JPS6051582A - Molecule washing method - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION Technical Classification/Field> The 17fl technology belongs to the technical field of cleaning and drying various micron and submicron level contaminants during the processing stages of 17 products such as glass and quartz.

<Explanation of the gist> Therefore, the present invention adds a predetermined surfactant to each row of compound stains adhering to the surface of an object to be cleaned, such as glass or quartz, by adding a predetermined surfactant to the surface of the object to be cleaned. A continuous film of the UrJ activator oriented and adsorbed on the surface is removed by polymer M! This invention relates to a molecular cleaning method in which a solvent is decomposed and removed by a cleaning solution, followed by washing and drying, and in particular, after removing a surfactant adsorption film with the polymeric catalyst, hydration Through the cleaning process with a solvent, the decomposition products obtained in the previous processes are dissolved, and the water wettability of the surface is improved, and a reducing electrolyte solution is added to the hydrogen peroxide solution to peel off and remove the remaining particulate dirt. This invention relates to a method for cleaning molecules.

<Prior art> In general, stains on industrial products such as glass, quartz, etc. can be macroscopically classified into inorganic and organic stains. ! It is usually extremely difficult to completely dissolve and remove these stains without damaging the product or material of the object to be cleaned. Select a solvent such as water alcohol that is suitable for the product, material and stain, and add surfactant and
A precision chemical cleaning method was employed in which a builder agent was appropriately blended and physical energy such as ultrasonic waves, liquid stirring, and showering was applied (cleaning using JI).

For example, one example of conventional typical precision chemical cleaning is shown in flow sheet 1 to approximately as shown in FIG.

However, in the conventional precision chemical cleaning v1 mentioned above, surfactants and the like are often used in the solvent as mentioned above in order to significantly improve the general dirt removal effect. Even if the dirt is removed, a continuous film with a molecular structure of hydrophilic and hydrophobic groups remains on the surface of the object to be cleaned due to the surface active phenomenon, and moreover, it often remains on the surface of the object to be cleaned. =j then 1
There was a drawback that the seeds remained in the form of stains (dry stains).

In other words, the rinsing effect caused by water or alcohol during the rinsing process varies, and furthermore, the surfactant is carried into the water rinsing process and thereafter, and this accumulates, resulting in changes in the surfactant film thickness and This causes variations in its distribution, which is a problem that causes the dry stains mentioned above, and these problems have not been solved for many years, causing problems that have become a bottleneck for the optical and electronic industries.

However, when a surfactant is used in the cleaning solution to precisely remove and peel off dirt, the following problems often occur in the stripping process.

In other words, since most organic solvents such as pure water, distilled water, flucoal, and fluorocarbons have high electrical resistivity, t-y
Submicron to several micron particulate contaminants exist in suspension in the sanitizing solution, exhibiting a colloidal phenomenon, each with its own unique potential.

On the other hand, if the surface of the object to be cleaned, such as glass, ceramic, or semiconductor, which has a highly insulating surface, is completely clean, it may be due to factors such as the type of material, the thickness of the processed layer in the previous process, or the humidity of the environment. Each interface will have its own unique interfacial potential depending on the conditions.

Therefore, in such a state, one part of the nearby particulate dirt
The parts are attracted by the electrostatic force and begin to tilt strongly, and the more they oscillate in the tin liquid, and the more tin tanks there are, There is an inconvenience in that the number of particulate stains in the water is not limited, and the ironic phenomenon continues such that it ends up being worn 4 times, and it is difficult to tell whether it is rinsed or unstained. i
There has been a strong desire to develop technology to reduce iJ performance as much as possible.

To deal with this, it has been devised to use a reverse osmosis membrane or a precision method, but in order to improve the precision of rinsing, the implementation equipment is complicated and expensive. There were advantages.

