JPS6079527A - Magnetic storage body - Google Patents

Magnetic storage body

Info

Publication number
JPS6079527A
JPS6079527A JP18556483A JP18556483A JPS6079527A JP S6079527 A JPS6079527 A JP S6079527A JP 18556483 A JP18556483 A JP 18556483A JP 18556483 A JP18556483 A JP 18556483A JP S6079527 A JPS6079527 A JP S6079527A
Authority
JP
Japan
Prior art keywords
magnetic
head
thin film
magnetic storage
storage body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18556483A
Other languages
Japanese (ja)
Inventor
Tetsuo Nakagawa
中川 哲男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP18556483A priority Critical patent/JPS6079527A/en
Publication of JPS6079527A publication Critical patent/JPS6079527A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To protect well a magnetic metallic thin film medium even when dust is contained, by forming a protective layer on the medium using a treating soln. contg. essentially colloidal silica and an organosilicon compound. CONSTITUTION:Co-Ni-P alloy plating of about 0.05mum thickness is formed as a magnetic metallic thin film medium, and a treating soln. consisting of 2wt% methanol silica sol, 1wt% gamma-glycidoxypropyltrimethoxysilane, 0.3wt% 0.05 N aqueous HCl soln. and the balance isopropanol is coated on the alloy plating to 800Angstrom thickness by a spinner method. Calcination is then carried out at 250 deg.C for 3hr in a thermostat to obtain a magnetic disk.

Description

【発明の詳細な説明】 本発明は磁気的記憶装置(磁気ディスク装置及び磁気ド
ラム装置等)に用いられる磁気記憶体に関する〇 一般に記録再生磁気ヘッド(以下ヘッドと呼ぶ)と磁気
記憶体とを構成部とする磁気記憶装置の記録再生方法に
は大別して次の二種の方法がある〇第1の方法は操作開
始時にヘッドと磁気記憶体面とを接触状態でセットした
後、該記憶体に所要の回転を与えることKより、該ヘッ
ドと該記憶体面との間に空気層分の空間を作り、この状
態で、記録再生する方法である◇この方法では、操作終
了時に磁気記憶体の回転寮止まり、この時ヘッドと磁気
記憶体面は操作開始時と同様に接触摩耗状態にある0第
2の方法は、磁気記憶体に予め回転を与えておき、急激
にヘッドを磁気記憶体面上に押しつけることにより、該
ヘッドと該記憶体面との間に空気層分の空間をつくり、
この状態で記録再生する方法である。この様に、第1の
方法では、操作開始時及び終了時にヘッドと磁気記憶体
面は接触摩擦状態にあり、第、2の方法ではヘッドを磁
気記憶体面に押しつける際に接触摩擦状態にある0これ
らの接触摩擦′状態におけるヘッドと磁気記憶体の間に
生じる摩擦力は、ヘッド及び磁気記憶体を摩耗させ、つ
いにはヘッド及び金属磁性薄膜媒体に傷を生じせしめる
ことがある。又該接触摩擦状態に於いてヘッドのわずか
なi勢の変化がニットにかかる荷重を不均一にさせヘッ
ド及び磁気記憶体表面に傷を作ることもある0又更に記
録再生中に突発的にヘッドが磁気記憶体に接触しヘラr
と磁気記憶体間に大きな摩擦力が働きヘッド及び磁気記
憶体が破壊されることがしばしば起こる。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic storage body used in a magnetic storage device (magnetic disk device, magnetic drum device, etc.) Generally, a recording/reproducing magnetic head (hereinafter referred to as a head) and a magnetic storage body are configured. There are two main methods for recording and reproducing a magnetic storage device, as follows: The first method is to set the head and the magnetic storage surface in contact at the start of operation, and then write the required information on the storage device. By applying a rotation of At this time, the head and the magnetic storage surface are in the same state of contact wear as at the start of operation.The second method is to give rotation to the magnetic storage body in advance and then suddenly press the head onto the magnetic storage surface. to create a space equivalent to an air layer between the head and the storage surface,
This is a method of recording and reproducing in this state. In this way, in the first method, the head and the magnetic storage surface are in a contact friction state at the start and end of the operation, and in the second method, the head and the magnetic storage surface are in a contact friction state when the head is pressed against the magnetic storage surface. The frictional force generated between the head and the magnetic storage body in the contact friction state causes wear on the head and the magnetic storage body, and may eventually cause damage to the head and the metal magnetic thin film medium. Also, in this contact friction state, a slight change in the force of the head may cause the load applied to the knit to become uneven and cause scratches on the head and the surface of the magnetic storage body. comes into contact with the magnetic memory and the spatula r
A large frictional force acts between the head and the magnetic storage body, often resulting in destruction of the head and the magnetic storage body.

