JPH08102068A - Formation of metal film and equipment therefor - Google Patents

Formation of metal film and equipment therefor

Info

Publication number
JPH08102068A
JPH08102068A JP23502394A JP23502394A JPH08102068A JP H08102068 A JPH08102068 A JP H08102068A JP 23502394 A JP23502394 A JP 23502394A JP 23502394 A JP23502394 A JP 23502394A JP H08102068 A JPH08102068 A JP H08102068A
Authority
JP
Japan
Prior art keywords
support
metal
film
substrate
metal film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23502394A
Other languages
Japanese (ja)
Inventor
Hirohide Mizunoya
博英 水野谷
Noriyuki Kitaori
典之 北折
Osamu Yoshida
修 吉田
Shigemi Wakabayashi
繁美 若林
Akira Shiga
章 志賀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kao Corp
Original Assignee
Kao Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kao Corp filed Critical Kao Corp
Priority to JP23502394A priority Critical patent/JPH08102068A/en
Publication of JPH08102068A publication Critical patent/JPH08102068A/en
Pending legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE: To improve the adhesion strength of a metal film by irradiating a substrate with ultraviolet rays and thereafter forming a metal film on the substrate in a vacuum atmosphere. CONSTITUTION: In this equipment, a substrate 1 consisting of a PET film is allowed to travel inside a vacuum vessel 8 evacuated to 10<-4> to 10<-6> Torr at an e.g. 5m/min traveling speed by using a traveling device 2 composed of a supply roll 2a, a can roll 3 and a wind-up roll 2b. A magnetic metal 6 consisting of Co, etc., in a crucible 5 is irradiated with the electron beam that is emitted from an electron gun 7 and has 16kW power to melt and evaporate the metal 6. Ultraviolet lamps 10 each having 300W output and has 50 to 350nm wavelengths are disposed along the traveling path of the substrate 1 on the upstream side of the can roll 3. The surface molecules of the irradiated substrate 1 with the ultraviolet rays are excited, or radicals are formed from them to improve the bonding strength between the surface of the substrate 1 and the evaporated particles of the magnetic metal 6. The angle of incidence of each of the evaporated particles of the magnetic metal 6 incident on the surface of the substrate 1 is controlled by using a shield plate 4 to form the objective magnetic metal thin film having an e.g. 1,600Åthickness.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、例えば金属薄膜型の磁
気記録媒体の製造方法及びその装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for manufacturing a metal thin film type magnetic recording medium.

【0002】[0002]

【発明の背景】磁気テープ等の磁気記録媒体において
は、高密度記録化の要請から、非磁性支持体上に設けら
れる磁性層として、バインダ樹脂を用いた塗布型のもの
ではなく、バインダ樹脂を用いない金属薄膜型のものが
提案されている。すなわち、真空蒸着、スパッタリング
あるいはイオンプレーティング等の乾式メッキ手段によ
り磁性層を構成した磁気記録媒体が提案されている。そ
して、この種の磁気記録媒体は磁性体の充填密度が高い
ことから、高密度記録に適したものである。
BACKGROUND OF THE INVENTION In a magnetic recording medium such as a magnetic tape, due to a demand for high density recording, a binder resin is not used as a magnetic layer provided on a non-magnetic support, instead of a coating type using a binder resin. A metal thin film type that is not used has been proposed. That is, there has been proposed a magnetic recording medium having a magnetic layer formed by a dry plating means such as vacuum deposition, sputtering or ion plating. Since the magnetic recording medium of this type has a high packing density of magnetic material, it is suitable for high-density recording.

【0003】このような乾式メッキ手段による磁気記録
媒体の製造装置は、図2のように構成されているものが
一般的である。尚、図2中、31は冷却キャンロール、
32aはポリエチレンテレフタレート(PET)フィル
ム33の供給側ロール、32bはPETフィルム33の
巻取側ロール、34は遮蔽板、35はルツボ、36は磁
性金属、37は真空槽である。そして、真空槽37内を
所定の真空度のものに排気した後、電子銃38を作動さ
せてルツボ35内の磁性金属36を飛散(蒸発)させ、
PETフィルム33に対して磁性金属36の蒸発粒子を
堆積(蒸着)させることによって磁気記録媒体が製造さ
れている。
An apparatus for manufacturing a magnetic recording medium by such dry plating means is generally constructed as shown in FIG. In FIG. 2, 31 is a cooling can roll,
32a is a supply side roll of the polyethylene terephthalate (PET) film 33, 32b is a winding side roll of the PET film 33, 34 is a shielding plate, 35 is a crucible, 36 is a magnetic metal, and 37 is a vacuum chamber. Then, after evacuating the vacuum chamber 37 to have a predetermined vacuum degree, the electron gun 38 is operated to scatter (evaporate) the magnetic metal 36 in the crucible 35,
A magnetic recording medium is manufactured by depositing (evaporating) evaporated particles of the magnetic metal 36 on the PET film 33.

