JPS6065434A - In-line type electron gun electrode body structure - Google Patents

In-line type electron gun electrode body structure

Info

Publication number
JPS6065434A
JPS6065434A JP17347083A JP17347083A JPS6065434A JP S6065434 A JPS6065434 A JP S6065434A JP 17347083 A JP17347083 A JP 17347083A JP 17347083 A JP17347083 A JP 17347083A JP S6065434 A JPS6065434 A JP S6065434A
Authority
JP
Japan
Prior art keywords
apertures
closed surface
closed
aperture
electron gun
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17347083A
Other languages
Japanese (ja)
Other versions
JPH0360142B2 (en
Inventor
Kazuaki Naiki
内記 一晃
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP17347083A priority Critical patent/JPS6065434A/en
Publication of JPS6065434A publication Critical patent/JPS6065434A/en
Publication of JPH0360142B2 publication Critical patent/JPH0360142B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48Electron guns
    • H01J29/50Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
    • H01J29/503Three or more guns, the axes of which lay in a common plane

Abstract

PURPOSE:To reduce spherical aberration and improve resolution in a closed cylindrical electrode in which independent apertures are perforated coaxially on a second closed surface by providing a recessed groove that is connected to overlapping type apertures at the cylinder side in the aperture alignment direction. CONSTITUTION:A closed cylindrical electrode 2 forms a second closed surface 13 that is receded only for a specified distance from a first closed surface by tapering the first closed surface with the diameter D1 exceeding the eccentric length S so that the center and both outside apertures 12R-12B can mutually be overlapped. Independent apertures 13R-13B with the smaller diameter D2 than the above diameter are perforated on the closed surface 13 coaxially with electron gun axes 20R-20B. In addition, a groove 22 that reaches the second closed surface 13 is formed with the same with l as the in-line alignment direction of a connection section 21 inserted between the center and both outside apertures, between the cylinder side 15 of the in-line alignment direction of the apertures 12R-12B and both outside apertures 12R and 12B.

Description

【発明の詳細な説明】 本発明はインライン型カラー受像管用電子銃の主電子レ
ンズ構成電極の改善に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in the main electron lens constituent electrode of an in-line color picture tube electron gun.

電子銃の解像度は主として、パイ・ボンテンシシル・フ
↓−カス刑、ユニ・ボテンシセルーフφカス型、その他
の多段集束型からなる静%電子レンズの球面収差に制約
され、尚解像度特性を得るには主電子レンズを構成する
電極口径を大きくし”C1電子レンズの球面収差を小さ
くする必扱がある。主電子レンズ電極口径はカラー受像
管の硝子頚部内径に制限され、三電子銃が一列配列され
たインライン型カラー受像管では主電子レンズ直径は最
大でも硝子頚部内径の1/3以下となり、電子銃構体設
計上例如にこの最大径に近づけるかが重要な点となって
いる。
The resolution of an electron gun is mainly limited by the spherical aberration of the static electron lens, which is composed of a pi-bontency lens lens, a uni-botency roof φ-cass type, and other multi-stage focusing types. It is necessary to increase the aperture of the electrodes that make up the electron lens and reduce the spherical aberration of the C1 electron lens.The aperture of the main electron lens electrode is limited to the inner diameter of the glass neck of the color picture tube, and three electron guns are arranged in a row. In an in-line color picture tube, the diameter of the main electron lens is at most 1/3 or less of the inner diameter of the glass neck, and in designing the electron gun structure, it is important to approach this maximum diameter as usual.

一方、主電子レンズ電ゼ・i口径音大きくするには開孔
間距離を大きくする必俊があるが、周知のように離心距
Pi(pの増大は二電子ビーム全走査画向上全域にわた
って一点に集中させるコンバージェンス特性を劣化させ
る。
On the other hand, in order to increase the main electron lens power and i-aperture sound, it is necessary to increase the distance between the apertures. convergence characteristics.

そこでインライン型電子銃の離心距Mf!’、 Sと硝
子頚部口径を変更することなく、主電子レンズ構成電極
の口径を大きくして球面収差を低減する方法として、第
1図、第2図に示す閉塞筒状体電極Jが提案されている
。第1図は閉塞筒状体電極1の平面図、第2図はその側
断面図であり、閉塞面11には離心距離Sより大きい口
径Dlをもった中央。
Therefore, the eccentricity Mf of the in-line electron gun! ', As a method for reducing spherical aberration by increasing the aperture of the main electron lens constituent electrode without changing S and the glass neck aperture, a closed cylindrical electrode J shown in Figs. 1 and 2 was proposed. ing. FIG. 1 is a plan view of the closed cylindrical body electrode 1, and FIG. 2 is a side sectional view thereof.The closed surface 11 has a central diameter Dl larger than the eccentric distance S.