この様なヘッドと磁気記憶体との接触摩擦、摩耗や破壊
からヘッド及び磁気記憶体を保護するために磁気記憶体
の表面に保護被膜を被覆することが必要である0従来か
ら保護被膜として金属メッキ膜(例えばOr、Rh、M
i−P等)を被覆する方法或いは金属磁性薄膜媒体を酸
化する方法、該酸化の後酸化膜を被覆する方法等がある
が、いずれも上記の接触摩耗現象に対して有効な手段と
はならない、。上記の欠点をなくしたテトラアルコキシ
シランの力「水分解物を用い形成したポリケイ酸から成
る検層゛iも提案されている(特公昭57−58731
)。
In order to protect the head and the magnetic memory from contact friction, abrasion, and destruction between the head and the magnetic memory, it is necessary to coat the surface of the magnetic memory with a protective film. Plating film (e.g. Or, Rh, M
There are methods such as coating the metal magnetic thin film medium (i-P, etc.), oxidizing the metal magnetic thin film medium, and coating the oxide film after the oxidation, but none of these methods are effective against the above contact wear phenomenon. ,. The power of tetraalkoxysilane that eliminates the above-mentioned drawbacks has also been proposed (Japanese Patent Publication No. 57-58731).
).

このポリケイ酸からなる保護被膜はヘッドと磁気記憶体
との接触摩擦、ヘッドの突発的な磁気記憶体との接触摩
耗に於ける耐久性でかなり良好な特性を示し、且つ高温
高温状態においても前記金属磁性薄膜をかなり長期間保
護しうるちのである〇しかし、ヘラ1ドと磁気記憶体と
の間にごみが引き込まれる事が多く、そのごみが研磨剤
の役割を果たしヘッド及び磁気記憶体を摩耗し、その摩
耗によって生じた摩耗粉が更にヘッド及び磁気記憶体を
摩耗させるため、耐摩耗性や耐衝撃性面からも前記ポリ
ケイ酸は保護被膜として充分とは言えない。又ポリケイ
酸被膜は、出発材料がテトラアルコキシシランであるこ
とから、その加水分解物を脱水縮合しても、かなり不充
分な縮合状態にしか成り得ず、水に対する耐久性は、ま
だ不充分と言わざるを得ない。
This protective coating made of polysilicic acid exhibits fairly good durability against contact friction between the head and the magnetic storage body and sudden contact wear between the head and the magnetic storage body. It can protect the metal magnetic thin film for a considerable period of time. However, dust is often drawn between the head and the magnetic memory, and the dust acts as an abrasive and damages the head and magnetic memory. The polysilicic acid is not sufficient as a protective film in terms of wear resistance and impact resistance, since the abrasion particles produced by the abrasion further abrade the head and the magnetic storage body. Furthermore, since the starting material of polysilicic acid coatings is tetraalkoxysilane, even if the hydrolyzate is dehydrated and condensed, only a very insufficient condensation state can be achieved, and the durability against water is still insufficient. I have to say it.