In addition, when cleaning objects such as optical lenses made of materials with hydrophobic surfaces, electrostatic adhesion of particulate dirt often occurs even during the process of overwashing in city water, where the specific resistance is much lower. There is a risk that some of these particulate dirt may remain on the surface of the object to be cleaned when the next drying process is completed, resulting in a defective product and a large increase in product waste. There were some disadvantages that affected it.

Furthermore, waste liquid treatment is always closely and inseparably related to pollution and treatment costs, but the cleaning and tinting processes are particularly closely related to this waste liquid problem, and the surfactants, builder agents, alcohol, etc. that are closely related to this problem are There are some defects that cannot be avoided after post-processing, and there are safety problems such as ignition and ignition regardless of whether it is in operation or not, as well as work environment preservation and sanitary maintenance. The point above 'I cannot be ignored, and alcohol related to this,
In particular, there were some troublesome points regarding its use that could not be addressed.

<Objective of the Invention> The object of the present invention is to solve the problems of precision chemical cleaning methods derived from the prior art, and to remove dirt from relatively hard solid surfaces such as glass as much as possible. By applying catalytic technology, colloid technology, etc., we can reliably clean complex contaminants in the submicron scale, which was impossible with conventional precision chemical cleaning methods. This paper aims to provide 12 excellent molecular cleaning methods that exhibit ?7i functions and benefit precision technology applications in various weighing industries.

<Structure of the Invention> In accordance with the above-mentioned object and based on the scope of the above-mentioned patent claims, the structure of the present invention is to solve the above-mentioned problem by using a glass coated with complex stains. First, wash the items to be cleaned, such as 4F, where paid solvent is stored! Continuously immerse in 1 to 3 baths (a) to remove soluble organic dirt, then wash in 8 baths with surfactant dissolved.
812, which was brought in from the previous process, is emulsified and organic matter, dirt, and their combined stains are removed. After washing, the next cleaning solution is added. In a tank containing a surfactant, remaining dirt is removed from the surface using a cleaning solution containing a surfactant, and then a polymeric catalyst is used to remove the oriented adsorption function of the surfactant brought in. Completely removes the continuous adsorption film and prevents electrostatic adhesion of colloidal particles.

Subsequently, the object to be cleaned is immersed in 4FF in which a cleaning solution of a hydratable solvent is stored to ensure water wettability on both the hydrophilic and hydrophobic surfaces of the object. Immersed in InI containing hydrogen peroxide and pure water,
In addition, the specific resistance of this liquid is reduced to 5X103Ω-, c+n or less, and the remaining fine particles are finally peeled off from the surface using clean water with a specific resistance of 5X103Q-cm or less, and alcohol vapor, etc. By the hydrating vapor of R
Technological means that allows cleaning and drying to be carried out in a natural manner, and by applying ultrasonic vibrations to each of the above steps to further activate the cleaning function, making it possible to remove even minute dirt on a submicron scale. This study included the following.

<Example> Next, an example of the present invention will be described below with reference to the drawings from FIG. 2 onwards. The object to be cleaned is glass, crystal, quartz, etc., and the embodiment for the object to be cleaned is FDL polishing, for example, before secondary processing such as attaching a film or pickling and etching, and After application, molecular cleaning and drying are performed.

In the examples not shown in FIGS. 2 to 6, steps a to j are washing steps, and the subsequent step j is one dry culm.

It is assumed that a to j represent each process, and together with J represent a tank for each object to be cleaned.

In the embodiment shown in FIG. 2, d3 is a cleaning and drying process for the object to be cleaned which has pitch, pine tar, other resin stains, or a large amount of oil stains during processing. This is the mode.

Therefore, in the embodiment not shown in FIG.
For example, a predetermined solvent such as trichlorethylene is stored in a tank, and the object to be cleaned, such as glass, is appropriately immersed in the organic solvent and, in some cases, shaken for cleaning. -46° In the first step a, the organic solvent is circulated between the filter 1 and the soluble 11
The right stone material removes dirt and peels.

