの
洩れもシールロール径に応じて大きくなり、しかも真空
ポンプの容量も必ｚ（を的に大きくする必要があった。For this reason, leakage from the side seals on both end faces of the seal roll also increases in proportion to the diameter of the seal roll, and it is also necessary to increase the capacity of the vacuum pump.
また、シールロール？鹿動する動力系も大きくなるなど
の問題点があった。Also, a seal roll? There were other problems, such as the power system that moved the vehicle becoming larger.
本発明の目的は、予備真空室の小形化および動力、真空
排気量などの省エネルギーを図るようにした真空連続処
理装置ｒ提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a vacuum continuous processing apparatus r that is capable of reducing the size of a preliminary vacuum chamber and saving energy such as power and vacuum evacuation amount.
本発明お特徴は、少なくとも真空処理室側の予備真空室
を最大気側の予備真壁室より小さくしたものである。A feature of the present invention is that at least the preliminary vacuum chamber on the vacuum processing chamber side is smaller than the preliminary wall chamber on the maximum vapor side.
〔発明の実施例〕 以下本発明の一実施例を図面により説明する。[Embodiments of the invention] An embodiment of the present invention will be described below with reference to the drawings.
第１図および第２図において、１はプラスチックフィル
ム例えば塩化ビニール系樹脂フィルムのように可撓性の
被処理物Ｆｆ：真空状態で連続的１・てプラズマ処理す
る真空処理室、２．２′は真空処理室１の前方側に複数
個配置さすしる予備真空室、３゜３′は真空処理室１の
後方側に複数個配置される予備真空室で、前記真空処理
室１内はこｎに接続する真空ポンプ４により１Ｏ−２）
−ル程度の真空圧力に保持するように排気管５を介して
真空排気される。1 and 2, reference numeral 1 denotes a flexible workpiece Ff such as a plastic film, for example, a vinyl chloride resin film: a vacuum processing chamber for continuous plasma treatment in a vacuum state; 2.2'3゜3' is a plurality of preliminary vacuum chambers arranged at the front side of the vacuum processing chamber 1; 3゜3' is a plurality of preliminary vacuum chambers arranged at the rear side of the vacuum processing chamber 1; 1O-2) by vacuum pump 4 connected to
It is evacuated through the exhaust pipe 5 so as to maintain a vacuum pressure of about -1000 ml.
前記予備真空室２．３内はこれに接続する真空ポンプ６
により前記真空処理室１内の真空圧力より若干高く、か
つ大気圧より段階的に減じる真空圧力に保持するように
排気ｇ７を介して真空リド気さｎる。Inside the preliminary vacuum chamber 2.3 is a vacuum pump 6 connected to it.
Thus, the vacuum pressure is maintained at a level that is slightly higher than the vacuum pressure in the vacuum processing chamber 1 and gradually decreases from the atmospheric pressure, through the exhaust gas g7.
処理される被処理物Ｆは巻出装置８より前方側の予備真
空室２を経て真空処理室１へ送られ、そこでプラズマ処
理された後、さらに後方側の予備真空室３を経て巻取装
置９で巻取られる。１０＆：に駆動用モータで、この駆
動用モータ１０けラインシャフト１１および無段変速ｔ
ａ １２ 、１３．１４ 。The workpiece F to be processed is sent from the unwinding device 8 through the preliminary vacuum chamber 2 on the front side to the vacuum processing chamber 1, where it is subjected to plasma treatment, and then further passed through the preliminary vacuum chamber 3 on the rear side to the winding device. It is wound up at 9. 10&: is a drive motor, and this drive motor has a line shaft 11 and a continuously variable speed t.
a 12, 13.14.
１５ｖｉ−介して真空処理室１、予備真空室２．３、巻
取装置９へ應動力を伝達し、真空処理室１、予備真空室
２．３および巻取装置９の各枢動系の回転速度は前記無
段変速機１２，１３．１４．１５により適宜調整される
。15vi- to the vacuum processing chamber 1, preliminary vacuum chamber 2.3, and winding device 9, and rotates each pivot system of the vacuum processing chamber 1, preliminary vacuum chamber 2.3, and winding device 9. The speed is appropriately adjusted by the continuously variable transmission 12, 13, 14, 15.
