JPS6070525A - Magnetic storage body - Google Patents

Magnetic storage body

Info

Publication number
JPS6070525A
JPS6070525A JP17984083A JP17984083A JPS6070525A JP S6070525 A JPS6070525 A JP S6070525A JP 17984083 A JP17984083 A JP 17984083A JP 17984083 A JP17984083 A JP 17984083A JP S6070525 A JPS6070525 A JP S6070525A
Authority
JP
Japan
Prior art keywords
magnetic
magnetic storage
head
storage body
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17984083A
Other languages
Japanese (ja)
Other versions
JPH0513330B2 (en
Inventor
Tetsuo Nakagawa
中川 哲男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP17984083A priority Critical patent/JPS6070525A/en
Publication of JPS6070525A publication Critical patent/JPS6070525A/en
Publication of JPH0513330B2 publication Critical patent/JPH0513330B2/ja
Granted legal-status Critical Current

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Abstract

PURPOSE:To form a protective film for a magnetic storage body having superior durability even at high temp. and humidity or immersion in water and superior wear resistance by using starting materials including specified substances. CONSTITUTION:This magnetic storage body is obtd. by coating a thin film medium of a magnetic metal formed on a nonmagnetic disklike substrate with a protective film contg. essentially colloidal alumina of 1-100mum particle size and at least one kind of organosilicon compound represented by a general formula R<1>n-Si-(OR)<2>4-n (where R<1> is 1-6C hydrocarbon, vinyl, methacryloxy, a group contg. epoxy or an org. group having halogen, R<2> is 1-6C hydrocarbon or H, and n is 0, 1 or 2). The protective film protects well the thin film medium even when dust is stuck, and the film prevents unfavorable influence from being exerted on the medium even when it is held at high temp. and humidity for a long term or immersed in water.

Description

【発明の詳細な説明】 本発明は磁気的記憶装置(磁気ディスク装置及び磁気ド
ラム装置等)に用いられる磁気記憶体に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic storage body used in a magnetic storage device (magnetic disk device, magnetic drum device, etc.).

一般に記憶再生磁気ヘッド(以下ヘッドと呼ぶ)と磁気
記憶体とを構成部とする磁気記憶装置の記録再生方法に
は大別して次の二種の方法がある。
In general, there are two types of recording and reproducing methods for a magnetic storage device that includes a storage and reproducing magnetic head (hereinafter referred to as a head) and a magnetic storage body.

第1の方法は操作開始時にヘッドと磁気記憶体面とを接
触状態でセットした後、該記憶体に所要の回転を与える
ことにより、該ヘッドと該記憶体面との間に空気層分の
空間を作り、この状態で、記録再生する方法である。こ
の方法では、操作終了時に磁気記憶体の回転が止マシ、
この時ヘッドと磁気記憶体面は操作開始時と同様に接触
摩耗状態にある。第2の方法は、磁気記憶体に予め回転
を与えておき、急激にヘッドを磁気記憶体面上に押しつ
けることによシ、該ヘッドと該記憶体面との間に空気層
分の空間をつくり、この状態で記録再生する方法である
。この様に、第1の方法では、操作開始時及び終了時に
ヘッドと磁気記憶体面は接触摩擦状態にあり、第2の方
法ではヘッドを磁気記憶体面に押しつける際に接触摩擦
状態にある。
The first method is to set the head and the magnetic storage surface in contact at the start of operation, and then give the storage body the required rotation to create a space between the head and the storage surface for an air layer. This is a method of creating and recording/playing in this state. With this method, the rotation of the magnetic storage body stops when the operation is finished;
At this time, the head and the magnetic storage surface are in a state of contact wear, similar to when the operation was started. The second method is to create a space between the head and the storage surface by an air layer by rotating the magnetic storage medium in advance and suddenly pressing the head onto the magnetic storage surface. This is a method of recording and reproducing in this state. Thus, in the first method, the head and the magnetic storage surface are in a frictional contact state at the start and end of the operation, and in the second method, the head and the magnetic storage surface are in a frictional contact state when the head is pressed against the magnetic storage surface.