The object to be cleaned that has been subjected to the cleaning action in the first step is then transferred to the second step, and the organic solvent brought in from the first step is removed by the action of the cleaning liquid in step 21. As it emulsifies, organic matter, dirt, and composite dirt, which is a mixture thereof, are removed.

Therefore, the washing liquid in the second process 1) was prepared by mixing sucrose fatty acid ester as a surfactant and trisodium citrate dihydrate as a builder agent, and adding pure water in U. It is something.

Next, the object to be cleaned, from which organic matter, inorganic matter, and their combined stains have been removed in the second step, is carried into the pure water that is poured into the third step 0. It is subjected to l-agi action.

Incidentally, the pure water of Suzugi water may be city water instead of pure water as long as an appropriate water softener is used.

Further, depending on the state of dirt on the object to be cleaned, the third step C may be changed to the second step, or the third step C may be omitted.

Next, the items to be cleaned that have been subjected to the rinsing action are processed in step d of the fourth step.
The object is then transferred to the cleaning agent and subjected to the cleaning action of the same cleaning agent as the cleaning agent in the second step, until the remaining organic matter, non-leprosy, and their combined stains are removed from the surface of the object to be cleaned. Then, in step C of the fifth step, it is subjected to the tinting action of pure water again.

Next, for example, the object to be cleaned is immersed in a polymeric catalyst prepared by mixing β-fulc 1 to furanosigup in pure water, and the above sucrose fatty acid adsorbed in a finely oriented manner onto the surface of the object to be cleaned. By decomposing the ester at its hydrophilic group in a short 12r period, it loses its ability to imitate orientation sucking as a surfactant,
1. As a result, the interfacial interpolant-adsorbed film is completely removed.

Moreover, by e of the sixth step, the continuous adsorbed oriented stains of λ·14−4jf on the object to be cleaned based on the prior art described in (e) above are removed.

However, in the sixth step e, J3, the surfactant suction is completely removed, so the skin (temperament) of the object to be cleaned becomes dewy. Another problem that has arisen in the past is the risk of electrostatic redeposition of colloidal particulate dirt.

Therefore, in the 61st step e, the sucrose part of the decomposed IC sucrose fatty acid ester dissolves in water, but the fat part is insoluble in water, and the cleaning solution in the 6th step 0 specific resistance (if the surface is hydrophilic because it is very low,
Although the fat does not re-deposit electrostatically, on the other hand, if the surface is hydrophobic, it forms a layer through the water in the form of fine particles.

Thereafter, the object to be cleaned washed in the 61st step C is then transferred to the 7th step f, where it is immersed in a mixed solution of ethanol, butanol, and city water to remove the trace amount of fat. is dissolved.

The cleaning liquid stored in the seventh step cleaning tank is used to ensure that the object to be cleaned does not leak to the object to be cleaned. Even if it is immersed with both sides turned to the right, water leakage in subsequent steps can be guaranteed by immersing it in the cleaning liquid.

In addition, if lipase is used instead of the β-fructofuranosidase in the sixth step of the previous step, the fatty acids, which are hydrophobic groups, will be decomposed and the seventh step will be made soluble in water. Although it is not necessary to use the above-mentioned mixed cleaning solution of ethanol, butanol, and city water for the culm, the water leakage of the hydrophobic surface is reduced.

Therefore, in any case, it is extremely effective to use the above-mentioned mixed cleaning solution of ethanol and butanol city water in the seventh step.

Therefore, the object to be cleaned is transferred to the step-by-step step Q of the 8th step, but if pure water is not used and J is not used, the resistivity is high, but the fine particles in the pure water are Although there may be some re-adhesion of the dirt caused by the process, it will be removed in the next step (A).

Next, the object to be cleaned that has been subjected to the pulsating action in the 81st culm Q is transferred to the 9th culm Q.
Engineering fi! 11 and soaked in wash water.

