JPH01146132A - Magnetic disk - Google Patents
Magnetic diskInfo
- Publication number
- JPH01146132A JPH01146132A JP30487487A JP30487487A JPH01146132A JP H01146132 A JPH01146132 A JP H01146132A JP 30487487 A JP30487487 A JP 30487487A JP 30487487 A JP30487487 A JP 30487487A JP H01146132 A JPH01146132 A JP H01146132A
- Authority
- JP
- Japan
- Prior art keywords
- island
- film
- recording medium
- magnetic recording
- magnetic disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000001681 protective effect Effects 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 claims abstract description 6
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 4
- 239000010703 silicon Substances 0.000 claims abstract description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052796 boron Inorganic materials 0.000 claims abstract description 3
- 230000003647 oxidation Effects 0.000 claims description 2
- 238000007254 oxidation reaction Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 5
- 229910045601 alloy Inorganic materials 0.000 abstract description 4
- 239000000956 alloy Substances 0.000 abstract description 4
- 238000007747 plating Methods 0.000 abstract description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 2
- 150000002739 metals Chemical class 0.000 abstract description 2
- 229910052760 oxygen Inorganic materials 0.000 abstract description 2
- 239000001301 oxygen Substances 0.000 abstract description 2
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 229910018134 Al-Mg Inorganic materials 0.000 abstract 1
- 229910018467 Al—Mg Inorganic materials 0.000 abstract 1
- 229910020630 Co Ni Inorganic materials 0.000 abstract 1
- 229910002440 Co–Ni Inorganic materials 0.000 abstract 1
- 229910018104 Ni-P Inorganic materials 0.000 abstract 1
- 229910018536 Ni—P Inorganic materials 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000005121 nitriding Methods 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 description 17
- 238000001179 sorption measurement Methods 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 230000003746 surface roughness Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- -1 8102 Chemical compound 0.000 description 2
- 229910000861 Mg alloy Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 230000010365 information processing Effects 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910015179 MoB Inorganic materials 0.000 description 1
- 229910005569 NiB Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、情報処理システムに於けるファイル記憶と
して用いられるような磁気ディスクに関するものである
。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic disk used for file storage in an information processing system.
情報処理システムの高度化・大規模化に伴い。 With the increasing sophistication and scale of information processing systems.
磁気ディスク装ｆは大容量化、高速化が強く要求されて
いる。Magnetic disk drives are strongly required to have larger capacities and faster speeds.
以下、従来の磁気ディスクの二個ｆζついて図面を参照
しながら説明する。Hereinafter, two conventional magnetic disks fζ will be explained with reference to the drawings.
第５図、第６図は例えば特開昭６１−２３０６１１１号
公報および特開昭８１−２３０６１９号公報に示された
従来の磁気ディスクの断面を示Ｔものである。FIGS. 5 and 6 are cross-sectional views of conventional magnetic disks disclosed in, for example, Japanese Patent Application Laid-open No. 61-2306111 and Japanese Patent Application Laid-open No. 81-230619.
第５図において、Ｃ！）は合金基板、（２）は下地硬化
層、（３）は磁気記録媒体である。In Figure 5, C! ) is an alloy substrate, (2) is a hardened base layer, and (3) is a magnetic recording medium.
また、第６図は磁気記録媒体の傷付・腐食防止のため、
磁気記録媒体（３）上に保護膜（４）を形成したもので
ある。例えば１合金基板（１）にはＡ／−Ｍｇ合金、下
地硬化層（２）には、アルマイトやＮ１−Ｃｕ −Ｐや
Ｎ１−Ｐ、磁気記録媒体（３）にはスパッタｒ −Ｆｅ
２０３やスパッタＣＱＮｉ やメツキ膜、保護膜（４
１にはスパッタ日１ｏ２やスパッタＣ０その他が使われ
ている。In addition, Figure 6 shows how to prevent scratches and corrosion of magnetic recording media.
