JPS6056087A - High-speed plating device - Google Patents

High-speed plating device

Info

Publication number
JPS6056087A
JPS6056087A JP16243683A JP16243683A JPS6056087A JP S6056087 A JPS6056087 A JP S6056087A JP 16243683 A JP16243683 A JP 16243683A JP 16243683 A JP16243683 A JP 16243683A JP S6056087 A JPS6056087 A JP S6056087A
Authority
JP
Japan
Prior art keywords
semi
cylindrical
plating
anodes
holders
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16243683A
Other languages
Japanese (ja)
Other versions
JPH025834B2 (en
Inventor
Shigeo Kosakai
小坂井 茂男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chuo Seisakusho KK
Original Assignee
Chuo Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chuo Seisakusho KK filed Critical Chuo Seisakusho KK
Priority to JP16243683A priority Critical patent/JPS6056087A/en
Publication of JPS6056087A publication Critical patent/JPS6056087A/en
Publication of JPH025834B2 publication Critical patent/JPH025834B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To increase plating rate while maintaining high quality by providing a pair of front and rear hollow cylindrical anodes having semi-cylindrical inside surfaces which attach and detach to and from each other in forward and backward directions between right and left holders which sandwich both ends of a bar-shaped material to be treated. CONSTITUTION:A titled device consists of right and left holders 10, 20 which sandwich both edns of a bar-shaped material (a) to be treated and use the material (a) as a cathode and a pair of front and rear semi-cylindrical anodes 30 having semi-cylindrical inside surfaces which attach and detach to and from each other in forward and backward directions between the holders 10 and 20. A cylindrical plating chamber 40 in the center of which the material (a) is inserted is formed by the semi-cylindrical inside surfaces 33 with each other while both anodes 30 are joined to each other. The only requirement for the holders 10, 20 is therefore to assure the slight right and left movement necessary for clamping and the only required for the anodes 30 is to assure forward and backward movement to open the same to the extent of allowing disengagement of the material (a) from above.

Description

【発明の詳細な説明】 本発明は、棒状被処理物の外周に被処理物の長手方向に
沿ったメッキ液の流動を生じさせ、前記被処理物の外周
にメッキ処理を施すようにした高速メッキ処理装置に関
する。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides a high-speed plating method that causes a plating solution to flow along the longitudinal direction of the rod-shaped object to perform plating on the outer periphery of the object. Related to plating processing equipment.

メッキ速度を向上させるためには、電極表面の電流密度
を高くすればよいが、高質な仕上がりを保持するために
は限界がある。そこで高品質を維持しつつメッキ速度の
向上を図るための方法として、被メツキ表面とメッキ液
を相対的に高速移動させる方法がある。
In order to improve the plating speed, it is possible to increase the current density on the electrode surface, but there is a limit to maintaining a high quality finish. Therefore, as a method for improving the plating speed while maintaining high quality, there is a method of moving the surface to be plated and the plating solution at a relatively high speed.

この方法を棒状被処理物のメッキ処理に適用したものと
して、被処理物の外周にその長手方向に沿ってメッキ液
の流動を生じさせるものがあるが、この種の従来の高速
メッキ装置は、特開昭57−143487に開示される
ように、固定した円筒状メッキ室の両側に棒状被処理物
を挟持する左右一対のホルダーをエアーシリンダーによ
ってメッキ室内への通人可能に配置し、あらかじめ前記
ホルダ一対を棒状被処理物の長手方向に沿って筒状メッ
キ室の一外側部に移動し、前記ホルダ一対間に被処理物
を挟持してから、再びメッキ室内部に移動して前記被処
理物をメッキ室の中間に位置させ、メッキ室内にメッキ
液を被処理物の長手方向に沿って流動して前記被処理物
の表面にメッキ処理を施すようにしてなる。ところでこ
のような構成であると、被処理物を取付は又は除去する
工程毎に一方のホルダーをメッキ室内を通過して、他側
部にその先端を移動させる必要があり。
There is a method in which this method is applied to plating a rod-shaped object, in which the plating solution is caused to flow along the length of the object, but conventional high-speed plating equipment of this type As disclosed in Japanese Patent Application Laid-Open No. 57-143487, a pair of left and right holders that hold a rod-shaped object to be processed are arranged on both sides of a fixed cylindrical plating chamber so that they can be passed through the plating chamber by an air cylinder, and the A pair of holders are moved along the longitudinal direction of the rod-shaped object to one outside of the cylindrical plating chamber, the object to be processed is held between the pair of holders, and then moved into the plating chamber again to hold the object to be processed. The object is placed in the middle of the plating chamber, and the plating solution is flowed into the plating chamber along the length of the object to plate the surface of the object. However, with such a configuration, it is necessary to pass one holder through the plating chamber and move its tip to the other side each time the object to be processed is attached or removed.