【0004】ところで、このようにして得られる金属薄
膜型の磁気記録媒体におけるPETフィルム33と磁性
金属36の蒸着粒子による膜(磁性膜)との間の結合力
は蒸着時の付着力のみであり、この力が小さいと磁性膜
が簡単に剥離してしまう。そこで、この結合力を高める
為に、蒸着に先立ってPETフィルム33をイオンボン
バード処理することが行われている。すなわち、イオン
ボンバード処理により、PETフィルム33の表面をク
リーンにすると共に、表面粗さを大きくし、蒸着粒子を
PETフィルム33に食い込ませるような形とすること
により、物理的結合力を高めていたのである。
By the way, the bonding force between the PET film 33 and the film (magnetic film) formed by the vapor deposition particles of the magnetic metal 36 in the metal thin film type magnetic recording medium thus obtained is only the adhesive force during vapor deposition. However, if this force is small, the magnetic film easily peels off. Therefore, in order to increase the bonding force, the PET film 33 is subjected to ion bombardment treatment prior to vapor deposition. That is, the physical bond strength was increased by cleaning the surface of the PET film 33 by ion bombardment, increasing the surface roughness, and making the vapor deposition particles bite into the PET film 33. Of.

【0005】しかしながら、このイオンボンバード処理
を真空槽37の外で行ったならば、イオンボンバード処
理されたPETフィルム33を真空槽37内に導くのに
一度大気に触れてしまう。この為、表面に埃や塵が付着
すると、結合力が低下する問題がある。そこで、イオン
ボンバード処理室と真空槽37とを連絡通路で繋いだ
り、イオンボンバード処理室を真空槽37内に設け、イ
オンボンバード処理されたPETフィルム33を大気中
に晒さなくても良いようにすることが考えられるもの
の、イオンボンバード処理に際して用いられるガスが真
空槽37内に漏れることは避けられず、この為蒸着特性
が低下し、必ずしも良い結果を奏していない。
However, if this ion bombardment process is performed outside the vacuum chamber 37, the PET film 33 subjected to the ion bombardment process will be exposed to the atmosphere once in order to be introduced into the vacuum chamber 37. Therefore, if dust or dirt adheres to the surface, there is a problem that the binding force is reduced. Therefore, it is not necessary to connect the ion bombardment processing chamber and the vacuum tank 37 with a communication passage or to provide the ion bombardment processing chamber in the vacuum tank 37 so that the ion bombarded PET film 33 is not exposed to the atmosphere. However, it is unavoidable that the gas used in the ion bombardment process leaks into the vacuum chamber 37, which deteriorates the vapor deposition characteristics and does not always give good results.

【0006】[0006]

【発明の開示】本発明は、前記の問題点についての検討
を押し進めて行くうちに、支持体はPETフィルムのよ
うなプラスチックで出来ていることに着目し、高エネル
ギー(電子線や紫外線など)を照射すれば、プラスチッ
ク製フィルム表面の分子が励起され、あるいはラディカ
ルが生成し、ここに蒸発粒子が飛来して来れば、蒸着粒
子の結合力は高くなるであろうと考えた。又、電子線や
紫外線の照射は、酸素ガスなどを真空蒸着槽内に持ち込
むことがないから、蒸着特性を低下せしめることがな
く、よって高性能な磁性膜が得られるであろうと考えら
れた。
DISCLOSURE OF THE INVENTION The present invention has focused on the fact that the support is made of a plastic such as PET film while advancing the examination of the above-mentioned problems, and has high energy (electron beam, ultraviolet ray, etc.). It was thought that, when irradiated with, the molecules on the surface of the plastic film were excited or radicals were generated, and if vaporized particles came flying there, the binding force of the vapor deposition particles would be increased. Further, it is considered that the irradiation of electron beam or ultraviolet ray does not bring oxygen gas or the like into the vacuum vapor deposition tank, so that the vapor deposition characteristics are not deteriorated and a high-performance magnetic film can be obtained.