これらの接触摩擦状態におけるヘッドと磁気記憶体の間
に生じる摩擦力は、ヘッド及び磁気記憶体を摩耗させ、
ついにはヘッド及び金層磁性薄膜媒体に傷を生じせしめ
ることがある。又該接触摩擦状態に於いてヘッドのわず
かが姿勢の変化がヘッドにかかる荷重を不均一にさせヘ
ッド及び磁気記憶体表面に傷を作ることもある。又更に
記録再生中に突発的にヘッドが磁気記憶体に接触しヘッ
ドと磁気記憶体間に大きな摩擦力が働きヘッド及び磁気
記憶体が破壊されることがしばしば起こる。
The frictional force generated between the head and the magnetic storage body in these contact friction states causes the head and the magnetic storage body to wear out,
This may eventually cause damage to the head and the gold-layer magnetic thin film medium. Further, in the contact friction state, a slight change in the posture of the head causes the load applied to the head to become uneven, which may cause scratches on the surface of the head and the magnetic storage body. Furthermore, during recording and reproduction, the head suddenly comes into contact with the magnetic storage body, and a large frictional force is generated between the head and the magnetic storage body, which often results in destruction of the head and the magnetic storage body.

この様なヘッドと磁気記憶体との接触摩擦、摩耗や破壊
からヘッド及び磁気記憶体を保護するために磁気記憶体
の表面に保護被膜を被覆することが必要である。従来か
ら保護被膜として金属メッキ膜(例えばCr、Rh、N
i −p等)を被覆する方法或いは金層磁性薄膜媒体を
酸化する方法、該酸化の後酸化)換を被栓する方法等が
あるが、いずれも上記の接触摩耗現象に対して有効な手
段とはならない。
In order to protect the head and the magnetic memory from such contact friction, abrasion, and destruction between the head and the magnetic memory, it is necessary to coat the surface of the magnetic memory with a protective film. Traditionally, metal plating films (e.g. Cr, Rh, N) have been used as protective films.
There are methods such as coating the gold-layered magnetic thin film medium (i-p, etc.), oxidizing the gold-layer magnetic thin film medium, and plugging the oxidation layer after the oxidation. It is not.

上記の欠点をなくしたテトラアルコキシシランの加水分
解物を用い形成したポリケイ酸から成る保護被膜も提案
されている(特公昭57−58731)このポリケイ酸
から々る保護被膜はヘッドと磁気記憶体との接触W擦、
ヘッドの突発的な磁気記憶体との接触摩耗に於ける耐久
性でかなり良好な特性を示し、且つ高温高湿状態におい
ても前記金属磁性薄膜をかなり長期間保護しうるもので
ある。
A protective coating made of polysilicic acid formed using a hydrolyzate of tetraalkoxysilane that eliminates the above drawbacks has also been proposed (Japanese Patent Publication No. 57-58731). Contact W rubbing,
It exhibits fairly good durability against sudden contact abrasion of the head with the magnetic storage body, and can protect the metal magnetic thin film for a considerable period of time even in high temperature and high humidity conditions.

しかし、ヘッドと磁気記憶体どの間にごみが引き込まれ
る手が多く、そのごみが研貼剤の役割を果たしヘッド及
び磁気記1届体を摩耗し、その摩耗によって生じた摩耗
粉が更にヘッド及び磁気記憶体を摩耗させるため、岨顯
耗性や血4衝撃性面からも前記ポリケイ酸は保護膜1凍
として充分とは名゛えない。又ポリケイ酸被膜は、出発
利料がテトラアルコキシシランであることから、その加
水分解物を脱水縮合しても、かなり不充分な輪台状態に
しか成り得す、水に苅する1制久性は、壕だ不充分と言
わざるを得ない。
However, there are many cases where dust is drawn between the head and the magnetic recording body, and the dust acts as an abrasive adhesive and wears down the head and the magnetic recording body. Polysilicic acid cannot be said to be sufficient as a protective film in terms of wear resistance and blood impact resistance since it causes wear of the magnetic memory. In addition, since the starting material of the polysilicic acid film is tetraalkoxysilane, even if its hydrolyzate is dehydrated and condensed, it can only form a very insufficient ring plate state, which has a limited durability when soaked in water. I have to say that the trench is insufficient.