このためホルダーの移動距離を確保する必要から、長ス
トロークのエアーシリンダーを要し、前記被処理物の長
さと相俟って装置が左右方向に長くなり、装置の纒まり
が悪く、かつ装置面積が大となる欠点がある。また被処
理物をメッキ室から離間した位置で取付けてからメッキ
室内へ移送するものであるから、メッキ室内での実際の
保持状態を確認できず、被処理物がメッキ室内面に対し
て偏位していたり、場合によっては移送途中で被処理物
が脱落している場合があってもこれを放置しがちとなる
。さらにまた前記メッキ室内部は常に閉状態にあるから
室内の点検保全が困難である。
For this reason, it is necessary to ensure the moving distance of the holder, so an air cylinder with a long stroke is required, which, together with the length of the object to be treated, makes the device long in the left and right direction, making it difficult to organize the device and reducing the device area. There is a major drawback. In addition, since the workpiece is mounted at a distance from the plating chamber and then transferred to the plating chamber, it is not possible to check the actual state of the workpiece being held in the plating chamber, and the workpiece may be deviated from the inside of the plating chamber. Even if the objects to be processed are washed away or, in some cases, fall off during transportation, they tend to be left unattended. Furthermore, since the interior of the plating chamber is always closed, inspection and maintenance of the interior of the chamber is difficult.

本発明は前記従来欠点を除去した高速メッキ装置の提供
を目的とするものであって、棒状被処理物の両端を挟持
して該被処理物を陰極とする左右のホルダーと、該ホル
ダー間において、前後方向に接離する半円筒状内面を有
する前後一対の中空円筒陽極とからなり、前記再陽極が
接合した状態で、前記半円筒状内面相互により前記被処
理物が中心を挿通する円筒状メッキ室を形成し、前記メ
ッキ室内にメッキ液を被処理物の長手方向に沿って流動
させるようにしてなり、棒の長手方向に沿ったホルダー
の移動を可及的に短縮するようにし、被処理物の挟持操
作をそのメッキ処理位置で施すことを可能としてその保
持を確実とし、さらにメッキ室内を縦分割を可能として
その内面の点検、保全を容易としたものである。
The present invention aims to provide a high-speed plating apparatus that eliminates the above-mentioned conventional drawbacks, and includes left and right holders that hold both ends of a rod-shaped object to be processed and use the object as a cathode, and a , consisting of a pair of front and rear hollow cylindrical anodes having semi-cylindrical inner surfaces that approach and separate in the front-rear direction, and in a state in which the re-anodes are joined, the object to be processed passes through the center of the semi-cylindrical inner surfaces. A plating chamber is formed, and the plating solution is made to flow in the longitudinal direction of the object to be treated, so that the movement of the holder along the longitudinal direction of the rod is shortened as much as possible. It is possible to perform a clamping operation on the object to be processed at the plating processing position, thereby ensuring the retention of the object, and furthermore, it is possible to vertically divide the interior of the plating chamber to facilitate inspection and maintenance of the inner surface.

本発明の一実施例を添付図面について説明する。An embodiment of the invention will be described with reference to the accompanying drawings.