【0007】そこで、早速、図2のような蒸着装置にお
いてPETフィルム33に電子線を照射した処、この場
合にはPETフィルム33の走行性が低下し、磁性膜が
綺麗に成膜されなかった。ところが、紫外線を照射した
場合には、PETフィルムの走行性に問題はなく、磁性
膜が綺麗に成膜され、かつ、PETフィルムは紫外線照
射を受けて表面が活性化しており、この活性状態のPE
Tフィルムに蒸着した磁性粒子の付着強度は高く、磁性
膜の剥離強度は大きなものであった。
Therefore, when the PET film 33 was immediately irradiated with an electron beam in the vapor deposition apparatus as shown in FIG. 2, the traveling property of the PET film 33 was deteriorated and the magnetic film was not formed neatly. . However, when it is irradiated with ultraviolet rays, there is no problem in the running property of the PET film, the magnetic film is formed neatly, and the surface of the PET film is activated by the irradiation of ultraviolet rays. PE
The adhesion strength of the magnetic particles deposited on the T film was high, and the peel strength of the magnetic film was high.

【0008】このような知見を基にして本発明が達成さ
れたものであり、本発明の目的は、金属膜の密着強度が
高く、かつ、金属膜が綺麗に成膜され、しかも簡単に実
施できる技術を提供することである。この本発明の目的
は、樹脂製の支持体上に金属膜を成膜する方法であっ
て、前記支持体に紫外線を照射する紫外線照射工程と、
この紫外線照射工程により紫外線照射を受けた支持体上
に金属粒子を堆積させる金属膜成膜工程とを具備するこ
とを特徴とする金属膜の成膜方法によって達成される。
The present invention has been achieved on the basis of such knowledge, and an object of the present invention is to achieve a high adhesion strength of a metal film, to form a fine metal film, and to easily carry out the same. It is to provide the technology that can. An object of the present invention is a method for forming a metal film on a resin support, which comprises an ultraviolet irradiation step of irradiating the support with ultraviolet rays,
And a metal film forming step of depositing metal particles on the support which has been subjected to the ultraviolet irradiation by the ultraviolet irradiation step.

【0009】又、樹脂製の支持体上に金属膜を成膜する
方法であって、前記支持体に紫外線を照射する紫外線照
射工程と、この紫外線照射工程により紫外線照射を受け
た支持体上に金属粒子を堆積させる金属膜成膜工程とを
具備し、前記紫外線照射工程は真空雰囲気下で行われ、
この真空雰囲気下において金属膜成膜工程も行われるこ
とを特徴とする金属膜の成膜方法によって達成される。
A method of forming a metal film on a resin support, which comprises an ultraviolet irradiation step of irradiating the support with ultraviolet rays, and a support irradiated with ultraviolet rays by the ultraviolet irradiation step. A metal film forming step of depositing metal particles, wherein the ultraviolet irradiation step is performed in a vacuum atmosphere,
This is achieved by the method for forming a metal film, which is characterized in that the metal film forming step is also performed in this vacuum atmosphere.

【0010】又、樹脂製の支持体上に金属膜を成膜する
装置であって、前記支持体に紫外線を照射する紫外線照
射手段と、この紫外線照射手段により紫外線照射を受け
た支持体上に金属粒子を堆積させる金属膜成膜手段とを
具備することを特徴とする金属膜の成膜装置によって達
成される。又、走行する支持体上に金属膜を成膜する装
置であって、真空槽と、成膜源となる金属材料と、この
金属材料を飛散させる飛散手段と、この飛散手段で飛散
した金属粒子が堆積する樹脂製の支持体と、この支持体
の供給手段と、支持体の巻取手段と、前記飛散した金属
粒子が堆積する支持体の走行をガイドする冷却キャンロ
ールと、この冷却キャンロールと前記供給手段との間で
あって、冷却キャンロールに添接されない側の支持体面
を紫外線照射する紫外線照射手段とを具備してなること
を特徴とする金属膜の成膜装置によって達成される。
Further, there is provided an apparatus for depositing a metal film on a resin support, which comprises ultraviolet irradiation means for irradiating the support with ultraviolet rays, and a support irradiated with ultraviolet rays by the ultraviolet irradiation means. And a metal film forming means for depositing metal particles. Further, a device for forming a metal film on a running support, comprising a vacuum chamber, a metal material as a film forming source, a scattering means for scattering the metal material, and metal particles scattered by the scattering means. A support made of resin on which is deposited, a supply means for the support, a winding means for the support, a cooling can roll for guiding the traveling of the support on which the scattered metal particles are deposited, and this cooling can roll. And the supply means, and an ultraviolet irradiation means for irradiating the surface of the support on the side not contacted with the cooling can roll with ultraviolet rays. .