そこで、上記欠点を改善することを目的に、上記ポリケ
イ酸被膜中に、BaQ 、sr□等がら選ばれる1種以
上の金属酸化物を含ませて保護被膜とすることが提案さ
れている。(特開昭56−76010) しかし、上記金属酸化物を直接テトラアルコキシシラン
の加水分解物液に均一分散させる事は、極めて困雌であ
り、保護被膜を約100OA形成しても、μmオーダー
の凸部が生じて、必要する特性が得られ々い。又口過に
ょシ、凝集した金属酸化物を除去しようとした場合、は
ぼ添加金属酸化物の全てが除去され、添加による効果は
得られない。以上の如く現実には、上記ポリケイ酸被膜
の品質の向上をはかることは不可能であり、金属酸化物
を添加するには、材料面からの工夫が不可欠である。
Therefore, in order to improve the above drawbacks, it has been proposed that one or more metal oxides selected from BaQ, sr□, etc. be included in the polysilicate film to form a protective film. (JP 56-76010) However, it is extremely difficult to uniformly disperse the metal oxide directly into a tetraalkoxysilane hydrolyzate solution, and even if a protective film is formed with a thickness of about 100 OA, Convex portions occur, making it difficult to obtain the required characteristics. Furthermore, if an attempt is made to remove the aggregated metal oxide, all of the added metal oxide will be removed, and no effect will be obtained from the addition. As described above, in reality, it is impossible to improve the quality of the polysilicate film, and in order to add metal oxides, it is essential to devise measures from the material standpoint.

本発明の目的は上述のごみを引き込んだ場合であっても
充分に金属磁性薄膜媒体を保護し且つ長期間に渡る高温
高湿状態で、そして水への浸漬状態で、金属磁性薄膜媒
体に何等悪影響を及ぼさせ々い保護被膜を有する磁気記
憶体を提供することにある。
The purpose of the present invention is to sufficiently protect a metal magnetic thin film medium even when the above-mentioned dust is drawn in, and to protect the metal magnetic thin film medium from any damage even when the metal magnetic thin film medium is exposed to high temperature and high humidity conditions for a long period of time or immersed in water. It is an object of the present invention to provide a magnetic memory having a protective coating that does not have an adverse effect.

すなわち、本発明の磁気記憶体は、非磁性円盤状基体上
に金属磁性薄膜媒体を被覆され、この金属磁性薄膜媒体
上に、下記(A)、(B)を少々くとも含む材料を原料
とする保護膜が被覆されている。
That is, in the magnetic storage body of the present invention, a metal magnetic thin film medium is coated on a non-magnetic disk-shaped substrate, and a material containing at least some of the following (A) and (B) is used as a raw material on the metal magnetic thin film medium. It is coated with a protective film.

(A)粒子f11〜100ミリミクロンのコロイダルア
ルミナ (B)一般式 g’n−s;−(OR24−n) (式
中R1は炭素数1〜乙の炭化水紫括、ビニル基、メタク
リロキシ基、エポキシ含有基やハロゲンを有する有機基
を、R2は炭素数1〜乙の灰化水素基又は水素を、nは
0,1.2を表わす。)で示される小なくとも1種の有
機ケイ素化合物。
(A) Colloidal alumina particles f11 to 100 millimicrons (B) General formula g'n-s;-(OR24-n) (In the formula, R1 is a hydrocarbon having 1 to 2 carbon atoms, a vinyl group, and a methacryloxy group. , an organic group having an epoxy-containing group or a halogen, R2 is an ashing hydrogen group having 1 to 2 carbon atoms or hydrogen, and n is 0, 1.2). Compound.

(A)のコロイダルアルミナは、三次元構造の強固なア
ルミと酸素の結合を主骨格する粒径1〜100ミリミク
ロンの粒子であり、核粒子の表面には、>Al−OH基
及び−OHイオンが存在する。この様に該コロイダルア
ルミナは、強固な結合よシなるため、極めて、化学的に
安定であシ、品温、高湿状態や水への浸漬に対しても、
優れた耐久性を示す。又コロイダルアルミナを主要成分
トスる保護被膜は、テトラアルコキシシランより成る保
護被膜より、熱膨張率に於いてよシ下地金属体に近く、
該保護被膜の内部応力は小さい。これにより該保護被膜
の強度は高く、ヘッドに対する耐摩耗性は向上する。
The colloidal alumina (A) is a particle with a particle size of 1 to 100 millimicrons whose main skeleton is a strong bond between aluminum and oxygen with a three-dimensional structure, and the surface of the core particle has >Al-OH groups and -OH groups. ions exist. In this way, colloidal alumina has strong bonds, so it is extremely chemically stable, and is resistant to temperature, high humidity conditions, and immersion in water.
Shows excellent durability. In addition, a protective coating made of colloidal alumina as a main component has a coefficient of thermal expansion closer to that of the underlying metal body than a protective coating made of tetraalkoxysilane.
The internal stress of the protective coating is small. This increases the strength of the protective coating and improves the abrasion resistance of the head.

