JPS6057539A - Production for magnetic recording medium - Google Patents

Production for magnetic recording medium

Info

Publication number
JPS6057539A
JPS6057539A JP16457883A JP16457883A JPS6057539A JP S6057539 A JPS6057539 A JP S6057539A JP 16457883 A JP16457883 A JP 16457883A JP 16457883 A JP16457883 A JP 16457883A JP S6057539 A JPS6057539 A JP S6057539A
Authority
JP
Japan
Prior art keywords
glow discharge
base material
polymer substrate
rotary drum
magnetic recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16457883A
Other languages
Japanese (ja)
Other versions
JPH0736223B2 (en
Inventor
Yoshihiro Arai
芳博 荒井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP58164578A priority Critical patent/JPH0736223B2/en
Publication of JPS6057539A publication Critical patent/JPS6057539A/en
Publication of JPH0736223B2 publication Critical patent/JPH0736223B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To prevent a high polymer base material on a rotary drum from being wound around the rotary drum, by forming a magnetic thin film layer on the high polymer base material on the rotary drum in the paper deposition method and subjecting the part of the base material, which is peeled from the rotary drum, to a local glow discharge processing. CONSTITUTION:The magnetic thin film layer is vacuum-deposited onto the surface of a high polymer base material 20 in a rotary drum 10, and this base material 20 enters a glow discharge processing part 21. The discharge processing part 21 is arranged near the part of the high polymer base material 20 which is peeled from the rotary drum 10, and gaseous Ar or the like is introduced into the processing part 21 through a gas leading-in hole 24, and the inside of the processing part 21 is set to a pressure suitable for glow discharge by a shielding wall 22. The base material 20 in the part peeled from the drum 10 is exposed to glow discharge due to a glow discharge electrode 23. Though the base material 20 is electrified by an electron beam or the like for vacuum deposition, this electrification is removed by said local glow discharge processing. Consequently, it is not difficult that the base material 20 is peeled from the drum 10.

Description

【発明の詳細な説明】 本発明は、ペーパーデポジション法により高分子基体−
1−に磁気記録層としての磁性薄膜層を形成する磁気記
録媒体の製造方法に関し、特に詳しくは製造装置への高
分子基体の巻込みを防止するようにした磁気記録媒体の
製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides a method for forming a polymer substrate by a paper deposition method.
The present invention relates to a method of manufacturing a magnetic recording medium in which a magnetic thin film layer as a magnetic recording layer is formed in 1-, and more particularly to a method of manufacturing a magnetic recording medium that prevents a polymer substrate from being caught in a manufacturing device.

従来より磁気記録媒体としては、非磁性支持体(高分子
基体)上に、γ−Fe203.COをドープした1−F
’e203. Fe3α、CoiドープしたFe3O4
+ r−Fe203とFe3O4のベルトライド化合物
、 CrO2等の磁性粉末あるいは強磁性合金粉末等の
粉末磁性材料を塩化ビニル−酢酸ビニル共重合体、スチ
レン−ブタジェン共重合体、エポキシ樹脂、ポリウレタ
ン樹脂等の有機バインダー中に分散せしめたもの?塗布
し乾燥させる塗布型のものが広く使用されてきている7
近年高密度記録への要求の高まりと共に真空蒸着、スパ
ッタリング、イオンブレーティング等のペーパーデポジ
ション法あるいは電気メッキ、無電解メッキ等のメッキ
法により形成される強磁性金属薄膜を磁気記録層とする
、バインダー全使用しない、いわゆる非バインダー型磁
気記録媒体が注目されており実用化への努力が種々行な
われている。
Conventionally, as a magnetic recording medium, γ-Fe203. 1-F doped with CO
'e203. Fe3α, Coi-doped Fe3O4
+ Powder magnetic materials such as beltlide compounds of r-Fe203 and Fe3O4, magnetic powders such as CrO2, or ferromagnetic alloy powders are combined with vinyl chloride-vinyl acetate copolymers, styrene-butadiene copolymers, epoxy resins, polyurethane resins, etc. Is it something dispersed in an organic binder? Paint-on type products that are applied and dried have been widely used7
In recent years, with the increasing demand for high-density recording, magnetic recording layers are made of ferromagnetic metal thin films formed by paper deposition methods such as vacuum evaporation, sputtering, and ion blating, or plating methods such as electroplating and electroless plating. So-called binder-free magnetic recording media that do not use any binder are attracting attention, and various efforts are being made to put them into practical use.