【0011】本発明が磁気記録媒体に適用される場合に
は、支持体(好ましくは非磁性の支持体)としては、例
えばポリエチレンテレフタレート等のポリエステル、ポ
リアミド、ポリイミド、ポリスルフォン、ポリカーボネ
ート、ポリプロピレン等のオレフィン系の樹脂、セルロ
ース系の樹脂、塩化ビニル系の樹脂などの高分子材料が
用いられる。尚、支持体面上には、必要に応じて密着性
を向上させる為のアンダーコート層が設けられている。
すなわち、表面の粗さを適度に粗すことにより、例えば
斜め蒸着法により構成される薄膜の密着性を向上させ、
さらに磁気記録媒体表面の表面粗さを適度なものとして
走行性を改善する為、例えばSiO2 等の粒子を含有さ
せた厚さが0.005〜0.1μmのバインダ樹脂塗膜
を設けることによってアンダーコート層が構成されてい
る。
When the present invention is applied to a magnetic recording medium, examples of the support (preferably non-magnetic support) include polyester such as polyethylene terephthalate, polyamide, polyimide, polysulfone, polycarbonate and polypropylene. Polymer materials such as olefin resins, cellulose resins, and vinyl chloride resins are used. An undercoat layer for improving the adhesion is provided on the surface of the support, if necessary.
That is, by appropriately roughening the surface roughness, for example, to improve the adhesion of a thin film formed by the oblique vapor deposition method,
Further, in order to improve the runnability by making the surface roughness of the magnetic recording medium moderate, for example, by providing a binder resin coating film containing particles such as SiO 2 and having a thickness of 0.005 to 0.1 μm. An undercoat layer is formed.

【0012】上記のような支持体の一面(表面)に金属
磁性膜が設けられる。尚、当然のことではあるが、本発
明においては金属磁性膜が設けられる前に紫外線照射が
なされる。金属磁性膜の材料としては、例えばFe,C
o,Ni等の金属の他に、Co−Ni合金、Co−Pt
合金、Co−Ni−Pt合金、Fe−Co合金、Fe−
Ni合金、Fe−Co−Ni合金、Fe−Co−B合
金、Co−Ni−Fe−B合金、Co−Cr合金、ある
いはこれらにAl等の金属を含有させたもの等が用いら
れる。尚、金属磁性膜の厚さは、例えば1000〜20
00Å程度であることが好ましい。
A metal magnetic film is provided on one surface (surface) of the support as described above. In addition, as a matter of course, in the present invention, the ultraviolet irradiation is performed before the metal magnetic film is provided. Examples of the material of the metal magnetic film include Fe and C
In addition to metals such as o and Ni, Co-Ni alloys, Co-Pt
Alloy, Co-Ni-Pt alloy, Fe-Co alloy, Fe-
A Ni alloy, an Fe-Co-Ni alloy, an Fe-Co-B alloy, a Co-Ni-Fe-B alloy, a Co-Cr alloy, or those containing a metal such as Al is used. The thickness of the metal magnetic film is, for example, 1000 to 20.
It is preferably about 00Å.