(B)の有機ケイ累化合物は、(A)のコロイダルアル
ミナト化学結合し、又コロイダルアルミナ同様下地金属
体と化学結合して保護被膜を構成しヘッドの衝撃力を緩
和する能力を高めるものである0 該有機ケイ素化合物は、希釈剤の有無の状態で水又は希
酸添加により加水分解され、必要に応じて濃度調節がな
され、更にコロイダルアルミナを加えて処理液とする。
The organic silicate compound (B) is chemically bonded to the colloidal alumina (A), and like colloidal alumina, is chemically bonded to the underlying metal body to form a protective film and enhance the ability to reduce the impact force of the head. 0 The organosilicon compound is hydrolyzed by adding water or dilute acid in the presence or absence of a diluent, the concentration is adjusted as necessary, and colloidal alumina is further added to form a treatment liquid.

そして金属磁性薄膜媒体上に塗布した後、全体を焼成す
る。
After coating the metal magnetic thin film medium, the whole is fired.

次に実施例を挙げて詳細に説明する。Next, a detailed explanation will be given with reference to examples.

実施例1 鏡面仕上げ(表面粗さ、0.05μm以下、ACC30
m/sec以下)されたディスク状アルミニウム合金基
板上に、非磁性合金メッキとしてNI−P合金を約50
pmの厚さにメッキし、このメッキを@摩によシ表面粗
さ0,03μm以下、厚さ60μmまで鏡面仕上げをし
た後、その上に金属磁性薄膜媒体としてco−Ni−p
合金を約0,05μmの厚さにメッキした。更にC0−
N1−P合金メッキ上に、下記処理液をスピンナー法に
より800人の膜厚になるように塗布した。次にディス
ク状円盤を250 ’0で6時間、恒温槽内で焼成し、
磁気ディスクとした。
Example 1 Mirror finish (surface roughness, 0.05 μm or less, ACC30
NI-P alloy is applied as a non-magnetic alloy plating onto a disc-shaped aluminum alloy substrate which is
After polishing this plating to a mirror finish with a surface roughness of 0.03 μm or less and a thickness of 60 μm, co-Ni-P is applied as a metal magnetic thin film medium.
The alloy was plated to a thickness of approximately 0.05 μm. Furthermore, C0-
On the N1-P alloy plating, the following treatment solution was applied to a film thickness of 800 mm using a spinner method. Next, the disc-shaped disc was fired in a constant temperature oven at 250'0 for 6 hours,
It was made into a magnetic disk.

(処理液) アルミナシ/L/(日照化学製品) 3″Mjxk%γ
−グリシドキシプロピルトリメト キシシラン1雛チ 0、05 N塩酸水溶液 03難チ イソプロビルアルコール 残部 実施例2 実施例1と同様外方法で、ただし処理液は以下に示す液
を用いて塗布したディスク状円盤、250°0で3時間
焼成したものを磁気ディスクとした。
(Treatment liquid) Aluminium/L/(Nissho Chemical Products) 3″Mjxk%γ
- Glycidoxypropyltrimethoxysilane 1 chick 0.05 N hydrochloric acid aqueous solution 03 Difficult isopropyl alcohol Remainder Example 2 A disk coated using the same method as Example 1, but using the treatment liquid shown below. A magnetic disk was prepared by firing at 250°0 for 3 hours.

(処理液) アルミナゾル 2 別I テトラメトキシシラン 1 謔チ 005N塩酸水溶液 0.4母I n−ブチルアルコール 残 部 比較例 実施例1と同様な方法で、ただし処理液は、以下に示す
液を用いて塗布したディスク状円盤を、250°Cで5
時間焼成したものを磁気ディスクとした。
(Treatment liquid) Alumina sol 2 Separate I Tetramethoxysilane 1 005N hydrochloric acid aqueous solution 0.4 Mother I n-butyl alcohol Remaining Comparative Example The same method as in Example 1 was used, except that the treatment liquid used was the one shown below. The coated disc was heated at 250°C for 55 minutes.
The time-sintered product was used as a magnetic disk.