及び内外9111電子ビーム透過開孔12G 、 12
几。
and inner and outer 9111 electron beam transmission apertures 12G, 12
几.

12Bが開設され、中央開孔12Gの両隣接開孔121
t、、12Bは互に1畳し連通状となってい、更にその
開孔部は閉塞面11より距離IHだけ後退した電極内部
に束二の閉塞面13を形成し、この面にMIJ記開孔1
2)L、120.12Bと同軸で、離心距離Sより小さ
い口径D2の完全円孔状開孔13R,130,13Bが
穿設され°Cいる。史に開孔13几、130.1:3B
には第二の閉塞面13から高さb2(f−持つた突状縁
14が形成され、各開孔を独立に曲んでいる。
12B is opened, and the openings 121 on both sides of the central opening 12G are opened.
t, , 12B are connected to each other by 1 tatami, and the openings form a bundle 2 closed surface 13 inside the electrode which is set back from the closed surface 11 by a distance IH, and MIJ markings are written on this surface. Hole 1
2) Completely circular holes 13R, 130, 13B with a diameter D2 smaller than the eccentric distance S are drilled coaxially with L and 120.12B. 13 holes opened in history, 130.1:3B
A protruding edge 14 having a height b2 (f) is formed from the second closing surface 13, and curves each opening independently.

第3図、第4図はこの電極構体lと同一構造の電極構体
l′を同一軸101’L、IOG、IOB上に対向配置
し、電極構体1に関電圧、を極構体l′に高電圧のIツ
r定割合にある低電圧を印加した場合、三本の電子銃軸
10f4,100.lo)Jを含む断面内(カラー受像
管の蛍光面に対する水平面)と、これにi直で中央の電
子銃軸10Gを含む断面内(カラー受像管の蛍光面に対
する垂直面)に於ける主電子レンズ電界を形成する静電
界を示し、その等電位面とこれら断面との交線である等
電位線を夫々線群18.19で示す。図から明らから様
に、離心距離Sより大きい口径DIを持った重畳形状の
開孔と、これに連続して同軸で口径D2の独立した開孔
によって口径D2の開孔の場合より著しく球面収差の低
減された電子レンズが得られる。
In FIGS. 3 and 4, an electrode assembly l' having the same structure as this electrode assembly l is arranged facing each other on the same axis 101'L, IOG, and IOB, and the voltage related to the electrode assembly 1 is raised to the pole assembly l'. When a low voltage at a constant ratio of voltage is applied, the three electron gun shafts 10f4, 100. lo) Main electrons in the cross section including J (horizontal plane to the phosphor screen of the color picture tube) and the cross section including the central electron gun axis 10G perpendicular to this (plane perpendicular to the phosphor screen of the color picture tube) The electrostatic field that forms the lens electric field is shown, and the equipotential lines that are the intersections of the equipotential surfaces and these cross sections are shown by line groups 18 and 19, respectively. As is clear from the figure, the superimposed apertures with apertures DI larger than the eccentric distance S and the independent apertures with the aperture D2 that are coaxial with the superimposed apertures result in significantly more spherical aberration than in the case of the apertures with the aperture D2. This results in an electron lens with reduced .

然しなから第3図に示す水平断面内の中央と内外側開孔
間隙160対向部間距離d2の方が電極筒側部15側閉
塞面対向部間距離d1より太きいため、中央開孔12G
の両側11C6る間隙16対向部間では等電位線群18
の密度は内外側開孔12R。
However, since the distance d2 between the center and the opposing parts of the inner and outer opening gap 160 in the horizontal cross section shown in FIG.
A group of equipotential lines 18 are formed between opposing parts of the gap 16 on both sides 11C6 of
The density of the inner and outer openings is 12R.