【0013】支持体の反対側の面(裏面)にバックコー
ト膜が設けられる。バックコート膜が金属膜で構成され
る場合には、金属膜(バックコート膜)が設けられる前
に紫外線照射がなされる。バックコート膜の材料として
は、例えばCu−Al−X(但し、XはMn,Fe,N
iの群の中から選ばれる一つ、若しくは二つ以上)系合
金やAl−Si系合金を用いることが出来る。尚、Cu
−Al−X系合金を用いる場合には、Al含有量は5〜
30at%であり、X含有量が5at%以下であること
が好ましい。特に、好ましくはCu含有量は70〜90
at%、Al含有量は8〜25at%、Mn含有量が
0.5〜4at%で、Fe含有量が0.4〜5at%
で、Ni含有量が0.4〜4at%であり、Mn,F
e,Niの総含有量が1〜6at%であることが好まし
い。Al−Si系合金を用いる場合には、Al含有量は
15〜70at%、Si含有量は15〜70at%であ
ることが好ましい。
A back coat film is provided on the opposite surface (back surface) of the support. When the back coat film is composed of a metal film, ultraviolet irradiation is performed before the metal film (back coat film) is provided. As the material of the back coat film, for example, Cu-Al-X (where X is Mn, Fe, N
One or more selected from the group of i) type alloys and Al-Si type alloys can be used. Cu
When using an -Al-X alloy, the Al content is 5 to
It is preferably 30 at% and the X content is 5 at% or less. Particularly preferably, the Cu content is 70 to 90.
at%, Al content is 8 to 25 at%, Mn content is 0.5 to 4 at%, Fe content is 0.4 to 5 at%.
And the Ni content is 0.4 to 4 at%, Mn, F
It is preferable that the total content of e and Ni is 1 to 6 at%. When an Al-Si alloy is used, the Al content is preferably 15 to 70 at% and the Si content is preferably 15 to 70 at%.

【0014】上記金属磁性膜やバックコート膜は、蒸着
法、直流スパッタ法、交流スパッタ法、高周波スパッタ
法、直流マグネトロンスパッタ法、高周波マグネトロン
スパッタ法、イオンビームスパッタ法などの各種の乾式
メッキ手段を採用できる。従って、本発明の装置は、こ
れらの乾式メッキ装置に紫外線照射手段を内蔵させるこ
とによって構成される。
The metal magnetic film and the back coat film may be formed by various dry plating means such as a vapor deposition method, a DC sputtering method, an AC sputtering method, a high frequency sputtering method, a DC magnetron sputtering method, a high frequency magnetron sputtering method and an ion beam sputtering method. Can be adopted. Therefore, the apparatus of the present invention is constructed by incorporating the ultraviolet irradiation means in these dry plating apparatuses.

【0015】尚、これらの膜の形成時に酸化性ガスを供
給し、表層部分を酸化させ、酸化膜による保護膜が形成
されるようにすることが好ましいものである。本発明で
用いられる紫外線としては、波長が50nm〜350n
mのものが用いられる。そして、このような波長の紫外
線を照射するランプが成膜の行われる真空槽(蒸着装置
などの乾式メッキ装置)内に配設されており、成膜がな
される前段階の位置において紫外線照射がなされる。そ
して、この後、引き続いて磁性膜などの成膜が行われ
る。
It is preferable that an oxidizing gas is supplied at the time of forming these films to oxidize the surface layer portion so that a protective film made of an oxide film is formed. The ultraviolet ray used in the present invention has a wavelength of 50 nm to 350 n.
m is used. A lamp for irradiating ultraviolet rays having such a wavelength is arranged in a vacuum chamber (dry plating apparatus such as a vapor deposition apparatus) in which film formation is performed, and the ultraviolet irradiation is performed at a position before the film formation. Done. Then, after this, a magnetic film or the like is subsequently formed.

【0016】尚、上記においては、磁気記録媒体に適用
される場合で述べたが、これは金属薄膜型のインクリボ
ン等にも適用できるものである。以下、具体的な実施例
を挙げて本発明を説明する。
In the above description, the case of being applied to a magnetic recording medium has been described, but this is also applicable to a metal thin film type ink ribbon and the like. Hereinafter, the present invention will be described with reference to specific examples.

【0017】[0017]

【実施例】【Example】

〔実施例1〕図1は、本発明になる磁気記録媒体の製造
装置の概略図である。同図中、1はPETフィルムから
なる支持体、2aは支持体1の供給側ロール、2bは支
持体1の巻取側ロール、3は冷却キャンロール、4は遮
蔽板、5はルツボ、6はCo系磁性金属、7は電子銃、
8は真空槽、9は酸素ガス供給ノズルである。
[Embodiment 1] FIG. 1 is a schematic view of an apparatus for manufacturing a magnetic recording medium according to the present invention. In the figure, 1 is a support made of a PET film, 2a is a supply side roll of the support 1, 2b is a winding side roll of the support 1, 3 is a cooling can roll, 4 is a shielding plate, 5 is a crucible, 6 Is a Co-based magnetic metal, 7 is an electron gun,
Reference numeral 8 is a vacuum tank, and 9 is an oxygen gas supply nozzle.