A protective film (4) is formed on a magnetic recording medium (3). For example, A/-Mg alloy is used for the 1 alloy substrate (1), alumite, N1-Cu -P, or N1-P is used for the hardened base layer (2), and sputtered r -Fe is used for the magnetic recording medium (3).
203, sputtered CQNi, plating film, protective film (4
For 1, sputter date 1o2, sputter C0, and others are used.
磁気ディスク装置は、高速回転する磁気ディスク亡この
上をサブミクロンの微少すきまで浮とする浮動ヘッドの
主構成部から構成されている。浮動ヘッドは負荷ばねｌ
ζよル押圧され、起動停止時にはディスク面に接触した
まま走行Ｔる（コンタクト・スタート・ストップ；Ｃ５
５）。A magnetic disk drive consists of a main component of a floating head that floats over a high-speed rotating magnetic disk over a submicron gap. The floating head is loaded with spring l
ζYoru is pressed, and when starting and stopping, it runs while contacting the disc surface (contact start/stop; C5
5).
この際、ヘッドとディスクとの非接触相対運動の安定性
および安全性が重要な課題となっている。At this time, stability and safety of the non-contact relative movement between the head and the disk are important issues.
そのため、ディスクの表面精度は年々向とする傾向にあ
る。現在では、ディスクのＲｍａｘは１００ｒ前後きな
っている。Therefore, the surface accuracy of disks tends to improve year by year. Currently, the Rmax of a disk is around 100r.
しかしながら磁気ディスクの表面積度の向上に伴い、摩
擦係数が増加するため、コンタクト・スタート・ストッ
プ方式で使用した際、耐摩耗性が劣シ、傷の発生につな
がる。また、吸着力が増加するなどの問題点があった。However, as the surface area of the magnetic disk increases, the coefficient of friction increases, so when used in a contact start-stop system, wear resistance deteriorates and scratches may occur. Further, there were problems such as an increase in adsorption force.
これは例えば雑誌（ＥｏＭ、Ｒｏｓｓｉ他、ジャーナル
・オプ・アプライド・フィジックス（Ｊ 、 Ａｐｐｌ
、Ｐｈ７す５５巻、６号。This can be done, for example, in journals (EoM, Rossi et al., Journal of Applied Physics (J, Appl.
, Ph7S Volume 55, Issue 6.
２２５４頁）等に記載されている。(page 2254), etc.
この発明は、上記のような問題点を解消するためになさ
れたもので、磁気ディスク亡ヘッドの耐摩耗性を向上さ
せるとともに、吸着を防止できる磁気ディスクを得るこ
とを目的としている。The present invention was made to solve the above-mentioned problems, and aims to improve the wear resistance of a magnetic disk head and to obtain a magnetic disk that can prevent adsorption.
［問題点を解決するための手段］
この発明に係る磁気ディスクは、平担な磁気記録媒体ま
たはこの磁気記録媒体上に成膜された保護膜に、金属、
シリコン、およびポロンのうちの１種で形成され酸化ま
たは窒化により硬化される島状の突起を有するものであ
る。[Means for Solving the Problems] The magnetic disk according to the present invention includes metal,
It has island-like protrusions made of one of silicon and poron and hardened by oxidation or nitridation.
この発明における島状の突起は、磁気へラドスライダ七
の真実接触面積を小さくする。そのため磁気ディスクさ
磁気へラドスライダ間の吸着力。The island-shaped protrusions in this invention reduce the actual contact area of the magnetic helide slider 7. Therefore, the adsorption force between the magnetic disk and the magnetic slider.
摩擦力が減少する上に、突起は硬化処理が施されている
ので耐摩耗性も向とする。In addition to reducing frictional force, the protrusions are hardened to improve wear resistance.