12Bの部側部15側対向部間より粗となっている。一
方第4図から明らかなように垂直り面内では電子銃軸1
0G対し軸対称な等電位線群19が得られ、図示しない
が、両外側の電子銃軸10R210Bを含む垂直断面内
でも同様に軸対称な等電位線群が得られる。水平面内の
等電位線群18が中央開孔対向部の方より内外側開孔対
向部より粗となっていることにより、中央開孔10G対
向部に形成される電子レンズの水平面内に於けるレンズ
強度は垂直面内のレンズ強度より弱くなる。更に水平面
内では中央の電子レンズの強度は両外側の電子レンズの
強度より弱くなっている。
12B is rougher than the opposing portions on the side 15 side. On the other hand, as is clear from Fig. 4, in the vertical plane, the electron gun axis 1
A group of equipotential lines 19 that are axially symmetrical with respect to 0G are obtained, and although not shown, a group of equipotential lines that are axially symmetrical are also obtained in a vertical cross section that includes both outer electron gun axes 10R210B. Because the equipotential line group 18 in the horizontal plane is rougher in the central aperture opposing part than in the inner and outer aperture opposing parts, the electron lens formed in the central aperture 10G opposing part in the horizontal plane The lens strength becomes weaker than that in the vertical plane. Furthermore, in the horizontal plane, the intensity of the central electron lens is weaker than the intensity of the electron lenses on both outer sides.

従うてこの電極構体1による電子レンズは中央と内外側
電子レンズとで集束条件が一致しなく、水平面と垂直面
内のレンズ強度の相違により蛍光向上の電子ビτムスポ
ットは横長形状となり、垂直方向の解像度が損われる欠
点があった。
Therefore, in the electron lens using the lever electrode structure 1, the focusing conditions do not match between the center and the inner and outer electron lenses, and due to the difference in lens strength in the horizontal plane and the vertical plane, the electron beam spot for fluorescence enhancement becomes horizontally elongated and vertically There was a drawback that directional resolution was impaired.

本発明は上述の欠点を除去するために開孔離心距離以上
の口径で閉基筒状体電物閉塞面に穿設されたインライン
配列重畳型開孔と、前記閉塞面より所定距離後退した第
二の閉塞面に前記口径より小さい独立した開孔が同軸に
穿設された開孔を(+tftえた閉塞筒状体電極に於°
C1開孔配列方向の筒1111部側に垂畳型開孔と連通
する凹状の溝を設置ねシたものである。これにより水平
面内のレンズ強度をほぼ等しくシ、更に中央と内外側電
子レンズの集束条件を一致させ、球面収差の低減されて
解像度が著しく改善された電子レンズを得ることが可能
となる。
In order to eliminate the above-mentioned drawbacks, the present invention provides an in-line array superimposed aperture that has a diameter greater than the eccentric distance of the aperture and is formed in a closed-base cylindrical body electrically closed surface, and a hole that is set back a predetermined distance from the closed surface. An independent aperture smaller than the above-mentioned diameter is coaxially drilled in the second obstructed surface.
A concave groove communicating with the vertical apertures is installed on the cylinder 1111 side in the C1 aperture arrangement direction. This makes it possible to substantially equalize the lens strength in the horizontal plane, match the focusing conditions of the central and inner and outer electron lenses, and obtain an electron lens with reduced spherical aberration and significantly improved resolution.

以下図面に従って本発明の実施例を詳細に説明する。Embodiments of the present invention will be described in detail below with reference to the drawings.