第３図および第４図は前記予備真空室２．２／、３．３
′の主要部を示すもので、最大気側の予備真空室２．３
と真空処理室１側の予備真空室２’、３’はその大きさ
が異なっている。すなわら、真空処理￥１側の予備真空
室２’、３’は最大気側の予備真空室２．３よりも小さ
くなっている。１６．１７は予備真空室２．２′および
３．３’ｉ構成する上下シールロールで、この上シール
ロール１６は表面にゴムなどの弾性材１８が一体的に焼
着されておす、下シールロール１７は表面に硬質のクロ
ムニッケル層などが施されている。この上下シールロー
ルの径は約２５０１ｎＭである。１９は上下ケース２０
．２１に固定され、かつ上下シールロール１６．１７の
外周面の一部と軸方向に沿って連続的に対接するリップ
ル部材、２２は上下シールロール１６．１７の両端面に
対接するサイドピースで、このサイドピース２２のシー
ルロール対接面にはフッソ樹脂膜２３が焼着されており
、このサイドピース２２は軸受ハウジング２４を介して
支持されている。Figures 3 and 4 show the preliminary vacuum chambers 2.2/3.3.
', which shows the main part of the preliminary vacuum chamber 2.3 on the maximum air side.
The preliminary vacuum chambers 2' and 3' on the vacuum processing chamber 1 side are different in size. That is, the preliminary vacuum chambers 2' and 3' on the vacuum processing ¥1 side are smaller than the preliminary vacuum chambers 2.3 on the maximum gas side. Reference numeral 16.17 denotes upper and lower seal rolls constituting the preliminary vacuum chambers 2.2' and 3.3'i, and the upper seal roll 16 has a lower seal having an elastic material 18 such as rubber integrally baked on its surface. The surface of the roll 17 is coated with a hard chromium nickel layer. The diameter of this upper and lower seal roll is approximately 2501 nM. 19 is upper and lower case 20
．． A ripple member fixed to 21 and continuously in contact with a part of the outer peripheral surface of the upper and lower seal rolls 16.17 along the axial direction; 22 is a side piece that is in contact with both end surfaces of the upper and lower seal rolls 16.17; A fluorine resin film 23 is baked onto the seal roll contacting surface of the side piece 22, and the side piece 22 is supported via a bearing housing 24.
また、予備真空室２’、３’の上下シールロール１６，
１７の径は約１００７７１７１１であシ、全体的に最大
気側の予備真空２，３より極端に小型化される０
表は前記予備真壁室２，２′および３，３′における真
空層と差圧力の関係を示したもので、衣から明らかのよ
うに最大気側の予備真空室２．３（第１予備真空室に相
当する）の差圧は真空処理室１側の予備真空室２’、３
’第２〜第３予備真空蚕に相当する）より極端に大きく
なる。In addition, the upper and lower seal rolls 16 of the preliminary vacuum chambers 2' and 3',
The diameter of the chamber 17 is approximately 100771711 mm, and the overall size is extremely smaller than that of the preliminary vacuum chambers 2 and 3 on the maximum air side. This shows the pressure relationship.As is clear from the cover, the differential pressure in the pre-vacuum chamber 2.3 (corresponding to the first pre-vacuum chamber) on the maximum gas side is the same as that of the pre-vacuum chamber 2' on the vacuum processing chamber 1 side. ,3
'corresponding to the second and third preliminary vacuum silkworms).
したがって、差圧の大きい最大気側の予備真壁室２，３
における被処理物のたわみ量を考慮すればよい。Therefore, the preliminary wall chambers 2 and 3 on the maximum air side with a large differential pressure
What is necessary is to consider the amount of deflection of the object to be processed.