In the 91st culm 11, the cleaning liquid is made by adding hydrogen peroxide and a very small amount of sodium hydroxide to pure water,
Due to the oxidation and reduction effects of these two elements and the 11-2 effects of the hydrating solvent in the 7th step, dirt that could not be removed by the 8th step (mainly particulate composite dirt)
It also has the effect of peeling off particulate dirt that has been electrostatically deposited again.

Therefore, due to the synergistic effect of ultrasonic application (Ll-8), even submicron particles are removed from the surface.

Furthermore, the electrostatic redeposition of particulate contamination is suppressed by the function of a minute amount of sodium hydroxide which reduces the specific resistance of the cleaning liquid, and this tendency appears from about 10@4 Ω-cm onwards.

Therefore, since the amount of sodium hydroxide is very small, the degree of sodium is also low, and the actual damage is extremely small.
Unfavorable for semiconductors.

In addition, although it is called am-, if you want to avoid sodium, ammonia water may be used instead of the above sodium hydroxide, but in this case, ammonia generates an odor,
Since it is toxic, cleaning solution management is problematic.

In the ninth step 1), the JJL cleaning solution is particularly effective for removing submicron class particles when the object to be cleaned has a hydrophilic temperament, and ultrasonic application (tJ-3
) exerts a synergistic effect.

In this way, the object to be cleaned from which submicron fine particles have been removed from the surface in step 11 of the 91st step is transferred to step 1 of the next 10th step. ) is added to the cleaning solution to more effectively remove the adhering fine particles when the temperament is hydrophobic. effectively removed.

In this case, it is a prerequisite that the tenth step 1 acts together with the ninth step 11, which is the preceding step.

Therefore, even if JJ is present in the 101st culm i, ammonia can be used in the same manner as in the second culm.

Note that this step is a final cleaning step similar to the previous step.

Although not mentioned in the cleaning steps a-i above, ultrasonic waves (LJ-3) were applied to each step a-i! Of course, by doing so, they act synergistically and effectively, and also,
It goes without saying that each cleaning solution and the water are circulated through the &+'a A unit 1 and the precision filter 1'.

The object to be cleaned that has completed all the cleaning steps as described above is then subjected to an alcohol vapor washing and drying step as the 11th step.
, rinsed with alcohol vapor, and dried.

In the alcohol vapor cleaning and drying process, an alcohol recovery device for recovery and separation is installed as an accessory device, and as a matter of course, a structure is adopted to prevent the intrusion of solid fine particles of Liebmicron. Ru.

In addition, it has a leak-proof structure, uses an indirect heating system to prevent fires from alcohol vapor, and is equipped with an automatic fire extinguishing system.

Furthermore, the surfactant, builder agent, polymeric catalyst agent, etc. used in the second step b, 41st step d, and 61st step e are all food additives and have low pollution, and The decomposition products of the surfactants are also low-pollution and do not require the use of alcohol.
Since the amount of water is regulated to a minimum and all possible measures have been taken to prevent the risk of ignition and ignition, the problem of waste liquid treatment and safety issues can be solved in general.

The above-mentioned embodiment is for washing and drying the object to be cleaned which has pitch, pine A72, and other resin-based stains or oil-based stains, but in the second embodiment shown in FIG. Items to be cleaned made from materials that are easily scratched and soluble in water, such as nitrous! This is an embodiment of molecular cleaning and drying for Lak, etc., after the second step, the third step d, and the final cleaning] In the ninth step i of the double culm, alcohol is added to the cleaning solution to remove the action of the cleaning solution. 71-, and
This is an embodiment in which the occurrence of latent scratches is suppressed by shortening the immersion time J3 and the ultrasonic irradiation time.

Further, as an embodiment in which oil stains are extremely slight, there is an embodiment shown in FIG. 4 in which the first step a of the two embodiments described above is omitted, and as a measure to suppress the occurrence of latent scratches, the embodiment shown in FIG. After one step, it is possible to adopt an embodiment in which alcohol is added to the second step d1 and σ and the eighth step i which is the final step of the cleaning step.