第5図は本発明の一実施例に基づく電極構体2の斜視図
であり、第6図はこの電極構体と同一構造の電極構体2
′を同一軸上201(,200,20B上に対向配置し
、電極構体2に高電圧、電極構体2′に高電圧の所定割
合にある低電圧を印加した場合、三本の電子銃軸2(u
(、,20G、20Bを含む断面内に於る主電子レンズ
電界を示し、その等電位面々この面との交線である等電
位線を線群28で示す。説明の簡略化のため前出と同一
のものには以下の説明では同一符号を付ける。第5図に
示す様に、[#1塞前筒状電極2は離心距離S以上の口
径Dlを持って第1の閉塞面を中央と内外側開孔121
(,12G、12Bが互に重畳形状となるように頚ませ
ることにより第1の閉塞面より所定距離後退した第2の
閉塞面13葡形成し、閉塞面13には’を子銃軸2oI
L、20()、20Bと同軸に前記口径より小さい口径
Dtt持ち独立した開孔13H,,13G、13Bが閉
設されている。然るに開孔12几、 12G 、 12
Bのインライン配列方向の部側部15と内外側開孔12
1’4.12B間には、中央と内外側聞孔間にはさまれ
た連通部21のインライン配列方向と同一幅lで第2の
閉塞面13に達する溝22が形成されている。
FIG. 5 is a perspective view of an electrode structure 2 based on an embodiment of the present invention, and FIG. 6 is a perspective view of an electrode structure 2 having the same structure as this electrode structure.
' are placed facing each other on the same axis 201 (, 200, 20B), and when a high voltage is applied to the electrode assembly 2 and a low voltage at a predetermined ratio of the high voltage is applied to the electrode assembly 2', the three electron gun axes 2 (u
(, , 20G, 20B are shown in the cross section including the main electron lens electric field, and the equipotential lines which are the lines of intersection with this plane are shown as the line group 28. The same reference numerals are given to the same parts in the following explanation.As shown in FIG. and inner and outer openings 121
(, 12G, 12B are arranged in a superimposed shape to form a second closing surface 13 which is recessed by a predetermined distance from the first closing surface.
Coaxially with the holes L, 20(), and 20B, independent openings 13H, 13G, and 13B having a diameter Dtt smaller than the aforementioned diameter are closed. However, the opening hole is 12, 12G, 12
Side part 15 and inner and outer openings 12 in the inline arrangement direction of B
A groove 22 reaching the second closed surface 13 is formed between 1'4 and 12B with the same width l as the inline arrangement direction of the communicating portion 21 sandwiched between the center and the inner and outer apertures.

溝22の存在により第6図に示す様に、水平断面内の中
央と内外側開孔間隙16の対向部距離も、電極筒側部1
5側閉塞面対向部距離も同一の値d2を持ち、それらの
間隙に於ける等電位線群28の密度は等しくなり、中央
及び内外側開孔13G。
Due to the presence of the groove 22, as shown in FIG.
The distance between the facing portions of the 5th closed surface has the same value d2, and the density of the equipotential line group 28 in the gap between them is equal, and the central and inner and outer openings 13G.

13)L、13B対向部の主電子レンズ電界は夫々軸対
称となっている。更に三つの開孔12R,12G。
13) The main electron lens electric fields of the opposing parts L and 13B are each axially symmetrical. Furthermore, three openings 12R and 12G.

12Bが穿設された閉塞面11はインライン配列方向に
ある中央部に連通状の溝が形成されたことになり、イン
ライン配列方向と直角方向で、電極内部側に凹となる曲
面が等制約に形成され、水平断面内の各電子銃軸zoa
 、20(J 、20B上に形成される電子レンズ電界
の曲率は第3図の場合より小さくなり、垂直断面内の各
電子銃軸上に形成される電子レンズ電界の曲率と一致す
るようになる。
A continuous groove is formed in the central part of the closed surface 11 in which 12B is perforated, and the curved surface concave toward the inside of the electrode is equally constrained in the direction perpendicular to the inline arrangement direction. Each electron gun axis zoa in horizontal section is formed
, 20(J, 20B) The curvature of the electron lens electric field formed on 20B is smaller than in the case of Fig. 3, and matches the curvature of the electron lens electric field formed on each electron gun axis in the vertical section. .

本発明の実施例によれは、水平面内に於ける中央及び内
外側開孔対向部に形成される電子レンズのレンズ強度を
互に等しくすると共に、垂直曲内の各電子銃軸上開孔幻
向部に形成される電子レンズの強度を前記水平面の各電
子レンズのレンズ強度と一致させることが可能となる。
According to the embodiment of the present invention, the lens strengths of the electron lenses formed in the central and inner and outer aperture opposing parts in the horizontal plane are made equal to each other, and the lens strengths of the electron lenses formed in the central and inner and outer aperture opposing parts are made equal to each other, and It becomes possible to match the strength of the electron lens formed on the opposite side with the strength of each electron lens on the horizontal plane.