【0018】10は、供給側ロール2aと冷却キャンロ
ール3との間の支持体1走行経路に沿って真空槽8内に
設けられた紫外線照射ランプである。尚、本実施例にお
いては、従来設けられていたイオンボンバード装置はな
い。上記のように構成させた装置において、真空槽8内
を10-4〜10-6Torr程度、例えば2×10-5To
rrの真空度に排気した後、電子銃(16kW)7によ
る電子ビーム加熱によりルツボ5内の磁性金属6を蒸発
させ、この蒸発が定常状態に到達した後、紫外線照射ラ
ンプ(出力300W、波長50〜350nm)10のス
イッチをオンにすると共に、支持体1を5m/minで
走行させる。これにより、紫外線照射を受けた支持体1
面上に、例えば1600Å厚さ磁性金属(Co)6が蒸
着し、磁性薄膜が構成される。
Reference numeral 10 denotes an ultraviolet irradiation lamp provided in the vacuum chamber 8 along the traveling path of the support 1 between the supply side roll 2a and the cooling can roll 3. In this embodiment, there is no conventional ion bombardment device. In the apparatus configured as described above, the inside of the vacuum chamber 8 is about 10 −4 to 10 −6 Torr, for example, 2 × 10 −5 Tor.
After exhausting to a vacuum degree of rr, electron beam heating by an electron gun (16 kW) 7 evaporates the magnetic metal 6 in the crucible 5, and after this evaporation reaches a steady state, an ultraviolet irradiation lamp (output 300 W, wavelength 50 (-350 nm) 10 and the support 1 is run at 5 m / min. As a result, the support 1 that has been irradiated with ultraviolet rays
A magnetic metal (Co) 6 having a thickness of, for example, 1600Å is vapor-deposited on the surface to form a magnetic thin film.

【0019】この磁性薄膜の形成に際しては、ノズル9
のノズル口からO2 ガスが180sccmの割合で供給
され、支持体1上に蒸着形成される磁性薄膜の表層部分
が強制酸化させられる。このようにして磁性薄膜が形成
され、巻取側ロール2bに巻き取られた後、巻取側ロー
ル2bを取り出し、そして平均粒径20nmのカーボン
ブラック及び塩化ビニル系樹脂とウレタンプレポリマー
とからなるバインダ樹脂を分散させてなるバックコート
用の塗料をダイレクトグラビア法により磁性層とは反対
側の支持体1面に塗布し、乾燥厚さが0.5μmのバッ
クコート層を設ける。
When forming this magnetic thin film, the nozzle 9 is used.
O 2 gas is supplied at a rate of 180 sccm from the nozzle port of No. 1 to forcibly oxidize the surface layer portion of the magnetic thin film formed by vapor deposition on the support 1. After the magnetic thin film is formed in this manner and wound on the winding side roll 2b, the winding side roll 2b is taken out and composed of carbon black having an average particle diameter of 20 nm, a vinyl chloride resin and a urethane prepolymer. A back coat coating material in which a binder resin is dispersed is applied by a direct gravure method to one surface of the support opposite to the magnetic layer to provide a back coat layer having a dry thickness of 0.5 μm.

【0020】そして、フッ素パーフルオロポリエーテル
(グレード:FOMBLIN ZDIAC カルボキシ
ル基変性、日本モンテジソン社製)をフッ素不活性液体
(フロリナート、FC−84、住友スリーエム社製)に
0.1%となるよう希釈・分散させた塗料をダイ塗工方
式により乾燥後の厚さが20Å程度となるよう磁性面に
塗布し、70℃で乾燥させる。
Fluorine perfluoropolyether (grade: FOMBLIN ZDIAC carboxyl group modified, manufactured by Nippon Montedison Co., Ltd.) was diluted with a fluorine inert liquid (Fluorinert, FC-84, manufactured by Sumitomo 3M Limited) to a concentration of 0.1%. -Apply the dispersed coating material on the magnetic surface by a die coating method so that the thickness after drying is about 20Å, and dry at 70 ° C.