従来の塗布型の磁気記録媒体では主として強磁性金属よ
り飽和磁化の小さい金属酸化物全磁性材旧として′使用
しているため、高密度記録に必要な薄形化が信号出力の
低下をもたらすため限界にきており、かつその製造工程
も複雑で、溶剤回収あるいは公害防止のだめの大きな付
帯設備を要するという欠点を有している。非バインダー
型の磁気記録媒体では上記酸化物より大きな飽和磁化を
有する強磁性金属全バインダーの如き非磁性物質全含有
しない状態で薄膜として形成せしめるため、高密度記録
化のために超薄形にできるという利点含有し、しかもそ
の製造工程は簡単である。
Conventional coating-type magnetic recording media mainly use fully magnetic metal oxide materials, which have lower saturation magnetization than ferromagnetic metals, and the thinning required for high-density recording results in a reduction in signal output. It has reached its limit, and its manufacturing process is complicated, and it has the disadvantage of requiring large amounts of incidental equipment for solvent recovery and pollution prevention. Non-binder type magnetic recording media are formed as thin films without containing any non-magnetic substances such as ferromagnetic metal binders, which have a saturation magnetization larger than that of the above-mentioned oxides, so they can be made ultra-thin for high-density recording. Moreover, the manufacturing process is simple.

高密度記録用の磁気記録媒体に要求される条件の一つと
して、高抗磁力化、薄形化が理論的にも実験的にも提唱
されており、塗布型の磁気記録媒体よりも一桁小さい薄
形化が容易で、飽和磁束密度も大きい非バインダー型磁
気記録媒体への期待は太きい。
As one of the requirements for magnetic recording media for high-density recording, high coercive force and thinness have been proposed both theoretically and experimentally. There are great expectations for non-binder type magnetic recording media, which can be easily made small and thin and have a high saturation magnetic flux density.

’I? Kペーパーデポジション法による方法はメッキ
の場合のよう々排液処理全必要とせず製造工程も簡単で
膜の付着速度も大きくできるため非常にメリットが大き
い。
'I? The K-paper deposition method is very advantageous because unlike plating, it does not require any drainage treatment, the manufacturing process is simple, and the film deposition rate can be increased.

しかしながら上記ペーパーデポジション法による磁気記
録媒体の製造方法においては、磁性薄膜層が形成された
高分子基体が製造装置に巻き込まれる事故が発生しやす
くなっていた。すなわちこの種の磁気記録媒体の製造方
法にあっては一般に、回転ドラムに掛けられた高分子基
体金、送出し機構と捲取り機構とを用いて該回転ドラム
に清って移動させ、この回転ドラム上において高分子基
体に磁性薄膜層を形成するようにしているが、例えば蒸
着に使用する電子ビーム等のために高分子基体が帯電し
て回転ドラムから剥離し難くなり、この回転ドラムに巻
き込まれるのである。
However, in the method of manufacturing a magnetic recording medium using the above-mentioned paper deposition method, accidents tend to occur in which the polymer substrate on which the magnetic thin film layer is formed gets caught up in the manufacturing equipment. In other words, in the method of manufacturing this type of magnetic recording medium, generally, a polymer base material hung on a rotating drum is cleanly moved to the rotating drum using a feeding mechanism and a winding mechanism, and this rotation A magnetic thin film layer is formed on the polymer substrate on the drum, but for example, the electron beam used for vapor deposition charges the polymer substrate and makes it difficult to peel off from the rotating drum. It is possible.

