JPS6090202A - キレート性吸着剤及びその製造法 - Google Patents
キレート性吸着剤及びその製造法Info
- Publication number
- JPS6090202A JPS6090202A JP58198349A JP19834983A JPS6090202A JP S6090202 A JPS6090202 A JP S6090202A JP 58198349 A JP58198349 A JP 58198349A JP 19834983 A JP19834983 A JP 19834983A JP S6090202 A JPS6090202 A JP S6090202A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- group
- hydrogen
- vinyl
- expressed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58198349A JPS6090202A (ja) | 1983-10-25 | 1983-10-25 | キレート性吸着剤及びその製造法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58198349A JPS6090202A (ja) | 1983-10-25 | 1983-10-25 | キレート性吸着剤及びその製造法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6090202A true JPS6090202A (ja) | 1985-05-21 |
JPH0469166B2 JPH0469166B2 (enrdf_load_stackoverflow) | 1992-11-05 |
Family
ID=16389630
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58198349A Granted JPS6090202A (ja) | 1983-10-25 | 1983-10-25 | キレート性吸着剤及びその製造法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6090202A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11592742B2 (en) * | 2017-08-25 | 2023-02-28 | Hefei Xinsheng Optoelectronics Technology Co., Ltd. | Photoresist composition, its manufacturing method, and manufacturing methods of metal pattern and array substrate |
-
1983
- 1983-10-25 JP JP58198349A patent/JPS6090202A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11592742B2 (en) * | 2017-08-25 | 2023-02-28 | Hefei Xinsheng Optoelectronics Technology Co., Ltd. | Photoresist composition, its manufacturing method, and manufacturing methods of metal pattern and array substrate |
Also Published As
Publication number | Publication date |
---|---|
JPH0469166B2 (enrdf_load_stackoverflow) | 1992-11-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101967209B (zh) | 一种n-乙酰基乙二胺螯合树脂及其制备方法 | |
CN102295723B (zh) | 一种6-氨基吡啶-3-羧酸螯合树脂及其制备方法 | |
CN106008843B (zh) | 一种表面改性离子印迹聚合物微球及其制备方法 | |
CN103923249A (zh) | 一类含邻位羟基羧酸基团的螯合树脂及其制备方法和应用 | |
CN108837813A (zh) | 一种介孔硅藻As(V)离子表面印迹材料的制备方法和应用 | |
CN113061215A (zh) | 一种基于MOFs的钴离子印迹聚合物及其制备方法和应用 | |
JPS6042234A (ja) | ガリウムの回収法 | |
CN105693940A (zh) | 一种4-乙烯基吡啶树脂及其制备方法和应用 | |
US4552905A (en) | Copolymer, a process for its preparation and its use as a sorbent | |
JPS6090202A (ja) | キレート性吸着剤及びその製造法 | |
JPS6026130B2 (ja) | 新規重合体の製造法 | |
KR100332859B1 (ko) | 밀도가높고,표면적이넓은흡착제 | |
Munirasu et al. | Hydrated clay for catalyst removal in copper mediated atom transfer radical polymerization | |
JPS6226643B2 (enrdf_load_stackoverflow) | ||
US4067854A (en) | Adsorption process | |
Hirotsu et al. | Synthesis of dihydroxamic acid chelating polymers and the adsorptive property for uranium in sea water | |
Yu et al. | Synthesis of poly (styrene-divinyl benzene) magnetic porous adsorbents prepared by sulfonation for the adsorption of 2, 4-dichlorophenol and 2, 4, 6-trichlorophenol from aqueous solutions | |
US2906716A (en) | N-thiolalkyl quaternary ammonium anion-exchange resins | |
JPS58201804A (ja) | キレ−ト基を有するスチレン系樹脂とその製造方法及び吸着処理方法 | |
JPS60106541A (ja) | 水性の流れにおいて塩を分離するためのイオン抑制方法 | |
JPS6065004A (ja) | キレ−ト樹脂及びその製造法 | |
Suzuki et al. | Preparation and metal-adsorption properties of the polymer-coated silica gel having iminodiacetate functional group. | |
JPS60102947A (ja) | ホウ素同位体の分離濃縮方法 | |
JPH08844B2 (ja) | スチレン系三次元共重合体及び硝酸イオン吸着剤 | |
US3749668A (en) | Water purification with amine oxide resins |