本発明によれは、真空処理室側の予備真壁室より小さく
したので、被処理物の搬送時におけるたわみを発生する
ことなく、予備真空室の小形化および動力、真空排気量
などの省エネルギーを図ることができる。According to the present invention, the preliminary vacuum chamber is made smaller than the preliminary wall chamber on the vacuum processing chamber side, so that deflection does not occur during transport of the workpiece, and the preliminary vacuum chamber is made smaller and saves energy such as power and vacuum exhaust amount. be able to.
第１図および第２図は本発明の真空連続処理装置の一実
施例を示すもので、第１図は正面図、第２図は第１図の
平面図、第３図は本発明装置における予備兵を室の要部
を示す拡大図、第４図は第３図の４−４腺矢視図である
。
１・・・真空処理室、２．２’ 、３．３１・・・予備
真空ｌ７
第１頁の続き
０発 明 者 平石信行
土浦市神立町６０３番地株式会社
日立製作所土浦工場内
＠出 願 人 信越化学工業株式会社
東京都千代田区大手町二丁目６
番１号1 and 2 show an embodiment of the vacuum continuous processing apparatus of the present invention. FIG. 1 is a front view, FIG. 2 is a plan view of FIG. 1, and FIG. FIG. 4 is an enlarged view showing the main parts of the reservist's room, and FIG. 4 is a view taken along the line 4-4 in FIG. 1...Vacuum processing chamber, 2.2', 3.31...Preliminary vacuum l7 Continued from page 1 0 Inventor Nobuyuki Hiraishi 603 Kandatecho, Tsuchiura City Hitachi, Ltd., Tsuchiura Factory @ Applicant Shin-Etsu Chemical Co., Ltd. 2-6-1 Otemachi, Chiyoda-ku, Tokyo
Claims (1)
真空室を、一対のシールロールを被処理物の搬送方向に
複数組配置し、このシールロールの一部に軸方向に溢っ
てリップル部材を対接させ゛ることにより形成し、前記
真空処理室で被処理物を連ｎｌシ的に処理すぎ真空連続
処理装置において、前記予備真空室のうち、真空処理室
側の予備真空室を最大気側の予備真空室より小さくした
ことを特徴とする真空連続処理装置。1. A vacuum processing chamber and a plurality of pre-vacuum chambers are provided, and the pre-vacuum chamber is formed by arranging a plurality of pairs of seal rolls in the conveying direction of the processed material, and overflowing a part of the seal rolls in the axial direction. In the continuous vacuum processing apparatus, a ripple member on the vacuum processing chamber side of the preliminary vacuum chamber is formed by bringing ripple members into contact with each other. A vacuum continuous processing device characterized in that the vacuum chamber is smaller than the preliminary vacuum chamber on the maximum air side.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10787483A JPS60945A (en) | 1983-06-17 | 1983-06-17 | Continuous vacuum treatment device |
| DE8484106879T DE3466414D1 (en) | 1983-06-17 | 1984-06-15 | Continuous vacuum treating apparatus |
| EP84106879A EP0130444B1 (en) | 1983-06-17 | 1984-06-15 | Continuous vacuum treating apparatus |
| US06/621,373 US4501428A (en) | 1983-06-17 | 1984-06-18 | Roll seal boxes for continuous vacuum treating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10787483A JPS60945A (en) | 1983-06-17 | 1983-06-17 | Continuous vacuum treatment device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60945A true JPS60945A (en) | 1985-01-07 |
| JPH0358374B2 JPH0358374B2 (en) | 1991-09-05 |
Family
ID=14470274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10787483A Granted JPS60945A (en) | 1983-06-17 | 1983-06-17 | Continuous vacuum treatment device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60945A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007501328A (en) * | 2003-05-23 | 2007-01-25 | ユジノール（ソシエテ アノニム） | Seal lock for vacuum deposition line on flat product |
-
1983
- 1983-06-17 JP JP10787483A patent/JPS60945A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007501328A (en) * | 2003-05-23 | 2007-01-25 | ユジノール（ソシエテ アノニム） | Seal lock for vacuum deposition line on flat product |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0358374B2 (en) | 1991-09-05 |
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