JPS6054665B2 - レリ−フ型を製造するための光重合可能の組成物 - Google Patents

レリ−フ型を製造するための光重合可能の組成物

Info

Publication number
JPS6054665B2
JPS6054665B2 JP15663077A JP15663077A JPS6054665B2 JP S6054665 B2 JPS6054665 B2 JP S6054665B2 JP 15663077 A JP15663077 A JP 15663077A JP 15663077 A JP15663077 A JP 15663077A JP S6054665 B2 JPS6054665 B2 JP S6054665B2
Authority
JP
Japan
Prior art keywords
alkyl
formula
mixture
hydrogen
parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15663077A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5385418A (en
Inventor
ゲ−ルハルト・ホフマン
ウエルナ−・レンツ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of JPS5385418A publication Critical patent/JPS5385418A/ja
Publication of JPS6054665B2 publication Critical patent/JPS6054665B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP15663077A 1976-12-31 1977-12-27 レリ−フ型を製造するための光重合可能の組成物 Expired JPS6054665B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2659699.6 1976-12-31
DE19762659699 DE2659699A1 (de) 1976-12-31 1976-12-31 Photopolymerisierbare masse fuer die herstellung von reliefformen

Publications (2)

Publication Number Publication Date
JPS5385418A JPS5385418A (en) 1978-07-27
JPS6054665B2 true JPS6054665B2 (ja) 1985-11-30

Family

ID=5997121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15663077A Expired JPS6054665B2 (ja) 1976-12-31 1977-12-27 レリ−フ型を製造するための光重合可能の組成物

Country Status (6)

Country Link
JP (1) JPS6054665B2 (US08197722-20120612-C00042.png)
CH (1) CH632096A5 (US08197722-20120612-C00042.png)
DE (1) DE2659699A1 (US08197722-20120612-C00042.png)
FR (1) FR2376439A1 (US08197722-20120612-C00042.png)
GB (1) GB1590590A (US08197722-20120612-C00042.png)
IT (1) IT1092248B (US08197722-20120612-C00042.png)

Also Published As

Publication number Publication date
IT1092248B (it) 1985-07-06
FR2376439A1 (fr) 1978-07-28
FR2376439B1 (US08197722-20120612-C00042.png) 1982-10-22
CH632096A5 (en) 1982-09-15
JPS5385418A (en) 1978-07-27
DE2659699A1 (de) 1978-07-20
GB1590590A (en) 1981-06-03

Similar Documents

Publication Publication Date Title
US4148658A (en) Photopolymerizable composition comprising multi-photoinitiator system
US4537855A (en) Photopolymerizable photosensitive composition
US4416975A (en) Photopolymerization process employing compounds containing acryloyl groups and maleimide groups
US3732107A (en) Photopolymerizable copying composition
US4517279A (en) Photosensitive elastomeric polymer composition for flexographic printing plates - processable in semi-aqueous basic solution or solvent systems
GB2029423A (en) Photo-polymerisable materials and recording method
US5474875A (en) Photosensitive mixture for producing relief and printing plates
US4188222A (en) Photocurable composition containing an N-nitrosodiarylamine
JPH08305018A (ja) 改良された光重合性組成物
US5322762A (en) Photopolymerizable composition
JPH02226148A (ja) 光重合性混合物及びそれを含む光重合性複写材料
JPS63280245A (ja) 水性現像可能な照射硬化性組成物
US4654294A (en) Photosensitive ethylenically unsaturated composition containing a vinyl alcohol polymer having a thiol group
JPH05132530A (ja) 水系現像可能な光硬化性組成物、これで製造された層を有する感光製品、並びにそれらの製品の改良方法
US4894314A (en) Photoinitiator composition containing bis ketocoumarin dialkylamino benzoate, camphorquinone and/or a triphenylimidazolyl dimer
US5750313A (en) Photosensitive resin composition and process for producing the same
JPS6054665B2 (ja) レリ−フ型を製造するための光重合可能の組成物
JPH0231090B2 (US08197722-20120612-C00042.png)
JPH05241340A (ja) 光重合性組成物
JP2002323760A (ja) 光重合性樹脂積層体
US3012952A (en) Process for preparing photopoly-merizable compositions
JPS602945A (ja) 光重合性組成物
JP3414030B2 (ja) 感光性樹脂組成物およびその製造方法
AU602541B2 (en) Photoinitiator composition
JPH07330814A (ja) 光開始剤、感光性組成物、感光材料及びレリーフパターンの製造法