JPS6082653A - Device for controlling amount of plated metal in hot dipping apparatus - Google Patents

Device for controlling amount of plated metal in hot dipping apparatus

Info

Publication number
JPS6082653A
JPS6082653A JP18916183A JP18916183A JPS6082653A JP S6082653 A JPS6082653 A JP S6082653A JP 18916183 A JP18916183 A JP 18916183A JP 18916183 A JP18916183 A JP 18916183A JP S6082653 A JPS6082653 A JP S6082653A
Authority
JP
Japan
Prior art keywords
strip
hot
plating
metal
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18916183A
Other languages
Japanese (ja)
Inventor
Yoshinori Fujita
藤田 芳則
Yoshimichi Yamane
山根 義道
Takashi Michigami
道上 隆司
Muneo Kato
加藤 宗夫
Yukihisa Komiya
小宮 幸久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Kawatetsu Galvanizing Co Ltd
Original Assignee
Kawatetsu Galvanizing Co Ltd
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawatetsu Galvanizing Co Ltd, Kawasaki Steel Corp filed Critical Kawatetsu Galvanizing Co Ltd
Priority to JP18916183A priority Critical patent/JPS6082653A/en
Publication of JPS6082653A publication Critical patent/JPS6082653A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/14Removing excess of molten coatings; Controlling or regulating the coating thickness
    • C23C2/16Removing excess of molten coatings; Controlling or regulating the coating thickness using fluids under pressure, e.g. air knives
    • C23C2/18Removing excess of molten coatings from elongated material
    • C23C2/20Strips; Plates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/14Removing excess of molten coatings; Controlling or regulating the coating thickness
    • C23C2/16Removing excess of molten coatings; Controlling or regulating the coating thickness using fluids under pressure, e.g. air knives
    • C23C2/18Removing excess of molten coatings from elongated material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating With Molten Metal (AREA)

Abstract

PURPOSE:To form a beautiful hot-dipped layer of extremely thin thickness on the surface of a strip by providing a supporting roll for the plated strip to a specified position above a gas wiper. CONSTITUTION:A strip 1 is passed through a hot-dipping bath and pulled up after passing through a sink roll 5 and supporting rolls 4, 4' in the bath. Excess molten metal is wiped off by blowing with ejected high pressure gas from gas wipers 3, 3' to form a hot dipped layer of extremely thin thickness. The supporting roll 2, 2' for preventing the vibration of the strip 1 are positioned in this case at a position apart by a distance Y from the top end of the wiper 3, 3' within a range surrounded by A-F in Fig. 2 and in a range where the hot- dipped metal is still unsolidified (h) depending on the rising speed of the strip. Even if the supporting roll 2, 2' are in the unsolidified range of the hot-dipped metal, a plated layer having smooth surface with beautiful extremely thin plated layer is obtd.

Description

【発明の詳細な説明】 技術分野 本発明は、溶融金属めっき設備において気体絞り法によ
ってめっき付着量を制御する装置に関し、特にめっき金
属が凝固を完了しないガスワイパー・近くの所定の領域
にサポートロールを配設することによシ、ガスワイパー
近傍での板ぶれ1反りを直接防止して表面の綺麗な極薄
目付溶融金属めっき板が得られるようにした技術につい
て提案する。
DETAILED DESCRIPTION OF THE INVENTION Technical Field The present invention relates to a device for controlling the amount of plating deposited by a gas squeezing method in hot-dip metal plating equipment. We propose a technology that directly prevents plate wobbling and warping near the gas wiper by arranging the gas wiper, thereby making it possible to obtain a hot-dip metal-plated plate with a clean surface and an ultra-thin coating.

従来技術とその問題点 気体絞9法でめっき付着倹制御を行う形式の連続溶融金
属めっきにおいて、超薄目付を達成する従来技術として
は、ガスワイパー(噴射ノズル)の吹付はガス圧力を大
きくするとか、被めっき板(ストリップ)とノズル先端
との距離を小さく調整するといったよりな方法がある。
Conventional technology and its problems In continuous hot-dip metal plating that uses the gas throttling method to control plating deposition, the conventional technology to achieve ultra-thin coating weight is to increase the gas pressure when spraying with a gas wiper (injection nozzle). Another method is to adjust the distance between the plated plate (strip) and the nozzle tip to a smaller value.