本発明は上記のような高分子基体の巻込みが防11:さ
れうる、ペーパーデポジション法による磁気記録媒体の
製造法全提供することを目r1勺とするものである。
It is an object of the present invention to provide an entire method for manufacturing a magnetic recording medium by a paper deposition method, which can prevent the above-described entrainment of a polymer substrate.

本発明の磁気記録媒体の製造方法は、前述したように送
出し機構および捲取り機構により高分子基体を回転ドラ
ムに沿って搬送し、この回転ドラム上の高分子基体にペ
ーパーデポジション法により磁性薄膜層全形成し、さら
に高分子基体の回転ドラムから剥離する部分に局所的な
グロー放電処理を施すこと全特徴とするものである。
As described above, in the method for manufacturing a magnetic recording medium of the present invention, a polymer substrate is conveyed along a rotating drum by a feeding mechanism and a winding mechanism, and a magnetic material is applied to the polymer substrate on this rotating drum by a paper deposition method. The main feature is that the entire thin film layer is formed and then a local glow discharge treatment is applied to the part of the polymer substrate that is to be peeled off from the rotating drum.

以下、図面に示す実施例に基づいて本発明の詳細な説明
する。
Hereinafter, the present invention will be described in detail based on embodiments shown in the drawings.

図は本発明の1実施例による方法を用いて磁気記録媒体
を製造する装置を示すものである。本装置はペーパーデ
ポジション法の一例として真空蒸着により高分子基体に
磁性薄膜層を形成するものであり、蒸着槽1の内部に送
出しローラ2、捲取りローラ3、搬送ローラ4.+5t
6+7.、s、タッチローラ9、回転ドラム10からな
る高分子基体搬送機構含有するとともに、それぞれ搬送
ローラ5,8の近傍に配されたグロー室11.]2、さ
らにルツボ13と電子ビーム照射装置J4とマスク15
を有してなる。なお高分子基体搬送機構は上記のような
ものの他、公知のエキスパンダーゴムローラやダンサ−
ローラ”4 ’j: 411み合わせて形成されてもよ
い。また蒸着槽]には、真空排気系(図示せず)に接続
される排気口16と、酸素導入口】7とが連通され、上
記グロー室1 ]、 、 ]、 2にも真空排気系に接
続される排気口18.19が連通されている。
The figure shows an apparatus for manufacturing magnetic recording media using a method according to one embodiment of the present invention. This apparatus forms a magnetic thin film layer on a polymer substrate by vacuum evaporation as an example of a paper deposition method. +5t
6+7. , s, a polymer substrate transport mechanism consisting of a touch roller 9 and a rotating drum 10, and a glow chamber 11. which is arranged near the transport rollers 5 and 8, respectively. ] 2. Furthermore, crucible 13, electron beam irradiation device J4, and mask 15
It has. In addition to the above-mentioned polymer substrate conveyance mechanism, known expander rubber rollers and dancer
Roller "4 'j: 411 may be formed in combination. Also, the vapor deposition tank is connected to an exhaust port 16 connected to a vacuum exhaust system (not shown) and an oxygen inlet port ]7, The glow chambers 1 ], , ], and 2 are also communicated with exhaust ports 18 and 19 connected to a vacuum exhaust system.