従つ°にの′電極構体を組合せた電子レンズは、中央と
内外側電子レンズとで集束条件を一致させ、更に水平面
内と垂直曲内のレンズ強度な同一にし、水平、垂一方向
の解像度を損うことなり、■を畳型開化による主電子レ
ンズ径の大口径化効果を十分生かせ、球面収差の低減さ
れて解像度が著しく改善されたものとなる。
Accordingly, an electron lens that combines two electrode structures has the same focusing conditions at the center and the inner and outer electron lenses, and also has the same lens strength in the horizontal plane and in the vertical curve, and has high resolution in both the horizontal and vertical directions. However, the effect of increasing the diameter of the main electron lens due to the fold-shaped aperture can be fully utilized, spherical aberration is reduced, and resolution is significantly improved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図はインライン型電子釧−の開孔間離上距
離を変更することなく、主電子レンズ構成電極の口径を
大きくした従来の閉塞筒状体電極の平曲図と側断曲図を
、第3図、第4図は前記一対の電極を互に対向させ、夫
々に所定電圧比にある高電圧と低電圧を印加した場合、
三本の電子銃軸を含む断面、及びこの断面に垂直で中央
電子銃軸を含む゛断面内の主電子レンズ電界を、第5図
は本発明の一実施例を示すインライン型電子銃電極構体
の斜視図を、第6図は前記一対の電極を互に対向させ、
夫々に、所定電圧比にある高電圧と低電圧を印加した場
合、三本の電子銃軸を含む断面内での主電子レンズ電界
を夫々示す。 10R,IOG、IOB、20ft、20G。 zoU・・・・・・電子銃軸、11・・・・・・第1の
閉塞面、121も、12G、12B・・・・・・重畳形
開孔、13R9130,1313・・・・・・独立形開
孔、14・・・・・・突状縁、15・・・・・・部側部
、16・・・・・・間隙、18,19゜28・・・・・
・等電位線群、21・・・・・・連通部、22・・・・
・・溝。 28 第6図 第S区
Figures 1 and 2 show a flat curved view and a side cross-section of a conventional closed cylindrical body electrode in which the diameter of the main electron lens electrode is increased without changing the vertical distance between the apertures of the in-line electronic lens. The curve diagrams in Figures 3 and 4 show the case where the pair of electrodes are opposed to each other and a high voltage and a low voltage at a predetermined voltage ratio are respectively applied.
The main electron lens electric field in a cross section including three electron gun axes and a cross section perpendicular to this cross section and including the central electron gun axis is shown in FIG. FIG. 6 shows a perspective view of the pair of electrodes facing each other,
The main electron lens electric field in a cross section including the three electron gun axes is shown when a high voltage and a low voltage at a predetermined voltage ratio are respectively applied. 10R, IOG, IOB, 20ft, 20G. zoU... Electron gun axis, 11... First closed surface, 121, 12G, 12B... Superimposed opening, 13R9130, 1313... Independent hole, 14... protruding edge, 15... section side, 16... gap, 18, 19° 28...
・Equipotential line group, 21...Communication part, 22...
··groove. 28 Figure 6 Section S

Claims (1)

【特許請求の範囲】[Claims] 閉塞筒状体電極の閉塞面より所定距離後退した第二の閉
塞面に距離以上の口径を持ちインライン配列された重畳
型開孔状凹部を形成し、第二の閉塞面に前記口径より小
さい独立した開孔が夫々同夫々向軸に穿設された開孔を
備えた閉塞筒状体電極に於゛C1開孔配列方向の部側部
側に重畳型開孔と連通ずる凹状溝を設置したことを特徴
とするインライン型電子銃電極構体。
A second closed surface that is set back a predetermined distance from the closed surface of the closed cylindrical electrode is formed with overlapping aperture-like recesses having an aperture larger than the distance and arranged in-line, and independent holes smaller than the aperture are formed on the second closed surface. A concave groove communicating with the superimposed apertures was installed on the side of the C1 aperture arrangement direction in the closed cylindrical electrode, each of which had apertures perforated along the same axis. An in-line electron gun electrode structure characterized by the following.
JP17347083A 1983-09-20 1983-09-20 In-line type electron gun electrode body structure Granted JPS6065434A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17347083A JPS6065434A (en) 1983-09-20 1983-09-20 In-line type electron gun electrode body structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17347083A JPS6065434A (en) 1983-09-20 1983-09-20 In-line type electron gun electrode body structure

Publications (2)

Publication Number Publication Date
JPS6065434A true JPS6065434A (en) 1985-04-15
JPH0360142B2 JPH0360142B2 (en) 1991-09-12

Family

ID=15961074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17347083A Granted JPS6065434A (en) 1983-09-20 1983-09-20 In-line type electron gun electrode body structure

Country Status (1)

Country Link
JP (1) JPS6065434A (en)

Also Published As

Publication number Publication date
JPH0360142B2 (en) 1991-09-12

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