第1図について、装置枠体l内部には、循環ポンプ4と
連通している矩形状タンク2が設けられ、さらに前記枠
体lの上部には図中左位置に、そのロッドの伸縮方向を
左右にした小ストロークのクランプ用シリンダー5が取
付けられ、そのロッド端に後記する移動ホルダー10を
支持する移動バー11が固定されている。また、前記移
動ホルダーlOに左右で対向し、かつ棒状被処理物aの
装着間隙Sを置いて固定ホルダー20が前記装置枠体l
に固定されている。前記固定ホルダー20は、後記する
ように前記循環ポンプ4と、ダイヤフラムバルブ7を介
装した導管路6によって連通し、前記循環ポンプ4によ
りタンク2内のメッキ液が前記導管路6から固定ホルダ
ー20内に供給される。
Referring to FIG. 1, a rectangular tank 2 communicating with a circulation pump 4 is provided inside the device frame l, and a rectangular tank 2 communicating with a circulation pump 4 is provided at the top of the frame l at the left position in the figure. A clamping cylinder 5 with a small stroke on the left and right sides is attached, and a moving bar 11 supporting a moving holder 10, which will be described later, is fixed to the rod end. Further, a fixed holder 20 is mounted on the device frame lO, facing the movable holder lO on the left and right sides, and with a mounting gap S for the rod-shaped object a placed therebetween.
Fixed. As will be described later, the fixed holder 20 communicates with the circulation pump 4 through a conduit 6 with a diaphragm valve 7 interposed therebetween. supplied within.

また前記装置枠体lの前記装着間隙Sの前後には、後記
する前後一対の中空半筒状陽極30,30が配置され、
夫々装置枠体lの前後に設けられて、そのロッドの伸縮
方向を前後方向とした押出シリンダー8,8の端部に連
結されている。前記半筒状陽極30.30は、タンク2
上部に差渡されたガイドバー9によって、その押出シリ
ンダー8.8の伸縮に伴う前後移動を確実に案内される
Further, a pair of front and rear hollow semi-cylindrical anodes 30, 30, which will be described later, are arranged before and after the mounting gap S of the device frame l,
They are provided at the front and rear of the device frame 1, respectively, and are connected to the ends of extrusion cylinders 8, 8 with the direction of expansion and contraction of the rods being the front and back direction. The semi-cylindrical anode 30.30 is connected to the tank 2.
A guide bar 9 extending across the upper portion reliably guides the forward and backward movement of the extrusion cylinder 8.8 as it expands and contracts.

その他、前記タンク2の左部には、前記移動ホルダー1
0の移動に伴ってオーバーフローしたメッキ液を回収す
るため、移動バー11の直下に補助タンク2aが設けら
れ、同じ意味からタンク2の前後位置にも半筒状陽極3
0.30の移動バー31の直下に補助タンク2 b 、
 2 b i<設けられている。
In addition, on the left side of the tank 2, the movable holder 1
An auxiliary tank 2a is provided directly under the moving bar 11 in order to collect the plating solution that overflows as the plating solution moves.
An auxiliary tank 2 b is placed directly below the moving bar 31 of 0.30 mm,
2 b i< provided.

前記移動ホルダー10.固定ホルダー20及び半筒状陽
極30.30について第2〜4図により、さらに詳細に
説明する。
The movable holder 10. The fixed holder 20 and the semi-cylindrical anode 30.30 will be explained in more detail with reference to FIGS. 2-4.

前記移動ホルダー10は、移動バー11先端に連続する
小径杆状をしていて、その先端に中空の棒状被処理物a
の端部に嵌入する円錐嘴片12が突成され、さらにその
周部に、開口面を内側とした液受カバー13が固定され
ている。また前記移動ホルダー10及び移動バー11周
面には、テフロン層14が形成され、その周面を電気的
に絶縁し、頚部にメッキ処理が施されるのを防止してい
る。
The movable holder 10 has a small-diameter rod shape that continues to the tip of the movable bar 11, and a hollow rod-shaped object to be processed a is attached to the tip of the rod.
A conical beak piece 12 is formed to fit into the end of the conical beak, and a liquid receiving cover 13 is fixed to the periphery of the conical beak piece 12 with the opening surface facing inside. Further, a Teflon layer 14 is formed on the circumferential surfaces of the movable holder 10 and the movable bar 11 to electrically insulate the circumferential surfaces and prevent the neck from being plated.