磁気記録媒体の磁性層支持体となる高分子基体20は、
前記送出しローラ2から順に搬送ローラ4,5、タッチ
ローラ9、回転ドラム]、O1搬送ローラ6.7.8に
掛けられて最終的に捲取りローラ3に捲き取られるよう
になっている。上記送出しローラ2がも送り出された高
分子基体20ば、グロー室】Jにおいてグロー放電電極
1 ]、 aによりグロー放電処理されてクリーニング
、活性化がなされた後に回転トラムIOK沿って搬送さ
れるが、この回転ドラム10上において表面に磁性簿膜
層が真空蒸着される。この磁性薄膜層の真空蒸着は、排
気口16から排気して蒸着槽1内ケ真空化した状態下で
、電子ビーム照射装置1/Iから発生させた電子ビーム
によりルツボ13を加熱させ、該ルツボ13内に貯えた
磁性金属材料M2蒸発させて行なう。
The polymer substrate 20 serving as the magnetic layer support of the magnetic recording medium is
Starting from the sending roller 2, the sheet is applied to the conveying rollers 4, 5, the touch roller 9, the rotary drum], the O1 conveying roller 6, 7, and 8, and is finally wound up by the winding roller 3. The polymer substrate 20 from which the above-mentioned delivery roller 2 has also been delivered is subjected to glow discharge treatment by the glow discharge electrode 1] in the glow chamber J and cleaned and activated, and then transported along the rotating tram IOK. However, a magnetic film layer is vacuum-deposited on the surface of the rotating drum 10. The vacuum evaporation of this magnetic thin film layer is carried out by heating the crucible 13 with an electron beam generated from the electron beam irradiation device 1/I under a state in which the inside of the evaporation tank 1 is evacuated by exhausting the air through the exhaust port 16. This is done by evaporating the magnetic metal material M2 stored in 13.

上記のようにして磁性薄膜層が蒸着された高分子基体2
0は、そのまま回転ドラム1゜に活って移動し、搬送ロ
ーラ6.7.8i経て捲取りローラ3に捲き取られるが
、捲き取られる前にグロー室12においてグロー放電電
極1.2 aによりグロー放電処理される。このグロー
放電処理により、高分子基体2oが除電され、捲取りロ
ーラ3において該高分子基体20に捲きンワやブロッキ
ングが生じることが防止される。
Polymer substrate 2 on which a magnetic thin film layer is deposited as described above
0 moves as it is on the rotating drum 1° and is wound up by the winding roller 3 via the conveying roller 6.7.8i, but before being wound up, it is moved by the glow discharge electrode 1.2a in the glow chamber 12. Glow discharge treated. This glow discharge treatment eliminates static electricity from the polymer substrate 2o, and prevents the polymer substrate 20 from being rolled up or blocked by the winding roller 3.

以上説明の構成は、従来からの真空蒸着による磁気記録
媒体製造装置において一般に採用されているものである
が、本装置においては本発明の特徴部分である局所的な
グロー放電処理を行なうためのグロー放電処理部21が
設けられている。このグロー放電処理部21は、遮蔽壁
22内にグロー放電電極23を配すとともにガス導入口
24全開口きせてなるものであり、高分子基体20が回
転トラム10から剥ガ[する部分の近傍に配置されてい
る。
The configuration described above is generally employed in conventional vacuum evaporation-based magnetic recording medium manufacturing equipment, but this equipment uses glow for localized glow discharge processing, which is a feature of the present invention. A discharge processing section 21 is provided. This glow discharge treatment section 21 has a glow discharge electrode 23 disposed inside a shielding wall 22 and a gas inlet 24 that is fully opened. It is located in