(処理液) テトラメトキシシラン 5 諭「 0、05 N塩酸水溶液 1.5重量%n−ブチルアル
コール 残 部 比較例及び実施例1,2に示した各磁気ディスクを用い
て、ヘッドと磁気ディスク面とが操作開始時及び操作終
了時に接触状態にある記録再生方法に於いて、この操作
開始と終了の繰り返し試験を10000回tsb返し行
なったところ、比較例の磁気ディスクではヘッドとの摩
耗跡の約10%がハクリしたが、実施例1,2の各磁気
ディスクではハクリは皆無であったO 又純水(液温40 a )に磁気ディスクを浸漬し70
時間放置後に取り出し、水分を除去してから前記同様の
操作開始及び終了の繰り返し試験を、10000回行な
ったところ、比較例の磁気ディスクではヘッドとの介耗
跡の約80チが71クリしたが、実施例1,2の各磁気
ディスクでは、ノ1クリは皆無であった。
(Treatment liquid) Tetramethoxysilane 5% N-hydrochloric acid aqueous solution 1.5% by weight n-butyl alcohol Remainder Using each magnetic disk shown in Comparative Example and Examples 1 and 2, head and magnetic disk surface were prepared. In a recording and reproducing method in which the head and the head are in contact at the start and end of the operation, we repeated the start and end of the operation 10,000 times. Although 10% of the magnetic disks peeled off, there was no peeling in each of the magnetic disks of Examples 1 and 2.
After leaving it for a while, I took it out, removed the moisture, and repeated the same test as above, starting and ending the operation 10,000 times. On the magnetic disk of the comparative example, about 80 scratches with the head were cleared by 71. In each of the magnetic disks of Examples 1 and 2, there were no cracks.

同、比較例、実施例では、非磁性円盤状基板として金属
を用いだが、プラスチックなども使用可能であり、非磁
性合金メッキの有無、や材質、磁性薄膜媒体の材質を問
わないことは明らかである。
In the comparative examples and examples, metal was used as the non-magnetic disc-shaped substrate, but plastic etc. can also be used, and it is clear that the presence or absence of non-magnetic alloy plating, the material, and the material of the magnetic thin film medium do not matter. be.

以上 出願人株式会社諏訪精工舎 代理人弁理士 最 上 務that's all Applicant Suwa Seikosha Co., Ltd. Representative Patent Attorney Mogami

Claims (1)

【特許請求の範囲】 鏡面研摩された非磁性基板上に、金属磁性薄膜媒体が被
覆され、この金属磁性薄膜媒体上に、下記(A)及び(
B) (A)粒径1〜100ミリミクロンのコロイplvアル
ミナ (B、)一般式 R゛n−s+−(oR2)、−n(式
中R。 は炭素数1〜6の炭化水素基、ビニル基、メタクリロキ
シ基、エポキシを有する有機基やハロゲンを有する有機
基を、R2は炭素数1〜乙の炭化水素基又は水素を、n
はO+ 1+ 2を表わす。)で示される少なくとも1
種の有機ケイ素化合物 を少なくとも含む材料を原料とする保護膜を被覆せしめ
た事を特徴とする磁気記憶体。
[Claims] A metal magnetic thin film medium is coated on a mirror-polished nonmagnetic substrate, and the following (A) and (
B) (A) Colloidal plv alumina (B,) with a particle size of 1 to 100 millimicrons General formula R゛n-s+-(oR2), -n (in the formula, R. is a hydrocarbon group having 1 to 6 carbon atoms, R2 is a hydrocarbon group having 1 to 2 carbon atoms or hydrogen, n
represents O+ 1+ 2. ) at least 1
1. A magnetic memory body characterized by being coated with a protective film made of a material containing at least a seed organosilicon compound.
JP17984083A 1983-09-28 1983-09-28 Magnetic storage body Granted JPS6070525A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17984083A JPS6070525A (en) 1983-09-28 1983-09-28 Magnetic storage body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17984083A JPS6070525A (en) 1983-09-28 1983-09-28 Magnetic storage body

Publications (2)

Publication Number Publication Date
JPS6070525A true JPS6070525A (en) 1985-04-22
JPH0513330B2 JPH0513330B2 (en) 1993-02-22

Family

ID=16072813

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17984083A Granted JPS6070525A (en) 1983-09-28 1983-09-28 Magnetic storage body

Country Status (1)

Country Link
JP (1) JPS6070525A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5439603A (en) * 1977-09-02 1979-03-27 Nec Corp Magnetic memory medium
JPS5440606A (en) * 1977-09-05 1979-03-30 Nec Corp Magnetic memory element
JPS5445103A (en) * 1977-09-17 1979-04-10 Nec Corp Magnetic storage medium

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5439603A (en) * 1977-09-02 1979-03-27 Nec Corp Magnetic memory medium
JPS5440606A (en) * 1977-09-05 1979-03-30 Nec Corp Magnetic memory element
JPS5445103A (en) * 1977-09-17 1979-04-10 Nec Corp Magnetic storage medium

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JPH0513330B2 (en) 1993-02-22

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