本発明の目的は上述のごみを引き込んだ場合であっても
充分に金属磁性薄膜媒体を保護し且つ長期間に渡る高温
高湿状態で、そして水への浸漬状態で、金属磁性薄膜媒
体に侮辱悪影響を及ぼさせない保護被膜を有する磁気記
憶体を提供することに、ある。
The purpose of the present invention is to sufficiently protect the metal magnetic thin film medium even when the above-mentioned dust is drawn in, and to prevent the metal magnetic thin film medium from being exposed to damage under high temperature and high humidity conditions for a long period of time or when immersed in water. An object of the present invention is to provide a magnetic memory having a protective coating that does not cause any adverse effects.

すなわち、本発明の磁気記憶体は・非磁性円盤状基体上
に金属磁性薄膜媒体が被覆され、この金属磁性薄膜媒体
上に、下記幻、参)を少なくとも含む材料を原料とする
保護膜が被覆されている。
That is, the magnetic storage body of the present invention includes: A metal magnetic thin film medium is coated on a non-magnetic disk-shaped substrate, and a protective film made of a material containing at least the following substances is coated on the metal magnetic thin film medium. has been done.

(A) 粒径1〜100ミリミクロンのコロイ、ダルシ
リカ (B) 一般式 R’ n−8i −(OR24−@)
(式中R′は炭素数1〜6の炭化水素基、ビニル基、メ
タクリロキシ基、エポキシ含有基やハロゲンを有する有
機基を、−R2は炭素数1〜6の炭化水素基又は水素を
、籠は0,1.2を表わす。)で示される少なくとも1
種の有機ケイ素化合物。
(A) Dull silica, a colloid with a particle size of 1 to 100 millimeters (B) General formula R' n-8i -(OR24-@)
(In the formula, R' is a hydrocarbon group having 1 to 6 carbon atoms, a vinyl group, a methacryloxy group, an epoxy-containing group, or an organic group having a halogen; -R2 is a hydrocarbon group having 1 to 6 carbon atoms or hydrogen; represents 0, 1.2).
Seed organosilicon compounds.

(A)のコロイダルシリカは・三次元構造の強固ナシロ
キサン結合を主骨格する粒径1〜100ミリミクロンの
粒子であり、該粒子の表面には、−8i−OH基及び−
OHイオンが存在する。この様に該コロイダルシリカは
、強固なシロキサン結合重りなるため、極めて・化学的
に安定であり、高温・高湿状態や水への浸漬に対しても
、優れた耐久性を示す0又コロイダルシリカを主要成分
とする保護被膜は1テトラアルコキシシランより成や保
護被膜より、熱膨張率に於いて、より下地金属体に近く
、該保護被膜の内部応力は小さい。これにより該保護被
膜の強度は高く、ヘッドに対する耐摩耗性は向上する◎ (B)の有機ケイ素化合物は、(A)のコロイダルシリ
カと化学結合し、又コロイダルシリカ同様下地金属体と
化学結合1て保護被膜を構成し、ヘッドの衝撃力を緩和
する能力を高めるものである。
The colloidal silica of (A) is a particle with a particle size of 1 to 100 millimicrons that has a three-dimensional structure of strong nasiloxane bonds as its main skeleton, and the surface of the particle has -8i-OH groups and -
OH ions are present. In this way, the colloidal silica has strong siloxane bonds, so it is extremely chemically stable and exhibits excellent durability even under high temperature and high humidity conditions and when immersed in water. The protective coating mainly composed of 1-tetraalkoxysilane has a coefficient of thermal expansion closer to that of the underlying metal body than the protective coating made of 1-tetraalkoxysilane, and the internal stress of the protective coating is small. As a result, the strength of the protective coating is high and the wear resistance of the head is improved.◎ The organosilicon compound (B) chemically bonds with the colloidal silica (A), and like colloidal silica, it also chemically bonds with the underlying metal body. It forms a protective coating and enhances the ability of the head to absorb impact forces.