グロー放電処理部21内には上記ガス導入口24を介し
て例えばAr等のガスが導入され、またグロー放電処理
部21内は上記遮蔽壁22により、JL空蒸着に適した
蒸着槽1内の圧力と差を有しグロー放電に適した圧力に
設定されるっ 上記構成のグロー放電処理部21内において、回転ドラ
ム]、Oから剥離する部分の高分子基体20(既述のよ
うに磁性薄膜層が形成されている)は、グロー放電電極
23によるグロー放電下に曝される。高分子基体20は
前述した真空蒸着において使用された電子ビームや、回
転ドラム10からの剥離時の静電気作用等により帯電し
ているが、上記のような局所的グロー放電処理を施すこ
とにより該高分子基体20上にイオンが吸着され、帯電
が中和され除電される。したがってこの高分子基体20
は、回転ドラム】0に電気的に吸引されて剥離し難くな
ることがなく、該回転ドラム10に巻き込まれなくなる
。また上記のように高分子基体20が除電されると、該
高分子基体20を搬送する搬送機構の制御装置の電気系
統に対してもノイズ等による影響がなくなり、基体搬送
が安定化される。
A gas such as Ar is introduced into the glow discharge processing section 21 through the gas inlet 24, and the inside of the glow discharge processing section 21 is protected by the shielding wall 22 so that the inside of the vapor deposition tank 1 suitable for JL empty evaporation is heated. In the glow discharge treatment section 21 having the above-described structure, the pressure is set at a pressure different from that of the rotary drum, and the pressure is set at a pressure suitable for glow discharge. layer) is exposed to a glow discharge by a glow discharge electrode 23. Although the polymer substrate 20 is charged by the electron beam used in the vacuum evaporation described above or by the electrostatic effect during peeling from the rotating drum 10, the high polymer substrate 20 can be charged by applying the local glow discharge treatment as described above. Ions are adsorbed onto the molecular substrate 20, and the charge is neutralized and removed. Therefore, this polymer base 20
is not electrically attracted to the rotating drum 10 and becomes difficult to peel off, and is no longer caught in the rotating drum 10. Furthermore, when the polymer substrate 20 is neutralized as described above, the electrical system of the control device of the transport mechanism that transports the polymer substrate 20 is not affected by noise, etc., and the substrate transport is stabilized.

上記グロー放電の発生機構は、交流グロー放電機構、直
流グロー放電機構、高周波グロー放電機構等が任意に選
択使用されうる。また上記局所的なグロー放電処理によ
り高分子基体20が十分に除電されれば、前述1〜だ捲
取すロー23前のグロー室12を省いてもよい。さらに
上記局所的なグロー放電処理は、磁性薄膜層が形成され
た面と反対側の基体表面のみに施されてもよいし、1だ
基体20の両表面に施されてもよい。
As the mechanism for generating the glow discharge, an AC glow discharge mechanism, a DC glow discharge mechanism, a high frequency glow discharge mechanism, etc. can be arbitrarily selected and used. Further, if the polymer substrate 20 is sufficiently neutralized by the above-described local glow discharge treatment, the glow chamber 12 before the row 23 to be wound up may be omitted. Further, the local glow discharge treatment may be applied only to the surface of the substrate opposite to the surface on which the magnetic thin film layer is formed, or may be applied to both surfaces of the substrate 20.

なお真空蒸着に用いられる磁性金属拐料Mとしては、P
c 、 Co 、 Ni等の金属、あるいはF’e−C
o、 Fe−Ni+ Co−Ni 、 Fe−Co−N
i、 Fe−Rh、 Fe−Cu。
In addition, as the magnetic metal particle M used for vacuum evaporation, P
Metals such as C, Co, Ni, or F'e-C
o, Fe-Ni+ Co-Ni, Fe-Co-N
i, Fe-Rh, Fe-Cu.

Co−Cu、 Cn−Au、Co−Y、 Co−La、
Co−Pr、 Co−()d。
Co-Cu, Cn-Au, Co-Y, Co-La,
Co-Pr, Co-()d.

Co−8m、 Co−Pl、、 Ni−Cu、 Mn−
B1. Mn−8b、 M’n−Ag。
Co-8m, Co-Pl, Ni-Cu, Mn-
B1. Mn-8b, M'n-Ag.

Fe−Cr、 Cn−Cr、 Ni−Cr、 Fe−C
o−Cr、 Ni −Co−Cr。
Fe-Cr, Cn-Cr, Ni-Cr, Fe-C
o-Cr, Ni-Co-Cr.