In addition, as an example of the molecular cleaning process when oily stains are slight and fingerprints are not carefully monitored, an example like J shown in Figure 5 can be adopted, and an example shown in Figure 2 can be adopted. The 21st step b1 and the 4th step d in the example shown in FIG. In the second step, a cleaning solution containing ethanol, butanol, and city water is used to ensure that the surface does not leak, and in the third step, the culm is rinsed with water to remove particulate dirt in the subsequent steps. JJ) to prevent re-adhesion.

Further, the embodiment shown in FIG. 6 is an embodiment of a cleaning process in which the cleaning process is carried out in the case where the object to be cleaned has solid particulate dirt, and substantially the r step is the first step.

It goes without saying that the embodiments of the present invention are not limited to the above-mentioned embodiments, and various embodiments can be adopted.

<Effects of the Invention> According to the present invention, basically, after the oily stains on the object to be cleaned are removed using a solvent, cleaning accuracy can be further improved by applying a surfactant. !1) As a result, the surface of the object to be cleaned is oriented and adsorbed. 1': The continuous film of surfactant is decomposed and removed using a polymeric catalyst cleaning solution, and then ethanol, butanol, city water, etc. Immersed in a hydrating solvent
- By doing so, it is possible to dissolve the degrading acid substances, and furthermore, it is possible to ensure the water wettability of the surface of the object to be cleaned in the subsequent steps.
The excellent effect of removing particulate dirt on the order of 1 micron is achieved.

Furthermore, after cleaning by immersion in the cleaning solution, it is further diluted with water and then reduced to hydrogen peroxide solution. The object to be cleaned is immersed in a mixed cleaning solution such as pure water to which Y'i solution has been added, and the specific resistance thereof is 5 x 1030-cm or less, and the specific resistance is also 5 x 103 Ω-cm or less. The remaining particulate dirt can be completely removed from the surface of the object to be cleaned by using as clean water as possible, and dirt attached to the hydrophobic surface, hydrophilic surface, or both surfaces coexist. It has an excellent effect of completely removing the microscopic stains adhering to the surface.

Conventionally, cleaning in a cleaning solution of 10' Ω-cm or more could not remove submicron particle dirt, but with the present invention, the nanoparticle dirt can be completely removed. I! Particles of sadness? It is absolutely necessary in the precision machinery industry that produces cameras, telescopes, microscopes, etc., and in the electronics industry that requires precision electronic circuits.
Compared to J livestock cleaning and minute-r cleaning, this method has an excellent effect of almost completely removing stains, and has the effect of being able to be dedicated to each type of livestock industry. −

[Brief explanation of drawings]

FIG. 1 is an explanatory flow sheet diagram of precision cleaning based on the prior art, and FIGS. 2 to 6 are explanatory flow sheets 1 to 1 of each embodiment of the present invention. Procedural amendment (from []) Kazuo Wakasugi, Commissioner of the Japan Patent Office Indication of the case 1982 Patent Application No. 157905 2 Title of the invention Molecular cleaning method 3 Relationship with the case of the person making the amendment Patent applicant 4, representative Attorney 〒105 06 Patent Attorney (,7585) Tomi 1) Yukiharu 5, Date of amendment order (voluntary)

Claims (1)

[Claims] Add a surfactant to the solvent and wash the object for a while, then rinse it, and then treat with a polymeric catalyst cleaning solution to absorb the oriented material on the surface of the object to be washed. In the washing/buoyancy method, which decomposes and removes the surfactant film,
immersing the object to be cleaned in the polymer catalyst in a hydratable solvent to dissolve decomposition products and ensure water wettability;
Next, after t-J with water, a reducing electrolyte solution is added to the hydrogen peroxide solution, and the remaining particulate dirt is removed from the surface of the object with clean water, and then it is washed with dust-free hydrating steam. A molecular cleaning method characterized by performing drying.