【0021】この後、所定の幅にスリットした。 〔実施例2〕実施例1においては、出力300Wの紫外
線照射ランプが2個であったが、これを3個に増やした
他は同様に行った。 〔実施例3〕実施例1においては、出力300Wの紫外
線照射ランプが2個であったが、出力500Wの紫外線
照射ランプが3個とした他は同様に行った。
After that, slits were made to a predetermined width. [Example 2] In Example 1, two ultraviolet irradiation lamps having an output of 300 W were used, but the same procedure was performed except that the number was increased to three. [Embodiment 3] In Embodiment 1, two ultraviolet irradiation lamps having an output of 300 W were used, but the same operation was performed except that three ultraviolet irradiation lamps having an output of 500 W were used.

【0022】〔比較例1〕実施例1において、紫外線照
射ランプ10のスイッチをオフにし、紫外線照射しなか
った他は同様に行った。 〔比較例2〕実施例1において、紫外線照射の代わりに
イオンボンバード処理した他は同様に行った。
[Comparative Example 1] The same procedure as in Example 1 was carried out except that the ultraviolet irradiation lamp 10 was turned off and no ultraviolet irradiation was performed. [Comparative Example 2] The same procedure as in Example 1 was carried out except that ion bombardment treatment was carried out instead of UV irradiation.

【0023】〔特性〕上記の各例で得た磁気テープにつ
いて、磁性膜の剥離強度を調べたので、その結果を表−
1に示す。 これによれば、紫外線照射されたフィルム上に蒸着形成
された膜の密着強度は高いことが判る。特に、イオンボ
ンバード処理による場合よりも密着強度が高く、かつ、
実施も簡単であり、製造コストも低廉であることは注目
される。
[Characteristics] With respect to the magnetic tapes obtained in the above examples, the peeling strength of the magnetic film was examined.
It is shown in FIG. According to this, it can be seen that the adhesion strength of the film formed by vapor deposition on the film irradiated with ultraviolet rays is high. In particular, the adhesion strength is higher than that by the ion bombardment treatment, and
It is noted that the implementation is simple and the manufacturing cost is low.

【0024】[0024]

【効果】本発明によれば、密着強度に富む金属膜が簡
単、かつ、低廉なコストで得られる。
According to the present invention, a metal film having a high adhesion strength can be obtained easily and at low cost.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明になる磁気記録媒体の製造装置の概略説
明図
FIG. 1 is a schematic explanatory view of a magnetic recording medium manufacturing apparatus according to the present invention.

【図2】従来の磁気記録媒体の製造装置の概略説明図FIG. 2 is a schematic explanatory diagram of a conventional magnetic recording medium manufacturing apparatus.

【符号の説明】[Explanation of symbols]

1 支持体 2a 供給側ロール 2b 巻取側ロール 3 冷却キャンロール 4 遮蔽板 5 ルツボ 6 磁性金属 8 真空槽 10 紫外線照射ランプ 1 Support 2a Supply side roll 2b Winding side roll 3 Cooling can roll 4 Shielding plate 5 Crucible 6 Magnetic metal 8 Vacuum tank 10 Ultraviolet irradiation lamp

───────────────────────────────────────────────────── フロントページの続き (72)発明者 若林 繁美 栃木県芳賀郡市貝町大字赤羽2606 花王株 式会社情報科学研究所内 (72)発明者 志賀 章 栃木県芳賀郡市貝町大字赤羽2606 花王株 式会社情報科学研究所内 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Shigemi Wakabayashi 2606, Akabane, Kai-cho, Haga-gun, Tochigi Prefecture Kao Co., Ltd.Institute of Information Sciences (72) Inventor Akira Shiga, 2606 Akabane, Kaiga-cho, Haga-gun, Tochigi Kao-sha ceremony Company Information Science Laboratory