Fe −Co−Ni−Cr等を主成分とする強磁性合金
が使用されうる。!1ヲに好寸しいのばCOあるいはC
o f 7.5重量多含有するような合金である。更に
添加物として、W+ Mo + T a ; Mg +
 S + + A1等全少量含んでもよい。またC 、
B、O,N、P等の非金属成分全少量含んでもよい。
A ferromagnetic alloy mainly composed of Fe-Co-Ni-Cr or the like may be used. ! CO or C is suitable for 1.
It is an alloy that contains a large amount of o f 7.5 by weight. Furthermore, as additives, W + Mo + Ta; Mg +
It may also contain a small amount of S + + A1, etc. Also C,
It may also contain a small amount of nonmetallic components such as B, O, N, and P.

又、本発明に用いられる高分子基体としてはポリエチレ
ンテレフタレート、ポリイミド、ポリアミド、ポリ塩化
ビニル、三酢酸セルロース、ポリカーボネート、ポリエ
チレンナフクレ−1・のようなプラスチックベースが好
ましい。特に本発明においては表面粗さくRa)が0.
0 ] 2μm以下であるような上記可撓性プラスチッ
クベースが好ましい。
Further, as the polymer substrate used in the present invention, plastic bases such as polyethylene terephthalate, polyimide, polyamide, polyvinyl chloride, cellulose triacetate, polycarbonate, and polyethylene naphthalene-1 are preferable. In particular, in the present invention, the surface roughness (Ra) is 0.
0 ] The above flexible plastic base having a thickness of 2 μm or less is preferable.

次に具体的数値例全挙げて、本発明方法と従来方法の作
用効果の差異について説明する。
Next, the differences in operation and effect between the method of the present invention and the conventional method will be explained by citing all specific numerical examples.

高分子基体20として平均表面粗さくR,a)0.02
μn]の23μm厚PET(ポリエチンンテレフタレー
ト)ベースを用い、図示の装置のグロー室11および1
.2 f 3 X ]、 O−” Torrの真空度に
保ぢ、グロー放電電極11a、12aに1kVの直流電
圧を印加してグロー放電処理を行なうとともに、回転ド
ラムlo上で磁性金属材料]Mが40°の入射角で斜方
蒸着されるようにマスク15全設定した。磁性金属材料
MとしてCO・gNi・2を用い、酸素導入口17がら
酸素ガスを導入して酸素分圧I X 10 ”T”or
rで高分子基体20に真空蒸着した。グロー放電処理部
2]においては、ガス導入口24からA、rガスk 3
00 cc / min導入し、グロー放電電極23に
一]1(Vの直流電圧全印加して、回転ドラム]0から
の剥離部の高分子基体20に局所的なグロー放電処理を
施す。高分子基体20の搬送速度は30 m/ min
で捲取り張力ば1.、5 kg以下としたが、高分子基
体20は回転ドラノ・10に巻き適寸れることなく、安
定して搬送された。
Average surface roughness R, a) of the polymer base 20 is 0.02
The glow chambers 11 and 1 of the illustrated device were made using a 23 μm thick PET (polyethine terephthalate) base of
.. 2 f 3 All masks 15 were set so that oblique evaporation was performed at an incident angle of 40°. CO.gNi.2 was used as the magnetic metal material M, and oxygen gas was introduced through the oxygen inlet 17 to increase the oxygen partial pressure I x 10''. T”or
Vacuum deposition was performed on the polymer substrate 20 at r. In the glow discharge treatment section 2], A, r gas k 3 is supplied from the gas inlet 24.
00 cc/min is applied to the glow discharge electrode 23, and a direct current voltage of 1]1 (V) is applied to the glow discharge electrode 23, and a local glow discharge treatment is performed on the polymer substrate 20 at the peeled part from the rotating drum 0.Polymer The conveyance speed of the base 20 is 30 m/min
If the winding tension is 1. , 5 kg or less, the polymer substrate 20 was wound around the rotating drone 10 and was stably transported without falling.