また前記固定ホルダー20は、第3図に示すように二段
筒体状をしていて、その小径前筒21aには大径後筒2
1bの内部空隙と連通ずる環状開口22が左右方向に設
けられている。固定ホルダー20の大径後筒21bの内
部空隙には、タンク2の壁面に支持される前記導管路6
の端部の取付は管23が内嵌し、その流路24の内径を
前記環状開口22の外周径と等しくしであるとともに、
前記小径前筒21aの内面に、基部の径を前記環状開口
22の内周径と等しくした円錐状の整流コーン25がそ
の先鋭端を後方に向けて螺着し、前記導管路6から送ら
れるメッキ液が乱流を生ず°ることなく、前記流路24
から環状開口22内に流入するようにしている。また前
記環状開口22の内周径は、被処理物aの外径と略等し
くし、また外周径は、後記するメッキ室40の内径と略
等しくし、これにより前記環状開口22から流出したメ
ッキ液がメッキ室40内においても乱流を生じないよう
にしている。
The fixed holder 20 has a two-stage cylindrical shape as shown in FIG.
An annular opening 22 communicating with the internal cavity of 1b is provided in the left-right direction. In the internal space of the large-diameter rear cylinder 21b of the fixed holder 20, the conduit passage 6 supported on the wall surface of the tank 2 is provided.
The end of the pipe 23 is fitted in such a manner that the inner diameter of the flow passage 24 is equal to the outer circumferential diameter of the annular opening 22, and
A conical rectifying cone 25 whose base diameter is equal to the inner circumferential diameter of the annular opening 22 is screwed onto the inner surface of the small-diameter front cylinder 21a with its sharp end facing backward, and is sent from the conduit 6. The plating solution flows through the flow path 24 without causing turbulence.
The water flows into the annular opening 22 from the inside. Further, the inner circumferential diameter of the annular opening 22 is made approximately equal to the outer diameter of the object to be processed a, and the outer circumferential diameter is made approximately equal to the inner diameter of the plating chamber 40, which will be described later, so that the plating that flows out from the annular opening 22 The liquid is also prevented from causing turbulence within the plating chamber 40.

さらに前記小径前筒21aの先端部には、前記移動ホル
ダー10の円錐嘴片12と左右で一致する位置で棒状被
処理物aの内端部に密嵌する嘴片26が突成されている
Further, at the tip of the small diameter front cylinder 21a, a beak piece 26 is formed to protrude and fit tightly into the inner end of the rod-shaped object a at a position that matches the conical beak piece 12 of the movable holder 10 on the left and right sides. .

前記固定ホルダー20は、給電部27から給電されて、
陰極側に印加される。また前記固定ホルダー20の外周
及び環状開口22の内面にはテフロン層28が形成され
、これによりその表面を絶縁して該表面にメッキ処理を
施されるのを防止している。
The fixed holder 20 is supplied with power from the power supply section 27,
Applied to the cathode side. Further, a Teflon layer 28 is formed on the outer periphery of the fixed holder 20 and the inner surface of the annular opening 22, thereby insulating the surface and preventing the surface from being plated.