該有機ケイ素化合物は、希釈剤の有無の状態で水又は希
酸添加により加水分解され、必要に応じて濃度調節がな
され、更にコロイダルシリカを加えて処理液とする◎そ
して金属磁性薄膜媒体上に塗布した後、全体を焼成する
〇 次に実施例を挙げて詳細に説明する。
The organosilicon compound is hydrolyzed by adding water or dilute acid in the presence or absence of a diluent, the concentration is adjusted as necessary, and colloidal silica is added to form a treatment solution. After coating, the whole is fired. Next, examples will be given to explain in detail.

実施例1゜ 鏡面仕上げ(表面粗さ0.05μ渭以下、ACC5Q 
@/eec2以下)されたディスク状アルミニウム合金
基板上に・非磁性合金メッキとしてN1−P合金を約5
0μmの厚さにメッキし、このメッキを研磨により表面
粗さ0.03μm以下、厚さ60μmまで鏡面仕上げを
した後、その上に金属磁性薄膜媒体としてOo −N 
i −P合金を約005μ渭の厚さにメッキした。更に
Oo −N i −P合金メッキ上に、下記処理液をス
ピンナー法により800Xの膜厚になるように塗布した
・次にディスク状円盤を250℃で3時間、恒温槽内で
焼成し、磁気ディスクとした。
Example 1゜Mirror finish (surface roughness 0.05μ or less, ACC5Q
Approximately 5% N1-P alloy is applied as non-magnetic alloy plating on the disc-shaped aluminum alloy substrate (@/eec2 or less).
After plating to a thickness of 0 μm and polishing this plating to a mirror finish with a surface roughness of 0.03 μm or less and a thickness of 60 μm, Oo-N is applied as a metal magnetic thin film medium on top of the plating.
The i-P alloy was plated to a thickness of approximately 0.005 μm. Furthermore, on the Oo-Ni-P alloy plating, the following processing solution was applied to a film thickness of 800X using a spinner method.Next, the disk-shaped disk was baked at 250℃ for 3 hours in a constant temperature bath, and magnetically applied. It was made into a disc.

(処理液) メタノールシリカゾル ・・・2重量%(日産化学製品
) γ−グリシドキシプロピルトリ メトキシシラン ・・・1重量% 005N塩酸水溶液 ・・・03重量%イソプロピルア
ルコール ・・・残部 実施例2゜ 実施例1と同様な方法で、ただし処理液は以下に示す液
を用いて塗布したディスク状円盤を、250℃で3時間
焼成したものを磁気ディスクとした0 (処理液) メタノールシリカゾル ・・・2重量%テトラメトキシ
シラン ・・・1重量%005N塩酸水溶液 ・・・0
4重量%n−ブチルアルコール ・・・残部 比較例 実施例1と同様な方法で、ただし処理液は、以下に示す
液を用いて塗布したディスク状円盤を250℃で3時間
焼成したものを磁気ディスクとした。
(Treatment liquid) Methanol silica sol...2% by weight (Nissan Chemical Products) γ-glycidoxypropyltrimethoxysilane...1% by weight 005N hydrochloric acid aqueous solution...03% by weight Isopropyl alcohol...Remainder Example 2゜A magnetic disk was prepared by applying the same method as in Example 1, but using the treatment liquid shown below and baking it at 250°C for 3 hours.0 (Treatment liquid) Methanol silica sol...・2% by weight tetramethoxysilane ...1% by weight 005N hydrochloric acid aqueous solution ...0
4% by weight n-butyl alcohol... Residual Comparative Example The same method as in Example 1 was used, except that the treatment liquid was as follows: A disk-shaped disk was coated with the liquid shown below and baked at 250°C for 3 hours. It was made into a disc.