これら従来技術において、例えば吹付はガス圧力を大き
くする方式では、スプラッシュと言われる飛散金属粉が
ストリップの表面に付着して欠陥とな・つたシ、スプラ
ッシュに伴うロスや著しい騒音を発生するというような
問題点があった。また、距離を調節する後者の方式では
、ストリングが多くの場合湾曲しておシかつ振れもある
ので、その距離を縮めることには限度があり、薄目付が
困離であった。
In these conventional techniques, for example, when spraying uses a method that increases gas pressure, flying metal powder called splash adheres to the surface of the strip and causes defects, as well as loss and significant noise due to splash. There was a problem. In addition, in the latter method of adjusting the distance, the string is often curved and has some wobbling, so there is a limit to how far the distance can be shortened, and it has been difficult to achieve a thin weight.

上述した従来技術の問題点を克服するために、最近張力
を上げて板ぶれを防止する方法や、エヤーバットを設け
て板ぶれを抑制する方法が提案されている。しかし女か
ら、これらの改良技術の場合、振動の抑制に多少の効果
が認められるものの、設備が高価であること、及び噴射
ノズル近傍での反シを完全に防止できないことから、め
っき面との距離を10市以上には近づけ得ないために、
例えば亜鉛めっきの例だと片面当980g7m2以下超
薄目付にすることができなかった。
In order to overcome the above-mentioned problems of the prior art, a method of increasing the tension to prevent plate deflection and a method of providing an air bat to suppress plate deflection have recently been proposed. However, a woman said that although these improved techniques are somewhat effective in suppressing vibration, the equipment is expensive and it is not possible to completely prevent scratches near the injection nozzle, so it is difficult to avoid contact with the plated surface. Because the distance cannot be closer than 10 cities,
For example, in the case of zinc plating, it was not possible to achieve an ultra-thin basis weight of less than 980g7m2 per side.

発明の目的 本発明の目的は、噴射ノズルの近くにサポートロールを
配設することで通板ストリップの振動抑制ならびに平坦
度の確保を図ることによシ、上述した従来技術の欠点を
克服することにある。
OBJECT OF THE INVENTION An object of the present invention is to overcome the above-mentioned drawbacks of the prior art by disposing a support roll near the injection nozzle to suppress vibrations and ensure flatness of the threading strip. It is in.

発明の構成と実施態様の範囲 一般に、溶融金属めっき設備にあっては、浴面上に、被
めっき通板ス) IJツブlを振動抑制下に保持するサ
ポートロール2,2′が配設されている。
Structure and scope of embodiments of the invention Generally, in hot-dip metal plating equipment, support rolls 2 and 2' are disposed above the bath surface to hold the IJ tube to be plated while suppressing vibrations. ing.

その配設の位置は、第1図に示すように、めっき金属付
着層が完全に凝固し終る位置である。めっき金属が未凝
固の段階で該サポートロール2.2′を配設すると、例
えばZn 、 kl 、 Zn−Ajt 、 Pb−8
n等の金属めっきでは、めっき表面が荒れて綺麗な表面
性状が得られないという弊害が見られた。
As shown in FIG. 1, the position is such that the plated metal adhesion layer is completely solidified. When the support roll 2.2' is disposed at a stage when the plated metal is not solidified, for example, Zn, kl, Zn-Ajt, Pb-8
Metal plating, such as n, had the disadvantage that the plating surface became rough and a clean surface quality could not be obtained.

そこで、本発明者らは、ラインスピード(’!)min
)、めっき付着量等と、サポートロール配設位置の関係
について種々検討したところ、溶融金属めっきにおいて
、めっき金属が未凝固の段階でサポートロールと接触し
た場合でも、めっき金属表面は傷をつけることなく誘導
できる好適範囲のあることを知見した。
Therefore, the present inventors determined that the line speed ('!)min
), various studies were conducted on the relationship between the amount of plating deposited, etc., and the position of the support roll, and it was found that in hot-dip metal plating, even if the plating metal comes into contact with the support roll in an unsolidified stage, the surface of the plating metal may be damaged. It was found that there is a suitable range in which induction can be achieved without any problems.