第１図はこの発明の一実施例による磁気ディスクを示す
断面図で９図において、（１）は例えばＡ／−Ｍｇ合金
基板、（２）は例えばＮ１−ｐ メツキ膜の下地硬化
層、（３）は例えばスパッタＣとよるＣ□ −Ｎｉ Ｏ
）磁気記録媒体、（４）は例えばスパッタによる８１０
２の保護膜、（５）は例えば、 Ａ／２０３ の島状の
突起である。FIG. 1 is a cross-sectional view showing a magnetic disk according to an embodiment of the present invention. In FIG. 3) is, for example, C□-NiO by sputtering C.
) Magnetic recording medium, (4) is 810 by sputtering, for example.
The protective film 2 (5) is, for example, an island-shaped protrusion of A/203.
次に製造方法について説明する。Ａ／−Ｍｇ合金基板（
１１の表面ｌこＮ１ −ｐメツキ膜の下地硬化層（２）
を成膜して鏡面加工しであるものは１通常サブストレイ
トと呼ばれ、市販されている。市販サブストレイト上ξ
ζスパッタによりｃ（、−Ｎｉの磁気記録媒体膜（３）
を８００ＡＩ成膜し、その上にスパッタにより保設膜で
ある５１０２膜（４）を５００Ａ”成膜した。Next, the manufacturing method will be explained. A/-Mg alloy substrate (
Hardened layer (2) on the surface of 11 of N1-p plating film
A film formed by forming a film and having a mirror finish is usually called a substrate and is commercially available. Commercially available substrate top ξ
c(, -Ni magnetic recording medium film (3) by ζ sputtering
A film of 800A'' was formed thereon, and a 5102 film (4) of 500A'', which was a storage film, was formed thereon by sputtering.
上記の８１０２保Ｍ膜（４）上にスパッタｆζよシＡｌ
の島状突起（５）を設ける。Sputter fζ onto the above 8102 M retention film (4).
An island-like projection (5) is provided.
さらに上記ディスクを酸素雰囲気中１例えば３００℃で
熱処理Ｔることにより、 Ａ／を酸化させ、硬化して
Ａ／２０３の島状突起を生成した。Further, the disk was heat-treated in an oxygen atmosphere at, for example, 300° C. to oxidize and harden A/203 to form island-like protrusions of A/203.
以上のように製造した磁気ディスクの表面粗さをタリス
テップで測定し、その結果を第３図及び第４図に示す。The surface roughness of the magnetic disk manufactured as described above was measured by Talystep, and the results are shown in FIGS. 3 and 4.
即ち、第３図は上記第１図のこの発明の一実施例による
磁気ディスクの表面粗さを示Ｔ％性図、第４図は第４図
の従来例の磁気ディスクの表面粗さを示Ｔ特性図であシ
、縦軸は粗さ（４，横軸は走査方向（μｍ）を示す。な
お１図中。That is, FIG. 3 shows the surface roughness of the magnetic disk according to the embodiment of the present invention shown in FIG. 1, and FIG. 4 shows the surface roughness of the conventional magnetic disk shown in FIG. This is a T characteristic diagram, the vertical axis shows the roughness (4), and the horizontal axis shows the scanning direction (μm).
縦軸の矢印間は１００Ａ’に相当する長さを、横軸の矢
印間は５μｍに相当する長さを示す。図から明らかなよ
うに、この発明の一実施例による磁気ディスクには微少
な突起が認められる。この突起の高さは最大１００Ａ’
程度であシ、ヘッドの浮上特性ｌζはなんら影響を与え
ない。The length between the arrows on the vertical axis is equivalent to 100 A', and the length between the arrows on the horizontal axis is equivalent to 5 μm. As is clear from the figure, minute protrusions are observed on the magnetic disk according to one embodiment of the present invention. The height of this protrusion is maximum 100A'
The flying characteristic lζ of the head does not have any influence at all.