次に高分子基体20および蒸着させる磁性金属材料Mと
して上記例のものと同じもの全使用し、グロー室1 ]
 、 1.2におけるグロー放電処理、真空蒸着の各条
件、高分子基体20の搬送速度全上記例と同じに設定し
た上で、グロー放電処理部21による局所的なグロー放
電処理は行なわないで真空蒸着を行なった。
Next, as the polymer substrate 20 and the magnetic metal material M to be vapor-deposited, all the same materials as those in the above example were used, and the glow chamber 1 was opened.
The conditions for the glow discharge treatment and vacuum deposition in 1.2 and the conveyance speed of the polymer substrate 20 were all set the same as in the above example, and the glow discharge treatment section 21 did not perform the local glow discharge treatment, but the vacuum deposition was performed. Vapor deposition was performed.

その結果、高分子基体20の捲取り張力を4kgtで上
げたが、該基体20が回転ドラム10に巻き込まれて基
体20の搬送が不可能となったユ 以上、J′ム空蒸着により高分子基体2o上に磁性性9
膜層を形成する方法に本発明が適用された例について)
71りべたが、本発明はその他、回転ドラムに沿って高
分子基体を搬送し該回転トラム上においてペーパーデポ
ジション法により高分子ノ1す体に磁性薄膜層を形成す
る磁気記録媒体製造法すべてに適用され、同様の効呆ケ
奏するものである。
As a result, although the winding tension of the polymer substrate 20 was increased to 4 kgt, the substrate 20 was caught up in the rotating drum 10 and it became impossible to convey the substrate 20. Magnetic 9 on the substrate 2o
Regarding an example in which the present invention is applied to a method of forming a film layer)
71, but the present invention also covers all magnetic recording media manufacturing methods in which a polymer substrate is conveyed along a rotating drum and a magnetic thin film layer is formed on the polymer substrate by a paper deposition method on the rotating tram. It has similar effects.

以−ヒ詳細に説明した通シ本発明の磁気記録媒体の製造
方法は、高分子基体が回転ドラムに巻き適寸れること全
確実に防止でき、磁気記録媒体の生産性を大いに高める
ものと々る。
The method of manufacturing a magnetic recording medium of the present invention, which has been explained in detail below, can reliably prevent the polymer substrate from being wound to the appropriate size on a rotating drum, and can greatly increase the productivity of magnetic recording media. Ru.

【図面の簡単な説明】[Brief explanation of drawings]

図は本発明方法を実施する装置の一例を示す概略図であ
る。 2・・・・・・・・送出しローラ 3・−・捲取りロー
ラ4.5,6,7,8・・・搬送ローラ 10・・・・・・回転ドラム 13・・・・ル ッ ポ
14・・・電子ビーム照射装置 20・・・・・高分子
基体21−・・グロー放電処理部 M・・・・・・・・
・磁性金属材料(自 発)手Utネ市正書 特許庁長官 殿 1、事イ′1の表示 特願昭58−164578号 2、発明の名称 磁気記録媒体の製造方法 3.7山正をする者 事イ!1との関係 特許出願人 任 所 神奈川県南足柄市中沼210番地名 称 富士
写真フィルム株式会社 4、代理人 東京都港区六木木5丁目2番1号 8、補正の内容 1)明細書第4頁第12〜13行 [製造装置に巻き込まれる」を「搬送できなくなる重大
な」に訂正する。 2)同第5頁第2行 「のである」を「事故がみられる」に訂正する。 3)図面を添(qのJ:うに補正する。
The figure is a schematic diagram showing an example of an apparatus for carrying out the method of the present invention. 2...Feeding roller 3... Winding up roller 4.5, 6, 7, 8... Conveyance roller 10...Rotating drum 13...Lupo 14...Electron beam irradiation device 20...Polymer base 21-...Glow discharge treatment section M......
・Magnetic Metal Materials (Voluntary) Mr. Utne City, Masashi, Commissioner of the Patent Office, 1, Indication of Matter A'1, Patent Application No. 1983-164578, 2, Name of the Invention, Method of Manufacturing Magnetic Recording Media, 3.7 Yamamasa. Things to do! Relationship with 1 Patent applicant Address 210 Nakanuma, Minamiashigara City, Kanagawa Prefecture Name Fuji Photo Film Co., Ltd. 4 Agent 5-2-1-8 Rokigi, Minato-ku, Tokyo Contents of amendment 1) Specification No. Page 4, lines 12-13, ``Caught up in manufacturing equipment'' is corrected to ``Significant, resulting in failure to transport.'' 2) On page 5, line 2, ``no deru'' is corrected to ``an accident has been seen.'' 3) Attach the drawing (j of q: Correct it to sea urchin.