第1表は、ラインスピード、亜鉛目付量、サポートロー
ルの浴面からの高さを種々変化させた場合のめつき表面
評価を訓べた結果を示すものであシ、この試験結果よシ
上記好適範囲は第8図示(○、△、×は第1表中のめつ
き狭面評価)のようになった。
Table 1 shows the results of evaluating the plating surface when the line speed, zinc coating weight, and support roll height from the bath surface were varied. The range was as shown in Figure 8 (○, △, and × are evaluations of narrow plating in Table 1).

第1表 注2 本・・表面にスプラッシュ発生 上記好適範囲である図示のA−Fに囲まれた領域を仕切
る線の臨界意義は、 ■MA〜B(Y=]OOrnm)・・このレベル以下で
は設備上の制約があって、サポートロールの配設が事実
上不可能である。
Table 1 Note 2: Splash occurs on the surface The critical significance of the line separating the area surrounded by A-F in the figure, which is the preferred range above, is: ■MA~B(Y=]OOrnm): Below this level However, due to equipment limitations, it is virtually impossible to provide support rolls.

・ 同じ目付を得るためにはラインスピードが速くなる
と、ダイス圧を高くする必要がちシ、この範囲を外れる
と薄目角を得る時に気体の流れがみだされてスゲラッシ
ュが出やすくなる。
・In order to obtain the same weight, as the line speed increases, the die pressure tends to need to be increased, and if it is outside this range, the gas flow will be squeezed out when obtaining a thinner grain angle, making it more likely that sedge rush will occur.

0m0−D (x (260m//I[]in) ・・
jノ上限tj、、現在一般に用いられている溶融金属め
っき設備のラインスピードは最高260 m/ncin
である。
0m0-D (x (260m//I[]in)...
Upper limit of j, tj, the line speed of currently commonly used hot-dip metal plating equipment is up to 260 m/ncin.
It is.

ラインスピードが240〜260 m/min近傍にな
ると目付量制御が困難になるためであり、この上限を決
定した。
This is because it becomes difficult to control the basis weight when the line speed is around 240 to 260 m/min, and this upper limit was determined.

■線り〜E(Y=80001il)・・これ以上高いと
ころだと、表面はみださなくても、板のCぞ9や振れを
防止する効果が非常に弱くなる。
■Wire ~ E (Y = 80001 il)... If it is higher than this, even if it does not protrude from the surface, the effect of preventing C 9 and runout of the board will be very weak.

・・・ラインスピードが遅くなるにつれて、Zn凝固位
置が低くなるためである。
...This is because the Zn solidification position becomes lower as the line speed becomes slower.

■線F−A (X ) D m/min )・・・ライ
ンスピードの下限はない。ただし溶融亜鉛メツキライン
の例では、ラインスピードが20 mpmよシおそいと
znのひき上げ宿が少なくなシ噴射ノズルからの気体で
絞pおとす量が少なくなり、美麗な表面が得難くなる。
■Line F-A (X) D m/min)...There is no lower limit for line speed. However, in the example of a hot-dip galvanizing line, if the line speed is slower than 20 mpm, there will be less Zn to pull up and the amount of gas to be squeezed out from the injection nozzle will be smaller, making it difficult to obtain a beautiful surface.