(処理液) テトラメトキシシラン ・・・5重量%0、05 N塩
酸水溶液 ・・・1.5重量%舊−ブチルアルコール 
・・・残部 比較例及び実施例1,2に示した各磁気ディスクを用い
て、ヘッドと磁気ディスク面とが操作開始時及び操作終
了時に接触状態にある記録再生方法に於いて、この操作
開始と終了の繰り返し試験を10 ’000回繰り返し
行なったところ・比較例の磁気ディスクではヘッドとの
摩耗跡の約10%がハクリしたが、実施例1,2の各磁
気ディスクではハクリは皆無であった。
(Treatment liquid) Tetramethoxysilane...5% by weight 0,05N hydrochloric acid aqueous solution...1.5% by weight Butyl alcohol
... Remainder In a recording and reproducing method using each of the magnetic disks shown in Comparative Example and Examples 1 and 2, in which the head and the magnetic disk surface are in a contact state at the start and end of the operation, this operation start When the test was repeated 10'000 times, approximately 10% of the wear marks on the magnetic disk of the comparative example peeled off, but on the magnetic disks of Examples 1 and 2, there was no peeling. Ta.

又純水(液温40℃)に磁気ディスクを浸漬し、48時
間放置後に取り出し、水分を除去してから、前記同様の
操作開始及び終了の繰り返し試験をi oooo回行な
ったところ、比較例の磁気ディスクではヘッドとの摩耗
跡の約80%がノ\クリしたが、実施例1,2の各磁気
ディスクでは、ノ1クリは皆無であったO 尚・比較例、実施例では・非磁性円盤状基板として金属
を用いたが、プラスチックなども使用可能であり、非磁
性合金メッキの有無や材質、磁性薄膜媒体の材質を問わ
ないことは明らかである。
In addition, a magnetic disk was immersed in pure water (liquid temperature 40°C), left for 48 hours, taken out, water removed, and the same operation start and end test repeated ioooo times as described above. In the magnetic disk, approximately 80% of the wear marks with the head were cracked, but in each of the magnetic disks of Examples 1 and 2, there were no cracks. Although metal is used as the disc-shaped substrate, it is clear that plastic or the like can also be used, and the presence or absence of non-magnetic alloy plating, the material, and the material of the magnetic thin film medium do not matter.

Claims (1)

【特許請求の範囲】 鏡面研磨された非磁性基板上に、金属磁性薄膜。 媒体が被覆され、この金属磁性薄膜媒体上に、下記(A
)及び(B)、 (A)粒径1〜100ミリミクロンのコロイダルシリカ (B) 一般式 R’?l−8i −(OR2)4−n
(式中R′は炭素数1〜6の炭化水素基、ビニル基、メ
タクリロキシ基、エポキシを有する有機基やハロゲンを
有する有機基を、R2は炭素数1〜6の炭化水素基又は
水素を、外は0.1.2を表わす。)で示される少なく
とも1種の有機ケイ素化合物、 を少なくとも含む材料を原料とする保護膜を被覆せしめ
た事を特徴とする磁気記憶体。
[Claims] A metal magnetic thin film on a mirror-polished nonmagnetic substrate. A medium is coated, and the following (A
) and (B), (A) Colloidal silica with a particle size of 1 to 100 millimicrons (B) General formula R'? l-8i -(OR2)4-n
(In the formula, R' is a hydrocarbon group having 1 to 6 carbon atoms, a vinyl group, a methacryloxy group, an organic group having epoxy, or an organic group having halogen, and R2 is a hydrocarbon group having 1 to 6 carbon atoms or hydrogen, 1. A magnetic memory body characterized by being coated with a protective film made of a material containing at least one organosilicon compound represented by the following: 0.1.2.
JP18556483A 1983-10-04 1983-10-04 Magnetic storage body Pending JPS6079527A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18556483A JPS6079527A (en) 1983-10-04 1983-10-04 Magnetic storage body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18556483A JPS6079527A (en) 1983-10-04 1983-10-04 Magnetic storage body

Publications (1)

Publication Number Publication Date
JPS6079527A true JPS6079527A (en) 1985-05-07

Family

ID=16173012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18556483A Pending JPS6079527A (en) 1983-10-04 1983-10-04 Magnetic storage body

Country Status (1)

Country Link
JP (1) JPS6079527A (en)

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