次に、上記一実施例による磁気ディスクと従来の磁気デ
ィスクの表面に３３８０形薄膜ヘツドを接触させ１周囲
を５０℃、８０％ＲＨにして２４時間放置後、静摩擦係
数を測定した。一実施例による磁気ディスクではＮ２４
．従来のディスクではＮ７４であシ、従来のディスクで
は吸着現象が認められた。このようｌζ、均一な凹凸に
よフ吸着に対しては飛躍的な改善となった。また、島状
突起（５）は熱処理により硬化されているので耐摩耗性
６ζ優れている。Next, a 3380 type thin film head was brought into contact with the surfaces of the magnetic disk according to the above embodiment and the conventional magnetic disk, and after being left for 24 hours at 50° C. and 80% RH, the coefficient of static friction was measured. In the magnetic disk according to one embodiment, N24
．． In the conventional disk, N74 was used, and in the conventional disk, an adsorption phenomenon was observed. This is a dramatic improvement in the adsorption due to the uniform unevenness. Furthermore, since the island-like protrusions (5) are hardened by heat treatment, they have excellent wear resistance 6ζ.
なお、上記実施例では、島状の突起（５）をスパッタで
形成したが、蒸着、ＣＶＤ、メツキ、その他で形成して
もよい。また、スパッタ、蒸着、 ＣＶＤの条件は、
上記実施例に限定されるものでなく要は微少突起が均−
Ｉζ生じる条件であればよい。In the above embodiment, the island-shaped protrusions (5) were formed by sputtering, but they may be formed by vapor deposition, CVD, plating, or other methods. In addition, the conditions for sputtering, vapor deposition, and CVD are as follows:
This is not limited to the above embodiments, but the point is that minute protrusions are uniform.
Any condition is sufficient as long as Iζ occurs.
また、上記実施例では、島状の突起（５）がＡ／２０３
の場合について説明したが、他の金属酸化物、金属窒化
物、酸化ケイ素、酸化ポロン、窒化ケイ素。Further, in the above embodiment, the island-shaped protrusion (5) is A/203
Although we have discussed the case of other metal oxides, metal nitrides, silicon oxide, poron oxide, and silicon nitride.
窒化ボロンなどであってもよく１例えばＴｉＯ２。It may also be boron nitride, for example TiO2.
Ｚ ｒ０２．ＴＩＮ 、８１０２ 、Ｂ２Ｏ３、ｓｉ
３Ｎ４ 、ＢＮ等が挙げられる。Z r02. TIN, 8102, B2O3, si
Examples include 3N4 and BN.
また、上記実施例では、保護膜（４１が８１０２の場合
を示したが、他の無機酸化物、無機炭化物、無機窒化物
、無機はう化物、金属、炭素などであっテモヨく０例え
ば、 Ａ／２０３ 、 ＺｒＯ２、ＴＩＣ。In addition, in the above embodiment, the case where the protective film (41) is 8102 is shown, but other inorganic oxides, inorganic carbides, inorganic nitrides, inorganic ferrides, metals, carbon, etc. /203, ZrO2, TIC.
ＷＣ、ＢＮ 、 ８ｉ３Ｎ４ 、 ＮｉＢ 、 ＭｏＢ
、 Ｃｕ 、 Ｃ。WC, BN, 8i3N4, NiB, MoB
, Cu, C.
ＯＦｎ等が挙げられる。OFn etc. are mentioned.
また、上記実施例では保護膜（４１上に島状突起（５）
を設けた場合について説明したが、保護膜なしの磁気デ
ィスクにおいては、第２図に示すように島状突起を直接
磁気記録媒体（３）上ｌζ設けてもよく。In addition, in the above embodiment, an island-like protrusion (5) is formed on the protective film (41).
In the case of a magnetic disk without a protective film, an island-like protrusion may be provided directly on the magnetic recording medium (3) as shown in FIG.
上記実施例と同様の効果を奏するこきは勿論である。It goes without saying that the wood burner has the same effect as the above embodiment.