前記半筒状陽極30.30について説明すると、半筒状
陽極30.30の内面には、白金、鉛等−の不溶性金属
によって成形された半円状露出極板32がその上下部を
半筒状陽極30.30の上下に螺着することにより交換
可能に取付けられ、これにより半筒状陽極30.30に
夫々半円筒状内面33.33が形成される。またその右
端部には、押出シリンダー8,8の伸張状態において、
前記固定ホルダー20の小径前筒21aに密接状に外嵌
する大径内面34を形成されている。さらに半筒状陽極
30.30の一方には、その上下の垂直面に棒状被処理
物aの長手方向に沿って、遮蔽用パツキン35.35が
固着され、前記押出シリンダー8.8の伸張状態におい
て、第4図に示すように遮蔽用パツキン35と他方の半
筒状陽極30の垂直面が当接して半筒状陽極30.30
内に密閉状のメッキ室40が形成されるようにしである
To explain the semi-cylindrical anode 30.30, on the inner surface of the semi-cylindrical anode 30.30, there is a semi-cylindrical exposed electrode plate 32 formed from an insoluble metal such as platinum or lead. The semi-cylindrical anodes 30.30 are screwed onto the top and bottom of the anodes 30.30 so as to be replaceable, thereby forming semi-cylindrical inner surfaces 33.33 on the semi-cylindrical anodes 30.30, respectively. In addition, at the right end part, when the extrusion cylinders 8, 8 are in the extended state,
A large-diameter inner surface 34 is formed that tightly fits onto the small-diameter front cylinder 21a of the fixed holder 20. Furthermore, a shielding gasket 35.35 is fixed to one of the semi-cylindrical anodes 30.30 along the longitudinal direction of the rod-shaped object a on the upper and lower vertical surfaces thereof, and the extrusion cylinder 8.8 is in an expanded state. As shown in FIG.
A sealed plating chamber 40 is formed inside.

前記露出極板32は、押出シリンダー8,8の収縮によ
り半筒状陽極30.30相互を離間してから棒状被処理
物aの外径に対応して最適なものと交換することが容易
にでき、これによりその半円筒状内面33と棒状被処理
物8表面との距離を均ゴかつ最適に保つようにするとと
もに、その半円筒状内面33が摩耗した場合には、適宜
に取換えることにより、常に最適なメッキ条件をもたら
すことができるようになる。
The exposed electrode plate 32 can be easily replaced with an optimal one corresponding to the outer diameter of the rod-shaped object a after the semi-cylindrical anodes 30 and 30 are separated from each other by contraction of the extrusion cylinders 8, 8. This allows the distance between the semi-cylindrical inner surface 33 and the surface of the rod-shaped object 8 to be maintained evenly and optimally, and when the semi-cylindrical inner surface 33 becomes worn, it can be replaced as appropriate. This makes it possible to always provide optimal plating conditions.

尚前記露出極板32を省略して、半筒状陽極30.30
に直接、半円筒状内面33を形成するようにしてもよい
Note that the exposed electrode plate 32 is omitted, and a semi-cylindrical anode 30.30 is used.
The semi-cylindrical inner surface 33 may be formed directly on the inner surface 33.

前記実施例の作動について説明する。The operation of the above embodiment will be explained.

棒状被処理物aを移動ホルダー10.固定ホルダー20
で装着間隙S内に挟持するには、あらかじめクランプ用
シリンダー5を収縮して移動ホルダー10を少し後退し
、装着間隙Sで棒状被処理物aの一端を前記固定ホルダ
ー20の嘴片26に嵌入し、再びクランプ用シリンダー
5を作動して移動ホルダー10の円錐嘴片12を内方に
伸出し、その円錐嘴片12を棒状被処理物aの他端に嵌
入し、これにより棒状被処理物aを移動ホルダー10.
固定ホルダー20により挟持する。しかる後、押出シリ
ンダー8,8のロッドを伸張して前記したように、半筒
状陽極30.30の上下の垂直面相互がパツキン35.
35を介して密接し、該内部にメッキ室40が形成され
る。
Move the rod-shaped object a to the holder 10. Fixed holder 20
In order to clamp the workpiece in the mounting gap S, the clamping cylinder 5 is contracted in advance, the movable holder 10 is moved back a little, and one end of the rod-shaped workpiece a is fitted into the beak piece 26 of the fixed holder 20 in the mounting gap S. Then, the clamping cylinder 5 is operated again to extend the conical beak piece 12 of the movable holder 10 inward, and the conical beak piece 12 is inserted into the other end of the rod-shaped workpiece a. Move the holder 10.
It is held by a fixed holder 20. Thereafter, the rods of the extrusion cylinders 8, 8 are expanded so that the upper and lower vertical surfaces of the semi-cylindrical anode 30, 30 are brought into contact with the gasket 35.
35, and a plating chamber 40 is formed therein.