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 樹脂製の支持体上に金属膜を成膜する方
法であって、前記支持体に紫外線を照射する紫外線照射
工程と、この紫外線照射工程により紫外線照射を受けた
支持体上に金属粒子を堆積させる金属膜成膜工程とを具
備することを特徴とする金属膜の成膜方法。
1. A method for forming a metal film on a resin-made support, which comprises an ultraviolet-irradiating step of irradiating the support with ultraviolet rays, and a support irradiated with ultraviolet rays by the ultraviolet-irradiating step. And a metal film forming step of depositing metal particles.
【請求項2】 紫外線照射工程が真空雰囲気下で行わ
れ、この真空雰囲気下において金属膜成膜工程も行われ
ることを特徴とする請求項1の金属膜の成膜方法。
2. The method for forming a metal film according to claim 1, wherein the ultraviolet irradiation step is performed in a vacuum atmosphere, and the metal film forming step is also performed in the vacuum atmosphere.
【請求項3】 樹脂製の支持体上に金属膜を成膜する装
置であって、前記支持体に紫外線を照射する紫外線照射
手段と、この紫外線照射手段により紫外線照射を受けた
支持体上に金属粒子を堆積させる金属膜成膜手段とを具
備することを特徴とする金属膜の成膜装置。
3. An apparatus for depositing a metal film on a resin support, comprising: an ultraviolet irradiation means for irradiating the support with ultraviolet rays; and a support irradiated with ultraviolet rays by the ultraviolet irradiation means. A metal film forming apparatus, comprising: a metal film forming means for depositing metal particles.
【請求項4】 走行する支持体上に金属膜を成膜する装
置であって、真空槽と、成膜源となる金属材料と、この
金属材料を飛散させる飛散手段と、この飛散手段で飛散
した金属粒子が堆積する樹脂製の支持体と、この支持体
の供給手段と、支持体の巻取手段と、前記飛散した金属
粒子が堆積する支持体の走行をガイドする冷却キャンロ
ールと、この冷却キャンロールと前記供給手段との間で
あって、冷却キャンロールに添接されない側の支持体面
を紫外線照射する紫外線照射手段とを具備してなること
を特徴とする金属膜の成膜装置。
4. An apparatus for forming a metal film on a moving support, comprising a vacuum chamber, a metal material as a film forming source, a scattering means for scattering the metal material, and a scattering means for scattering the metal material. A resin support on which the metal particles are deposited, a supply means for the support, a winding means for the support, a cooling can roll for guiding the travel of the support on which the scattered metal particles are deposited, An apparatus for depositing a metal film, comprising: an ultraviolet irradiation means for irradiating the surface of the support, which is between the cooling can roll and the supply means, and is not contacted with the cooling can roll, with ultraviolet light.
JP23502394A 1994-09-29 1994-09-29 Formation of metal film and equipment therefor Pending JPH08102068A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23502394A JPH08102068A (en) 1994-09-29 1994-09-29 Formation of metal film and equipment therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23502394A JPH08102068A (en) 1994-09-29 1994-09-29 Formation of metal film and equipment therefor

Publications (1)

Publication Number Publication Date
JPH08102068A true JPH08102068A (en) 1996-04-16

Family

ID=16979940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23502394A Pending JPH08102068A (en) 1994-09-29 1994-09-29 Formation of metal film and equipment therefor

Country Status (1)

Country Link
JP (1) JPH08102068A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004024804A1 (en) * 2002-09-10 2004-03-25 National Institute Of Advanced Industrial Science And Technology Method for producing poly(methyl methacrylate)-metal cluster composite
WO2024119580A1 (en) * 2022-12-07 2024-06-13 重庆金美新材料科技有限公司 Polymer base film surface treatment method and device, and coated product

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004024804A1 (en) * 2002-09-10 2004-03-25 National Institute Of Advanced Industrial Science And Technology Method for producing poly(methyl methacrylate)-metal cluster composite
GB2408738A (en) * 2002-09-10 2005-06-08 Nat Inst Of Advanced Ind Scien Method for producing poly(methyl methacrylate)-metal cluster composite
GB2408738B (en) * 2002-09-10 2006-12-06 Nat Inst Of Advanced Ind Scien Method for producing Poly(Methyl Methacrylate)-metal cluster composite
KR100851790B1 (en) * 2002-09-10 2008-08-13 도꾸리쯔교세이호진 상교기쥬쯔 소고겡뀨죠 Method for producing polymethyl methacrylate-metal cluster composite
WO2024119580A1 (en) * 2022-12-07 2024-06-13 重庆金美新材料科技有限公司 Polymer base film surface treatment method and device, and coated product

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