また、実施例では突起高さが１００Ａ’程度のものを示
したが、これに限らず１ ＧＯＡ’〜１５００Ａ０．好
ましくは１２０Ａ”〜ｚｏｏａ’程度の突起まで許され
る。Further, in the example, the protrusion height is about 100A', but the height is not limited to this, and it can be from 1 GOA' to 1500A0. Preferably, a protrusion of about 120 A'' to zooa' is allowed.
以上のように、この発明によれば、平担な磁気記録媒体
またはこの磁気記録媒体上に成膜された保膿膜ｌζ、金
属、シリコン、およびボロンのうちの１種で形成され酸
化または窒化により硬化される島状の突起を有するので
、耐摩耗性が向とすると共に吸着を防止できる効果があ
る。As described above, according to the present invention, the flat magnetic recording medium or the purulent-retaining film lζ formed on the magnetic recording medium is formed of one of metal, silicon, and boron, and is oxidized or nitrided. Since it has island-shaped protrusions that are hardened, it has the effect of improving wear resistance and preventing adsorption.
第１図はこの発明の一実施例による磁気ディスクを示す
断面図、第２図はこの発明の他の実施例による磁気ディ
スクを示す断面図、第３図は第１図のこの発明の一実施
例１ζよる磁気ディスクの表面粗さを示す特性図、第４
図は従来の磁気ディスクの表面粗さを示す特性図、第５
図、第６図はそれぞれ従来の磁気ディスクを示Ｔ断面図
である。
図において、（１）は合金基板、（２）は下地硬化層。
（３）は磁気記録媒体、（４）は保＠膜、 （５）は島
状突起である。
なお、各図中同一符号は同−又は相当部分を示す。FIG. 1 is a sectional view showing a magnetic disk according to one embodiment of the invention, FIG. 2 is a sectional view showing a magnetic disk according to another embodiment of the invention, and FIG. 3 is an embodiment of the invention shown in FIG. 1. Characteristic diagram showing the surface roughness of a magnetic disk according to Example 1ζ, No. 4
The figure is a characteristic diagram showing the surface roughness of a conventional magnetic disk.
6 are T cross-sectional views showing conventional magnetic disks, respectively. In the figure, (1) is an alloy substrate, and (2) is a hardened base layer. (3) is a magnetic recording medium, (4) is a protective film, and (5) is an island-like protrusion. Note that the same reference numerals in each figure indicate the same or corresponding parts.
Claims (1)
れた保護膜に、金属、シリコン、およびボロンのうちの
１種で形成され酸化または窒化により硬化される島状の
突起を有することを特徴とする磁気ディスク。A planar magnetic recording medium or a protective film formed on the magnetic recording medium has island-like protrusions made of one of metal, silicon, and boron and hardened by oxidation or nitridation. Features a magnetic disk.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30487487A JPH01146132A (en) | 1987-12-02 | 1987-12-02 | Magnetic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30487487A JPH01146132A (en) | 1987-12-02 | 1987-12-02 | Magnetic disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01146132A true JPH01146132A (en) | 1989-06-08 |
Family
ID=17938318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30487487A Pending JPH01146132A (en) | 1987-12-02 | 1987-12-02 | Magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01146132A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03198218A (en) * | 1989-12-25 | 1991-08-29 | Toray Ind Inc | Magnetic recording medium |
| US5474830A (en) * | 1992-08-06 | 1995-12-12 | Fuji Electric Co., Ltd. | Magnetic recording medium and method for the manufacture thereof including spaced apart deposits |
-
1987
- 1987-12-02 JP JP30487487A patent/JPH01146132A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03198218A (en) * | 1989-12-25 | 1991-08-29 | Toray Ind Inc | Magnetic recording medium |
| US5474830A (en) * | 1992-08-06 | 1995-12-12 | Fuji Electric Co., Ltd. | Magnetic recording medium and method for the manufacture thereof including spaced apart deposits |
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