第2図は、本発明装置の一実施態様を示し、1は通板の
ストリップ、2 、2’はサポートロール、3.3′は
噴射ノズル、4 、4’は浴中サポートロール、5はジ
ンクロールであり、Yは本発明サポートロールの噴射ノ
ズル8,3′先端からの高さ、hはめつき金属の凝固完
了位置である。々お噴射ノズル3,3′先端は通常の溶
融めっきラインでは浴面から100 mm〜250朋離
れた位置にある。使用するサポートロール2,2′の材
質としては、ステンレス系耐熱ロールを水冷したもの、
あるいはセラミック溶射ロール等を用いる。
FIG. 2 shows an embodiment of the apparatus of the present invention, in which 1 is a threaded strip, 2 and 2' are support rolls, 3 and 3' are injection nozzles, 4 and 4' are bath support rolls, and 5 is a This is a zinc roll, Y is the height from the tip of the injection nozzle 8, 3' of the support roll of the present invention, and h is the position at which solidification of the plated metal is completed. In a normal hot-dip plating line, the tips of the injection nozzles 3 and 3' are located at a distance of 100 mm to 250 mm from the bath surface. The materials used for the support rolls 2 and 2' are water-cooled stainless steel heat-resistant rolls;
Alternatively, use a ceramic spray roll or the like.

なお、本発明においては、ロールは駆動、無駆動(≦2
00 mm )を問わず、バックアップロールの使用、
めっき阻止剤を使う片面めっき処理装置への適用、さら
には合金化処理のための再溶融装置をもつ溶融めっき設
備への適用を除くものではない。
In addition, in the present invention, the roll may be driven or not driven (≦2
00 mm), the use of a backup roll,
This does not exclude application to single-sided plating equipment that uses a plating inhibitor, and furthermore, application to hot-dip plating equipment that has a remelting device for alloying processing.

ただし、本発明は、表面性状に対する要請の厳しい再溶
融処理(合金化処理)装置を持たないめっき設備に採用
する場合に、特にその効果が顕著である。
However, the present invention is particularly effective when employed in plating equipment that does not have a remelting treatment (alloying treatment) device that requires strict requirements for surface properties.

実施例 サポートロールを本発明にかかる好適範囲内にある位置
に設置した。即ち、ラインスピード80mpmで運転し
ている時、サポートロールを浴面上500、猪の位置に
設置したところ、めっきした金属表面は平滑で美麗なも
のが得れ、ストリップのふれも減少したため、噴射ノズ
ルを約5朋までストリップに接近でき、しかもガス噴射
圧力1”/cry?’でめっき付着量を絞ったところ、
片面当、!1122jl’、p・まで減少させることが
でき、超薄目付が達成された。
EXAMPLE The support roll was installed at a position within the preferred range according to the present invention. That is, when operating at a line speed of 80 mpm, when the support roll was placed at a position 500 mm above the bath surface, the plated metal surface was smooth and beautiful, and the deflection of the strip was reduced, so that the injection When the nozzle was able to approach the strip up to about 5 mm, and the amount of plating deposited was reduced with a gas injection pressure of 1"/cry?',
One side! It was possible to reduce the weight to 1122jl', p·, and an ultra-thin basis weight was achieved.

比較のために、サポートロールを従来のように、亜鉛が
凝固している浴面上線5mmの位置に設置し、少ないイ
」着量を得ようとしたが、銅帯と噴射ノズルとの間はス
) IJッグのふれやわん曲のために、]、 Q mm
までしか接近できず、最小付着量は亜鉛めっきの場合で
30 g/m2 (片面当シ)が限度であった。
For comparison, we installed a support roll at a position 5 mm above the bath surface where the zinc solidifies, as in the past, in an attempt to obtain a smaller amount of zinc, but the distance between the copper strip and the injection nozzle was S) For IJgu's Fureyawan song, ], Q mm
In the case of zinc plating, the minimum coating weight was 30 g/m2 (on one side).