Claims (1)

【特許請求の範囲】[Claims] 送出し機構および捲取り機構によシ高分子基体を回転ド
ラムに沿って搬送し、この回転トラム上の高分子基体に
ペーパーデポジション法により磁性薄膜層全形成し、高
分子基体の回転ドラムから剥離する部分に局所的なグロ
ー放電処理を施すことを特徴とする磁気記録媒体の製造
方法。
The polymer substrate is conveyed along a rotating drum by a feeding mechanism and a winding mechanism, a magnetic thin film layer is entirely formed on the polymer substrate on this rotating tram by a paper deposition method, and the polymer substrate is transported from the rotating drum to the polymer substrate on this rotating tram. A method of manufacturing a magnetic recording medium, comprising applying local glow discharge treatment to a portion to be peeled off.
JP58164578A 1983-09-07 1983-09-07 Method of manufacturing magnetic recording medium Expired - Lifetime JPH0736223B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58164578A JPH0736223B2 (en) 1983-09-07 1983-09-07 Method of manufacturing magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58164578A JPH0736223B2 (en) 1983-09-07 1983-09-07 Method of manufacturing magnetic recording medium

Publications (2)

Publication Number Publication Date
JPS6057539A true JPS6057539A (en) 1985-04-03
JPH0736223B2 JPH0736223B2 (en) 1995-04-19

Family

ID=15795827

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58164578A Expired - Lifetime JPH0736223B2 (en) 1983-09-07 1983-09-07 Method of manufacturing magnetic recording medium

Country Status (1)

Country Link
JP (1) JPH0736223B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61278031A (en) * 1985-05-31 1986-12-08 Hitachi Maxell Ltd Method and device for manufacturing magnetic recording medium
JPS6220137A (en) * 1985-07-18 1987-01-28 Matsushita Electric Ind Co Ltd Production of magnetic recording medium
JP2009228015A (en) * 2008-03-19 2009-10-08 Toppan Printing Co Ltd Method and apparatus for manufacturing laminate and gas barrier-film

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS581432A (en) * 1981-06-25 1983-01-06 東京光学機械株式会社 Apparatus for detecting eye inspecting position of ophthalmic device
JPS5817543A (en) * 1981-07-22 1983-02-01 Sony Corp Manufacture of magnetic recording medium

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS581432A (en) * 1981-06-25 1983-01-06 東京光学機械株式会社 Apparatus for detecting eye inspecting position of ophthalmic device
JPS5817543A (en) * 1981-07-22 1983-02-01 Sony Corp Manufacture of magnetic recording medium

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61278031A (en) * 1985-05-31 1986-12-08 Hitachi Maxell Ltd Method and device for manufacturing magnetic recording medium
JPS6220137A (en) * 1985-07-18 1987-01-28 Matsushita Electric Ind Co Ltd Production of magnetic recording medium
JP2009228015A (en) * 2008-03-19 2009-10-08 Toppan Printing Co Ltd Method and apparatus for manufacturing laminate and gas barrier-film

Also Published As

Publication number Publication date
JPH0736223B2 (en) 1995-04-19

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