而て、固定ホルダー20及び半筒状陽極30゜30に通
電してから、循環ポンプ4を作動すると、導管路6から
流路24にタンク2内のメッキ液が流入し、前記したよ
うに整流コーン25によって整流されてメッキ液が環状
開口22から乱流を生じることなくメッキ室40内へ流
出する。該メッキ室40内のメッキ液は棒状被処理物a
の周部を被処理物の長手方向に沿って流れて、液受カバ
ー13に衝突して落下し、タンク2に回収される。この
流動状態下において固定ホルダー20によって給電され
て陰極となった棒状被処理物aは、その外周面にメッキ
処理を施される。
When the circulation pump 4 is activated after power is applied to the fixed holder 20 and the semi-cylindrical anode 30, the plating solution in the tank 2 flows from the conduit 6 into the flow path 24, and is rectified as described above. The plating solution is rectified by the cone 25 and flows out from the annular opening 22 into the plating chamber 40 without generating turbulence. The plating solution in the plating chamber 40 is applied to the rod-shaped object a.
The liquid flows along the length of the object to be treated, collides with the liquid receiving cover 13 and falls, and is collected in the tank 2. In this flowing state, the rod-shaped object a, which is supplied with electricity by the fixed holder 20 and becomes a cathode, is subjected to a plating process on its outer peripheral surface.

尚、本実施例は、中空の棒状被処理物aに適用する構成
ではあるが、非中空の棒状被処理物aに適用するには、
前記嘴片12,26の構造を棒状被処理物aの両端部に
外嵌し得る形状にすればよく、すなわち本発明に適用可
能な被処理物は棒状であればよく、その他の形状の差異
によって限定されるものではない。
Although this embodiment is configured to be applied to a hollow rod-shaped object a, in order to apply it to a non-hollow rod-shaped object a,
The structures of the beak pieces 12 and 26 may be shaped so that they can be fitted onto both ends of the rod-shaped object a, that is, the objects to be treated that can be applied to the present invention may be rod-shaped, and other differences in shape may be used. It is not limited by.

本発明は前記の説明によって明らかにしたように、棒状
被処理物aの両端を挟持する左右のホルダ−10,20
間に、前後方向に接離する半円筒状内面33を有する前
後一対の中空円筒陽極30.30を設け、前記両陽極が
接合した状態で、前記半円筒状内面33.33相互によ
り前記被処理物が中心を挿通する円筒状メッキ室40が
形成されるようにしたから、左右のホルダー1O220
はクランプに要する左右微移動を保障されればよく、半
筒状陽極30.30は、棒状被処理物aを上方から装脱
できる程度の前後開放移動を保障されればよいから、棒
状被処理物aの装脱に伴う各装置の移動ストロークが可
及的に小さくなり、装置が小さくかつ纒まりが良好とな
って装置の据え付は面積を小さくすることができるとと
もに、棒状被処理物aの取付けをその処理位置で施し、
実際の保持状態を確認することができるから、棒状被処
理物aの保持に関する種々のトラブルを事前に除去する
ことができ、さらにはメッキ室40が縦割りになってい
るからメッキ室40内部の点検及び保全が容易となる等
の優れた効果がある。
As clarified from the above description, the present invention is directed to the left and right holders 10 and 20 that hold both ends of the rod-shaped workpiece a.
A pair of front and rear hollow cylindrical anodes 30.30 having a semi-cylindrical inner surface 33 that approaches and separates in the front-rear direction is provided between them, and in a state where both the anodes are joined, the semi-cylindrical inner surface 33. Since the cylindrical plating chamber 40 through which objects are inserted through the center is formed, the left and right holders 1O220
The semi-cylindrical anode 30, 30 only needs to be able to move forward and backward to the extent that the rod-shaped workpiece a can be loaded and unloaded from above. The movement stroke of each device accompanying the loading and unloading of the object a is made as small as possible, the device is small and well-organized, and the installation area of the device can be reduced. installation at the treatment location,
Since the actual holding state can be confirmed, various troubles related to the holding of the rod-shaped workpiece a can be eliminated in advance.Furthermore, since the plating chamber 40 is vertically divided, the inside of the plating chamber 40 can be checked. This has excellent effects such as ease of inspection and maintenance.