発明の詳細 な説明したように本発明によれば、噴射ノズルに近接す
る位置にサポートロールを設置することができるから、
噴射ガスによるめっき付着量制御域の板ぶれ、反シを阻
止することになり、噴射ノズルをス) IJッグ表面に
近づけ得ることと相俟って、超薄目付けと表面性状の綺
麗なめつき表面が得られる。
DETAILED DESCRIPTION OF THE INVENTION According to the present invention, as described in detail, the support roll can be installed at a position close to the injection nozzle.
This prevents plate wobbling and deformation in the plating coating control area caused by the injection gas, and allows the injection nozzle to be brought close to the IJ surface, resulting in ultra-thin coating weight and beautiful plating on the surface. A surface is obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、従来装置の例を示す路線図、第2図は、本発
明めっき付着量制御装置の一例を示す路線図、 第3図は、本発明にかかるサポートロール配設位置好適
範囲を示すグラフである。 l・・・ストリップ 2,2′・サポートロール3.3
′・・・噴射ノズル。 特許出願人 川崎製鉄株式会社 同 出、願人 川鉄鋼板株式会社 tlj、1.l〆苧 同 弁理士 杉 村 興 作 。 第1図 第3図 ラインスート(Mh寄り
FIG. 1 is a route map showing an example of a conventional device, FIG. 2 is a route map showing an example of the plating coating amount control device of the present invention, and FIG. 3 is a route diagram showing an example of the support roll arrangement position according to the present invention. This is a graph showing. l...Strip 2, 2'/Support roll 3.3
'...Injection nozzle. Patent applicant Kawasaki Steel Co., Ltd., applicant Kawasaki Steel Sheet Co., Ltd. TLJ, 1. Written by patent attorney Ko Sugimura. Figure 1 Figure 3 Line suit (Mh side)

Claims (1)

【特許請求の範囲】[Claims] L 被めっきストリップの通板経路に沿う浴面上にガス
ワイパーを設けてなる溶融金属めっき設備におけるめっ
き付着量制御装置において、上記浴面上のガスワイパー
と付着しためつき金属が凝固を完了する位置との間の上
記ストリップの通板経路に沿って、第3図融水のA、B
、C,D、EおよびFに囲まれる領域内にサポートロー
ルを配設したことを特徴とする溶融金属めっきにおける
めっき例着景制御装置。
L In a plating deposition amount control device in a hot-dip metal plating facility, which has a gas wiper on the bath surface along the passing path of the strip to be plated, the gas wiper on the bath surface and the attached plating metal complete solidification. Along the passage path of the strip between the positions A and B of the melt water in Figure 3
, C, D, E, and F. 1. A plating example landscape control device in molten metal plating, characterized in that a support roll is disposed within an area surrounded by C, D, E, and F.
JP18916183A 1983-10-12 1983-10-12 Device for controlling amount of plated metal in hot dipping apparatus Pending JPS6082653A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18916183A JPS6082653A (en) 1983-10-12 1983-10-12 Device for controlling amount of plated metal in hot dipping apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18916183A JPS6082653A (en) 1983-10-12 1983-10-12 Device for controlling amount of plated metal in hot dipping apparatus

Publications (1)

Publication Number Publication Date
JPS6082653A true JPS6082653A (en) 1985-05-10

Family

ID=16236472

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18916183A Pending JPS6082653A (en) 1983-10-12 1983-10-12 Device for controlling amount of plated metal in hot dipping apparatus

Country Status (1)

Country Link
JP (1) JPS6082653A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1063314A1 (en) * 1999-06-24 2000-12-27 Kawasaki Steel Corporation Method of manufacturing hot dip coated metal strip

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5618667A (en) * 1979-07-23 1981-02-21 Chosaku Ishihara Production of paste solution
JPS5693865A (en) * 1979-12-27 1981-07-29 Nisshin Steel Co Ltd Strip support apparatus in molten metal plating
JPS57153759A (en) * 1981-03-19 1982-09-22 Nippon Kokan Kk <Nkk> Controller for amount of surface-treating agent adhering to strip material
JPS581064A (en) * 1981-06-26 1983-01-06 Sumitomo Metal Ind Ltd Steel band supporting device of continuous plating device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5618667A (en) * 1979-07-23 1981-02-21 Chosaku Ishihara Production of paste solution
JPS5693865A (en) * 1979-12-27 1981-07-29 Nisshin Steel Co Ltd Strip support apparatus in molten metal plating
JPS57153759A (en) * 1981-03-19 1982-09-22 Nippon Kokan Kk <Nkk> Controller for amount of surface-treating agent adhering to strip material
JPS581064A (en) * 1981-06-26 1983-01-06 Sumitomo Metal Ind Ltd Steel band supporting device of continuous plating device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1063314A1 (en) * 1999-06-24 2000-12-27 Kawasaki Steel Corporation Method of manufacturing hot dip coated metal strip

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