【図面の簡単な説明】[Brief explanation of drawings]

添付図面は本発明の実施例を示し第1図は装置の概要平
面図、第2図は要部の縦断側面図、第3図は第2図A−
A線断面図、第4図は第2図B−B線断面図である。 2;タンク 5;クランプ用シリンダー 6;導管路 
lO;移動ホルダー 12;嘴片 20;固定ホルダー
 22;環状開口 25;整流コーン 26;嘴片 3
0 、30 、半筒状陽極 32:露出極板 33:半
円筒状内面 40;メッキ室
The accompanying drawings show embodiments of the present invention, and Fig. 1 is a schematic plan view of the device, Fig. 2 is a longitudinal sectional side view of the main part, and Fig. 3 is Fig. 2A-
FIG. 4 is a sectional view taken along line A and FIG. 4 is a sectional view taken along line B--B in FIG. 2; Tank 5; Cylinder for clamp 6; Conduit line
lO; moving holder 12; beak piece 20; fixed holder 22; annular opening 25; rectifying cone 26; beak piece 3
0, 30, semi-cylindrical anode 32: exposed electrode plate 33: semi-cylindrical inner surface 40; plating chamber

Claims (1)

【特許請求の範囲】[Claims] 棒状被処理物の両端を挟持して該被処理物を陰極とする
左右のホルダーと、該ホルダー間において、前後方向に
接離する半円筒状内面を有する前後一対の中空半筒状陽
極とからなり、前記再陽極が接合した状態で、前記半円
筒状内面相互により前記被処理物が中心を挿通する円筒
状メッキ室を形成し、前記メッキ室内にメッキ液を被処
理物の長手方向に沿って流動させるようにしたことを特
徴とする高速メッキ処理装置
Left and right holders that hold both ends of a rod-shaped object to be processed and use the object as a cathode, and a pair of front and rear hollow semi-cylindrical anodes each having a semi-cylindrical inner surface that approaches and separates in the front-rear direction between the holders. With the re-anode bonded, a cylindrical plating chamber through which the object to be processed passes through the center is formed by the semi-cylindrical inner surfaces, and a plating solution is introduced into the plating chamber along the longitudinal direction of the object to be processed. High-speed plating processing equipment characterized by fluidizing
JP16243683A 1983-09-02 1983-09-02 High-speed plating device Granted JPS6056087A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16243683A JPS6056087A (en) 1983-09-02 1983-09-02 High-speed plating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16243683A JPS6056087A (en) 1983-09-02 1983-09-02 High-speed plating device

Publications (2)

Publication Number Publication Date
JPS6056087A true JPS6056087A (en) 1985-04-01
JPH025834B2 JPH025834B2 (en) 1990-02-06

Family

ID=15754572

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16243683A Granted JPS6056087A (en) 1983-09-02 1983-09-02 High-speed plating device

Country Status (1)

Country Link
JP (1) JPS6056087A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006034277A1 (en) * 2006-07-21 2008-01-24 Gramm Technik Gmbh Device for the surface treatment of a workpiece
US7812891B2 (en) 2005-04-26 2010-10-12 Funai Electric Co., Ltd. Panel display type television and cabinet structure

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55138098A (en) * 1979-04-13 1980-10-28 Yamaha Motor Co Ltd Plating device at high speed

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55138098A (en) * 1979-04-13 1980-10-28 Yamaha Motor Co Ltd Plating device at high speed

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7812891B2 (en) 2005-04-26 2010-10-12 Funai Electric Co., Ltd. Panel display type television and cabinet structure
DE102006034277A1 (en) * 2006-07-21 2008-01-24 Gramm Technik Gmbh Device for the surface treatment of a workpiece

Also Published As

Publication number Publication date
JPH025834B2 (en) 1990-02-06

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